DE69209397D1 - Verfahren zur Herstellung eines Glasgegenstandes aus Quarzglas zum Gebrauch mit einem Excimerlaser - Google Patents

Verfahren zur Herstellung eines Glasgegenstandes aus Quarzglas zum Gebrauch mit einem Excimerlaser

Info

Publication number
DE69209397D1
DE69209397D1 DE69209397T DE69209397T DE69209397D1 DE 69209397 D1 DE69209397 D1 DE 69209397D1 DE 69209397 T DE69209397 T DE 69209397T DE 69209397 T DE69209397 T DE 69209397T DE 69209397 D1 DE69209397 D1 DE 69209397D1
Authority
DE
Germany
Prior art keywords
manufacturing
quartz glass
excimer laser
glass article
article
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Revoked
Application number
DE69209397T
Other languages
English (en)
Other versions
DE69209397T2 (de
Inventor
Hiroyuki Nishimura
Akira Fujinoki
Toshikatsu Matsuya
Masatoshi Takita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Shin Etsu Quartz Products Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Shin Etsu Quartz Products Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=16125669&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69209397(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Shin Etsu Chemical Co Ltd, Shin Etsu Quartz Products Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Application granted granted Critical
Publication of DE69209397D1 publication Critical patent/DE69209397D1/de
Publication of DE69209397T2 publication Critical patent/DE69209397T2/de
Anticipated expiration legal-status Critical
Revoked legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2203/00—Fibre product details, e.g. structure, shape
    • C03B2203/10—Internal structure or shape details
    • C03B2203/22—Radial profile of refractive index, composition or softening point
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/04—Multi-nested ports
    • C03B2207/06—Concentric circular ports
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
    • C03B2207/22—Inert gas details
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • C03B2207/86—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid by bubbling a gas through the liquid

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Glass Compositions (AREA)
DE1992609397 1991-06-29 1992-06-29 Verfahren zur Herstellung eines Glasgegenstandes aus Quarzglas zum Gebrauch mit einem Excimerlaser Revoked DE69209397T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3182857A JP2588447B2 (ja) 1991-06-29 1991-06-29 エキシマレーザー用石英ガラス部材の製造方法

Publications (2)

Publication Number Publication Date
DE69209397D1 true DE69209397D1 (de) 1996-05-02
DE69209397T2 DE69209397T2 (de) 1996-10-24

Family

ID=16125669

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1992609397 Revoked DE69209397T2 (de) 1991-06-29 1992-06-29 Verfahren zur Herstellung eines Glasgegenstandes aus Quarzglas zum Gebrauch mit einem Excimerlaser

Country Status (3)

Country Link
EP (1) EP0525984B1 (de)
JP (1) JP2588447B2 (de)
DE (1) DE69209397T2 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11209134A (ja) * 1998-01-23 1999-08-03 Nikon Corp 合成石英ガラスおよびその製造方法
US6442973B1 (en) 1995-01-06 2002-09-03 Nikon Corporation Synthetic silica glass and its manufacturing method
JP3064857B2 (ja) * 1995-03-28 2000-07-12 株式会社ニコン 光リソグラフィー用光学部材および合成石英ガラスの製造方法
WO1997010184A1 (en) * 1995-09-12 1997-03-20 Corning Incorporated Boule oscillation patterns for producing fused silica glass
EP0960074B1 (de) * 1996-08-29 2005-11-16 Corning Incorporated Verfahren zur determinierung von laser-induzierter kompaktierung in geschmolzenem quarz
EP0870737B1 (de) 1997-04-08 2002-07-24 Shin-Etsu Quartz Products Co., Ltd. Optisches synthetisches Quarzglas, Herstellungsverfahren davon, und optisches Element für Excimer-Laser mit dem synthetischen Quarzglas
TW440548B (en) * 1997-05-14 2001-06-16 Nippon Kogaku Kk Synthetic silica glass optical member and method of manufacturing the same
GB9722020D0 (en) * 1997-10-17 1997-12-17 Tsl Group Plc Production of quartz glass articles having high surface purity
DE19841932A1 (de) * 1998-09-14 2000-03-16 Heraeus Quarzglas Optisches Bauteil aus Quarzglas und Verfahren für seine Herstellung
JP4158009B2 (ja) 2001-12-11 2008-10-01 信越化学工業株式会社 合成石英ガラスインゴット及び合成石英ガラスの製造方法
JP2004284886A (ja) 2003-03-24 2004-10-14 Shin Etsu Chem Co Ltd 合成石英ガラス製造用バーナー
US20050132749A1 (en) 2003-12-05 2005-06-23 Shin-Etsu Chmeical Co., Ltd. Burner and method for the manufacture of synthetic quartz glass
JP4855988B2 (ja) * 2007-03-28 2012-01-18 Ｈｏｙａ株式会社 ガラス光学素子の製造方法及びガラス光学素子
DE102010052685A1 (de) 2010-11-26 2012-05-31 J-Fiber Gmbh Verfahren zur Herstellung von strahlungsresistentem Quarzglasmaterial und danach hergestellte Quarzglaskörper

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2083806B (en) * 1980-09-11 1984-08-08 Nippon Telegraph & Telephone Fabrication methods of doped silica glass and optical fibre preform by using the doped silica glass
JPS6090836A (ja) * 1983-10-25 1985-05-22 Shin Etsu Chem Co Ltd 合成石英の製造方法
EP0146659B1 (de) * 1983-12-22 1988-03-30 Shin-Etsu Chemical Co., Ltd. Verfahren zur Herstellung von synthetischem Quarzglas und seine Verwendung in optischen Fasern
JPH01138145A (ja) * 1987-08-20 1989-05-31 Shin Etsu Chem Co Ltd 合成石英ガラス部材の製造方法
JP2764207B2 (ja) * 1988-08-31 1998-06-11 日本石英硝子株式会社 紫外域用有水合成石英ガラス及びその製造方法
JPH0791084B2 (ja) * 1988-09-14 1995-10-04 信越化学工業株式会社 耐紫外線用合成石英ガラスおよびその製造方法
GB8905966D0 (en) * 1989-03-15 1989-04-26 Tsl Group Plc Improved vitreous silica products
DE69015453T3 (de) * 1989-06-09 2001-10-11 Heraeus Quarzglas Gmbh & Co. Kg Optische Teile und Rohlinge aus synthetischem Siliziumdioxidglas und Verfahren zu ihrer Herstellung.
JPH03198338A (ja) * 1989-12-27 1991-08-29 Handotai Process Kenkyusho:Kk 気相成長膜の形成方法および半導体装置
US5043002A (en) * 1990-08-16 1991-08-27 Corning Incorporated Method of making fused silica by decomposing siloxanes

Also Published As

Publication number Publication date
JPH06199532A (ja) 1994-07-19
DE69209397T2 (de) 1996-10-24
JP2588447B2 (ja) 1997-03-05
EP0525984B1 (de) 1996-03-27
EP0525984A1 (de) 1993-02-03

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8331 Complete revocation