DE69123528T2 - Gerät und Verfahren unter Verwendung eines durch Mikrowellen erzeugten Plasmas - Google Patents

Gerät und Verfahren unter Verwendung eines durch Mikrowellen erzeugten Plasmas

Info

Publication number
DE69123528T2
DE69123528T2 DE69123528T DE69123528T DE69123528T2 DE 69123528 T2 DE69123528 T2 DE 69123528T2 DE 69123528 T DE69123528 T DE 69123528T DE 69123528 T DE69123528 T DE 69123528T DE 69123528 T2 DE69123528 T2 DE 69123528T2
Authority
DE
Germany
Prior art keywords
generated plasma
microwave generated
microwave
plasma
generated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69123528T
Other languages
English (en)
Other versions
DE69123528D1 (de
Inventor
Yasunori Ohno
Takashi Iga
Noriyuki Sakudo
Kenichi Natsui
Isao Hashimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of DE69123528D1 publication Critical patent/DE69123528D1/de
Application granted granted Critical
Publication of DE69123528T2 publication Critical patent/DE69123528T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Plasma Technology (AREA)
DE69123528T 1990-09-20 1991-09-09 Gerät und Verfahren unter Verwendung eines durch Mikrowellen erzeugten Plasmas Expired - Fee Related DE69123528T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2248801A JPH04129133A (ja) 1990-09-20 1990-09-20 イオン源及びプラズマ装置

Publications (2)

Publication Number Publication Date
DE69123528D1 DE69123528D1 (de) 1997-01-23
DE69123528T2 true DE69123528T2 (de) 1997-06-12

Family

ID=17183607

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69123528T Expired - Fee Related DE69123528T2 (de) 1990-09-20 1991-09-09 Gerät und Verfahren unter Verwendung eines durch Mikrowellen erzeugten Plasmas

Country Status (4)

Country Link
US (1) US5266146A (de)
EP (1) EP0476900B1 (de)
JP (1) JPH04129133A (de)
DE (1) DE69123528T2 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6046425A (en) * 1991-05-31 2000-04-04 Hitachi, Ltd. Plasma processing apparatus having insulator disposed on inner surface of plasma generating chamber
US5700326A (en) * 1992-02-27 1997-12-23 Canon Kabushiki Kaisha Microwave plasma processing apparatus
US5444207A (en) * 1992-03-26 1995-08-22 Kabushiki Kaisha Toshiba Plasma generating device and surface processing device and method for processing wafers in a uniform magnetic field
US5660744A (en) * 1992-03-26 1997-08-26 Kabushiki Kaisha Toshiba Plasma generating apparatus and surface processing apparatus
DE4217900A1 (de) * 1992-05-29 1993-12-02 Leybold Ag Anordnung einer mikrowellendurchlässigen Scheibe in einem Hohlleiter und Verfahren zur Einbringung dieser Scheibe
KR970000538B1 (ko) * 1993-04-27 1997-01-13 엘지전자 주식회사 게이트 리세스 구조를 갖는 전계효과트랜지스터의 제조방법
JPH08102279A (ja) * 1994-09-30 1996-04-16 Hitachi Ltd マイクロ波プラズマ生成装置
DE19680845D2 (de) * 1996-11-01 1999-03-18 Theva Duennschicht Gmbh Vorrichtung zur Herstellung oxidischer Dünnschichten
US5824607A (en) * 1997-02-06 1998-10-20 Applied Materials, Inc. Plasma confinement for an inductively coupled plasma reactor
US6109206A (en) * 1997-05-29 2000-08-29 Applied Materials, Inc. Remote plasma source for chamber cleaning
JP3599564B2 (ja) 1998-06-25 2004-12-08 東京エレクトロン株式会社 イオン流形成方法及び装置
JPH11102799A (ja) * 1997-09-26 1999-04-13 Mitsubishi Electric Corp プラズマ発生装置
FR2774251B1 (fr) * 1998-01-26 2000-02-25 Commissariat Energie Atomique Source a plasma micro-onde lineaire en aimants permanents
US6163006A (en) * 1998-02-06 2000-12-19 Astex-Plasmaquest, Inc. Permanent magnet ECR plasma source with magnetic field optimization
US6225592B1 (en) * 1998-09-15 2001-05-01 Astex-Plasmaquest, Inc. Method and apparatus for launching microwave energy into a plasma processing chamber
US6646223B2 (en) * 1999-12-28 2003-11-11 Texas Instruments Incorporated Method for improving ash rate uniformity in photoresist ashing process equipment
US6232723B1 (en) * 2000-02-09 2001-05-15 Igor Alexeff Direct current energy discharge system
US20050026436A1 (en) * 2000-12-21 2005-02-03 Hogan Timothy J. Method for improving ash rate uniformity in photoresist ashing process equipment
JP2003342757A (ja) * 2002-05-28 2003-12-03 Canon Inc ミリング方法およびミリング装置
US6846396B2 (en) * 2002-08-08 2005-01-25 Applied Materials, Inc. Active magnetic shielding
US7500445B2 (en) * 2003-01-27 2009-03-10 Applied Materials, Inc. Method and apparatus for cleaning a CVD chamber
US9922795B2 (en) * 2015-07-27 2018-03-20 Varian Semiconductor Equipment Associates, Inc. High brightness ion beam extraction using bias electrodes and magnets proximate the extraction aperture

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6292322A (ja) * 1985-10-18 1987-04-27 Hitachi Ltd ドライエツチング装置
JPS6377120A (ja) * 1986-09-19 1988-04-07 Mitsubishi Electric Corp プラズマ処理装置
JPH07120648B2 (ja) * 1987-01-12 1995-12-20 日本真空技術株式会社 マイクロ波プラズマ処理装置
KR960015609B1 (ko) * 1987-01-19 1996-11-18 미쓰다 가쓰시게 플라즈마 처리장치 및 방법
KR880013424A (ko) * 1987-04-08 1988-11-30 미타 가츠시게 플라즈머 장치
JPH0672306B2 (ja) * 1987-04-27 1994-09-14 株式会社半導体エネルギー研究所 プラズマ処理装置およびプラズマ処理方法
JPH0687440B2 (ja) * 1987-05-11 1994-11-02 松下電器産業株式会社 マイクロ波プラズマ発生方法
US4778561A (en) * 1987-10-30 1988-10-18 Veeco Instruments, Inc. Electron cyclotron resonance plasma source
JPH01243343A (ja) * 1988-03-25 1989-09-28 Hitachi Ltd マイクロ波イオン源
JPH0217636A (ja) * 1988-07-06 1990-01-22 Hitachi Ltd ドライエッチング装置
JP2670623B2 (ja) * 1988-09-19 1997-10-29 アネルバ株式会社 マイクロ波プラズマ処理装置
JPH0752635B2 (ja) * 1988-10-18 1995-06-05 日新電機株式会社 イオン源装置
JPH02123640A (ja) * 1988-11-01 1990-05-11 Anelva Corp 放電装置

Also Published As

Publication number Publication date
DE69123528D1 (de) 1997-01-23
EP0476900B1 (de) 1996-12-11
JPH04129133A (ja) 1992-04-30
US5266146A (en) 1993-11-30
EP0476900A1 (de) 1992-03-25

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee