DE69225915T2 - Abbildungseinrichtung mit einer Vorrichtung zur Detektion eines Fokussierfehlers und/oder einer Verkantung - Google Patents

Abbildungseinrichtung mit einer Vorrichtung zur Detektion eines Fokussierfehlers und/oder einer Verkantung

Info

Publication number
DE69225915T2
DE69225915T2 DE69225915T DE69225915T DE69225915T2 DE 69225915 T2 DE69225915 T2 DE 69225915T2 DE 69225915 T DE69225915 T DE 69225915T DE 69225915 T DE69225915 T DE 69225915T DE 69225915 T2 DE69225915 T2 DE 69225915T2
Authority
DE
Germany
Prior art keywords
tilt
detecting
focusing error
imaging device
imaging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69225915T
Other languages
English (en)
Other versions
DE69225915D1 (de
Inventor
Der Werf Jan Evert Van
Den Brink Marinus Aart Van
Henk Frederik Dirk Linders
Johannes Marcus Maria Beltman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=19858987&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69225915(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by ASML Netherlands BV, Philips Electronics NV filed Critical ASML Netherlands BV
Publication of DE69225915D1 publication Critical patent/DE69225915D1/de
Application granted granted Critical
Publication of DE69225915T2 publication Critical patent/DE69225915T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G02B27/20—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective for imaging minute objects, e.g. light-pointer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/24—Base structure
    • G02B21/241—Devices for focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7034—Leveling
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Automatic Focus Adjustment (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Focusing (AREA)
DE69225915T 1991-03-07 1992-03-03 Abbildungseinrichtung mit einer Vorrichtung zur Detektion eines Fokussierfehlers und/oder einer Verkantung Expired - Lifetime DE69225915T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL9100410A NL9100410A (nl) 1991-03-07 1991-03-07 Afbeeldingsapparaat voorzien van een focusfout- en/of scheefstandsdetectie-inrichting.

Publications (2)

Publication Number Publication Date
DE69225915D1 DE69225915D1 (de) 1998-07-23
DE69225915T2 true DE69225915T2 (de) 1999-02-11

Family

ID=19858987

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69225915T Expired - Lifetime DE69225915T2 (de) 1991-03-07 1992-03-03 Abbildungseinrichtung mit einer Vorrichtung zur Detektion eines Fokussierfehlers und/oder einer Verkantung

Country Status (6)

Country Link
US (1) US5191200A (de)
EP (1) EP0502583B1 (de)
JP (1) JP2965097B2 (de)
KR (1) KR100282098B1 (de)
DE (1) DE69225915T2 (de)
NL (1) NL9100410A (de)

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KR100282098B1 (ko) 2001-02-15
US5191200A (en) 1993-03-02
NL9100410A (nl) 1992-10-01
EP0502583B1 (de) 1998-06-17
EP0502583A1 (de) 1992-09-09
JPH06188172A (ja) 1994-07-08
DE69225915D1 (de) 1998-07-23
JP2965097B2 (ja) 1999-10-18
KR920018502A (ko) 1992-10-22

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