DE69130300D1 - Photovernetzbare und durch Licht unlöslich werdende Beschichtungszusammensetzung mit Halomethyl-1,3,5-triazin-Funktionen - Google Patents

Photovernetzbare und durch Licht unlöslich werdende Beschichtungszusammensetzung mit Halomethyl-1,3,5-triazin-Funktionen

Info

Publication number
DE69130300D1
DE69130300D1 DE69130300T DE69130300T DE69130300D1 DE 69130300 D1 DE69130300 D1 DE 69130300D1 DE 69130300 T DE69130300 T DE 69130300T DE 69130300 T DE69130300 T DE 69130300T DE 69130300 D1 DE69130300 D1 DE 69130300D1
Authority
DE
Germany
Prior art keywords
photocrosslinkable
halomethyl
light
coating composition
insoluble coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69130300T
Other languages
English (en)
Other versions
DE69130300T2 (de
Inventor
James A Bonham
Mitchell A Rossman
Richard J Grant
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of DE69130300D1 publication Critical patent/DE69130300D1/de
Application granted granted Critical
Publication of DE69130300T2 publication Critical patent/DE69130300T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)
DE69130300T 1990-02-07 1991-01-30 Photovernetzbare und durch Licht unlöslich werdende Beschichtungszusammensetzung mit Halomethyl-1,3,5-triazin-Funktionen Expired - Fee Related DE69130300T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US47634090A 1990-02-07 1990-02-07

Publications (2)

Publication Number Publication Date
DE69130300D1 true DE69130300D1 (de) 1998-11-12
DE69130300T2 DE69130300T2 (de) 1999-05-06

Family

ID=23891452

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69130300T Expired - Fee Related DE69130300T2 (de) 1990-02-07 1991-01-30 Photovernetzbare und durch Licht unlöslich werdende Beschichtungszusammensetzung mit Halomethyl-1,3,5-triazin-Funktionen

Country Status (7)

Country Link
US (1) US5723513A (de)
EP (1) EP0441524B1 (de)
JP (1) JPH04213304A (de)
KR (1) KR910015884A (de)
AU (1) AU635603B2 (de)
CA (1) CA2034274A1 (de)
DE (1) DE69130300T2 (de)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2034274A1 (en) * 1990-02-07 1991-08-08 James A. Bonham Polymers containing halomethyl-1,3,5-triazine moieties
US5298361A (en) * 1991-08-30 1994-03-29 Minnesota Mining And Manufacturing Company Light-sensitive article containing migration-resistant halomethyl-1,3,5-triazine photoinitiator
DE69402232T2 (de) * 1993-02-26 1997-09-18 Ibm Universaler negativ arbeitender Photoresist
US7547445B2 (en) * 1998-03-19 2009-06-16 Surmodics, Inc. Crosslinkable macromers
US6007833A (en) * 1998-03-19 1999-12-28 Surmodics, Inc. Crosslinkable macromers bearing initiator groups
US6410044B1 (en) 1998-03-19 2002-06-25 Surmodics, Inc. Crosslinkable macromers
EP1289967B1 (de) * 2000-06-12 2009-10-28 LG Chemical Co. Ltd Zusammensetzung auf triazinbasis mit funktionalisierten alkylthiogruppen und fotopolymerisierungsinitiator
US6448301B1 (en) 2000-09-08 2002-09-10 3M Innovative Properties Company Crosslinkable polymeric compositions and use thereof
GB0102388D0 (en) * 2001-01-31 2001-03-14 Secr Defence Polymers
KR100379760B1 (ko) * 2001-02-24 2003-04-10 한국화학연구원 고굴절 트리아진형 단량체
KR100451442B1 (ko) * 2001-11-12 2004-10-06 엘지전선 주식회사 트리아진 고리를 주쇄로 하는 폴리유레아계 감광성 고분자액정 배향제와 이를 이용한 액정 배향막
US6949207B2 (en) * 2002-04-04 2005-09-27 3M Innovative Properties Company K-type polarizer and preparation thereof
US7087194B2 (en) * 2002-04-04 2006-08-08 3M Innovative Properties Company K-type polarizer and preparation thereof
US7323290B2 (en) * 2002-09-30 2008-01-29 Eternal Technology Corporation Dry film photoresist
DE102004018544A1 (de) * 2004-04-14 2005-11-03 Basf Ag Verfahren zur Herstellung von 1,3,5-Triazincarbamaten und -harnstoffen
DE102004018546A1 (de) * 2004-04-14 2005-11-03 Basf Ag Strahlungshärtbare 1,3,5-Triazincarbamate und -harnstoffe
US20070077498A1 (en) * 2005-09-30 2007-04-05 Fuji Photo Film Co., Ltd. Optical recording composition, optical recording medium and production method thereof, optical recording method and optical recording apparatus
CN101802711B (zh) * 2007-07-30 2014-12-03 布鲁尔科技公司 用于光刻法的可非共价交联的材料
AU2011248537B2 (en) 2010-04-28 2014-04-17 University Of Georgia Research Foundation, Inc. Photochemical cross-linkable polymers, methods of marking photochemical cross-linkable polymers, methods of using photochemical cross-linkable polymers, and methods of making articles containing photochemical cross-linkable polymers
EP2585497B1 (de) * 2010-06-22 2023-08-09 Coloplast A/S Hydrophile gele aus polyurethanbasierten photoinitiatoren
WO2011160636A2 (en) 2010-06-22 2011-12-29 Coloplast A/S Grafted photoinitiators
RU2013102587A (ru) * 2010-06-22 2014-07-27 Колопласт А/С Фотоинициаторы на основе полиуретана
JP5897037B2 (ja) 2010-12-29 2016-03-30 スリーエム イノベイティブ プロパティズ カンパニー トリアジン−エポキシ架橋系を有する感圧性接着剤
US9839213B2 (en) 2011-10-14 2017-12-12 The University Of Georgia Research Foundation, Inc. Photochemical cross-linkable polymers, methods of making photochemical cross-linkable polymers, methods of using photochemical cross-linkable polymers, and methods of making articles containing photochemical cross-linkable polymers
CN102585186B (zh) * 2012-02-06 2014-01-29 中南大学 一种含芳基-1,3,5-三嗪结构聚芳酯及其制备方法
JP6632378B2 (ja) 2012-12-20 2020-01-22 スリーエム イノベイティブ プロパティズ カンパニー 紫外線吸収基を有するオリゴマーを含むフルオロポリマー組成物
US11110689B2 (en) 2014-06-25 2021-09-07 3M Innovative Properties Company Pressure sensitive adhesive composition including ultraviolet light-absorbing oligomer
WO2015200655A1 (en) 2014-06-25 2015-12-30 3M Innovative Properties Company Fluoropolymer composition including at least one oligomer
WO2016210140A1 (en) * 2015-06-25 2016-12-29 3M Innovative Properties Company Copolymer including ultraviolet light-absorbing group and compositions including the same
JP7256954B2 (ja) * 2019-01-31 2023-04-13 セイコーエプソン株式会社 分散液、インクジェット記録用インク組成物、及びインクジェット記録方法
JP7401678B2 (ja) * 2019-11-28 2023-12-19 エボニック オペレーションズ ゲーエムベーハー ポリエーテル修飾ポリブタジエンおよびその製造方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3154523A (en) * 1960-10-11 1964-10-27 Dal Mon Research Co Polymerizable triazines and products thereof
NL126765C (de) * 1966-03-21
US3847916A (en) * 1968-06-03 1974-11-12 Dow Corning Fluorocarbon triazine compounds
US3652464A (en) * 1968-10-28 1972-03-28 Dow Corning Perfluoroalkylene ether and thioether triazine polymers
US3644300A (en) * 1969-04-14 1972-02-22 Hooker Chemical Corp Crosslinking of perfluoroalkylene triazine polymer
US3954475A (en) * 1971-09-03 1976-05-04 Minnesota Mining And Manufacturing Company Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines
JPS5928328B2 (ja) * 1977-11-29 1984-07-12 富士写真フイルム株式会社 光重合性組成物
JPS5815503A (ja) * 1981-07-20 1983-01-28 Fuji Photo Film Co Ltd 光重合性組成物
US4356287A (en) * 1981-07-20 1982-10-26 American Cyanamid Company Novel polymeric light stabilizers for polymers
JPS6238450A (ja) * 1985-08-13 1987-02-19 Fuji Photo Film Co Ltd 光可溶化組成物
JPH067263B2 (ja) * 1985-08-19 1994-01-26 富士写真フイルム株式会社 光可溶化組成物
JPH0642074B2 (ja) * 1986-09-10 1994-06-01 富士写真フイルム株式会社 感光性組成物
GB8719730D0 (en) * 1987-08-20 1987-09-30 Vickers Plc Radiation sensitive compounds
US5262276A (en) * 1988-05-11 1993-11-16 Fuji Photo Film Co., Ltd. Light-sensitive compositions
JPH0820734B2 (ja) * 1988-08-11 1996-03-04 富士写真フイルム株式会社 感光性組成物及びそれを用いた光重合性組成物
EP0359431B1 (de) * 1988-09-07 1993-12-22 Minnesota Mining And Manufacturing Company Sensibilisatorteil enthaltende Halogenmethyl-1,3,5-Triazine
EP0359430B1 (de) * 1988-09-07 1995-05-10 Minnesota Mining And Manufacturing Company Eine Monomergruppe enthaltende Halogenmethyl-1,3,5-Triazine
US4985562A (en) * 1988-09-07 1991-01-15 Minnesota Mining And Manufacturing Company Halomethyl-1,3,5-triazines containing an amine-containing moiety
CA2034274A1 (en) * 1990-02-07 1991-08-08 James A. Bonham Polymers containing halomethyl-1,3,5-triazine moieties
US5561029A (en) * 1995-04-28 1996-10-01 Polaroid Corporation Low-volatility, substituted 2-phenyl-4,6-bis (halomethyl)-1,3,5-triazine for lithographic printing plates

Also Published As

Publication number Publication date
JPH04213304A (ja) 1992-08-04
DE69130300T2 (de) 1999-05-06
US5723513A (en) 1998-03-03
AU6983691A (en) 1991-08-08
KR910015884A (ko) 1991-09-30
EP0441524A2 (de) 1991-08-14
CA2034274A1 (en) 1991-08-08
AU635603B2 (en) 1993-03-25
EP0441524B1 (de) 1998-10-07
EP0441524A3 (de) 1994-01-19

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee