DE69227210D1 - Gleichmässig beschichtete Photolackzusammensetzung - Google Patents
Gleichmässig beschichtete PhotolackzusammensetzungInfo
- Publication number
- DE69227210D1 DE69227210D1 DE69227210T DE69227210T DE69227210D1 DE 69227210 D1 DE69227210 D1 DE 69227210D1 DE 69227210 T DE69227210 T DE 69227210T DE 69227210 T DE69227210 T DE 69227210T DE 69227210 D1 DE69227210 D1 DE 69227210D1
- Authority
- DE
- Germany
- Prior art keywords
- photoresist composition
- uniformly coated
- coated photoresist
- uniformly
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US67614191A | 1991-03-27 | 1991-03-27 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69227210D1 true DE69227210D1 (de) | 1998-11-12 |
DE69227210T2 DE69227210T2 (de) | 1999-06-02 |
Family
ID=24713385
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1992627210 Expired - Fee Related DE69227210T2 (de) | 1991-03-27 | 1992-02-11 | Gleichmässig beschichtete Photolackzusammensetzung |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0506593B1 (de) |
JP (1) | JPH04328747A (de) |
DE (1) | DE69227210T2 (de) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100341563B1 (ko) * | 1992-03-23 | 2002-10-25 | 제이에스알 가부시끼가이샤 | 레지스트도포조성물 |
KR20010031071A (ko) | 1998-08-11 | 2001-04-16 | 레빈 제임스 피. | 공중합체 레지스트용 단일 성분 현상제 |
US6426177B2 (en) | 1998-08-11 | 2002-07-30 | International Business Machines Corporation | Single component developer for use with ghost exposure |
JP2007101715A (ja) * | 2005-09-30 | 2007-04-19 | Fujifilm Corp | パターン形成方法及びそれに用いるレジスト組成物 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4397937A (en) * | 1982-02-10 | 1983-08-09 | International Business Machines Corporation | Positive resist compositions |
GB8413395D0 (en) * | 1984-05-25 | 1984-07-04 | Ciba Geigy Ag | Production of images |
JPS62123444A (ja) * | 1985-08-07 | 1987-06-04 | Japan Synthetic Rubber Co Ltd | ポジ型感放射線性樹脂組成物 |
ES2202389T3 (es) * | 1986-12-23 | 2004-04-01 | Shipley Company Inc. | Composicnes fotorresistentes de alta resolucion. |
US4853315A (en) * | 1988-01-15 | 1989-08-01 | International Business Machines Corporation | O-quinone diazide sulfonic acid monoesters useful as sensitizers for positive resists |
NO891062L (no) * | 1988-03-31 | 1989-10-02 | Thiokol Morton Inc | Positiv fotofoelsom sammensetning. |
-
1991
- 1991-12-18 JP JP3334646A patent/JPH04328747A/ja active Pending
-
1992
- 1992-02-11 EP EP19920480023 patent/EP0506593B1/de not_active Expired - Lifetime
- 1992-02-11 DE DE1992627210 patent/DE69227210T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH04328747A (ja) | 1992-11-17 |
DE69227210T2 (de) | 1999-06-02 |
EP0506593B1 (de) | 1998-10-07 |
EP0506593A1 (de) | 1992-09-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69322946D1 (de) | Photolackzusammensetzung | |
DE69301999D1 (de) | Photoresist Zusammensetzung | |
DE69222234D1 (de) | Photopolymerisierbare Zusammensetzung | |
DE69129955D1 (de) | Photolackzusammensetzung | |
DE69302650D1 (de) | Lichtempfindliche Zusammensetzung | |
DE69327741D1 (de) | Photopolymerisierbare Zusammensetzung | |
DE69226920D1 (de) | Lichtempfindliche Zusammensetzung | |
DE69223033D1 (de) | Fluorgummi-beschichtungszusammensetzung | |
DE69425786D1 (de) | Photoresistzusammensetzung | |
DE68927140D1 (de) | Photolackzusammensetzung | |
DE69222987D1 (de) | Photopolymerisierbare zusammensetzung | |
DE69128369D1 (de) | Beschichtungszusammensetzung | |
DE69123873D1 (de) | Photoresistzusammensetzung | |
DE69320397D1 (de) | Photopolymerisierbare Zusammensetzung | |
DE69203574D1 (de) | Beschichtungszusammensetzung. | |
NO942305D0 (no) | Belegningsmaterialer | |
DE69027432D1 (de) | Beschichtungszusammensetzung | |
DE69229419D1 (de) | Photoempfindliche Polymerzusammensetzung | |
DE69219626D1 (de) | Beschichtungsmaterialzusammensetzung | |
FI98746B (fi) | Päällystyslaite | |
DE69210542D1 (de) | Beschichtungsmittel | |
DE69219747D1 (de) | Lichtempfindliche Zusammensetzung | |
DE69204411D1 (de) | Überzugszusammensetzung. | |
DE69303215D1 (de) | Überzugzusammensetzung | |
DE69208580D1 (de) | Photopolymerisierbare Zusammensetzung |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |