DE69129930T2 - Verfahren zur Herstellung der Elektrodenmetallisierung von einem Transistor - Google Patents

Verfahren zur Herstellung der Elektrodenmetallisierung von einem Transistor

Info

Publication number
DE69129930T2
DE69129930T2 DE69129930T DE69129930T DE69129930T2 DE 69129930 T2 DE69129930 T2 DE 69129930T2 DE 69129930 T DE69129930 T DE 69129930T DE 69129930 T DE69129930 T DE 69129930T DE 69129930 T2 DE69129930 T2 DE 69129930T2
Authority
DE
Germany
Prior art keywords
transistor
producing
electrode metallization
metallization
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69129930T
Other languages
English (en)
Other versions
DE69129930D1 (de
Inventor
Sylvain Delage
Philippe Collot
Marie-Antoinette Poisson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Publication of DE69129930D1 publication Critical patent/DE69129930D1/de
Application granted granted Critical
Publication of DE69129930T2 publication Critical patent/DE69129930T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76897—Formation of self-aligned vias or contact plugs, i.e. involving a lithographically uncritical step
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604—Chemical etching
    • H01L21/30612—Etching of AIIIBV compounds
    • H01L21/30621—Vapour phase etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66234—Bipolar junction transistors [BJT]
    • H01L29/6631—Bipolar junction transistors [BJT] with an active layer made of a group 13/15 material
    • H01L29/66318—Heterojunction transistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Bipolar Transistors (AREA)
  • Electrodes Of Semiconductors (AREA)
DE69129930T 1990-10-09 1991-10-04 Verfahren zur Herstellung der Elektrodenmetallisierung von einem Transistor Expired - Lifetime DE69129930T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9012442A FR2667724B1 (fr) 1990-10-09 1990-10-09 Procede de realisation des metallisations d'electrodes d'un transistor.

Publications (2)

Publication Number Publication Date
DE69129930D1 DE69129930D1 (de) 1998-09-10
DE69129930T2 true DE69129930T2 (de) 1998-12-17

Family

ID=9401061

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69129930T Expired - Lifetime DE69129930T2 (de) 1990-10-09 1991-10-04 Verfahren zur Herstellung der Elektrodenmetallisierung von einem Transistor

Country Status (5)

Country Link
US (1) US5194403A (de)
EP (1) EP0480803B1 (de)
JP (1) JPH0629305A (de)
DE (1) DE69129930T2 (de)
FR (1) FR2667724B1 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06132303A (ja) * 1991-11-29 1994-05-13 Semiconductor Energy Lab Co Ltd 薄膜トランジスタおよびその作製方法
FR2697945B1 (fr) * 1992-11-06 1995-01-06 Thomson Csf Procédé de gravure d'une hétérostructure de matériaux du groupe III-V.
US5330932A (en) * 1992-12-31 1994-07-19 Texas Instruments Incorporated Method for fabricating GaInP/GaAs structures
US5773334A (en) * 1994-09-26 1998-06-30 Toyota Jidosha Kabushiki Kaisha Method of manufacturing a semiconductor device
FR2727570B1 (fr) * 1994-11-25 1997-01-24 Thomson Csf Amplificateur hyperfrequence monolithique haute integration, a topologie distribuee arborescente
FR2736468B1 (fr) * 1995-07-07 1997-08-14 Thomson Csf Transistor bipolaire a structure optimisee
FR2737342B1 (fr) * 1995-07-25 1997-08-22 Thomson Csf Composant semiconducteur avec dissipateur thermique integre
KR19980064250A (ko) * 1996-12-18 1998-10-07 윌리엄비.켐플러 다중 레벨 금속화를 위한 완전히 인캡슐레이팅된 금속 리드
FR2764118B1 (fr) * 1997-05-30 2000-08-04 Thomson Csf Transistor bipolaire stabilise avec elements isolants electriques
FR2792082B1 (fr) 1999-04-06 2003-05-30 Thomson Csf Dispositif d'holographie numerique
FR2793953B1 (fr) 1999-05-21 2002-08-09 Thomson Csf Capacite thermique pour composant electronique fonctionnant en impulsions longues
FR2803102B1 (fr) 1999-12-23 2002-03-22 Thomson Csf Transistor bipolaire a heterojonction a collecteur en haut et procede de realisation
DE10225525A1 (de) * 2002-06-10 2003-12-18 United Monolithic Semiconduct Verfahren zur Herstellung eines Hetero-Bipolar-Transistors und Hetero-Bipolar-Transistor
US7081415B2 (en) * 2004-02-18 2006-07-25 Northrop Grumman Corporation Method of dry plasma etching semiconductor materials
US7692223B2 (en) 2006-04-28 2010-04-06 Semiconductor Energy Laboratory Co., Ltd Semiconductor device and method for manufacturing the same
US8610285B2 (en) 2011-05-30 2013-12-17 Taiwan Semiconductor Manufacturing Company, Ltd. 3D IC packaging structures and methods with a metal pillar
US8664760B2 (en) * 2011-05-30 2014-03-04 Taiwan Semiconductor Manufacturing Company, Ltd. Connector design for packaging integrated circuits

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3801391A (en) * 1972-09-25 1974-04-02 Bell Telephone Labor Inc Method for selectively etching alxga1-xas multiplier structures
NL7505134A (nl) * 1975-05-01 1976-11-03 Philips Nv Werkwijze voor het vervaardigen van een half- geleiderinrichting.
JPS631066A (ja) * 1986-06-19 1988-01-06 Fujitsu Ltd 半導体装置の製造方法
US4829347A (en) * 1987-02-06 1989-05-09 American Telephone And Telegraph Company, At&T Bell Laboratories Process for making indium gallium arsenide devices
JPS63276267A (ja) * 1987-05-08 1988-11-14 Fujitsu Ltd 半導体装置の製造方法
JP2526626B2 (ja) * 1988-03-14 1996-08-21 日本電気株式会社 ヘテロ接合バイポ―ラ・トランジスタおよびその製造方法
JPH01241867A (ja) * 1988-03-23 1989-09-26 Mitsubishi Electric Corp ヘテロ接合バイポーラトランジスタおよびその製造方法
US4954457A (en) * 1988-10-31 1990-09-04 International Business Machines Corporation Method of making heterojunction bipolar transistors
US4935797A (en) * 1988-10-31 1990-06-19 International Business Machines Corporation Heterojunction bipolar transistors
US5097312A (en) * 1989-02-16 1992-03-17 Texas Instruments Incorporated Heterojunction bipolar transistor and integration of same with field effect device

Also Published As

Publication number Publication date
US5194403A (en) 1993-03-16
EP0480803A1 (de) 1992-04-15
DE69129930D1 (de) 1998-09-10
JPH0629305A (ja) 1994-02-04
FR2667724B1 (fr) 1992-11-27
EP0480803B1 (de) 1998-08-05
FR2667724A1 (fr) 1992-04-10

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