DE69331502D1 - Fotopolymerisierbare Bestandteile von strahlungsempfindlichen Zusammensetzungen - Google Patents
Fotopolymerisierbare Bestandteile von strahlungsempfindlichen ZusammensetzungenInfo
- Publication number
- DE69331502D1 DE69331502D1 DE69331502T DE69331502T DE69331502D1 DE 69331502 D1 DE69331502 D1 DE 69331502D1 DE 69331502 T DE69331502 T DE 69331502T DE 69331502 T DE69331502 T DE 69331502T DE 69331502 D1 DE69331502 D1 DE 69331502D1
- Authority
- DE
- Germany
- Prior art keywords
- radiation sensitive
- sensitive compositions
- photopolymerizable components
- photopolymerizable
- components
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000203 mixture Substances 0.000 title 1
- 230000005855 radiation Effects 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
- C07C271/24—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a ring other than a six-membered aromatic ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
- C07C271/26—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring
- C07C271/28—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring to a carbon atom of a non-condensed six-membered aromatic ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/30—Low-molecular-weight compounds
- C08G18/32—Polyhydroxy compounds; Polyamines; Hydroxyamines
- C08G18/3271—Hydroxyamines
- C08G18/329—Hydroxyamines containing aromatic groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/81—Unsaturated isocyanates or isothiocyanates
- C08G18/8141—Unsaturated isocyanates or isothiocyanates masked
- C08G18/815—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen
- C08G18/8158—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S522/904—Monomer or polymer contains initiating group
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S522/904—Monomer or polymer contains initiating group
- Y10S522/905—Benzophenone group
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polymerisation Methods In General (AREA)
- Polyurethanes Or Polyureas (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9201269A GB2263909B (en) | 1992-01-21 | 1992-01-21 | Improvements in or relating to photopolymerisable components of radiation sensitive compositions |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69331502D1 true DE69331502D1 (de) | 2002-03-14 |
DE69331502T2 DE69331502T2 (de) | 2002-08-22 |
Family
ID=10708983
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69331502T Expired - Fee Related DE69331502T2 (de) | 1992-01-21 | 1993-01-21 | Fotopolymerisierbare Bestandteile von strahlungsempfindlichen Zusammensetzungen |
Country Status (6)
Country | Link |
---|---|
US (1) | US5710193A (de) |
EP (1) | EP0554005B1 (de) |
JP (1) | JP3391832B2 (de) |
CA (1) | CA2087635A1 (de) |
DE (1) | DE69331502T2 (de) |
GB (2) | GB2263909B (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2280905A (en) * | 1993-08-06 | 1995-02-15 | Coates Brothers Plc | Ethylenically unsaturated photoinitiator |
US5436112A (en) * | 1994-04-01 | 1995-07-25 | Hoechst Celanese Corporation | Method for producing a negative image with color proofing element containing a urethane monomer |
JP2001290267A (ja) * | 2000-02-01 | 2001-10-19 | Mitsubishi Chemicals Corp | 光重合性組成物、感光性平版印刷版及び印刷版の製版方法 |
JP2003122002A (ja) * | 2001-10-18 | 2003-04-25 | Mitsubishi Chemicals Corp | 光重合性組成物、感光性平版印刷版及び印刷版の製版方法 |
JP2007114604A (ja) * | 2005-10-21 | 2007-05-10 | Fujifilm Electronic Materials Co Ltd | 感光性組成物及びカラーフィルタ |
JP5218127B2 (ja) * | 2008-03-26 | 2013-06-26 | Jsr株式会社 | 硬化性組成物、硬化膜及び積層体 |
GB2476275A (en) | 2009-12-17 | 2011-06-22 | Dublin Inst Of Technology | Photosensitive holographic recording medium comprising glycerol |
KR101813023B1 (ko) * | 2013-11-29 | 2017-12-28 | 디아이씨 가부시끼가이샤 | 중합성 화합물, 조성물, 중합체, 광학 이방체, 액정 표시 소자 및 유기 el 소자 |
CN110229253B (zh) * | 2015-01-05 | 2021-11-02 | Igm集团公司 | Led可固化的低迁移性光引发剂 |
CN116768742A (zh) * | 2022-03-07 | 2023-09-19 | 艾坚蒙(安庆)科技发展有限公司 | 一种二苯甲酮衍生物、制备方法及其用途 |
CN115558069B (zh) * | 2022-09-26 | 2023-08-29 | 上海交通大学 | 一种pH敏感聚氨酯材料及其在构建二维表面图案及力致结构色信息储存中的应用 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2718516A (en) * | 1952-11-08 | 1955-09-20 | Rohm & Haas | Isocyanato esters of acrylic, methacrylic, and crotonic acids |
US2821544A (en) * | 1954-04-26 | 1958-01-28 | Bayer Ag | Production of alkylisocyanate esters of 2-alkenoic acids |
US2882259A (en) * | 1955-12-27 | 1959-04-14 | Rohm & Haas | Segmented polymers having a linear polymeric backbone with linear polymer branches attached thereto through ureido groups and process for preparing the same |
NL137857C (de) * | 1963-08-31 | |||
JPS4857620A (de) * | 1971-11-19 | 1973-08-13 | ||
GB1432202A (en) * | 1972-05-05 | 1976-04-14 | Grace W R & Co | Derivatives of a styrene/thylenically unsaturated alcohol copolymer |
US3825479A (en) * | 1972-08-21 | 1974-07-23 | Sun Chemical Corp | Radiation curable printing ink compositions comprising an isocyanate-modified polyfunctional ester and a photoiniator |
US3759809A (en) * | 1972-11-14 | 1973-09-18 | Sun Chemical Corp | Radiation curable compositions comprising an isocyanate modified polyfunctional ester and a photoinitiator |
DE2631030A1 (de) * | 1976-07-09 | 1978-01-12 | Bayer Ag | Kationische farbstoffe |
CH629520A5 (de) * | 1977-08-12 | 1982-04-30 | Sandoz Ag | Verfahren zur herstellung von azofarbstoffen. |
US4192762A (en) * | 1978-04-20 | 1980-03-11 | Union Carbide Corporation | Radiation curable urethane compositions |
FR2442257A1 (fr) * | 1978-11-21 | 1980-06-20 | Ugine Kuhlmann | Composes structurellement colores reticulables, leur preparation et leur utilisation dans des compositions pour revetements |
US4316949A (en) * | 1979-12-14 | 1982-02-23 | Minnesota Mining And Manufacturing Company | Photoreactive oligomer composition and printing plate |
BR8101674A (pt) * | 1980-03-25 | 1981-09-29 | Goodrich Co B F | Processo para a preparacao de polimeros liquidos reativos terminados em vinila e polimero reativo terminado em vinila |
US4358476A (en) * | 1981-06-24 | 1982-11-09 | Lord Corporation | Radiation-curable compositions containing water |
JPS5863760A (ja) * | 1981-10-09 | 1983-04-15 | Nippon Paint Co Ltd | 光硬化性被覆組成物 |
US4722947A (en) * | 1985-08-05 | 1988-02-02 | Pony Industries, Inc. | Production of radiation curable partial esters of anhydride-containing copolymers |
US4665146A (en) * | 1986-05-22 | 1987-05-12 | Desoto, Inc. | Amine-functional monoethylenic monomers, acrylic copolymers and aqueous coating compositions containing the same |
DE3703130A1 (de) * | 1986-07-25 | 1988-01-28 | Bayer Ag | Urethangruppen enthaltende (meth)-acrylsaeurederivate |
GB8622266D0 (en) * | 1986-09-16 | 1986-10-22 | Vickers Plc | Printing plate precursors |
DE3710279A1 (de) * | 1987-03-28 | 1988-10-06 | Hoechst Ag | Polymerisierbare verbindungen und diese enthaltendes durch strahlung polymerisierbares gemisch |
GB8719730D0 (en) * | 1987-08-20 | 1987-09-30 | Vickers Plc | Radiation sensitive compounds |
-
1992
- 1992-01-21 GB GB9201269A patent/GB2263909B/en not_active Expired - Fee Related
- 1992-01-21 GB GB9601268A patent/GB2298209B/en not_active Expired - Fee Related
-
1993
- 1993-01-20 CA CA002087635A patent/CA2087635A1/en not_active Abandoned
- 1993-01-21 EP EP93300422A patent/EP0554005B1/de not_active Expired - Lifetime
- 1993-01-21 DE DE69331502T patent/DE69331502T2/de not_active Expired - Fee Related
- 1993-01-21 JP JP00866593A patent/JP3391832B2/ja not_active Expired - Fee Related
-
1996
- 1996-05-21 US US08/646,808 patent/US5710193A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US5710193A (en) | 1998-01-20 |
CA2087635A1 (en) | 1993-07-22 |
GB2263909A (en) | 1993-08-11 |
EP0554005A1 (de) | 1993-08-04 |
GB2298209B (en) | 1996-11-06 |
GB9601268D0 (en) | 1996-03-27 |
GB2263909B (en) | 1996-09-11 |
DE69331502T2 (de) | 2002-08-22 |
JP3391832B2 (ja) | 2003-03-31 |
GB2298209A (en) | 1996-08-28 |
JPH0693193A (ja) | 1994-04-05 |
GB9201269D0 (en) | 1992-03-11 |
EP0554005B1 (de) | 2002-01-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |