DE69226223T2 - Kontaktausrichtung für Festwertspeicher - Google Patents
Kontaktausrichtung für FestwertspeicherInfo
- Publication number
- DE69226223T2 DE69226223T2 DE69226223T DE69226223T DE69226223T2 DE 69226223 T2 DE69226223 T2 DE 69226223T2 DE 69226223 T DE69226223 T DE 69226223T DE 69226223 T DE69226223 T DE 69226223T DE 69226223 T2 DE69226223 T2 DE 69226223T2
- Authority
- DE
- Germany
- Prior art keywords
- read
- memory
- contact alignment
- alignment
- contact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B69/00—Erasable-and-programmable ROM [EPROM] devices not provided for in groups H10B41/00 - H10B63/00, e.g. ultraviolet erasable-and-programmable ROM [UVEPROM] devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S257/00—Active solid-state devices, e.g. transistors, solid-state diodes
- Y10S257/90—MOSFET type gate sidewall insulating spacer
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Semiconductor Memories (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Non-Volatile Memory (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US74829091A | 1991-08-21 | 1991-08-21 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69226223D1 DE69226223D1 (de) | 1998-08-20 |
DE69226223T2 true DE69226223T2 (de) | 1998-12-24 |
Family
ID=25008824
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69226223T Expired - Fee Related DE69226223T2 (de) | 1991-08-21 | 1992-08-20 | Kontaktausrichtung für Festwertspeicher |
Country Status (4)
Country | Link |
---|---|
US (2) | US5376571A (de) |
EP (1) | EP0528690B1 (de) |
JP (1) | JPH0685277A (de) |
DE (1) | DE69226223T2 (de) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7071060B1 (en) * | 1996-02-28 | 2006-07-04 | Sandisk Corporation | EEPROM with split gate source side infection with sidewall spacers |
ES2154291T3 (es) * | 1992-12-09 | 2001-04-01 | Discovery Communicat Inc | Controlador de red para sistemas de distribucion de programas de television por cable. |
JP3224907B2 (ja) * | 1993-06-08 | 2001-11-05 | 株式会社東芝 | 不揮発性半導体記憶装置 |
FR2711275B1 (fr) * | 1993-10-15 | 1996-10-31 | Intel Corp | Procédé automatiquement aligné de contact en fabrication de semi-conducteurs et dispositifs produits. |
US5702979A (en) * | 1994-05-31 | 1997-12-30 | Sgs-Thomson Microelectronics, Inc. | Method of forming a landing pad structure in an integrated circuit |
US5945738A (en) * | 1994-05-31 | 1999-08-31 | Stmicroelectronics, Inc. | Dual landing pad structure in an integrated circuit |
US5956615A (en) * | 1994-05-31 | 1999-09-21 | Stmicroelectronics, Inc. | Method of forming a metal contact to landing pad structure in an integrated circuit |
JP4156044B2 (ja) * | 1994-12-22 | 2008-09-24 | エスティーマイクロエレクトロニクス,インコーポレイテッド | 集積回路におけるランディングパッド構成体の製造方法 |
US5705427A (en) * | 1994-12-22 | 1998-01-06 | Sgs-Thomson Microelectronics, Inc. | Method of forming a landing pad structure in an integrated circuit |
JP3542189B2 (ja) * | 1995-03-08 | 2004-07-14 | 株式会社ルネサステクノロジ | 半導体装置の製造方法及び半導体装置 |
KR19980014258A (ko) * | 1996-08-09 | 1998-05-25 | 김주용 | 메모리 셀 어레이 |
JP3548834B2 (ja) * | 1996-09-04 | 2004-07-28 | 沖電気工業株式会社 | 不揮発性半導体メモリの製造方法 |
US5854127A (en) * | 1997-03-13 | 1998-12-29 | Micron Technology, Inc. | Method of forming a contact landing pad |
TW471116B (en) * | 1999-01-22 | 2002-01-01 | United Microelectronics Corp | Contact isolation structure and the manufacturing method thereof |
US6821847B2 (en) * | 2001-10-02 | 2004-11-23 | Mosel Vitelic, Inc. | Nonvolatile memory structures and fabrication methods |
US6461905B1 (en) * | 2002-02-22 | 2002-10-08 | Advanced Micro Devices, Inc. | Dummy gate process to reduce the Vss resistance of flash products |
US8247861B2 (en) * | 2007-07-18 | 2012-08-21 | Infineon Technologies Ag | Semiconductor device and method of making same |
US20140015031A1 (en) * | 2012-07-12 | 2014-01-16 | Taiwan Semiconductor Manufacturing Company, Ltd. | Apparatus and Method for Memory Device |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4935380A (en) * | 1987-08-04 | 1990-06-19 | Mitsubishi Denki Kabushiki Kaisha | Method for manufacturing semiconductor device |
JP2723530B2 (ja) * | 1988-04-13 | 1998-03-09 | 日本電気株式会社 | ダイナミック型ランダムアクセスメモリ装置の製造方法 |
FR2638285B1 (fr) * | 1988-10-25 | 1992-06-19 | Commissariat Energie Atomique | Circuit integre a haute densite d'integration tel que memoire eprom et procede d'obtention correspondant |
US5113238A (en) * | 1989-01-06 | 1992-05-12 | Wang Chen Chin | Contactless non-volatile memory array cells |
FR2642900B1 (fr) * | 1989-01-17 | 1991-05-10 | Sgs Thomson Microelectronics | Procede de fabrication de circuits integres a transistors de memoire eprom et a transistors logiques |
KR920005453B1 (ko) * | 1989-05-13 | 1992-07-04 | 현대전자산업 주식회사 | 반도체 접속장치 형성방법 |
EP0405850A3 (de) * | 1989-06-30 | 1991-03-13 | AT&T Corp. | Dielektrikum-Herstellungsverfahren und dadurch hergestellte Komponente |
JPH0783066B2 (ja) * | 1989-08-11 | 1995-09-06 | 株式会社東芝 | 半導体装置の製造方法 |
IT1236601B (it) * | 1989-12-22 | 1993-03-18 | Sgs Thomson Microelectronics | Dispositivo a semiconduttore integrato di tipo eprom con connessioni metalliche di source e procedimento per la sua fabbricazione. |
JP2825585B2 (ja) * | 1990-01-29 | 1998-11-18 | 株式会社日立製作所 | 半導体集積回路装置及びその製造方法 |
JP2524863B2 (ja) * | 1990-05-02 | 1996-08-14 | 三菱電機株式会社 | 半導体装置およびその製造方法 |
JP2893894B2 (ja) * | 1990-08-15 | 1999-05-24 | 日本電気株式会社 | 不揮発性メモリ及びその製造方法 |
US5060190A (en) * | 1990-09-18 | 1991-10-22 | Industrial Technology Research Institute | Read only memory with write operation using mask |
US5231043A (en) * | 1991-08-21 | 1993-07-27 | Sgs-Thomson Microelectronics, Inc. | Contact alignment for integrated circuits |
-
1992
- 1992-08-20 DE DE69226223T patent/DE69226223T2/de not_active Expired - Fee Related
- 1992-08-20 EP EP92307596A patent/EP0528690B1/de not_active Expired - Lifetime
- 1992-08-21 JP JP4222966A patent/JPH0685277A/ja active Pending
-
1993
- 1993-09-10 US US08/118,843 patent/US5376571A/en not_active Expired - Lifetime
-
1994
- 1994-09-16 US US08/307,475 patent/US5448091A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US5448091A (en) | 1995-09-05 |
EP0528690A1 (de) | 1993-02-24 |
DE69226223D1 (de) | 1998-08-20 |
US5376571A (en) | 1994-12-27 |
EP0528690B1 (de) | 1998-07-15 |
JPH0685277A (ja) | 1994-03-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |