DE69403590T2 - Verfahren zur Herstellung eines Phosphors - Google Patents

Verfahren zur Herstellung eines Phosphors

Info

Publication number
DE69403590T2
DE69403590T2 DE69403590T DE69403590T DE69403590T2 DE 69403590 T2 DE69403590 T2 DE 69403590T2 DE 69403590 T DE69403590 T DE 69403590T DE 69403590 T DE69403590 T DE 69403590T DE 69403590 T2 DE69403590 T2 DE 69403590T2
Authority
DE
Germany
Prior art keywords
phosphor
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69403590T
Other languages
English (en)
Other versions
DE69403590D1 (de
Inventor
Nang Tri Tran
Kenneth R Paulson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Application granted granted Critical
Publication of DE69403590D1 publication Critical patent/DE69403590D1/de
Publication of DE69403590T2 publication Critical patent/DE69403590T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/16—Measuring radiation intensity
    • G01T1/20—Measuring radiation intensity with scintillation detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
    • H01L31/115—Devices sensitive to very short wavelength, e.g. X-rays, gamma-rays or corpuscular radiation

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Molecular Biology (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Conversion Of X-Rays Into Visible Images (AREA)
  • Measurement Of Radiation (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
  • Light Receiving Elements (AREA)
DE69403590T 1993-08-25 1994-08-24 Verfahren zur Herstellung eines Phosphors Expired - Fee Related DE69403590T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/111,994 US5368882A (en) 1993-08-25 1993-08-25 Process for forming a radiation detector

Publications (2)

Publication Number Publication Date
DE69403590D1 DE69403590D1 (de) 1997-07-10
DE69403590T2 true DE69403590T2 (de) 1998-02-05

Family

ID=22341563

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69403590T Expired - Fee Related DE69403590T2 (de) 1993-08-25 1994-08-24 Verfahren zur Herstellung eines Phosphors

Country Status (6)

Country Link
US (1) US5368882A (de)
EP (1) EP0642177B1 (de)
JP (1) JPH0792299A (de)
KR (1) KR100312890B1 (de)
CA (1) CA2128746C (de)
DE (1) DE69403590T2 (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5515411A (en) * 1993-03-31 1996-05-07 Shimadzu Corporation X-ray image pickup tube
CA2131243A1 (en) * 1993-09-27 1995-03-28 Kenneth R. Paulson Process for forming a phosphor
WO1997042661A1 (en) 1996-05-08 1997-11-13 1294339 Ontario Inc. High resolution flat panel for radiation imaging
US6177236B1 (en) 1997-12-05 2001-01-23 Xerox Corporation Method of making a pixelized scintillation layer and structures incorporating same
US5981959A (en) * 1997-12-05 1999-11-09 Xerox Corporation Pixelized scintillation layer and structures incorporating same
US6486470B2 (en) 1998-11-02 2002-11-26 1294339 Ontario, Inc. Compensation circuit for use in a high resolution amplified flat panel for radiation imaging
DE10004891C2 (de) * 2000-02-04 2002-10-31 Astrium Gmbh Fokalfläche und Detektor für optoelektronische Bildaufnahmesysteme, Herstellungsverfahren und optoelektronisches Bildaufnahmesystem
US6628072B2 (en) 2001-05-14 2003-09-30 Battelle Memorial Institute Acicular photomultiplier photocathode structure
US7053381B2 (en) 2001-12-06 2006-05-30 General Electric Company Dual para-xylylene layers for an X-ray detector
JP2004003955A (ja) * 2002-03-25 2004-01-08 Fuji Photo Film Co Ltd 放射線像変換パネル
US7117588B2 (en) * 2002-04-23 2006-10-10 Ge Medical Systems Global Technology Company, Llc Method for assembling tiled detectors for ionizing radiation based image detection
US7618511B2 (en) * 2003-03-07 2009-11-17 Hamamatsu Photonics K.K. Scintillator panel and method of manufacturing radiation image sensor
US20040229002A1 (en) * 2003-05-15 2004-11-18 3D Systems, Inc. Stereolithographic seal and support structure for semiconductor wafer
PT103370B (pt) * 2005-10-20 2009-01-19 Univ Do Minho Matriz de imagem de raios-x com guias de luz e sensores de pixel inteligentes, dispositivos detectores de radiação ou de partículas de alta energia que a contém, seu processo de fabrico e sua utilização
US7525094B2 (en) * 2005-12-21 2009-04-28 Los Alamos National Security, Llc Nanocomposite scintillator, detector, and method
US7521685B2 (en) * 2006-01-18 2009-04-21 General Electric Company Structured scintillator and systems employing structured scintillators
US7589324B2 (en) * 2006-12-21 2009-09-15 Redlen Technologies Use of solder mask as a protective coating for radiation detector
US7955992B2 (en) * 2008-08-08 2011-06-07 Redlen Technologies, Inc. Method of passivating and encapsulating CdTe and CZT segmented detectors
US9202961B2 (en) 2009-02-02 2015-12-01 Redlen Technologies Imaging devices with solid-state radiation detector with improved sensitivity
US8614423B2 (en) * 2009-02-02 2013-12-24 Redlen Technologies, Inc. Solid-state radiation detector with improved sensitivity
US8476101B2 (en) * 2009-12-28 2013-07-02 Redlen Technologies Method of fabricating patterned CZT and CdTe devices
JP5875420B2 (ja) * 2011-04-07 2016-03-02 キヤノン株式会社 放射線検出素子およびその製造方法
JP6018854B2 (ja) * 2012-09-14 2016-11-02 浜松ホトニクス株式会社 シンチレータパネル、及び、放射線検出器
EP3613085B1 (de) * 2017-04-21 2021-11-24 Shenzhen Xpectvision Technology Co., Ltd. Halbleiterstrahlungsdetektor und herstellungsverfahren

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2705764A (en) * 1950-02-25 1955-04-05 Rca Corp Dual-area target electrodes and methods of making the same
US3672931A (en) * 1970-07-27 1972-06-27 Columbia Broadcasting Syst Inc Method of forming phosphor screen
US4011454A (en) * 1975-04-28 1977-03-08 General Electric Company Structured X-ray phosphor screen
FR2360989A1 (fr) * 1976-08-03 1978-03-03 Thomson Csf Intensificateur d'image radiologique, et son procede de fabrication
JPS5916701B2 (ja) * 1977-03-14 1984-04-17 株式会社東芝 像増倍管の入力スクリ−ン及びその製造方法
JPS5913133B2 (ja) * 1977-08-29 1984-03-28 株式会社東芝 螢光面の製造方法
DE3175963D1 (en) * 1980-06-16 1987-04-09 Toshiba Kk Radiation excited phosphor screen and method for manufacturing the same
US4415609A (en) * 1980-07-30 1983-11-15 Avco Corporation Method of applying a carbon-rich surface layer to a silicon carbide filament
JPH0677079B2 (ja) * 1984-09-18 1994-09-28 コニカ株式会社 放射線画像情報読取装置
NL8602021A (nl) * 1986-08-07 1988-03-01 Optische Ind De Oude Delft Nv Werkwijze voor het vervaardigen van een beeldopneeminrichting voor radiografische toepassingen.
US5153438A (en) * 1990-10-01 1992-10-06 General Electric Company Method of forming an x-ray imaging array and the array
US5171996A (en) * 1991-07-31 1992-12-15 Regents Of The University Of California Particle detector spatial resolution
EP0597943A4 (en) * 1991-07-31 1994-07-27 Univ California Improvements in particle detector spatial resolution.
DE4219347C2 (de) * 1992-06-12 1996-05-02 Siemens Ag Verfahren zum Erzeugen einer strukturierten Alkalihalogenidschicht und damit hergestellte Leuchtstoffschicht

Also Published As

Publication number Publication date
KR950005387A (ko) 1995-03-20
US5368882A (en) 1994-11-29
EP0642177B1 (de) 1997-06-04
JPH0792299A (ja) 1995-04-07
KR100312890B1 (ko) 2002-02-19
DE69403590D1 (de) 1997-07-10
EP0642177A1 (de) 1995-03-08
CA2128746A1 (en) 1995-02-26
CA2128746C (en) 2000-02-08

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: EASTMAN KODAK CO., ROCHESTER, N.Y., US

8328 Change in the person/name/address of the agent

Free format text: LEWANDOWSKY, K., DIPL.-ING., PAT.-ANW., 73033 GOEPPINGEN

8339 Ceased/non-payment of the annual fee