DE69322983D1 - System zum Steuern von Trägerplatten - Google Patents
System zum Steuern von TrägerplattenInfo
- Publication number
- DE69322983D1 DE69322983D1 DE69322983T DE69322983T DE69322983D1 DE 69322983 D1 DE69322983 D1 DE 69322983D1 DE 69322983 T DE69322983 T DE 69322983T DE 69322983 T DE69322983 T DE 69322983T DE 69322983 D1 DE69322983 D1 DE 69322983D1
- Authority
- DE
- Germany
- Prior art keywords
- carrier plates
- controlling carrier
- controlling
- plates
- carrier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
- G05B19/19—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path
- G05B19/195—Controlling the position of several slides on one axis
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Toxicology (AREA)
- Atmospheric Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Human Computer Interaction (AREA)
- Manufacturing & Machinery (AREA)
- Automation & Control Theory (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP07007092A JP3202308B2 (ja) | 1992-02-21 | 1992-02-21 | 複合位置決め装置 |
JP4084974A JPH05250041A (ja) | 1992-03-09 | 1992-03-09 | 多重加速度フィードバック付き位置決め装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69322983D1 true DE69322983D1 (de) | 1999-02-25 |
DE69322983T2 DE69322983T2 (de) | 1999-07-15 |
Family
ID=26411231
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69322983T Expired - Fee Related DE69322983T2 (de) | 1992-02-21 | 1993-02-18 | System zum Steuern von Trägerplatten |
Country Status (3)
Country | Link |
---|---|
US (1) | US5504407A (de) |
EP (1) | EP0557100B1 (de) |
DE (1) | DE69322983T2 (de) |
Families Citing this family (84)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5528118A (en) | 1994-04-01 | 1996-06-18 | Nikon Precision, Inc. | Guideless stage with isolated reaction stage |
US6989647B1 (en) | 1994-04-01 | 2006-01-24 | Nikon Corporation | Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device |
US5874820A (en) | 1995-04-04 | 1999-02-23 | Nikon Corporation | Window frame-guided stage mechanism |
US7365513B1 (en) | 1994-04-01 | 2008-04-29 | Nikon Corporation | Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device |
US6246204B1 (en) | 1994-06-27 | 2001-06-12 | Nikon Corporation | Electromagnetic alignment and scanning apparatus |
JP3224489B2 (ja) * | 1995-03-28 | 2001-10-29 | キヤノン株式会社 | 空気バネ式除振装置 |
JPH08293459A (ja) * | 1995-04-21 | 1996-11-05 | Nikon Corp | ステージ駆動制御方法及びその装置 |
TW318255B (de) | 1995-05-30 | 1997-10-21 | Philips Electronics Nv | |
DE69629087T2 (de) * | 1995-05-30 | 2004-04-22 | Asml Netherlands B.V. | Positionierungsgerät mit einem referenzrahmen für ein messsystem |
EP0762255B1 (de) * | 1995-09-04 | 1999-03-17 | Canon Kabushiki Kaisha | Einrichtung zur Antriebsregelung |
US5936710A (en) * | 1996-01-05 | 1999-08-10 | Canon Kabushiki Kaisha | Scanning type exposure apparatus, position control apparatus, and method therefor |
JP3733174B2 (ja) * | 1996-06-19 | 2006-01-11 | キヤノン株式会社 | 走査型投影露光装置 |
JP3266515B2 (ja) * | 1996-08-02 | 2002-03-18 | キヤノン株式会社 | 露光装置、デバイス製造方法およびステージ装置 |
JP3548353B2 (ja) * | 1996-10-15 | 2004-07-28 | キヤノン株式会社 | ステージ装置およびこれを用いた露光装置ならびにデバイス製造方法 |
SG88824A1 (en) * | 1996-11-28 | 2002-05-21 | Nikon Corp | Projection exposure method |
JPH10209039A (ja) | 1997-01-27 | 1998-08-07 | Nikon Corp | 投影露光方法及び投影露光装置 |
US6170622B1 (en) | 1997-03-07 | 2001-01-09 | Canon Kabushiki Kaisha | Anti-vibration apparatus and anti-vibration method thereof |
JP3890136B2 (ja) * | 1997-03-25 | 2007-03-07 | キヤノン株式会社 | 露光装置とこれを用いたデバイス製造方法、ならびにステージ装置 |
IL135139A0 (en) * | 1997-09-19 | 2001-05-20 | Nikon Corp | Stage apparatus, scanning type exposure apparatus, and device produced with the same |
US20010003028A1 (en) | 1997-09-19 | 2001-06-07 | Nikon Corporation | Scanning Exposure Method |
US6089525A (en) * | 1997-10-07 | 2000-07-18 | Ultratech Stepper, Inc. | Six axis active vibration isolation and payload reaction force compensation system |
US6408045B1 (en) * | 1997-11-11 | 2002-06-18 | Canon Kabushiki Kaisha | Stage system and exposure apparatus with the same |
TW448487B (en) * | 1997-11-22 | 2001-08-01 | Nippon Kogaku Kk | Exposure apparatus, exposure method and manufacturing method of device |
JP3535749B2 (ja) * | 1997-12-10 | 2004-06-07 | キヤノン株式会社 | ステージ装置、露光装置、並びにデバイス製造方法 |
US6107770A (en) * | 1998-01-27 | 2000-08-22 | Lockheed Martin Corporation | Control system for counter-oscillating masses |
JP3526202B2 (ja) * | 1998-02-03 | 2004-05-10 | キヤノン株式会社 | ステージ装置、およびこれを用いた露光装置、ならびにデバイス製造方法 |
JP4194160B2 (ja) | 1998-02-19 | 2008-12-10 | キヤノン株式会社 | 投影露光装置 |
US6320345B1 (en) * | 1998-03-05 | 2001-11-20 | Nikon Corporation | Command trajectory for driving a stage with minimal vibration |
DE19810996A1 (de) * | 1998-03-13 | 1999-09-16 | Krauss Maffei Ag | Impulsentkoppelter Direktantrieb |
US6008610A (en) * | 1998-03-20 | 1999-12-28 | Nikon Corporation | Position control apparatus for fine stages carried by a coarse stage on a high-precision scanning positioning system |
US6260282B1 (en) | 1998-03-27 | 2001-07-17 | Nikon Corporation | Stage control with reduced synchronization error and settling time |
JPH11294520A (ja) | 1998-04-08 | 1999-10-29 | Canon Inc | 除振装置、これを用いた露光装置およびデバイス製造方法、ならびに除振方法 |
KR20010043861A (ko) * | 1998-06-17 | 2001-05-25 | 오노 시게오 | 노광방법 및 장치 |
JP3745167B2 (ja) * | 1998-07-29 | 2006-02-15 | キヤノン株式会社 | ステージ装置、露光装置およびデバイス製造方法ならびにステージ駆動方法 |
US6252234B1 (en) * | 1998-08-14 | 2001-06-26 | Nikon Corporation | Reaction force isolation system for a planar motor |
US6144118A (en) * | 1998-09-18 | 2000-11-07 | General Scanning, Inc. | High-speed precision positioning apparatus |
US6070480A (en) * | 1998-10-09 | 2000-06-06 | Hewlett Packard Company | Differential motor drive for an XY stage |
US6147421A (en) * | 1998-11-16 | 2000-11-14 | Nikon Corporation | Platform positionable in at least three degrees of freedom by interaction with coils |
US6208045B1 (en) | 1998-11-16 | 2001-03-27 | Nikon Corporation | Electric motors and positioning devices having moving magnet arrays and six degrees of freedom |
JP2000274482A (ja) | 1999-01-18 | 2000-10-03 | Canon Inc | 能動的除振装置、露光装置及び方法並びにデバイス製造方法 |
US6473159B1 (en) | 1999-05-31 | 2002-10-29 | Canon Kabushiki Kaisha | Anti-vibration system in exposure apparatus |
JP2001023882A (ja) | 1999-07-07 | 2001-01-26 | Canon Inc | 振動センサ付きペデスタルおよびこれを用いた露光装置 |
JP2001068396A (ja) | 1999-08-26 | 2001-03-16 | Canon Inc | ステージ制御装置 |
JP2001118773A (ja) * | 1999-10-18 | 2001-04-27 | Nikon Corp | ステージ装置及び露光装置 |
TW546551B (en) | 1999-12-21 | 2003-08-11 | Asml Netherlands Bv | Balanced positioning system for use in lithographic apparatus |
JP3814453B2 (ja) * | 2000-01-11 | 2006-08-30 | キヤノン株式会社 | 位置決め装置、半導体露光装置およびデバイス製造方法 |
US6452292B1 (en) | 2000-06-26 | 2002-09-17 | Nikon Corporation | Planar motor with linear coil arrays |
US6445093B1 (en) | 2000-06-26 | 2002-09-03 | Nikon Corporation | Planar motor with linear coil arrays |
US7561270B2 (en) * | 2000-08-24 | 2009-07-14 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufactured thereby |
TW527526B (en) * | 2000-08-24 | 2003-04-11 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
US7289212B2 (en) * | 2000-08-24 | 2007-10-30 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufacturing thereby |
US6504162B1 (en) * | 2000-09-15 | 2003-01-07 | Nikon Corporation | Stage device, control system, and method for stabilizing wafer stage and wafer table |
JP2002283174A (ja) * | 2001-03-26 | 2002-10-03 | Fanuc Ltd | 直線駆動装置 |
US6678038B2 (en) | 2001-08-03 | 2004-01-13 | Nikon Corporation | Apparatus and methods for detecting tool-induced shift in microlithography apparatus |
US6674512B2 (en) | 2001-08-07 | 2004-01-06 | Nikon Corporation | Interferometer system for a semiconductor exposure system |
US6785005B2 (en) | 2001-09-21 | 2004-08-31 | Nikon Corporation | Switching type dual wafer stage |
US6665054B2 (en) | 2001-10-22 | 2003-12-16 | Nikon Corporation | Two stage method |
JP3919560B2 (ja) * | 2002-02-26 | 2007-05-30 | キヤノン株式会社 | 振動制御装置及び振動制御方法及び露光装置及びデバイスの製造方法 |
DE10212344A1 (de) * | 2002-03-15 | 2003-10-09 | Kleo Halbleitertechnik Gmbh | Vorrichtung zum Belichten von Substratmaterialien |
JP4315420B2 (ja) * | 2003-04-18 | 2009-08-19 | キヤノン株式会社 | 露光装置及び露光方法 |
EP1494078A1 (de) * | 2003-07-01 | 2005-01-05 | ASML Netherlands B.V. | Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung |
TWI284253B (en) * | 2003-07-01 | 2007-07-21 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
TWI254190B (en) * | 2003-09-22 | 2006-05-01 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
US7193722B2 (en) * | 2003-12-30 | 2007-03-20 | Asml Netherlands B.V. | Lithographic apparatus with disturbance correction system and device manufacturing method |
JP2005203567A (ja) | 2004-01-15 | 2005-07-28 | Canon Inc | 駆動装置、露光装置及びデバイス製造方法 |
US7221433B2 (en) * | 2004-01-28 | 2007-05-22 | Nikon Corporation | Stage assembly including a reaction assembly having a connector assembly |
JP2005216132A (ja) | 2004-01-30 | 2005-08-11 | Sumitomo Eaton Noba Kk | 移動装置の制御方法、及び移動装置の連動装置、及び移動装置の連動方法、及び半導体製造装置、及び液晶製造装置、及びメカニカルスキャンイオン注入装置 |
US7321418B2 (en) * | 2004-10-14 | 2008-01-22 | Canon Kabushiki Kaisha | Stage apparatus, exposure apparatus, and device manufacturing method |
DE202005016654U1 (de) * | 2005-10-21 | 2007-03-01 | Integrated Dynamics Engineering Gmbh | Vorrichtung zur Überwachung der Relativposition mehrerer Einrichtungen |
DE102006008080A1 (de) | 2006-02-22 | 2007-08-30 | Kleo Maschinenbau Ag | Belichtungsanlage |
US7649613B2 (en) * | 2006-03-03 | 2010-01-19 | Asml Netherlands B.V. | Lithographic apparatus, method of controlling a component of a lithographic apparatus and device manufacturing method |
DE102008038728A1 (de) * | 2008-08-12 | 2010-02-18 | J.G. WEISSER SöHNE GMBH & CO. KG | Fertigungsmaschine für unrunde Werkstücke |
US8633420B2 (en) * | 2008-10-10 | 2014-01-21 | Ipg Microsystems Llc | Laser machining systems and methods with debris extraction |
JP5308249B2 (ja) * | 2009-06-22 | 2013-10-09 | 三菱重工業株式会社 | サーボ制御装置 |
JP5358388B2 (ja) * | 2009-10-08 | 2013-12-04 | 株式会社日立製作所 | 工作機械 |
JP5913872B2 (ja) * | 2011-09-05 | 2016-04-27 | キヤノン株式会社 | リソグラフィシステム及び物品の製造方法 |
JP5918965B2 (ja) | 2011-10-25 | 2016-05-18 | キヤノン株式会社 | 加工機システム及び加工機の配置方法 |
WO2013113632A2 (en) | 2012-02-03 | 2013-08-08 | Asml Netherlands B.V. | A stage system and a lithographic apparatus |
US9529341B2 (en) * | 2013-10-25 | 2016-12-27 | Mitsubishi Electric Research Laboratories, Inc. | Motion-control system for performing different tasks |
DE102014204523A1 (de) * | 2014-03-12 | 2015-09-17 | Carl Zeiss Smt Gmbh | Schwingungskompensiertes optisches system, lithographieanlage und verfahren |
JP6053715B2 (ja) * | 2014-03-31 | 2016-12-27 | キヤノン株式会社 | 位置制御装置および位置制御方法、光学機器、撮像装置 |
US10192773B2 (en) * | 2016-06-20 | 2019-01-29 | Nexperia B.V. | Semiconductor device positioning system and method for semiconductor device positioning |
JP6423839B2 (ja) * | 2016-09-26 | 2018-11-14 | ファナック株式会社 | 機械振動抑制機能を備えた駆動装置、及び機械振動抑制機能を備えたシステム |
KR101864846B1 (ko) * | 2017-01-03 | 2018-06-05 | 숭실대학교산학협력단 | 수동 반발력 보상 기능을 갖는 선형 모터 모션 스테이지 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3656014A (en) * | 1971-04-08 | 1972-04-11 | Gerber Scientific Instr Co | Damping apparatus for a linear step motor having two translational degrees of freedom |
US3904945A (en) * | 1973-09-10 | 1975-09-09 | Ibm | Precision tool and workpiece positioning apparatus |
JPS5868118A (ja) * | 1981-10-20 | 1983-04-22 | Telmec Co Ltd | 高精度位置決めステ−ジ用防振装置 |
US4653903A (en) * | 1984-01-24 | 1987-03-31 | Canon Kabushiki Kaisha | Exposure apparatus |
US4843293A (en) * | 1987-02-02 | 1989-06-27 | Research Development Corporation | Apparatus for controlling servo system employing piezo-electric actuator |
JP2814241B2 (ja) * | 1987-09-25 | 1998-10-22 | 株式会社ブリヂストン | 振動制御装置 |
US4952858A (en) * | 1988-05-18 | 1990-08-28 | Galburt Daniel N | Microlithographic apparatus |
JPH07108101B2 (ja) * | 1989-02-28 | 1995-11-15 | オ−クマ株式会社 | リニアアクチュエータ駆動制御装置 |
US5208497A (en) * | 1989-04-17 | 1993-05-04 | Sharp Kabushiki Kaisha | Linear driving apparatus |
FR2645981B1 (fr) * | 1989-04-17 | 1991-07-26 | Aerospatiale | Dispositif de commande en deplacement sans vibrations d'un element optique dans un interferometre stellaire et interferometre stellaire le comportant |
US5315526A (en) * | 1989-12-07 | 1994-05-24 | Okuma Corporation | Numerically controlled lathe |
US5153494A (en) * | 1990-04-06 | 1992-10-06 | International Business Machines Corp. | Ultrafast electro-dynamic x, y and theta positioning stage |
GB2249189B (en) * | 1990-10-05 | 1994-07-27 | Canon Kk | Exposure apparatus |
NL9100407A (nl) * | 1991-03-07 | 1992-10-01 | Philips Nv | Optisch lithografische inrichting met een krachtgecompenseerd machinegestel. |
DE4123323C2 (de) * | 1991-07-13 | 1994-02-10 | Andreas Ehlerding | Werkzeugträger |
JP2714502B2 (ja) * | 1991-09-18 | 1998-02-16 | キヤノン株式会社 | 移動ステージ装置 |
JP2822809B2 (ja) * | 1992-09-30 | 1998-11-11 | 三菱電機株式会社 | 位置制御方法および位置制御装置 |
-
1993
- 1993-02-18 DE DE69322983T patent/DE69322983T2/de not_active Expired - Fee Related
- 1993-02-18 US US08/019,579 patent/US5504407A/en not_active Expired - Fee Related
- 1993-02-18 EP EP93301204A patent/EP0557100B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0557100B1 (de) | 1999-01-13 |
US5504407A (en) | 1996-04-02 |
EP0557100A1 (de) | 1993-08-25 |
DE69322983T2 (de) | 1999-07-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |