DE69319964T2 - System zur Umwandlung eines Infrarotbilds in ein Bild im sichtbaren oder nahen infraroten Bereich - Google Patents
System zur Umwandlung eines Infrarotbilds in ein Bild im sichtbaren oder nahen infraroten BereichInfo
- Publication number
- DE69319964T2 DE69319964T2 DE69319964T DE69319964T DE69319964T2 DE 69319964 T2 DE69319964 T2 DE 69319964T2 DE 69319964 T DE69319964 T DE 69319964T DE 69319964 T DE69319964 T DE 69319964T DE 69319964 T2 DE69319964 T2 DE 69319964T2
- Authority
- DE
- Germany
- Prior art keywords
- transmitter
- light
- infrared
- detector
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 claims description 60
- 238000012545 processing Methods 0.000 claims description 21
- 230000003287 optical effect Effects 0.000 claims description 11
- 239000004065 semiconductor Substances 0.000 claims description 5
- 239000010410 layer Substances 0.000 description 37
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 22
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 20
- 238000000034 method Methods 0.000 description 16
- 238000004519 manufacturing process Methods 0.000 description 14
- 229910052710 silicon Inorganic materials 0.000 description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 13
- 239000010703 silicon Substances 0.000 description 13
- 238000001816 cooling Methods 0.000 description 6
- 238000001514 detection method Methods 0.000 description 6
- 238000009396 hybridization Methods 0.000 description 6
- 230000010354 integration Effects 0.000 description 6
- 230000004297 night vision Effects 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 238000000407 epitaxy Methods 0.000 description 5
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- VLJQDHDVZJXNQL-UHFFFAOYSA-N 4-methyl-n-(oxomethylidene)benzenesulfonamide Chemical compound CC1=CC=C(S(=O)(=O)N=C=O)C=C1 VLJQDHDVZJXNQL-UHFFFAOYSA-N 0.000 description 4
- 229910021340 platinum monosilicide Inorganic materials 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 230000003321 amplification Effects 0.000 description 3
- 238000012937 correction Methods 0.000 description 3
- 229910052738 indium Inorganic materials 0.000 description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 3
- 238000003331 infrared imaging Methods 0.000 description 3
- 238000003199 nucleic acid amplification method Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910000661 Mercury cadmium telluride Inorganic materials 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000004377 microelectronic Methods 0.000 description 2
- 239000004005 microsphere Substances 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 238000001931 thermography Methods 0.000 description 2
- WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical compound CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 description 1
- 240000004752 Laburnum anagyroides Species 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910006990 Si1-xGex Inorganic materials 0.000 description 1
- 229910007020 Si1−xGex Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000004438 eyesight Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 235000011007 phosphoric acid Nutrition 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000005036 potential barrier Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 235000011149 sulphuric acid Nutrition 0.000 description 1
- 238000000927 vapour-phase epitaxy Methods 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F55/00—Radiation-sensitive semiconductor devices covered by groups H10F10/00, H10F19/00 or H10F30/00 being structurally associated with electric light sources and electrically or optically coupled thereto
- H10F55/10—Radiation-sensitive semiconductor devices covered by groups H10F10/00, H10F19/00 or H10F30/00 being structurally associated with electric light sources and electrically or optically coupled thereto wherein the radiation-sensitive semiconductor devices control the electric light source, e.g. image converters, image amplifiers or image storage devices
- H10F55/15—Radiation-sensitive semiconductor devices covered by groups H10F10/00, H10F19/00 or H10F30/00 being structurally associated with electric light sources and electrically or optically coupled thereto wherein the radiation-sensitive semiconductor devices control the electric light source, e.g. image converters, image amplifiers or image storage devices wherein the radiation-sensitive devices and the electric light source are all semiconductor devices
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/20—Cameras or camera modules comprising electronic image sensors; Control thereof for generating image signals from infrared radiation only
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
- H10F39/184—Infrared image sensors
- H10F39/1843—Infrared image sensors of the hybrid type
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/191—Photoconductor image sensors
- H10F39/193—Infrared image sensors
- H10F39/1935—Infrared image sensors of the hybrid type
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F55/00—Radiation-sensitive semiconductor devices covered by groups H10F10/00, H10F19/00 or H10F30/00 being structurally associated with electric light sources and electrically or optically coupled thereto
- H10F55/10—Radiation-sensitive semiconductor devices covered by groups H10F10/00, H10F19/00 or H10F30/00 being structurally associated with electric light sources and electrically or optically coupled thereto wherein the radiation-sensitive semiconductor devices control the electric light source, e.g. image converters, image amplifiers or image storage devices
- H10F55/15—Radiation-sensitive semiconductor devices covered by groups H10F10/00, H10F19/00 or H10F30/00 being structurally associated with electric light sources and electrically or optically coupled thereto wherein the radiation-sensitive semiconductor devices control the electric light source, e.g. image converters, image amplifiers or image storage devices wherein the radiation-sensitive devices and the electric light source are all semiconductor devices
- H10F55/155—Radiation-sensitive semiconductor devices covered by groups H10F10/00, H10F19/00 or H10F30/00 being structurally associated with electric light sources and electrically or optically coupled thereto wherein the radiation-sensitive semiconductor devices control the electric light source, e.g. image converters, image amplifiers or image storage devices wherein the radiation-sensitive devices and the electric light source are all semiconductor devices formed in, or on, a common substrate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H29/00—Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
- H10H29/10—Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/1015—Shape
- H01L2924/10155—Shape being other than a cuboid
- H01L2924/10158—Shape being other than a cuboid at the passive surface
Landscapes
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Telescopes (AREA)
- Closed-Circuit Television Systems (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9206209A FR2691579A1 (fr) | 1992-05-21 | 1992-05-21 | Système de conversion d'une image infrarouge en image visible ou proche infrarouge. |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE69319964D1 DE69319964D1 (de) | 1998-09-03 |
| DE69319964T2 true DE69319964T2 (de) | 1999-03-04 |
Family
ID=9430036
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69319964T Expired - Fee Related DE69319964T2 (de) | 1992-05-21 | 1993-05-18 | System zur Umwandlung eines Infrarotbilds in ein Bild im sichtbaren oder nahen infraroten Bereich |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US5332899A (enExample) |
| EP (1) | EP0571268B1 (enExample) |
| JP (1) | JPH06121232A (enExample) |
| DE (1) | DE69319964T2 (enExample) |
| FR (1) | FR2691579A1 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2715250B1 (fr) * | 1994-01-19 | 1996-04-05 | Commissariat Energie Atomique | Dispositif tridimensionnel de détection de rayonnement et procédé de fabrication de ce dispositif. |
| US5567955A (en) * | 1995-05-04 | 1996-10-22 | National Research Council Of Canada | Method for infrared thermal imaging using integrated gasa quantum well mid-infrared detector and near-infrared light emitter and SI charge coupled device |
| US5751344A (en) * | 1995-07-05 | 1998-05-12 | Schnee; Robert Alan | Navigation system for a marine vessel in low light conditions |
| US5710428A (en) * | 1995-08-10 | 1998-01-20 | Samsung Electronics Co., Ltd. | Infrared focal plane array detecting apparatus having light emitting devices and infrared camera adopting the same |
| US5703363A (en) * | 1996-04-25 | 1997-12-30 | He Holdings, Inc. | Infrared to visible light image conversion device |
| US6157854A (en) | 1999-01-13 | 2000-12-05 | Bales Scientific Inc. | Photon irradiation human pain treatment monitored by thermal imaging |
| US6930298B2 (en) * | 2000-11-15 | 2005-08-16 | The Johns Hopkins University | Method and structure for minimizing error sources in image and position sensing detectors |
| WO2010023408A1 (fr) * | 2008-08-25 | 2010-03-04 | Commissariat A L'energie Atomique | Imageur biface |
| US10354366B2 (en) | 2015-01-16 | 2019-07-16 | Nec Corporation | Image processing device, image processing method, and recording medium |
| FR3039926A1 (fr) * | 2015-08-04 | 2017-02-10 | Commissariat Energie Atomique | Procede d'assemblage de dispositifs electroniques |
| US10754142B2 (en) * | 2017-06-07 | 2020-08-25 | The United States Of America, As Represented By The Secretary Of The Navy | Electronic up-conversions of a scene using a pixelated detector array |
| CN111916469B (zh) * | 2020-08-31 | 2022-06-28 | 山西国惠光电科技有限公司 | 一种新型双色InGaAs红外焦平面探测器的制备方法 |
| FR3149130A1 (fr) * | 2023-05-24 | 2024-11-29 | Airbus Defence And Space Sas | Circuit de lecture pour capteur hybride |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR373807A (fr) * | 1906-01-22 | 1907-05-28 | Emile Adrien Vignes | Jeu |
| FR371868A (fr) * | 1906-11-28 | 1907-03-18 | Eugene De Dorlodot | Bandage élastique |
| US3649838A (en) * | 1968-07-25 | 1972-03-14 | Massachusetts Inst Technology | Semiconductor device for producing radiation in response to incident radiation |
| US4205227A (en) * | 1976-11-26 | 1980-05-27 | Texas Instruments Incorporated | Single junction emitter array |
| US4067104A (en) * | 1977-02-24 | 1978-01-10 | Rockwell International Corporation | Method of fabricating an array of flexible metallic interconnects for coupling microelectronics components |
| GB2014395B (en) * | 1978-02-14 | 1982-08-18 | Emi Ltd | Infra-red imager |
| US4362938A (en) * | 1980-11-14 | 1982-12-07 | The United States Of America As Represented By The Secretary Of The Army | Infrared viewing system |
| DE3133641A1 (de) * | 1981-08-26 | 1983-03-10 | Philips Patentverwaltung Gmbh, 2000 Hamburg | Ir-sichtgeraet |
| DE3531666A1 (de) * | 1985-09-05 | 1987-03-12 | Zeiss Carl Fa | Vorrichtung zur erzeugung eines bildes einer szene, vorzugsweise eines waermebildes |
| US4914296A (en) * | 1988-04-21 | 1990-04-03 | The Boeing Company | Infrared converter |
| FR2639784B1 (fr) * | 1988-11-29 | 1991-01-11 | Commissariat Energie Atomique | Structure monolithique de detection ou d'imagerie infrarouge et son procede de fabrication |
| GB8829035D0 (en) * | 1988-12-13 | 1989-07-05 | Emi Plc Thorn | Thermal imaging device |
| US4998688A (en) * | 1989-06-29 | 1991-03-12 | Hughes Aircraft Company | Operating temperature hybridizing for focal plane arrays |
| US4943491A (en) * | 1989-11-20 | 1990-07-24 | Honeywell Inc. | Structure for improving interconnect reliability of focal plane arrays |
-
1992
- 1992-05-21 FR FR9206209A patent/FR2691579A1/fr active Granted
-
1993
- 1993-05-18 EP EP19930401270 patent/EP0571268B1/fr not_active Expired - Lifetime
- 1993-05-18 DE DE69319964T patent/DE69319964T2/de not_active Expired - Fee Related
- 1993-05-19 US US08/063,333 patent/US5332899A/en not_active Expired - Fee Related
- 1993-05-19 JP JP11736593A patent/JPH06121232A/ja not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| DE69319964D1 (de) | 1998-09-03 |
| JPH06121232A (ja) | 1994-04-28 |
| FR2691579A1 (fr) | 1993-11-26 |
| EP0571268B1 (fr) | 1998-07-29 |
| FR2691579B1 (enExample) | 1994-07-13 |
| EP0571268A1 (fr) | 1993-11-24 |
| US5332899A (en) | 1994-07-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |