DE69417461D1 - Reinigungssysteme mit kontrollierten Rühren - Google Patents

Reinigungssysteme mit kontrollierten Rühren

Info

Publication number
DE69417461D1
DE69417461D1 DE69417461T DE69417461T DE69417461D1 DE 69417461 D1 DE69417461 D1 DE 69417461D1 DE 69417461 T DE69417461 T DE 69417461T DE 69417461 T DE69417461 T DE 69417461T DE 69417461 D1 DE69417461 D1 DE 69417461D1
Authority
DE
Germany
Prior art keywords
cleaning systems
controlled stirring
stirring
controlled
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69417461T
Other languages
English (en)
Other versions
DE69417461T2 (de
Inventor
David Reed Benedict
James Frederick Burke
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lockheed Martin Corp
Original Assignee
Lockheed Corp
Lockheed Martin Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lockheed Corp, Lockheed Martin Corp filed Critical Lockheed Corp
Application granted granted Critical
Publication of DE69417461D1 publication Critical patent/DE69417461D1/de
Publication of DE69417461T2 publication Critical patent/DE69417461T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/26—Cleaning or polishing of the conductive pattern
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/102—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0736—Methods for applying liquids, e.g. spraying
    • H05K2203/0743—Mechanical agitation of fluid, e.g. during cleaning of the conductive pattern
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0736—Methods for applying liquids, e.g. spraying
    • H05K2203/0746—Local treatment using a fluid jet, e.g. for removing or cleaning material; Providing mechanical pressure using a fluid jet
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
    • H05K2203/0783—Using solvent, e.g. for cleaning; Regulating solvent content of pastes or coatings for adjusting the viscosity
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/15—Position of the PCB during processing
    • H05K2203/1518—Vertically held PCB

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Cleaning By Liquid Or Steam (AREA)
DE69417461T 1993-04-16 1994-04-13 Reinigungssysteme mit kontrollierten Rühren Expired - Fee Related DE69417461T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/047,080 US5339843A (en) 1993-04-16 1993-04-16 Controlled agitation cleaning system

Publications (2)

Publication Number Publication Date
DE69417461D1 true DE69417461D1 (de) 1999-05-06
DE69417461T2 DE69417461T2 (de) 1999-10-21

Family

ID=21946966

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69417461T Expired - Fee Related DE69417461T2 (de) 1993-04-16 1994-04-13 Reinigungssysteme mit kontrollierten Rühren

Country Status (3)

Country Link
US (1) US5339843A (de)
EP (1) EP0620052B1 (de)
DE (1) DE69417461T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5863348A (en) * 1993-12-22 1999-01-26 International Business Machines Corporation Programmable method for cleaning semiconductor elements
US5431178A (en) * 1994-03-30 1995-07-11 Chiu; Hsien Hsin Centrifugal type, enclosed cleaning apparatus
US5849104A (en) * 1996-09-19 1998-12-15 Yieldup International Method and apparatus for cleaning wafers using multiple tanks
US5884644A (en) * 1997-12-10 1999-03-23 Micron Technology, Inc. Quartz tank for wet semiconductor wafer processing
US6047717A (en) * 1998-04-29 2000-04-11 Scd Mountain View, Inc. Mandrel device and method for hard disks
US6216710B1 (en) 1999-02-05 2001-04-17 Caterpillar Inc. Method and apparatus for removing quench oil from a permeable metal part
US20020023667A1 (en) * 2000-08-31 2002-02-28 Thuan Pham Apparatus and method for cleaning a probe tip
US6858248B2 (en) * 2001-05-30 2005-02-22 Novartis Ag Method for applying a coating to a medical device
TWM308491U (en) * 2006-09-01 2007-03-21 Innolux Display Corp Photoresist striping apparatus with internal air circulating system
US11045845B2 (en) * 2019-09-25 2021-06-29 Honda Motor Co., Ltd. Decontamination station and methods of making and using the same
CN112547587B (zh) * 2020-11-20 2021-10-26 泰州市津达电子科技有限公司 一种变压器铁芯清洗装置

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB529986A (en) * 1939-05-30 1940-12-03 Wallace Scott Improved apparatus for the cleansing of drinking glasses and other receptacles
DE1059740B (de) * 1954-11-15 1959-06-18 Bendix Aviat Corp Reinigungsvorrichtung fuer Waelzlager
DE1067657B (de) * 1955-08-03 1959-10-22 Schilde Maschb Ag Tauchbehaelter fuer Oberflaechenbehandlung
US2918925A (en) * 1956-10-24 1959-12-29 Phillips Petroleum Co Chemical cleaning apparatus
GB1168035A (en) * 1968-06-05 1969-10-22 Scotts Electrical Wholesalers Apparatus for Washing and Decontaminating Hollow Articles Formed of Rubber or Rubber-Like Material
GB1278268A (en) * 1968-08-05 1972-06-21 Colin Clayton Mayers Method and apparatus for polishing glassware
US3868272A (en) * 1973-03-05 1975-02-25 Electrovert Mfg Co Ltd Cleaning of printed circuit boards by solid and coherent jets of cleaning liquid
US4025363A (en) * 1976-01-12 1977-05-24 Benito De Santis Spray equipment cleaner
DE2818512C3 (de) * 1978-04-27 1981-02-05 Daimler-Benz Ag, 7000 Stuttgart Zentralverschluß für Scheibenräder
EP0270928B1 (de) * 1986-11-29 1992-01-15 Asea Brown Boveri Aktiengesellschaft Reinigungsverfahren für ein elekrisches Isolierteil
US4785836A (en) * 1987-07-17 1988-11-22 Soichiro Yamamoto Spray washer
DE3731410A1 (de) * 1987-09-18 1989-04-06 Duerr Gmbh & Co Verfahren und anlage zum flutwaschen
JPH01106493A (ja) * 1987-10-20 1989-04-24 Fujitsu Ltd プリント板洗浄方法
US5048549A (en) * 1988-03-02 1991-09-17 General Dynamics Corp., Air Defense Systems Div. Apparatus for cleaning and/or fluxing circuit card assemblies
US5030293A (en) * 1988-03-09 1991-07-09 Randall L. Rich Method and apparatus for circuit board cleaning
EP0350316B1 (de) * 1988-07-08 1997-05-02 Rhone-Poulenc Chimie Reinigung und Trocknung von elektronischen Bauteilen
FI86944C (fi) * 1989-02-02 1992-10-26 Nokia Mobira Oy Foerfarande foer tvaettning av kretsplattor och en anordning foeg anvaendning i foerfarandet
JPH0389985A (ja) * 1989-05-29 1991-04-15 Japan Fuirudo Kk 被洗浄物の洗浄方法および装置
US5129956A (en) * 1989-10-06 1992-07-14 Digital Equipment Corporation Method and apparatus for the aqueous cleaning of populated printed circuit boards
JPH0458520A (ja) * 1990-06-28 1992-02-25 Ckd Corp 薬液吐出装置
JP2853317B2 (ja) * 1990-11-08 1999-02-03 日本電気株式会社 ウエハー処理装置
DE4100126C2 (de) * 1991-01-04 1995-06-08 Metakon Metallverarbeitung Gmb Verfahren und Vorrichtung zum Reinigen von verschmutzten, insbesondere metallischen Gegenständen mittels einer Reinigungsflüssigkeit
JPH0559397A (ja) * 1991-08-29 1993-03-09 Hitachi Ltd フラツクス洗浄剤およびそれを用いた半田付け電子部品の洗浄方法

Also Published As

Publication number Publication date
DE69417461T2 (de) 1999-10-21
EP0620052B1 (de) 1999-03-31
EP0620052A1 (de) 1994-10-19
US5339843A (en) 1994-08-23

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee