DE69210767D1 - Substrat-Transport-Vorrichtung - Google Patents

Substrat-Transport-Vorrichtung

Info

Publication number
DE69210767D1
DE69210767D1 DE69210767T DE69210767T DE69210767D1 DE 69210767 D1 DE69210767 D1 DE 69210767D1 DE 69210767 T DE69210767 T DE 69210767T DE 69210767 T DE69210767 T DE 69210767T DE 69210767 D1 DE69210767 D1 DE 69210767D1
Authority
DE
Germany
Prior art keywords
transport device
substrate transport
substrate
transport
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Revoked
Application number
DE69210767T
Other languages
English (en)
Other versions
DE69210767T2 (de
Inventor
Yoshiteru Fukutomi
Masami Ohtani
Takeo Okamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=18312108&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69210767(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Application granted granted Critical
Publication of DE69210767D1 publication Critical patent/DE69210767D1/de
Publication of DE69210767T2 publication Critical patent/DE69210767T2/de
Anticipated expiration legal-status Critical
Revoked legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67769—Storage means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67766—Mechanical parts of transfer devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Robotics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Liquid Crystal (AREA)
DE69210767T 1991-11-26 1992-11-26 Substrat-Transport-Vorrichtung Revoked DE69210767T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3337802A JP2622046B2 (ja) 1991-11-26 1991-11-26 基板搬送装置

Publications (2)

Publication Number Publication Date
DE69210767D1 true DE69210767D1 (de) 1996-06-20
DE69210767T2 DE69210767T2 (de) 1997-01-23

Family

ID=18312108

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69210767T Revoked DE69210767T2 (de) 1991-11-26 1992-11-26 Substrat-Transport-Vorrichtung

Country Status (5)

Country Link
US (1) US5359785A (de)
EP (1) EP0544311B1 (de)
JP (1) JP2622046B2 (de)
KR (1) KR970000698B1 (de)
DE (1) DE69210767T2 (de)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5733024A (en) * 1995-09-13 1998-03-31 Silicon Valley Group, Inc. Modular system
US5628121A (en) * 1995-12-01 1997-05-13 Convey, Inc. Method and apparatus for maintaining sensitive articles in a contaminant-free environment
KR100403667B1 (ko) * 1995-12-30 2004-04-03 고려화학 주식회사 우레탄아크릴레이트올리고머를이용한광경화형도막조성물
KR100385910B1 (ko) * 1995-12-30 2003-08-21 고려화학 주식회사 우레탄 아크릴레이트 올리고머를 함유한 광경화형도막조성물
US6203582B1 (en) * 1996-07-15 2001-03-20 Semitool, Inc. Modular semiconductor workpiece processing tool
US6672820B1 (en) 1996-07-15 2004-01-06 Semitool, Inc. Semiconductor processing apparatus having linear conveyer system
US6645355B2 (en) 1996-07-15 2003-11-11 Semitool, Inc. Semiconductor processing apparatus having lift and tilt mechanism
US6091498A (en) 1996-07-15 2000-07-18 Semitool, Inc. Semiconductor processing apparatus having lift and tilt mechanism
US5724748A (en) * 1996-07-24 1998-03-10 Brooks; Ray G. Apparatus for packaging contaminant-sensitive articles and resulting package
US5756157A (en) * 1996-10-02 1998-05-26 Silicon Valley Group Method for processing flat panel displays and large wafers
KR100482026B1 (ko) * 1996-12-31 2006-01-12 고려화학 주식회사 방충성이우수한광경화형도막조성물
TW401582B (en) * 1997-05-15 2000-08-11 Tokyo Electorn Limtied Apparatus for and method of transferring substrates
JP3850952B2 (ja) * 1997-05-15 2006-11-29 東京エレクトロン株式会社 基板搬送装置及び基板搬送方法
TW398024B (en) * 1997-09-01 2000-07-11 United Microelectronics Corp Method to prevent stepper fetch arm from scratching the wafer back and its control device
JP2000138283A (ja) * 1998-08-28 2000-05-16 Tadahiro Omi ウエハの交換機能を有するウエハストッカ
JP4230642B2 (ja) 1999-07-08 2009-02-25 株式会社荏原製作所 基板搬送治具及び基板搬送装置
US6481951B1 (en) * 1999-09-16 2002-11-19 Applied Materials, Inc. Multiple sided robot blade for semiconductor processing equipment
US7651306B2 (en) 2004-12-22 2010-01-26 Applied Materials, Inc. Cartesian robot cluster tool architecture
US7819079B2 (en) 2004-12-22 2010-10-26 Applied Materials, Inc. Cartesian cluster tool configuration for lithography type processes
US7699021B2 (en) 2004-12-22 2010-04-20 Sokudo Co., Ltd. Cluster tool substrate throughput optimization
US7798764B2 (en) 2005-12-22 2010-09-21 Applied Materials, Inc. Substrate processing sequence in a cartesian robot cluster tool
US7396412B2 (en) 2004-12-22 2008-07-08 Sokudo Co., Ltd. Coat/develop module with shared dispense
KR100754190B1 (ko) 2005-11-03 2007-09-03 삼성전자주식회사 레이저 디스플레이 장치
US7694688B2 (en) 2007-01-05 2010-04-13 Applied Materials, Inc. Wet clean system design
US7950407B2 (en) 2007-02-07 2011-05-31 Applied Materials, Inc. Apparatus for rapid filling of a processing volume
US9254566B2 (en) * 2009-03-13 2016-02-09 Kawasaki Jukogyo Kabushiki Kaisha Robot having end effector and method of operating the same
JP5274335B2 (ja) * 2009-03-26 2013-08-28 大日本スクリーン製造株式会社 基板処理装置および基板受渡方法
JP5698518B2 (ja) * 2010-12-21 2015-04-08 川崎重工業株式会社 搬送ロボット用エンドエフェクタ
WO2012141067A1 (ja) * 2011-04-15 2012-10-18 タツモ株式会社 ウエハ交換装置およびウエハ支持用ハンド
EP3309279B1 (de) 2016-10-14 2020-07-15 ATOTECH Deutschland GmbH Verfahren, vorrichtung zur verarbeitung von wafer-artigen substraten und verwendung davon
FR3084518B1 (fr) * 2018-07-25 2020-10-30 Commissariat Energie Atomique Dispositif de prehension d'une structure monocouche ou multicouche comportant un element de prehension rotatif et thermique
JP7359583B2 (ja) * 2019-07-22 2023-10-11 株式会社ディスコ 加工装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4556362A (en) * 1983-12-21 1985-12-03 At&T Technologies, Inc. Methods of and apparatus for handling semiconductor devices
US4808059A (en) * 1986-07-15 1989-02-28 Peak Systems, Inc. Apparatus and method for transferring workpieces
US4775281A (en) * 1986-12-02 1988-10-04 Teradyne, Inc. Apparatus and method for loading and unloading wafers
JP2552886B2 (ja) * 1987-10-29 1996-11-13 日本真空技術 株式会社 真空中に於ける磁気浮上式交差搬送装置
JPH02178946A (ja) * 1988-12-29 1990-07-11 Tokyo Electron Ltd 半導体製造装置
JP2528962B2 (ja) * 1989-02-27 1996-08-28 株式会社日立製作所 試料処理方法及び装置
JP2862956B2 (ja) * 1990-05-28 1999-03-03 大日本スクリーン製造株式会社 基板搬送装置

Also Published As

Publication number Publication date
KR930011156A (ko) 1993-06-23
DE69210767T2 (de) 1997-01-23
KR970000698B1 (ko) 1997-01-18
EP0544311B1 (de) 1996-05-15
JPH05152266A (ja) 1993-06-18
JP2622046B2 (ja) 1997-06-18
US5359785A (en) 1994-11-01
EP0544311A1 (de) 1993-06-02

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8331 Complete revocation