DE69416771D1 - Inspektionsapparat für Halbleiterscheiben - Google Patents

Inspektionsapparat für Halbleiterscheiben

Info

Publication number
DE69416771D1
DE69416771D1 DE69416771T DE69416771T DE69416771D1 DE 69416771 D1 DE69416771 D1 DE 69416771D1 DE 69416771 T DE69416771 T DE 69416771T DE 69416771 T DE69416771 T DE 69416771T DE 69416771 D1 DE69416771 D1 DE 69416771D1
Authority
DE
Germany
Prior art keywords
inspection apparatus
semiconductor wafers
wafers
semiconductor
inspection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69416771T
Other languages
English (en)
Other versions
DE69416771T2 (de
Inventor
Yukiko Nakashige
Tadashi Nishioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renesas Semiconductor Engineering Corp
Mitsubishi Electric Corp
Original Assignee
Renesas Semiconductor Engineering Corp
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renesas Semiconductor Engineering Corp, Mitsubishi Electric Corp filed Critical Renesas Semiconductor Engineering Corp
Application granted granted Critical
Publication of DE69416771D1 publication Critical patent/DE69416771D1/de
Publication of DE69416771T2 publication Critical patent/DE69416771T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • General Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
DE69416771T 1993-10-18 1994-09-06 Inspektionsapparat für Halbleiterscheiben Expired - Fee Related DE69416771T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26020193A JP3246811B2 (ja) 1993-10-18 1993-10-18 半導体ウエハ検査装置

Publications (2)

Publication Number Publication Date
DE69416771D1 true DE69416771D1 (de) 1999-04-08
DE69416771T2 DE69416771T2 (de) 1999-07-22

Family

ID=17344744

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69416771T Expired - Fee Related DE69416771T2 (de) 1993-10-18 1994-09-06 Inspektionsapparat für Halbleiterscheiben

Country Status (4)

Country Link
US (1) US5465145A (de)
EP (1) EP0649170B1 (de)
JP (1) JP3246811B2 (de)
DE (1) DE69416771T2 (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5923430A (en) 1993-06-17 1999-07-13 Ultrapointe Corporation Method for characterizing defects on semiconductor wafers
US5479252A (en) * 1993-06-17 1995-12-26 Ultrapointe Corporation Laser imaging system for inspection and analysis of sub-micron particles
US6271916B1 (en) * 1994-03-24 2001-08-07 Kla-Tencor Corporation Process and assembly for non-destructive surface inspections
JPH0815169A (ja) * 1994-06-28 1996-01-19 Canon Inc 異物検査装置及びそれを用いた半導体デバイスの製造 方法
US6118525A (en) * 1995-03-06 2000-09-12 Ade Optical Systems Corporation Wafer inspection system for distinguishing pits and particles
US6982794B1 (en) * 1995-06-07 2006-01-03 The Boeing Company Directional reflectometer
JP3514555B2 (ja) * 1995-07-06 2004-03-31 株式会社ルネサステクノロジ 異物評価装置および異物評価方法
US5798829A (en) * 1996-03-05 1998-08-25 Kla-Tencor Corporation Single laser bright field and dark field system for detecting anomalies of a sample
US6148114A (en) 1996-11-27 2000-11-14 Ultrapointe Corporation Ring dilation and erosion techniques for digital image processing
JPH10284359A (ja) * 1997-04-11 1998-10-23 Mitsubishi Electric Corp ウエハの認識装置及びウエハの認識方法
US20040057045A1 (en) * 2000-12-21 2004-03-25 Mehdi Vaez-Iravani Sample inspection system
US6201601B1 (en) 1997-09-19 2001-03-13 Kla-Tencor Corporation Sample inspection system
US6956644B2 (en) * 1997-09-19 2005-10-18 Kla-Tencor Technologies Corporation Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination
US6169601B1 (en) 1998-06-23 2001-01-02 Ade Optical Systems Method and apparatus for distinguishing particles from subsurface defects on a substrate using polarized light
US20050134841A1 (en) * 1998-09-18 2005-06-23 Mehdi Vacz-Iravani Sample inspection system
US6486946B1 (en) 1999-06-15 2002-11-26 Ade Corporation Method for discriminating between holes in and particles on a film covering a substrate
KR100301067B1 (ko) * 1999-08-23 2001-11-01 윤종용 마이크로 스크래치 검사방법 및 이를 적용한 장치
US6515742B1 (en) 2000-11-28 2003-02-04 Memc Electronic Materials, Inc. Defect classification using scattered light intensities
JP4135347B2 (ja) * 2001-10-02 2008-08-20 株式会社日立製作所 ポリシリコン膜生成方法
US7319518B2 (en) 2005-08-24 2008-01-15 Cree, Inc. Double side polished wafer scratch inspection tool
US7512501B2 (en) * 2006-08-22 2009-03-31 Kabushiki Kaisha Toshiba Defect inspecting apparatus for semiconductor wafer
US7656519B2 (en) * 2007-08-30 2010-02-02 Kla-Tencor Corporation Wafer edge inspection
JP5396703B2 (ja) * 2007-10-09 2014-01-22 富士通セミコンダクター株式会社 熱処理装置及び方法、並びに半導体装置の製造方法
FR2933194B1 (fr) * 2008-06-26 2010-08-13 Commissariat Energie Atomique Procede et dispositif de quantification des contaminants particulaires de surface par analyse amelioree
KR102554867B1 (ko) * 2015-09-09 2023-07-14 삼성전자주식회사 기판 검사 장치
JP6531579B2 (ja) * 2015-09-10 2019-06-19 株式会社Sumco ウェーハ検査方法およびウェーハ検査装置
ES2834375T3 (es) * 2018-04-27 2021-06-17 Jeanologia Sl Sistema y método de caracterización de patrones marcados sobre un tejido

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3248551A (en) * 1962-10-22 1966-04-26 Joseph C Frommer Optical arrangement for sensing very small particles
US4601576A (en) * 1983-12-09 1986-07-22 Tencor Instruments Light collector for optical contaminant and flaw detector
US5076692A (en) * 1990-05-31 1991-12-31 Tencor Instruments Particle detection on a patterned or bare wafer surface
WO1992001923A1 (en) * 1990-07-17 1992-02-06 Tencor Instruments Optical scatter imaging
JPH04170543A (ja) * 1990-11-02 1992-06-18 Canon Inc 面状態検査装置

Also Published As

Publication number Publication date
US5465145A (en) 1995-11-07
JP3246811B2 (ja) 2002-01-15
EP0649170A2 (de) 1995-04-19
JPH07115111A (ja) 1995-05-02
EP0649170A3 (de) 1995-10-18
DE69416771T2 (de) 1999-07-22
EP0649170B1 (de) 1999-03-03

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee