DE69208924D1 - Kühlsystem mit Flüssigkeitsfilmzwischenschicht zur Bearbeitung von Halbleiterscheiben - Google Patents
Kühlsystem mit Flüssigkeitsfilmzwischenschicht zur Bearbeitung von HalbleiterscheibenInfo
- Publication number
- DE69208924D1 DE69208924D1 DE69208924T DE69208924T DE69208924D1 DE 69208924 D1 DE69208924 D1 DE 69208924D1 DE 69208924 T DE69208924 T DE 69208924T DE 69208924 T DE69208924 T DE 69208924T DE 69208924 D1 DE69208924 D1 DE 69208924D1
- Authority
- DE
- Germany
- Prior art keywords
- intermediate layer
- cooling system
- liquid film
- semiconductor wafers
- processing semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Machine Tool Units (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/691,628 US5088006A (en) | 1991-04-25 | 1991-04-25 | Liquid film interface cooling system for semiconductor wafer processing |
Publications (1)
Publication Number | Publication Date |
---|---|
DE69208924D1 true DE69208924D1 (de) | 1996-04-18 |
Family
ID=24777307
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69208924T Expired - Lifetime DE69208924D1 (de) | 1991-04-25 | 1992-03-27 | Kühlsystem mit Flüssigkeitsfilmzwischenschicht zur Bearbeitung von Halbleiterscheiben |
Country Status (4)
Country | Link |
---|---|
US (1) | US5088006A (de) |
EP (1) | EP0511928B1 (de) |
JP (1) | JPH0817200B2 (de) |
DE (1) | DE69208924D1 (de) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5972505A (en) * | 1989-04-04 | 1999-10-26 | Eastman Chemical Company | Fibers capable of spontaneously transporting fluids |
US5203401A (en) * | 1990-06-29 | 1993-04-20 | Digital Equipment Corporation | Wet micro-channel wafer chuck and cooling method |
DE9212752U1 (de) * | 1992-09-22 | 1993-03-04 | Siemens AG, 8000 München | Flüssigkeitskühlkörper |
US5740016A (en) * | 1996-03-29 | 1998-04-14 | Lam Research Corporation | Solid state temperature controlled substrate holder |
DE19808461A1 (de) | 1998-03-02 | 1999-09-09 | Zeiss Carl Fa | Retikel mit Kristall-Trägermaterial |
US8401336B2 (en) * | 2001-05-04 | 2013-03-19 | Legend3D, Inc. | System and method for rapid image sequence depth enhancement with augmented computer-generated elements |
DE10156407A1 (de) | 2001-11-16 | 2003-06-05 | Bosch Gmbh Robert | Haltevorrichtung, insbesondere zum Fixieren eines Halbleiterwafers in einer Plasmaätzvorrichtung, und Verfahren zur Wärmezufuhr oder Wärmeabfuhr von einem Substrat |
JP3979143B2 (ja) * | 2002-03-27 | 2007-09-19 | 株式会社日立製作所 | 情報処理装置の冷却装置 |
DE10216786C5 (de) * | 2002-04-15 | 2009-10-15 | Ers Electronic Gmbh | Verfahren und Vorrichtung zur Konditionierung von Halbleiterwafern und/oder Hybriden |
US6907742B2 (en) * | 2002-12-19 | 2005-06-21 | Taiwan Semiconductor Manufacturing Co., Ltd | Apparatus and method for controlling wafer temperature |
US7158211B2 (en) * | 2003-09-29 | 2007-01-02 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
DE102004057215B4 (de) * | 2004-11-26 | 2008-12-18 | Erich Reitinger | Verfahren und Vorrichtung zum Testen von Halbleiterwafern mittels einer Sondenkarte unter Verwendung eines temperierten Fluidstrahls |
DE102005001163B3 (de) * | 2005-01-10 | 2006-05-18 | Erich Reitinger | Verfahren und Vorrichtung zum Testen von Halbleiterwafern mittels einer temperierbaren Aufspanneinrichtung |
DE102005014513B4 (de) * | 2005-03-30 | 2011-05-12 | Att Advanced Temperature Test Systems Gmbh | Vorrichtung und Verfahren zum Temperieren eines Substrats, sowie Verfahren zur Herstellung der Vorrichtung |
JP4647401B2 (ja) * | 2005-06-06 | 2011-03-09 | 東京エレクトロン株式会社 | 基板保持台、基板温度制御装置及び基板温度制御方法 |
US7593096B2 (en) * | 2006-05-15 | 2009-09-22 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7466402B2 (en) * | 2006-12-18 | 2008-12-16 | Texas Instruments Incorporated | System and method for testing a lighting diode |
TWI450047B (zh) | 2007-07-13 | 2014-08-21 | Mapper Lithography Ip Bv | 微影系統、夾緊方法及晶圓台 |
JP5596058B2 (ja) * | 2009-02-22 | 2014-09-24 | マッパー・リソグラフィー・アイピー・ビー.ブイ. | 基板支持構造体、クランプ調整ユニット及び、リソグラフィシステム |
US8436324B2 (en) | 2009-02-22 | 2013-05-07 | Mapper Lithography Ip B.V. | Preparation unit for lithography machine |
KR101686549B1 (ko) | 2010-02-19 | 2016-12-14 | 마퍼 리쏘그라피 아이피 비.브이. | 기판 지지 구조물, 클램프 준비 유닛, 그리고 리소그래피 시스템 |
NL1037754C2 (en) * | 2010-02-26 | 2011-08-30 | Mapper Lithography Ip Bv | Substrate support structure, clamp preparation unit, and lithography system. |
NL1038213C2 (en) * | 2010-03-04 | 2012-10-08 | Mapper Lithography Ip Bv | Substrate support structure, clamp preparation unit, and lithography system. |
US8471575B2 (en) | 2010-04-30 | 2013-06-25 | International Business Machines Corporation | Methodologies and test configurations for testing thermal interface materials |
US8686749B2 (en) | 2010-04-30 | 2014-04-01 | International Business Machines Corporation | Thermal interface material, test structure and method of use |
US9377423B2 (en) | 2012-12-31 | 2016-06-28 | Cascade Microtech, Inc. | Systems and methods for handling substrates at below dew point temperatures |
JP6213824B2 (ja) * | 2013-11-20 | 2017-10-18 | 株式会社リコー | シート材載置装置および画像形成装置 |
CN104882275A (zh) * | 2015-06-10 | 2015-09-02 | 江苏省电力公司涟水县供电公司 | 一种带有散热结构的电力电容 |
US9870934B2 (en) * | 2015-07-28 | 2018-01-16 | Micron Technology, Inc. | Electrostatic chuck and temperature-control method for the same |
JP6510461B2 (ja) * | 2016-05-25 | 2019-05-08 | 日本特殊陶業株式会社 | 基板保持装置 |
JP1624353S (de) * | 2018-07-19 | 2019-02-12 | ||
DE102019128942A1 (de) | 2019-10-28 | 2021-04-29 | Infineon Technologies Ag | Prober mit Kühlmechanismus zum direkten Kühlen einer zu prüfenden Vorrichtung |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4019098A (en) * | 1974-11-25 | 1977-04-19 | Sundstrand Corporation | Heat pipe cooling system for electronic devices |
US4559580A (en) * | 1983-11-04 | 1985-12-17 | Sundstrand Corporation | Semiconductor package with internal heat exchanger |
US4920574A (en) * | 1985-10-04 | 1990-04-24 | Fujitsu Limited | Cooling system for an electronic circuit device |
US4750086A (en) * | 1985-12-11 | 1988-06-07 | Unisys Corporation | Apparatus for cooling integrated circuit chips with forced coolant jet |
JPH065700B2 (ja) * | 1987-07-22 | 1994-01-19 | 株式会社日立製作所 | 電子回路デバイスの冷却装置 |
US4942497A (en) * | 1987-07-24 | 1990-07-17 | Nec Corporation | Cooling structure for heat generating electronic components mounted on a substrate |
US4918928A (en) * | 1987-12-17 | 1990-04-24 | Kabushiki Kaisha Kobe Seikosho | Apparatus for testing IC devices at low temperature and cooling bag for use in testing IC devices at low temperature |
FR2631010B1 (fr) * | 1988-05-06 | 1991-03-22 | Sagem | Dispositif de support et de regulation thermique d'une piece et appareillage de test de plaques de circuits semi-conducteurs incluant un tel dispositif |
JP2748127B2 (ja) * | 1988-09-02 | 1998-05-06 | キヤノン株式会社 | ウエハ保持方法 |
US4956746A (en) * | 1989-03-29 | 1990-09-11 | Hughes Aircraft Company | Stacked wafer electronic package |
JPH0670984B2 (ja) * | 1989-09-27 | 1994-09-07 | 株式会社日立製作所 | 試料の温度制御方法及び装置 |
US4967832A (en) * | 1989-12-27 | 1990-11-06 | Nrc Corporation | Cooling method and apparatus for integrated circuit chips |
-
1991
- 1991-04-25 US US07/691,628 patent/US5088006A/en not_active Expired - Fee Related
-
1992
- 1992-03-03 JP JP4545392A patent/JPH0817200B2/ja not_active Expired - Lifetime
- 1992-03-27 DE DE69208924T patent/DE69208924D1/de not_active Expired - Lifetime
- 1992-03-27 EP EP92480047A patent/EP0511928B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0511928B1 (de) | 1996-03-13 |
JPH0817200B2 (ja) | 1996-02-21 |
EP0511928A1 (de) | 1992-11-04 |
JPH04329656A (ja) | 1992-11-18 |
US5088006A (en) | 1992-02-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69208924D1 (de) | Kühlsystem mit Flüssigkeitsfilmzwischenschicht zur Bearbeitung von Halbleiterscheiben | |
DE69210886D1 (de) | Substrat mit Dünnfilmelementen | |
DE69212185D1 (de) | Halbleiteraufbau mit flexibler Trägerfolie | |
KR890015366A (ko) | 반도체 박막형성법 | |
DE69630501D1 (de) | Vorrichtung zur Bearbeitung von Einzelhalbleiterwafern mit In-situ-Temperaturregelung | |
DE69207295D1 (de) | Flüssigkeitskühlkreislaufsystem | |
DE69223034D1 (de) | Übertragungsvorrichtung von beschichtungsfilmen | |
DE69231971D1 (de) | Lösungen zur Oberflächenbehandlung von Halbleitern | |
DE69207303D1 (de) | Fluessiges reinigungsmittel fuer halbleitersubstrat | |
DE69118921D1 (de) | Kühlungspannvorrichtung mit flüssiger zwischenschicht für die verarbeitung von halbleiterschichten | |
FR2541511B1 (fr) | Substrat pour support de circuits integres | |
DE69219535D1 (de) | Behälter für Halbleiter-Wafer | |
EP0451740A3 (en) | Temperature control system for semiconductor wafer or substrate | |
DE69428618D1 (de) | Thermischer Reaktor für Operationen zur Bearbeitung von Halbleiter-Wafer | |
DE69316136D1 (de) | Halbleitermessaufnehmer mit Schaltung zur Feststellung von Fehlern | |
DE69210767D1 (de) | Substrat-Transport-Vorrichtung | |
DE69324330D1 (de) | Vorrichtungen zur Fördern und Ausrichten von mit Linsen versehenen photographischen Filmverpackungen | |
DE68906127D1 (de) | Kuehlanlage fuer kohlensaeurehaltige fluessigkeiten. | |
DE69427501D1 (de) | Halbleiteranordnung mit Dünnfilm-Widerstand | |
DE69210063D1 (de) | Integrierte Halbleiter-Schaltungseinheit mit Detektionsschaltung für Substrat-Potential | |
FI883565A0 (fi) | Anordning foer kontroll av egenskaper hos en film pao ett substrat. | |
DE3280202D1 (de) | Heterouebergang-halbleitereinrichtung mit hoher elektronenbeweglichkeit. | |
FR2683054B1 (fr) | Modulateur electrooptique integre et procede de fabrication de ce modulateur. | |
DE69020421D1 (de) | Multiplexe elektrolumineszierende Randstrahlerstruktur mit Dünnfilm und elektronisches Betriebssystem dafür. | |
DE3883188D1 (de) | Duennfilm-halbleiteranordung. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8332 | No legal effect for de |