DE69130300T2 - Photovernetzbare und durch Licht unlöslich werdende Beschichtungszusammensetzung mit Halomethyl-1,3,5-triazin-Funktionen - Google Patents
Photovernetzbare und durch Licht unlöslich werdende Beschichtungszusammensetzung mit Halomethyl-1,3,5-triazin-FunktionenInfo
- Publication number
- DE69130300T2 DE69130300T2 DE69130300T DE69130300T DE69130300T2 DE 69130300 T2 DE69130300 T2 DE 69130300T2 DE 69130300 T DE69130300 T DE 69130300T DE 69130300 T DE69130300 T DE 69130300T DE 69130300 T2 DE69130300 T2 DE 69130300T2
- Authority
- DE
- Germany
- Prior art keywords
- photocrosslinkable
- halomethyl
- light
- coating composition
- insoluble coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S522/904—Monomer or polymer contains initiating group
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US47634090A | 1990-02-07 | 1990-02-07 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69130300D1 DE69130300D1 (de) | 1998-11-12 |
DE69130300T2 true DE69130300T2 (de) | 1999-05-06 |
Family
ID=23891452
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69130300T Expired - Fee Related DE69130300T2 (de) | 1990-02-07 | 1991-01-30 | Photovernetzbare und durch Licht unlöslich werdende Beschichtungszusammensetzung mit Halomethyl-1,3,5-triazin-Funktionen |
Country Status (7)
Country | Link |
---|---|
US (1) | US5723513A (de) |
EP (1) | EP0441524B1 (de) |
JP (1) | JPH04213304A (de) |
KR (1) | KR910015884A (de) |
AU (1) | AU635603B2 (de) |
CA (1) | CA2034274A1 (de) |
DE (1) | DE69130300T2 (de) |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2034274A1 (en) * | 1990-02-07 | 1991-08-08 | James A. Bonham | Polymers containing halomethyl-1,3,5-triazine moieties |
US5298361A (en) * | 1991-08-30 | 1994-03-29 | Minnesota Mining And Manufacturing Company | Light-sensitive article containing migration-resistant halomethyl-1,3,5-triazine photoinitiator |
DE69402232T2 (de) * | 1993-02-26 | 1997-09-18 | Ibm | Universaler negativ arbeitender Photoresist |
US6410044B1 (en) | 1998-03-19 | 2002-06-25 | Surmodics, Inc. | Crosslinkable macromers |
US6007833A (en) * | 1998-03-19 | 1999-12-28 | Surmodics, Inc. | Crosslinkable macromers bearing initiator groups |
US7547445B2 (en) * | 1998-03-19 | 2009-06-16 | Surmodics, Inc. | Crosslinkable macromers |
JP3962781B2 (ja) * | 2000-06-12 | 2007-08-22 | エルジー・ケミカル・カンパニー・リミテッド | 機能性アルキルチオ基を含むトリアジン系化合物及び光重合開始剤(triazine−basedcompoundcomprisingfunctionalizedalkylthiogroups、andphotpolymerizationinitiator) |
US6448301B1 (en) | 2000-09-08 | 2002-09-10 | 3M Innovative Properties Company | Crosslinkable polymeric compositions and use thereof |
GB0102388D0 (en) * | 2001-01-31 | 2001-03-14 | Secr Defence | Polymers |
KR100379760B1 (ko) * | 2001-02-24 | 2003-04-10 | 한국화학연구원 | 고굴절 트리아진형 단량체 |
KR100451442B1 (ko) * | 2001-11-12 | 2004-10-06 | 엘지전선 주식회사 | 트리아진 고리를 주쇄로 하는 폴리유레아계 감광성 고분자액정 배향제와 이를 이용한 액정 배향막 |
US7087194B2 (en) * | 2002-04-04 | 2006-08-08 | 3M Innovative Properties Company | K-type polarizer and preparation thereof |
US6949207B2 (en) * | 2002-04-04 | 2005-09-27 | 3M Innovative Properties Company | K-type polarizer and preparation thereof |
US7323290B2 (en) * | 2002-09-30 | 2008-01-29 | Eternal Technology Corporation | Dry film photoresist |
DE102004018546A1 (de) * | 2004-04-14 | 2005-11-03 | Basf Ag | Strahlungshärtbare 1,3,5-Triazincarbamate und -harnstoffe |
DE102004018544A1 (de) * | 2004-04-14 | 2005-11-03 | Basf Ag | Verfahren zur Herstellung von 1,3,5-Triazincarbamaten und -harnstoffen |
US20070077498A1 (en) * | 2005-09-30 | 2007-04-05 | Fuji Photo Film Co., Ltd. | Optical recording composition, optical recording medium and production method thereof, optical recording method and optical recording apparatus |
WO2009018217A2 (en) | 2007-07-30 | 2009-02-05 | Brewer Science Inc. | Non-covalently crosslinkable materials for photolithography processes |
CA3000077A1 (en) | 2010-04-28 | 2011-11-10 | University Of Georgia Research Foundation, Inc. | Photochemical cross-linkable polymers, methods of making photochemical cross-linkable polymers, methods of using photochemical cross-linkable polymers, and methods of making articles containing photochemical cross-linkable polymers |
WO2011160637A2 (en) * | 2010-06-22 | 2011-12-29 | Coloplast A/S | Polyurethane based photoinitiators |
WO2011160636A2 (en) | 2010-06-22 | 2011-12-29 | Coloplast A/S | Grafted photoinitiators |
WO2011160641A2 (en) * | 2010-06-22 | 2011-12-29 | Coloplast A/S | Hydrophilic gels from polyurethane-based photoinitiators |
EP2658921B1 (de) | 2010-12-29 | 2016-04-06 | 3M Innovative Properties Company | Haftkleber mit triazinepoxidvernetzungssystem |
WO2013056007A2 (en) | 2011-10-14 | 2013-04-18 | University Of Georgia Research Foundation, Inc. | Photochemical cross-linkable polymers, methods of making photochemical cross-linkable plolymers, methods of using photochemical cross-linkable poloymers, and methods of making articles containing photochemical cross-linkable polymers |
CN102585186B (zh) * | 2012-02-06 | 2014-01-29 | 中南大学 | 一种含芳基-1,3,5-三嗪结构聚芳酯及其制备方法 |
CN105073909B (zh) | 2012-12-20 | 2019-05-21 | 3M创新有限公司 | 包含具有紫外线吸收基团的低聚物的含氟聚合物组合物 |
US11110689B2 (en) | 2014-06-25 | 2021-09-07 | 3M Innovative Properties Company | Pressure sensitive adhesive composition including ultraviolet light-absorbing oligomer |
JP6294513B2 (ja) | 2014-06-25 | 2018-03-14 | スリーエム イノベイティブ プロパティズ カンパニー | 少なくとも1つのオリゴマーを含むフルオロポリマー組成物 |
KR20180021094A (ko) * | 2015-06-25 | 2018-02-28 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | 자외광-흡수 기를 포함하는 공중합체 및 그것을 포함하는 조성물 |
JP7256954B2 (ja) * | 2019-01-31 | 2023-04-13 | セイコーエプソン株式会社 | 分散液、インクジェット記録用インク組成物、及びインクジェット記録方法 |
CN114729103A (zh) * | 2019-11-28 | 2022-07-08 | 赢创运营有限公司 | 聚醚改性的聚丁二烯及其制备方法 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3154523A (en) * | 1960-10-11 | 1964-10-27 | Dal Mon Research Co | Polymerizable triazines and products thereof |
NL126765C (de) * | 1966-03-21 | |||
US3847916A (en) * | 1968-06-03 | 1974-11-12 | Dow Corning | Fluorocarbon triazine compounds |
US3652464A (en) * | 1968-10-28 | 1972-03-28 | Dow Corning | Perfluoroalkylene ether and thioether triazine polymers |
US3644300A (en) * | 1969-04-14 | 1972-02-22 | Hooker Chemical Corp | Crosslinking of perfluoroalkylene triazine polymer |
US3954475A (en) * | 1971-09-03 | 1976-05-04 | Minnesota Mining And Manufacturing Company | Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines |
JPS5928328B2 (ja) * | 1977-11-29 | 1984-07-12 | 富士写真フイルム株式会社 | 光重合性組成物 |
JPS5815503A (ja) * | 1981-07-20 | 1983-01-28 | Fuji Photo Film Co Ltd | 光重合性組成物 |
US4356287A (en) * | 1981-07-20 | 1982-10-26 | American Cyanamid Company | Novel polymeric light stabilizers for polymers |
JPS6238450A (ja) * | 1985-08-13 | 1987-02-19 | Fuji Photo Film Co Ltd | 光可溶化組成物 |
JPH067263B2 (ja) * | 1985-08-19 | 1994-01-26 | 富士写真フイルム株式会社 | 光可溶化組成物 |
JPH0642074B2 (ja) * | 1986-09-10 | 1994-06-01 | 富士写真フイルム株式会社 | 感光性組成物 |
GB8719730D0 (en) * | 1987-08-20 | 1987-09-30 | Vickers Plc | Radiation sensitive compounds |
US5262276A (en) * | 1988-05-11 | 1993-11-16 | Fuji Photo Film Co., Ltd. | Light-sensitive compositions |
JPH0820734B2 (ja) * | 1988-08-11 | 1996-03-04 | 富士写真フイルム株式会社 | 感光性組成物及びそれを用いた光重合性組成物 |
US4985562A (en) * | 1988-09-07 | 1991-01-15 | Minnesota Mining And Manufacturing Company | Halomethyl-1,3,5-triazines containing an amine-containing moiety |
DE68911632T2 (de) * | 1988-09-07 | 1994-07-07 | Minnesota Mining & Mfg | Sensibilisatorteil enthaltende Halogenmethyl-1,3,5-Triazine. |
EP0359430B1 (de) * | 1988-09-07 | 1995-05-10 | Minnesota Mining And Manufacturing Company | Eine Monomergruppe enthaltende Halogenmethyl-1,3,5-Triazine |
CA2034274A1 (en) * | 1990-02-07 | 1991-08-08 | James A. Bonham | Polymers containing halomethyl-1,3,5-triazine moieties |
US5561029A (en) * | 1995-04-28 | 1996-10-01 | Polaroid Corporation | Low-volatility, substituted 2-phenyl-4,6-bis (halomethyl)-1,3,5-triazine for lithographic printing plates |
-
1991
- 1991-01-16 CA CA002034274A patent/CA2034274A1/en not_active Abandoned
- 1991-01-18 AU AU69836/91A patent/AU635603B2/en not_active Ceased
- 1991-01-30 EP EP91300706A patent/EP0441524B1/de not_active Expired - Lifetime
- 1991-01-30 DE DE69130300T patent/DE69130300T2/de not_active Expired - Fee Related
- 1991-02-06 KR KR1019910002053A patent/KR910015884A/ko not_active Application Discontinuation
- 1991-02-06 JP JP3015374A patent/JPH04213304A/ja active Pending
-
1996
- 1996-03-08 US US08/612,739 patent/US5723513A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
AU635603B2 (en) | 1993-03-25 |
AU6983691A (en) | 1991-08-08 |
DE69130300D1 (de) | 1998-11-12 |
US5723513A (en) | 1998-03-03 |
EP0441524A3 (de) | 1994-01-19 |
CA2034274A1 (en) | 1991-08-08 |
EP0441524A2 (de) | 1991-08-14 |
JPH04213304A (ja) | 1992-08-04 |
KR910015884A (ko) | 1991-09-30 |
EP0441524B1 (de) | 1998-10-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |