DE69214318D1 - Verfahren und Vorrichtung zur Bestimmung der kristallographischen Achse eines Einkristallbarrens - Google Patents

Verfahren und Vorrichtung zur Bestimmung der kristallographischen Achse eines Einkristallbarrens

Info

Publication number
DE69214318D1
DE69214318D1 DE69214318T DE69214318T DE69214318D1 DE 69214318 D1 DE69214318 D1 DE 69214318D1 DE 69214318 T DE69214318 T DE 69214318T DE 69214318 T DE69214318 T DE 69214318T DE 69214318 D1 DE69214318 D1 DE 69214318D1
Authority
DE
Germany
Prior art keywords
determining
single crystal
crystal ingot
crystallographic axis
crystallographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69214318T
Other languages
English (en)
Other versions
DE69214318T2 (de
Inventor
Hiroyuki Ibe
Seiichi Terashima
Tsumoru Masui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Handotai Co Ltd
Original Assignee
Shin Etsu Handotai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Handotai Co Ltd filed Critical Shin Etsu Handotai Co Ltd
Publication of DE69214318D1 publication Critical patent/DE69214318D1/de
Application granted granted Critical
Publication of DE69214318T2 publication Critical patent/DE69214318T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20008Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/05Investigating materials by wave or particle radiation by diffraction, scatter or reflection
    • G01N2223/056Investigating materials by wave or particle radiation by diffraction, scatter or reflection diffraction
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/10Different kinds of radiation or particles
    • G01N2223/101Different kinds of radiation or particles electromagnetic radiation
    • G01N2223/1016X-ray
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/30Accessories, mechanical or electrical features
    • G01N2223/33Accessories, mechanical or electrical features scanning, i.e. relative motion for measurement of successive object-parts
    • G01N2223/3306Accessories, mechanical or electrical features scanning, i.e. relative motion for measurement of successive object-parts object rotates
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/60Specific applications or type of materials
    • G01N2223/604Specific applications or type of materials monocrystal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE69214318T 1991-02-19 1992-02-19 Verfahren und Vorrichtung zur Bestimmung der kristallographischen Achse eines Einkristallbarrens Expired - Fee Related DE69214318T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3045458A JPH0820384B2 (ja) 1991-02-19 1991-02-19 単結晶のof方位検出方法及び装置

Publications (2)

Publication Number Publication Date
DE69214318D1 true DE69214318D1 (de) 1996-11-14
DE69214318T2 DE69214318T2 (de) 1997-04-24

Family

ID=12719916

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69214318T Expired - Fee Related DE69214318T2 (de) 1991-02-19 1992-02-19 Verfahren und Vorrichtung zur Bestimmung der kristallographischen Achse eines Einkristallbarrens

Country Status (4)

Country Link
US (1) US5187729A (de)
EP (1) EP0500339B1 (de)
JP (1) JPH0820384B2 (de)
DE (1) DE69214318T2 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2903916B2 (ja) * 1992-11-30 1999-06-14 信越半導体株式会社 半導体インゴット加工方法
JPH08222798A (ja) * 1995-02-15 1996-08-30 Mitsubishi Electric Corp 半導体レーザの製造方法
EP0738572B1 (de) * 1995-04-22 2004-01-21 HCT Shaping Systems SA Verfahren zur Orientierung von Einkristallen zum Schneiden in eine Schneidemaschine und Einrichtung zur Durchführung des Verfahrens
JPH10160688A (ja) * 1996-12-04 1998-06-19 Rigaku Corp 単結晶インゴットのx線トポグラフィー方法および装置
US5768335A (en) * 1997-02-10 1998-06-16 Lucent Technologies Inc. Apparatus and method for measuring the orientation of a single crystal surface
US5966423A (en) * 1997-03-28 1999-10-12 Philips Electronics North America Corporation Arc diffractometer
US6055293A (en) * 1998-06-30 2000-04-25 Seh America, Inc. Method for identifying desired features in a crystal
US6760403B2 (en) 2001-10-25 2004-07-06 Seh America, Inc. Method and apparatus for orienting a crystalline body during radiation diffractometry
US6792075B2 (en) * 2002-08-21 2004-09-14 Hypernex, Inc. Method and apparatus for thin film thickness mapping
US7027557B2 (en) * 2004-05-13 2006-04-11 Jorge Llacer Method for assisted beam selection in radiation therapy planning
CN101903467B (zh) * 2007-12-19 2012-04-04 旭硝子株式会社 醚组合物
JP2009233819A (ja) * 2008-03-28 2009-10-15 Shin Etsu Handotai Co Ltd 単結晶インゴットの円筒研削装置および加工方法
DE102010007459B4 (de) * 2010-02-10 2012-01-19 Siltronic Ag Verfahren zum Abtrennen einer Vielzahl von Scheiben von einem Kristall aus Halbleitermaterial
US8259901B1 (en) 2010-05-25 2012-09-04 Rubicon Technology, Inc. Intelligent machines and process for production of monocrystalline products with goniometer continual feedback
JP6685078B2 (ja) * 2013-03-15 2020-04-22 プロト マニュファクチャリング リミテッド X線回折装置およびx線回折装置駆動方法
WO2015125134A1 (en) * 2014-02-21 2015-08-27 Gem Solar Ltd. A method and apparatus for internal marking of ingots and wafers
CN108693893B (zh) * 2017-04-07 2021-01-12 中国科学院沈阳计算技术研究所有限公司 用于x射线单晶衍射仪的卡帕测角仪的防碰撞控制方法
US11781708B1 (en) * 2022-03-24 2023-10-10 Bruker Axs, Llc Low non-repetitive runout rotational mount

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4065211A (en) * 1976-03-01 1977-12-27 The United States Of America As Represented By The Secretary Of The Army Precision X-ray diffraction system incorporating a laser aligner
JPH0743331B2 (ja) * 1985-11-15 1995-05-15 株式会社日立製作所 検出装置
US4884887A (en) * 1987-01-23 1989-12-05 Hewlett-Packard Company Method for positioning a crystal ingot

Also Published As

Publication number Publication date
JPH04264241A (ja) 1992-09-21
EP0500339B1 (de) 1996-10-09
JPH0820384B2 (ja) 1996-03-04
US5187729A (en) 1993-02-16
DE69214318T2 (de) 1997-04-24
EP0500339A3 (en) 1993-07-28
EP0500339A2 (de) 1992-08-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee