ZA925282B - Diffuse secondary emission electron shower - Google Patents

Diffuse secondary emission electron shower

Info

Publication number
ZA925282B
ZA925282B ZA925282A ZA925282A ZA925282B ZA 925282 B ZA925282 B ZA 925282B ZA 925282 A ZA925282 A ZA 925282A ZA 925282 A ZA925282 A ZA 925282A ZA 925282 B ZA925282 B ZA 925282B
Authority
ZA
South Africa
Prior art keywords
emission electron
secondary emission
electron shower
diffuse secondary
diffuse
Prior art date
Application number
ZA925282A
Other languages
English (en)
Inventor
Victor Maurice Benveniste
Maurice Benveniste Victor
Original Assignee
Eaton Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eaton Corp filed Critical Eaton Corp
Publication of ZA925282B publication Critical patent/ZA925282B/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/004—Charge control of objects or beams
    • H01J2237/0041—Neutralising arrangements
    • H01J2237/0044—Neutralising arrangements of objects being observed or treated
    • H01J2237/0045—Neutralising arrangements of objects being observed or treated using secondary electrons
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
ZA925282A 1991-07-19 1992-07-15 Diffuse secondary emission electron shower ZA925282B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/732,778 US5164599A (en) 1991-07-19 1991-07-19 Ion beam neutralization means generating diffuse secondary emission electron shower

Publications (1)

Publication Number Publication Date
ZA925282B true ZA925282B (en) 1993-04-28

Family

ID=24944919

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA925282A ZA925282B (en) 1991-07-19 1992-07-15 Diffuse secondary emission electron shower

Country Status (9)

Country Link
US (1) US5164599A (de)
EP (1) EP0523983B1 (de)
JP (1) JPH05211055A (de)
KR (1) KR0152449B1 (de)
CA (1) CA2072848A1 (de)
DE (1) DE69209391T2 (de)
ES (1) ES2085571T3 (de)
TW (1) TW205605B (de)
ZA (1) ZA925282B (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5378899A (en) * 1993-10-07 1995-01-03 Kimber; Eugene L. Ion implantation target charge control system
US5531420A (en) * 1994-07-01 1996-07-02 Eaton Corporation Ion beam electron neutralizer
US5554854A (en) * 1995-07-17 1996-09-10 Eaton Corporation In situ removal of contaminants from the interior surfaces of an ion beam implanter
US5633506A (en) * 1995-07-17 1997-05-27 Eaton Corporation Method and apparatus for in situ removal of contaminants from ion beam neutralization and implantation apparatuses
US5554857A (en) * 1995-10-19 1996-09-10 Eaton Corporation Method and apparatus for ion beam formation in an ion implanter
US5691537A (en) * 1996-01-22 1997-11-25 Chen; John Method and apparatus for ion beam transport
US5661308A (en) * 1996-05-30 1997-08-26 Eaton Corporation Method and apparatus for ion formation in an ion implanter
US5703375A (en) * 1996-08-02 1997-12-30 Eaton Corporation Method and apparatus for ion beam neutralization
US5814819A (en) * 1997-07-11 1998-09-29 Eaton Corporation System and method for neutralizing an ion beam using water vapor
US5909031A (en) * 1997-09-08 1999-06-01 Eaton Corporation Ion implanter electron shower having enhanced secondary electron emission
US5856674A (en) * 1997-09-16 1999-01-05 Eaton Corporation Filament for ion implanter plasma shower
US6271529B1 (en) 1997-12-01 2001-08-07 Ebara Corporation Ion implantation with charge neutralization
US5959305A (en) * 1998-06-19 1999-09-28 Eaton Corporation Method and apparatus for monitoring charge neutralization operation
US6555835B1 (en) 1999-08-09 2003-04-29 Samco International, Inc. Ultraviolet-ozone oxidation system and method
US6164146A (en) * 1999-08-09 2000-12-26 Samco International, Inc. Test device for ozone-ultraviolet cleaning-stripping equipment
WO2003012160A1 (fr) * 2001-07-31 2003-02-13 Asahi Optronics, Ltd. Systeme de galvanoplastie haute frequence par depot par evaporation sous vide
DE10254416A1 (de) 2002-11-21 2004-06-09 Infineon Technologies Ag Vorrichtung zum Erzeugen von Sekundärelektronen, insbesondere Sekundärelektrode und Beschleunigungselektrode
US7038223B2 (en) * 2004-04-05 2006-05-02 Burle Technologies, Inc. Controlled charge neutralization of ion-implanted articles
KR100836765B1 (ko) * 2007-01-08 2008-06-10 삼성전자주식회사 이온빔을 사용하는 반도체 장비
CN105206492A (zh) * 2014-06-18 2015-12-30 上海华力微电子有限公司 一种改善带状离子束均匀性的装置
CN108242379A (zh) * 2016-12-26 2018-07-03 无锡中微掩模电子有限公司 一种环形电子枪

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4361762A (en) * 1980-07-30 1982-11-30 Rca Corporation Apparatus and method for neutralizing the beam in an ion implanter
US4463255A (en) * 1980-09-24 1984-07-31 Varian Associates, Inc. Apparatus for enhanced neutralization of positively charged ion beam
US4786814A (en) * 1983-09-16 1988-11-22 General Electric Company Method of reducing electrostatic charge on ion-implanted devices
JPS62103951A (ja) * 1985-10-29 1987-05-14 Toshiba Corp イオン注入装置
US4886971A (en) * 1987-03-13 1989-12-12 Mitsubishi Denki Kabushiki Kaisha Ion beam irradiating apparatus including ion neutralizer
US4825087A (en) * 1987-05-13 1989-04-25 Applied Materials, Inc. System and methods for wafer charge reduction for ion implantation
JPS6410563A (en) * 1987-07-02 1989-01-13 Sumitomo Eaton Nova Electric charging suppressor of ion implanter
US4804837A (en) * 1988-01-11 1989-02-14 Eaton Corporation Ion implantation surface charge control method and apparatus
EP0397120B1 (de) * 1989-05-09 1994-09-14 Sumitomo Eaton Nova Corporation Ionen-Implantationsgerät, in dem das elektrische Aufladen von Substraten vermieden wird

Also Published As

Publication number Publication date
JPH05211055A (ja) 1993-08-20
TW205605B (de) 1993-05-11
DE69209391D1 (de) 1996-05-02
DE69209391T2 (de) 1996-10-31
ES2085571T3 (es) 1996-06-01
KR930003248A (ko) 1993-02-24
KR0152449B1 (ko) 1998-12-01
EP0523983B1 (de) 1996-03-27
CA2072848A1 (en) 1993-01-20
EP0523983A1 (de) 1993-01-20
US5164599A (en) 1992-11-17

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