DE69219502D1 - yösungsmitteldispergierbare interpenetrierende Polymernetzwerke enthaltende lichtempfindliche Zusammensetzung - Google Patents
yösungsmitteldispergierbare interpenetrierende Polymernetzwerke enthaltende lichtempfindliche ZusammensetzungInfo
- Publication number
- DE69219502D1 DE69219502D1 DE69219502T DE69219502T DE69219502D1 DE 69219502 D1 DE69219502 D1 DE 69219502D1 DE 69219502 T DE69219502 T DE 69219502T DE 69219502 T DE69219502 T DE 69219502T DE 69219502 D1 DE69219502 D1 DE 69219502D1
- Authority
- DE
- Germany
- Prior art keywords
- dispersible
- composition containing
- photosensitive composition
- containing solvent
- interpenetrating polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F255/00—Macromolecular compounds obtained by polymerising monomers on to polymers of hydrocarbons as defined in group C08F10/00
- C08F255/02—Macromolecular compounds obtained by polymerising monomers on to polymers of hydrocarbons as defined in group C08F10/00 on to polymers of olefins having two or three carbon atoms
- C08F255/06—Macromolecular compounds obtained by polymerising monomers on to polymers of hydrocarbons as defined in group C08F10/00 on to polymers of olefins having two or three carbon atoms on to ethene-propene-diene terpolymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
- C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
- C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
- C08F265/06—Polymerisation of acrylate or methacrylate esters on to polymers thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/04—Polymers provided for in subclasses C08C or C08F
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/42—Polycondensates having carboxylic or carbonic ester groups in the main chain
- C08G18/4205—Polycondensates having carboxylic or carbonic ester groups in the main chain containing cyclic groups
- C08G18/4208—Polycondensates having carboxylic or carbonic ester groups in the main chain containing cyclic groups containing aromatic groups
- C08G18/4211—Polycondensates having carboxylic or carbonic ester groups in the main chain containing cyclic groups containing aromatic groups derived from aromatic dicarboxylic acids and dialcohols
- C08G18/4216—Polycondensates having carboxylic or carbonic ester groups in the main chain containing cyclic groups containing aromatic groups derived from aromatic dicarboxylic acids and dialcohols from mixtures or combinations of aromatic dicarboxylic acids and aliphatic dicarboxylic acids and dialcohols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/62—Polymers of compounds having carbon-to-carbon double bonds
- C08G18/6216—Polymers of alpha-beta ethylenically unsaturated carboxylic acids or of derivatives thereof
- C08G18/625—Polymers of alpha-beta ethylenically unsaturated carboxylic acids; hydrolyzed polymers of esters of these acids
- C08G18/6254—Polymers of alpha-beta ethylenically unsaturated carboxylic acids and of esters of these acids containing hydroxy groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
- C08G18/671—Unsaturated compounds having only one group containing active hydrogen
- C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
- C08G18/673—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen containing two or more acrylate or alkylacrylate ester groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
- C08G18/80—Masked polyisocyanates
- C08G18/8061—Masked polyisocyanates masked with compounds having only one group containing active hydrogen
- C08G18/807—Masked polyisocyanates masked with compounds having only one group containing active hydrogen with nitrogen containing compounds
- C08G18/8077—Oximes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D167/00—Coating compositions based on polyesters obtained by reactions forming a carboxylic ester link in the main chain; Coating compositions based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Paints Or Removers (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Polymerisation Methods In General (AREA)
- Graft Or Block Polymers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US66253991A | 1991-02-28 | 1991-02-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69219502D1 true DE69219502D1 (de) | 1997-06-12 |
DE69219502T2 DE69219502T2 (de) | 1997-12-11 |
Family
ID=24658125
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69219502T Expired - Fee Related DE69219502T2 (de) | 1991-02-28 | 1992-02-26 | yösungsmitteldispergierbare interpenetrierende Polymernetzwerke enthaltende lichtempfindliche Zusammensetzung |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP0501433B1 (de) |
JP (1) | JP3264511B2 (de) |
KR (1) | KR920016558A (de) |
CN (1) | CN1065468A (de) |
CA (1) | CA2061877A1 (de) |
DE (1) | DE69219502T2 (de) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5415971A (en) * | 1993-04-02 | 1995-05-16 | The Chromaline Corporation | Photoresist laminate including photoimageable adhesive layer |
US5641594A (en) * | 1993-12-27 | 1997-06-24 | Hoechst Japan Limited | Colored, photosensitive resin composition |
US5965256A (en) * | 1997-10-14 | 1999-10-12 | Minnesota Mining And Manufacturing Company | Protective films and coatings |
BR9901906B1 (pt) * | 1998-09-21 | 2008-11-18 | composiÇço para revestimento sensÍvel a radiaÇço étil para chapas de impressço litogrÁfica e similares. | |
DE10054933A1 (de) | 2000-11-06 | 2002-05-08 | Bayer Ag | Verfahren zur Beschichtung von Substraten |
JP2004515627A (ja) * | 2000-12-15 | 2004-05-27 | アベリー・デニソン・コーポレイション | 印刷可能媒体用組成物 |
US20040161538A1 (en) * | 2003-02-10 | 2004-08-19 | Angelika Boehme | Coating agents and a process for the preparation of multi-layer coatings |
ATE409890T1 (de) | 2004-02-26 | 2008-10-15 | Fujifilm Corp | Polymerisierbare zusammensetzung und verfahren zur herstellung von lithographischen druckplatten unter verwendung der polymerisierbaren zusammensetzung |
CN100345879C (zh) * | 2004-08-03 | 2007-10-31 | 耿耀宗 | 一种新型聚氨酯/聚丙烯酸酯胶乳互穿网络聚合物乳液材料及其合成方法 |
WO2006085741A1 (en) * | 2005-02-09 | 2006-08-17 | Stichting Dutch Polymer Institute | Process for preparing a polymeric relief structure |
JP4248020B2 (ja) | 2005-04-08 | 2009-04-02 | 日東電工株式会社 | ホログラム記録材料 |
JP5273455B2 (ja) * | 2008-09-22 | 2013-08-28 | 日立化成株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造法 |
JP5243597B2 (ja) * | 2009-03-27 | 2013-07-24 | ユニマテック株式会社 | 導光板材料用ポリウレタンシート及びその製造方法並びに使用 |
EP2436713A1 (de) * | 2010-09-29 | 2012-04-04 | Sika Technology AG | Zweikomponentige Polyurethane basierend auf hyperbranched Polymeren |
DE102011009235A1 (de) * | 2011-01-22 | 2012-07-26 | Schott Ag | Festigkeitssteigernde Beschichtung auf Polyurethan-basis |
US20160168724A1 (en) * | 2014-12-15 | 2016-06-16 | The Boeing Company | Polyvinylbutyral coating containing thiol corrosion inhibitors |
TWI677492B (zh) * | 2018-07-17 | 2019-11-21 | 奇鈦科技股份有限公司 | 液態光引發化合物及其應用 |
CN109134745B (zh) * | 2018-08-21 | 2021-06-01 | 深圳市广业电子科技有限公司 | 一种制备(甲基)丙烯酸-聚酯嵌段共聚物的无溶剂聚合产生技术 |
US20200354594A1 (en) * | 2019-05-08 | 2020-11-12 | Facebook Technologies, Llc | Thermally reversible and reorganizable crosslinking polymers for volume bragg gratings |
CN114075395B (zh) * | 2020-08-19 | 2023-06-30 | 深圳正峰印刷有限公司 | 一种易于附着的uv油墨及其印刷方法 |
CN112473647B (zh) * | 2020-12-23 | 2022-08-12 | 唐山学院 | 一种纤维簇状SmBO3光催化剂的制备方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3067582D1 (en) * | 1979-12-06 | 1984-05-24 | Ici Plc | Polymerisation process for preparation of non-aqueous dispersions of microparticles and coating compositions containing said microparticles |
AT377999B (de) * | 1982-05-27 | 1985-05-28 | Vianova Kunstharz Ag | Verfahren zur herstellung von waermehaertbaren acrylatbindemittel-loesungen |
GB8321933D0 (en) * | 1983-08-15 | 1983-09-14 | Ici Plc | Coating compositions |
US4753865A (en) * | 1986-01-22 | 1988-06-28 | E. I. Du Pont De Nemours And Company | Photosensitive compositions containing microgels |
US5006593A (en) * | 1988-06-16 | 1991-04-09 | E. I. Du Pont De Nemours And Company | Catenated polymer systems |
US5070002A (en) * | 1988-09-13 | 1991-12-03 | Amp-Akzo Corporation | Photoimageable permanent resist |
-
1992
- 1992-02-26 EP EP92103213A patent/EP0501433B1/de not_active Expired - Lifetime
- 1992-02-26 DE DE69219502T patent/DE69219502T2/de not_active Expired - Fee Related
- 1992-02-26 CA CA002061877A patent/CA2061877A1/en not_active Abandoned
- 1992-02-27 JP JP04085692A patent/JP3264511B2/ja not_active Expired - Fee Related
- 1992-02-27 KR KR1019920003073A patent/KR920016558A/ko not_active Application Discontinuation
- 1992-02-28 CN CN92101140A patent/CN1065468A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
JP3264511B2 (ja) | 2002-03-11 |
KR920016558A (ko) | 1992-09-25 |
CN1065468A (zh) | 1992-10-21 |
EP0501433B1 (de) | 1997-05-07 |
JPH0593003A (ja) | 1993-04-16 |
DE69219502T2 (de) | 1997-12-11 |
EP0501433A1 (de) | 1992-09-02 |
CA2061877A1 (en) | 1992-08-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |