DE69107882T2 - Verfahren und Gerät zur Untersuchung eines Oberflächenmusters eines Objektes. - Google Patents

Verfahren und Gerät zur Untersuchung eines Oberflächenmusters eines Objektes.

Info

Publication number
DE69107882T2
DE69107882T2 DE69107882T DE69107882T DE69107882T2 DE 69107882 T2 DE69107882 T2 DE 69107882T2 DE 69107882 T DE69107882 T DE 69107882T DE 69107882 T DE69107882 T DE 69107882T DE 69107882 T2 DE69107882 T2 DE 69107882T2
Authority
DE
Germany
Prior art keywords
examining
surface pattern
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69107882T
Other languages
English (en)
Other versions
DE69107882D1 (de
Inventor
Yuji Takagi
Seiji Hata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of DE69107882D1 publication Critical patent/DE69107882D1/de
Application granted granted Critical
Publication of DE69107882T2 publication Critical patent/DE69107882T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95684—Patterns showing highly reflecting parts, e.g. metallic elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N2021/1765—Method using an image detector and processing of image signal
    • G01N2021/177—Detector of the video camera type
    • G01N2021/1776—Colour camera
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N2021/178—Methods for obtaining spatial resolution of the property being measured
    • G01N2021/1785—Three dimensional
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95638—Inspecting patterns on the surface of objects for PCB's
    • G01N2021/95653—Through-holes
DE69107882T 1990-04-18 1991-04-17 Verfahren und Gerät zur Untersuchung eines Oberflächenmusters eines Objektes. Expired - Fee Related DE69107882T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP02100294A JP3072998B2 (ja) 1990-04-18 1990-04-18 はんだ付け状態検査方法及びその装置

Publications (2)

Publication Number Publication Date
DE69107882D1 DE69107882D1 (de) 1995-04-13
DE69107882T2 true DE69107882T2 (de) 1995-11-02

Family

ID=14270158

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69107882T Expired - Fee Related DE69107882T2 (de) 1990-04-18 1991-04-17 Verfahren und Gerät zur Untersuchung eines Oberflächenmusters eines Objektes.

Country Status (5)

Country Link
US (1) US5166985A (de)
EP (1) EP0452905B1 (de)
JP (1) JP3072998B2 (de)
KR (1) KR950000331B1 (de)
DE (1) DE69107882T2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007035198A1 (de) * 2007-07-25 2009-01-29 Datarius Technologies Gmbh Vorrichtung zur Inspektion von optischen Datenträgern

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007035198A1 (de) * 2007-07-25 2009-01-29 Datarius Technologies Gmbh Vorrichtung zur Inspektion von optischen Datenträgern

Also Published As

Publication number Publication date
DE69107882D1 (de) 1995-04-13
EP0452905B1 (de) 1995-03-08
JPH041510A (ja) 1992-01-07
US5166985A (en) 1992-11-24
JP3072998B2 (ja) 2000-08-07
EP0452905A1 (de) 1991-10-23
KR950000331B1 (ko) 1995-01-13
KR910018797A (ko) 1991-11-30

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8339 Ceased/non-payment of the annual fee