DE69312182T2 - Lichtempfindliche Zusammensetzung - Google Patents

Lichtempfindliche Zusammensetzung

Info

Publication number
DE69312182T2
DE69312182T2 DE69312182T DE69312182T DE69312182T2 DE 69312182 T2 DE69312182 T2 DE 69312182T2 DE 69312182 T DE69312182 T DE 69312182T DE 69312182 T DE69312182 T DE 69312182T DE 69312182 T2 DE69312182 T2 DE 69312182T2
Authority
DE
Germany
Prior art keywords
photosensitive composition
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69312182T
Other languages
English (en)
Other versions
DE69312182D1 (de
Inventor
Satoshi Konuma
Akihisa Murata
Toshiyuki Matsumura
Shigeo Tsuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Kasei Corp
Konica Minolta Inc
Original Assignee
Mitsubishi Kasei Corp
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Kasei Corp, Konica Minolta Inc filed Critical Mitsubishi Kasei Corp
Publication of DE69312182D1 publication Critical patent/DE69312182D1/de
Application granted granted Critical
Publication of DE69312182T2 publication Critical patent/DE69312182T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE69312182T 1992-08-17 1993-08-13 Lichtempfindliche Zusammensetzung Expired - Fee Related DE69312182T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24001992 1992-08-17

Publications (2)

Publication Number Publication Date
DE69312182D1 DE69312182D1 (de) 1997-08-21
DE69312182T2 true DE69312182T2 (de) 1997-12-11

Family

ID=17053260

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69312182T Expired - Fee Related DE69312182T2 (de) 1992-08-17 1993-08-13 Lichtempfindliche Zusammensetzung

Country Status (3)

Country Link
US (1) US5427887A (de)
EP (1) EP0583962B1 (de)
DE (1) DE69312182T2 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69502645T2 (de) * 1994-03-03 1999-01-28 Mitsubishi Chem Corp Fotoempfindliche Zusammensetzung
US5846685A (en) * 1997-01-31 1998-12-08 Kodak Polychrome Graphics, Llc Radiation sensitive diazo sulfo-acrylic adducts and method for producing a printing plate

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2679498A (en) * 1954-05-25 Atent office
DE596731C (de) * 1932-05-23 1934-05-09 Kalle & Co Akt Ges Verfahren zur Darstellung von hoehermolekularen Diazoverbindungen
BE507657A (de) * 1950-12-06
NL254170A (de) * 1958-12-29
BE606888A (de) * 1960-08-05 1900-01-01
US3181461A (en) * 1963-05-23 1965-05-04 Howard A Fromson Photographic plate
JPS527364B2 (de) * 1973-07-23 1977-03-02
JPS5036207A (de) * 1973-08-03 1975-04-05
DE2363806B2 (de) * 1973-12-21 1979-05-17 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Gemisch
US4123276A (en) * 1974-02-28 1978-10-31 Fuji Photo Film Co., Ltd. Photosensitive composition
JPS533216A (en) * 1976-06-28 1978-01-12 Fuji Photo Film Co Ltd Diazo photosensitive composition
DE2652304A1 (de) * 1976-11-17 1978-05-18 Hoechst Ag Negativ arbeitende, lichtempfindliche kopiermasse und damit hergestelltes kopiermaterial
JPS564144A (en) * 1979-06-23 1981-01-17 Tokyo Ohka Kogyo Co Ltd Photosensitive composition
JPS5865430A (ja) * 1981-05-27 1983-04-19 Konishiroku Photo Ind Co Ltd 感光性印刷版用感光性組成物
JPS603632A (ja) * 1983-06-21 1985-01-10 Fuji Photo Film Co Ltd 感光性平版印刷版
JPS61275838A (ja) * 1985-05-31 1986-12-05 Fuji Photo Film Co Ltd 感光性組成物
JPS627045A (ja) * 1985-07-04 1987-01-14 Konishiroku Photo Ind Co Ltd 感光性組成物
US4929532A (en) * 1986-07-01 1990-05-29 Hoechst Celanese Corporation Diazo negative color proofing process utilizing acrylic/acrylate polymers
JPS63259657A (ja) * 1987-04-17 1988-10-26 Fuji Photo Film Co Ltd 感光性組成物
US5112743A (en) * 1989-05-24 1992-05-12 Fuji Photo Film Co., Ltd. Light-sensitive composition and presensitized plate for use in making lithographic printing plates
JPH05127372A (ja) * 1991-11-01 1993-05-25 Nippon Paint Co Ltd 平版印刷用感光性樹脂および樹脂組成物

Also Published As

Publication number Publication date
EP0583962B1 (de) 1997-07-16
US5427887A (en) 1995-06-27
EP0583962A2 (de) 1994-02-23
DE69312182D1 (de) 1997-08-21
EP0583962A3 (de) 1994-11-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee