DE69112897T2 - Resist-Zusammensetzung. - Google Patents

Resist-Zusammensetzung.

Info

Publication number
DE69112897T2
DE69112897T2 DE69112897T DE69112897T DE69112897T2 DE 69112897 T2 DE69112897 T2 DE 69112897T2 DE 69112897 T DE69112897 T DE 69112897T DE 69112897 T DE69112897 T DE 69112897T DE 69112897 T2 DE69112897 T2 DE 69112897T2
Authority
DE
Germany
Prior art keywords
resist composition
resist
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69112897T
Other languages
English (en)
Other versions
DE69112897D1 (de
Inventor
Teijiro Kitao
Masaru Matsuoka
Ryotaro Hanawa
Yasunori Uetani
Naoki Takeyama
Takeshi Hioki
Hiroshi Takagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2115984A external-priority patent/JP2921023B2/ja
Priority claimed from JP2115983A external-priority patent/JP2921022B2/ja
Priority claimed from JP2115982A external-priority patent/JP2921021B2/ja
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Application granted granted Critical
Publication of DE69112897D1 publication Critical patent/DE69112897D1/de
Publication of DE69112897T2 publication Critical patent/DE69112897T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/116—Redox or dye sensitizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y10S430/123—Sulfur in heterocyclic ring

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE69112897T 1990-05-02 1991-04-30 Resist-Zusammensetzung. Expired - Fee Related DE69112897T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2115984A JP2921023B2 (ja) 1990-05-02 1990-05-02 レジスト用の組成物
JP2115983A JP2921022B2 (ja) 1990-05-02 1990-05-02 レジスト組成物
JP2115982A JP2921021B2 (ja) 1990-05-02 1990-05-02 レジスト用組成物

Publications (2)

Publication Number Publication Date
DE69112897D1 DE69112897D1 (de) 1995-10-19
DE69112897T2 true DE69112897T2 (de) 1996-02-29

Family

ID=27313054

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69112897T Expired - Fee Related DE69112897T2 (de) 1990-05-02 1991-04-30 Resist-Zusammensetzung.

Country Status (4)

Country Link
US (1) US5198323A (de)
EP (1) EP0455223B1 (de)
CA (1) CA2041434A1 (de)
DE (1) DE69112897T2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05323604A (ja) * 1992-05-27 1993-12-07 Sumitomo Chem Co Ltd ポジ型レジスト組成物
US5593812A (en) * 1995-02-17 1997-01-14 International Business Machines Corporation Photoresist having increased sensitivity and use thereof
US5521142A (en) * 1995-09-14 1996-05-28 Minnesota Mining And Manufacturing Company Thermal transfer dye donor element
US5756257A (en) * 1996-02-14 1998-05-26 Imation Corp. Color proofing article incorporating novel antihalation dye
KR100363695B1 (ko) * 1998-12-31 2003-04-11 주식회사 하이닉스반도체 유기난반사방지중합체및그의제조방법

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3916069A (en) * 1973-04-02 1975-10-28 Minnesota Mining & Mfg Reduced styryl/cyanine dye
JPS6088941A (ja) * 1983-10-21 1985-05-18 Nagase Kasei Kogyo Kk フオトレジスト組成物
US4617373A (en) * 1985-02-15 1986-10-14 Eastman Kodak Company Condensation polymers and products therefrom
JPS63286843A (ja) * 1987-05-19 1988-11-24 Nippon Zeon Co Ltd ポジ型フォトレジスト組成物
US4749772A (en) * 1987-07-20 1988-06-07 Eastman Kodak Company Condensation copolymers containing methine ultraviolet radiation-absorbing residues and shaped articles produced therefrom
EP0303967A3 (de) * 1987-08-20 1990-10-31 Hoechst Celanese Corporation Aufzeichnungsmaterial mit einer Kontrastverstärkungsschicht sowie Verfahren zur Herstellung eines Aufzeichnungsmaterials mit einer darauf aufgebrachten Maske
DE3735852A1 (de) * 1987-10-23 1989-05-03 Hoechst Ag Positiv arbeitendes lichtempfindliches gemisch, enthaltend einen farbstoff, und daraus hergestelltes positiv arbeitendes lichtempfindliches aufzeichnungsmaterial
JP2682126B2 (ja) * 1989-04-10 1997-11-26 住友化学工業株式会社 フォトレジスト組成物

Also Published As

Publication number Publication date
EP0455223A2 (de) 1991-11-06
CA2041434A1 (en) 1991-11-03
US5198323A (en) 1993-03-30
EP0455223A3 (en) 1992-07-01
DE69112897D1 (de) 1995-10-19
EP0455223B1 (de) 1995-09-13

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee