DE69209391D1 - Ionenstrahl-Neutralisator und Ionen-Implantationssystem mit einem solchen. - Google Patents

Ionenstrahl-Neutralisator und Ionen-Implantationssystem mit einem solchen.

Info

Publication number
DE69209391D1
DE69209391D1 DE69209391T DE69209391T DE69209391D1 DE 69209391 D1 DE69209391 D1 DE 69209391D1 DE 69209391 T DE69209391 T DE 69209391T DE 69209391 T DE69209391 T DE 69209391T DE 69209391 D1 DE69209391 D1 DE 69209391D1
Authority
DE
Germany
Prior art keywords
ion
implantation system
beam neutralizer
ion implantation
ion beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69209391T
Other languages
English (en)
Other versions
DE69209391T2 (de
Inventor
Victor Maurice Benveniste
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Axcelis Technologies Inc
Original Assignee
Eaton Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eaton Corp filed Critical Eaton Corp
Publication of DE69209391D1 publication Critical patent/DE69209391D1/de
Application granted granted Critical
Publication of DE69209391T2 publication Critical patent/DE69209391T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/004—Charge control of objects or beams
    • H01J2237/0041—Neutralising arrangements
    • H01J2237/0044—Neutralising arrangements of objects being observed or treated
    • H01J2237/0045—Neutralising arrangements of objects being observed or treated using secondary electrons
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
DE69209391T 1991-07-19 1992-07-15 Ionenstrahl-Neutralisator und Ionen-Implantationssystem mit einem solchen. Expired - Fee Related DE69209391T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/732,778 US5164599A (en) 1991-07-19 1991-07-19 Ion beam neutralization means generating diffuse secondary emission electron shower

Publications (2)

Publication Number Publication Date
DE69209391D1 true DE69209391D1 (de) 1996-05-02
DE69209391T2 DE69209391T2 (de) 1996-10-31

Family

ID=24944919

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69209391T Expired - Fee Related DE69209391T2 (de) 1991-07-19 1992-07-15 Ionenstrahl-Neutralisator und Ionen-Implantationssystem mit einem solchen.

Country Status (9)

Country Link
US (1) US5164599A (de)
EP (1) EP0523983B1 (de)
JP (1) JPH05211055A (de)
KR (1) KR0152449B1 (de)
CA (1) CA2072848A1 (de)
DE (1) DE69209391T2 (de)
ES (1) ES2085571T3 (de)
TW (1) TW205605B (de)
ZA (1) ZA925282B (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5378899A (en) * 1993-10-07 1995-01-03 Kimber; Eugene L. Ion implantation target charge control system
US5531420A (en) * 1994-07-01 1996-07-02 Eaton Corporation Ion beam electron neutralizer
US5633506A (en) * 1995-07-17 1997-05-27 Eaton Corporation Method and apparatus for in situ removal of contaminants from ion beam neutralization and implantation apparatuses
US5554854A (en) * 1995-07-17 1996-09-10 Eaton Corporation In situ removal of contaminants from the interior surfaces of an ion beam implanter
US5554857A (en) * 1995-10-19 1996-09-10 Eaton Corporation Method and apparatus for ion beam formation in an ion implanter
US5691537A (en) * 1996-01-22 1997-11-25 Chen; John Method and apparatus for ion beam transport
US5661308A (en) * 1996-05-30 1997-08-26 Eaton Corporation Method and apparatus for ion formation in an ion implanter
US5703375A (en) * 1996-08-02 1997-12-30 Eaton Corporation Method and apparatus for ion beam neutralization
US5814819A (en) * 1997-07-11 1998-09-29 Eaton Corporation System and method for neutralizing an ion beam using water vapor
US5909031A (en) * 1997-09-08 1999-06-01 Eaton Corporation Ion implanter electron shower having enhanced secondary electron emission
US5856674A (en) * 1997-09-16 1999-01-05 Eaton Corporation Filament for ion implanter plasma shower
US6271529B1 (en) 1997-12-01 2001-08-07 Ebara Corporation Ion implantation with charge neutralization
US5959305A (en) * 1998-06-19 1999-09-28 Eaton Corporation Method and apparatus for monitoring charge neutralization operation
US6555835B1 (en) 1999-08-09 2003-04-29 Samco International, Inc. Ultraviolet-ozone oxidation system and method
US6164146A (en) * 1999-08-09 2000-12-26 Samco International, Inc. Test device for ozone-ultraviolet cleaning-stripping equipment
WO2003012160A1 (fr) * 2001-07-31 2003-02-13 Asahi Optronics, Ltd. Systeme de galvanoplastie haute frequence par depot par evaporation sous vide
DE10254416A1 (de) * 2002-11-21 2004-06-09 Infineon Technologies Ag Vorrichtung zum Erzeugen von Sekundärelektronen, insbesondere Sekundärelektrode und Beschleunigungselektrode
US7038223B2 (en) * 2004-04-05 2006-05-02 Burle Technologies, Inc. Controlled charge neutralization of ion-implanted articles
KR100836765B1 (ko) * 2007-01-08 2008-06-10 삼성전자주식회사 이온빔을 사용하는 반도체 장비
CN105206492A (zh) * 2014-06-18 2015-12-30 上海华力微电子有限公司 一种改善带状离子束均匀性的装置
CN108242379A (zh) * 2016-12-26 2018-07-03 无锡中微掩模电子有限公司 一种环形电子枪

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4361762A (en) * 1980-07-30 1982-11-30 Rca Corporation Apparatus and method for neutralizing the beam in an ion implanter
US4463255A (en) * 1980-09-24 1984-07-31 Varian Associates, Inc. Apparatus for enhanced neutralization of positively charged ion beam
US4786814A (en) * 1983-09-16 1988-11-22 General Electric Company Method of reducing electrostatic charge on ion-implanted devices
JPS62103951A (ja) * 1985-10-29 1987-05-14 Toshiba Corp イオン注入装置
US4886971A (en) * 1987-03-13 1989-12-12 Mitsubishi Denki Kabushiki Kaisha Ion beam irradiating apparatus including ion neutralizer
US4825087A (en) * 1987-05-13 1989-04-25 Applied Materials, Inc. System and methods for wafer charge reduction for ion implantation
JPS6410563A (en) * 1987-07-02 1989-01-13 Sumitomo Eaton Nova Electric charging suppressor of ion implanter
US4804837A (en) * 1988-01-11 1989-02-14 Eaton Corporation Ion implantation surface charge control method and apparatus
EP0397120B1 (de) * 1989-05-09 1994-09-14 Sumitomo Eaton Nova Corporation Ionen-Implantationsgerät, in dem das elektrische Aufladen von Substraten vermieden wird

Also Published As

Publication number Publication date
ZA925282B (en) 1993-04-28
EP0523983B1 (de) 1996-03-27
ES2085571T3 (es) 1996-06-01
KR0152449B1 (ko) 1998-12-01
JPH05211055A (ja) 1993-08-20
CA2072848A1 (en) 1993-01-20
US5164599A (en) 1992-11-17
EP0523983A1 (de) 1993-01-20
DE69209391T2 (de) 1996-10-31
TW205605B (de) 1993-05-11
KR930003248A (ko) 1993-02-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: AXCELIS TECHNOLOGIES, INC., BEVERLY, MASS., US

8339 Ceased/non-payment of the annual fee