DE69313807T2 - Halbleiterlaser mit Begrenzungsschicht aus AlGaInP - Google Patents
Halbleiterlaser mit Begrenzungsschicht aus AlGaInPInfo
- Publication number
- DE69313807T2 DE69313807T2 DE69313807T DE69313807T DE69313807T2 DE 69313807 T2 DE69313807 T2 DE 69313807T2 DE 69313807 T DE69313807 T DE 69313807T DE 69313807 T DE69313807 T DE 69313807T DE 69313807 T2 DE69313807 T2 DE 69313807T2
- Authority
- DE
- Germany
- Prior art keywords
- algainp
- semiconductor laser
- layer made
- boundary layer
- boundary
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34313—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer having only As as V-compound, e.g. AlGaAs, InGaAs
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2231—Buried stripe structure with inner confining structure only between the active layer and the upper electrode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/2205—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers
- H01S5/2206—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers based on III-V materials
- H01S5/2209—GaInP based
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3211—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34928092A JPH06204613A (ja) | 1992-12-28 | 1992-12-28 | 半導体レーザ |
JP9438293 | 1993-04-21 | ||
JP18834193A JPH077230A (ja) | 1993-04-21 | 1993-07-29 | 屈折率反導波型半導体レーザ |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69313807D1 DE69313807D1 (de) | 1997-10-16 |
DE69313807T2 true DE69313807T2 (de) | 1998-01-22 |
Family
ID=27307531
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69313807T Expired - Fee Related DE69313807T2 (de) | 1992-12-28 | 1993-12-27 | Halbleiterlaser mit Begrenzungsschicht aus AlGaInP |
Country Status (4)
Country | Link |
---|---|
US (1) | US5586135A (de) |
EP (1) | EP0604965B1 (de) |
CA (1) | CA2112319C (de) |
DE (1) | DE69313807T2 (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5764671A (en) * | 1996-10-21 | 1998-06-09 | Motorola, Inc. | VCSEL with selective oxide transition regions |
US6461884B1 (en) * | 2001-01-05 | 2002-10-08 | Manijeh Razeghi | Diode laser |
JP2006245341A (ja) * | 2005-03-03 | 2006-09-14 | Mitsubishi Electric Corp | 半導体光素子 |
JP2007250896A (ja) * | 2006-03-16 | 2007-09-27 | Sumitomo Electric Ind Ltd | 半導体光素子 |
US20100260915A1 (en) * | 2009-04-09 | 2010-10-14 | The Folgers Coffee Company | Ground roast coffee tablet |
CN106384771B (zh) * | 2016-10-25 | 2019-01-11 | 华灿光电(浙江)有限公司 | AlGaInP基发光二极管外延片、芯片及制备方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01181493A (ja) * | 1988-01-09 | 1989-07-19 | Sharp Corp | 端面窓型半導体レーザ素子 |
GB2222307B (en) * | 1988-07-22 | 1992-04-01 | Mitsubishi Electric Corp | Semiconductor laser |
US5146466A (en) * | 1988-09-29 | 1992-09-08 | Sanyo Electric Co., Ltd. | Semiconductor laser device |
JP2978530B2 (ja) * | 1990-06-05 | 1999-11-15 | 富士通株式会社 | 半導体レーザ装置 |
JPH04150087A (ja) * | 1990-10-12 | 1992-05-22 | Mitsubishi Electric Corp | 可視光半導体レーザ装置 |
US5210767A (en) * | 1990-09-20 | 1993-05-11 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor laser |
US5274656A (en) * | 1991-06-12 | 1993-12-28 | Sumitomo Electric Industries, Ltd. | Semiconductor laser |
JP3129779B2 (ja) * | 1991-08-30 | 2001-01-31 | 株式会社東芝 | 半導体レーザ装置 |
JP3242967B2 (ja) * | 1992-01-31 | 2001-12-25 | 株式会社東芝 | 半導体発光素子 |
US5222090A (en) * | 1992-03-05 | 1993-06-22 | Mcdonnell Douglas Corporation | 700-850 nanometer semiconductor diode laser |
-
1993
- 1993-12-23 CA CA002112319A patent/CA2112319C/en not_active Expired - Fee Related
- 1993-12-27 DE DE69313807T patent/DE69313807T2/de not_active Expired - Fee Related
- 1993-12-27 EP EP93120981A patent/EP0604965B1/de not_active Expired - Lifetime
- 1993-12-28 US US08/174,067 patent/US5586135A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CA2112319C (en) | 1999-01-05 |
US5586135A (en) | 1996-12-17 |
CA2112319A1 (en) | 1994-06-29 |
EP0604965B1 (de) | 1997-09-10 |
DE69313807D1 (de) | 1997-10-16 |
EP0604965A1 (de) | 1994-07-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8320 | Willingness to grant licences declared (paragraph 23) | ||
8339 | Ceased/non-payment of the annual fee |