DE69102451D1 - Herstellung und Verwendung von Farbstoffen. - Google Patents
Herstellung und Verwendung von Farbstoffen.Info
- Publication number
- DE69102451D1 DE69102451D1 DE69102451T DE69102451T DE69102451D1 DE 69102451 D1 DE69102451 D1 DE 69102451D1 DE 69102451 T DE69102451 T DE 69102451T DE 69102451 T DE69102451 T DE 69102451T DE 69102451 D1 DE69102451 D1 DE 69102451D1
- Authority
- DE
- Germany
- Prior art keywords
- dyes
- manufacture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
- C09B23/02—Methine or polymethine dyes, e.g. cyanine dyes the polymethine chain containing an odd number of >CH- or >C[alkyl]- groups
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/115—Cationic or anionic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/116—Redox or dye sensitizer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/127—Spectral sensitizer containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/145—Infrared
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB909004337A GB9004337D0 (en) | 1990-02-27 | 1990-02-27 | Preparation and use of dyes |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69102451D1 true DE69102451D1 (de) | 1994-07-21 |
DE69102451T2 DE69102451T2 (de) | 1994-10-06 |
Family
ID=10671653
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69102451T Expired - Fee Related DE69102451T2 (de) | 1990-02-27 | 1991-02-01 | Herstellung und Verwendung von Farbstoffen. |
Country Status (5)
Country | Link |
---|---|
US (1) | US5208135A (de) |
EP (1) | EP0444786B1 (de) |
JP (1) | JP2931114B2 (de) |
DE (1) | DE69102451T2 (de) |
GB (1) | GB9004337D0 (de) |
Families Citing this family (90)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9121789D0 (en) * | 1991-10-14 | 1991-11-27 | Minnesota Mining & Mfg | Positive-acting photothermographic materials |
PL324248A1 (en) | 1996-04-23 | 1998-05-11 | Horsell Graphic Ind Ltd | Composition sensitive to heat and method of making lithographic formes incorporating such compositions |
US6117610A (en) * | 1997-08-08 | 2000-09-12 | Kodak Polychrome Graphics Llc | Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use |
US6063544A (en) * | 1997-03-21 | 2000-05-16 | Kodak Polychrome Graphics Llc | Positive-working printing plate and method of providing a positive image therefrom using laser imaging |
US6090532A (en) * | 1997-03-21 | 2000-07-18 | Kodak Polychrome Graphics Llc | Positive-working infrared radiation sensitive composition and printing plate and imaging method |
ATE204388T1 (de) | 1997-07-05 | 2001-09-15 | Kodak Polychrome Graphics Llc | Bilderzeugungsverfahren |
US6060217A (en) * | 1997-09-02 | 2000-05-09 | Kodak Polychrome Graphics Llc | Thermal lithographic printing plates |
JP4041611B2 (ja) * | 1998-09-24 | 2008-01-30 | 富士フイルム株式会社 | アニオン性赤外線吸収剤、感光性組成物及びそれを用いた平版印刷版原版 |
ATE323602T1 (de) * | 1999-05-31 | 2006-05-15 | Fuji Photo Film Co Ltd | Bildaufzeichnungsmaterial und flachdruckplatte mit diesem bildaufzeichnungsmaterial |
US6740464B2 (en) * | 2000-01-14 | 2004-05-25 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor |
JP4373624B2 (ja) * | 2000-09-04 | 2009-11-25 | 富士フイルム株式会社 | 感熱性組成物、それを用いた平版印刷版原版及びスルホニウム塩化合物 |
US6548222B2 (en) * | 2000-09-06 | 2003-04-15 | Gary Ganghui Teng | On-press developable thermosensitive lithographic printing plates |
US6576401B2 (en) * | 2001-09-14 | 2003-06-10 | Gary Ganghui Teng | On-press developable thermosensitive lithographic plates utilizing an onium or borate salt initiator |
US7261998B2 (en) * | 2001-04-04 | 2007-08-28 | Eastman Kodak Company | Imageable element with solvent-resistant polymeric binder |
US7659046B2 (en) * | 2002-04-10 | 2010-02-09 | Eastman Kodak Company | Water-developable infrared-sensitive printing plate |
US7172850B2 (en) * | 2002-04-10 | 2007-02-06 | Eastman Kodak Company | Preparation of solvent-resistant binder for an imageable element |
US7368215B2 (en) * | 2003-05-12 | 2008-05-06 | Eastman Kodak Company | On-press developable IR sensitive printing plates containing an onium salt initiator system |
US6939663B2 (en) | 2003-07-08 | 2005-09-06 | Kodak Polychrome Graphics Llc | Sulfated phenolic resins and printing plate precursors comprising sulfated phenolic resins |
US6893783B2 (en) | 2003-10-08 | 2005-05-17 | Kodak Polychrome Graphics Lld | Multilayer imageable elements |
US7008751B2 (en) | 2004-08-04 | 2006-03-07 | Eastman Kodak Company | Thermally switchable imageable elements containing betaine-containing co-polymers |
US20060210917A1 (en) | 2005-03-18 | 2006-09-21 | Kodak Polychrome Graphics Llc | Positive-working, thermally sensitive imageable element |
US7144661B1 (en) | 2005-11-01 | 2006-12-05 | Eastman Kodak Company | Multilayer imageable element with improved chemical resistance |
US7226709B1 (en) | 2006-06-20 | 2007-06-05 | Eastman Kodak Company | Digital mask-forming film and method of use |
US7300726B1 (en) | 2006-10-20 | 2007-11-27 | Eastman Kodak Company | Multi-layer imageable element with improved properties |
US7544462B2 (en) | 2007-02-22 | 2009-06-09 | Eastman Kodak Company | Radiation-sensitive composition and elements with basic development enhancers |
EP2135901A4 (de) * | 2007-03-05 | 2013-02-13 | Fujifilm Corp | Verbindung für photoresist, photoresistlösung und davon gebrauch machendes ätzverfahren |
US7799504B2 (en) | 2007-06-05 | 2010-09-21 | Eastman Kodak Company | Mask film to form relief images and method of use |
JP5255297B2 (ja) * | 2008-02-28 | 2013-08-07 | 富士フイルム株式会社 | フォトレジスト液、およびこれを用いるエッチング方法 |
US20100151385A1 (en) | 2008-12-17 | 2010-06-17 | Ray Kevin B | Stack of negative-working imageable elements |
US8034538B2 (en) | 2009-02-13 | 2011-10-11 | Eastman Kodak Company | Negative-working imageable elements |
US20100215919A1 (en) | 2009-02-20 | 2010-08-26 | Ting Tao | On-press developable imageable elements |
US20100227269A1 (en) | 2009-03-04 | 2010-09-09 | Simpson Christopher D | Imageable elements with colorants |
US8318405B2 (en) | 2009-03-13 | 2012-11-27 | Eastman Kodak Company | Negative-working imageable elements with overcoat |
US8221960B2 (en) | 2009-06-03 | 2012-07-17 | Eastman Kodak Company | On-press development of imaged elements |
US8257907B2 (en) | 2009-06-12 | 2012-09-04 | Eastman Kodak Company | Negative-working imageable elements |
US8247163B2 (en) | 2009-06-12 | 2012-08-21 | Eastman Kodak Company | Preparing lithographic printing plates with enhanced contrast |
US8383319B2 (en) | 2009-08-25 | 2013-02-26 | Eastman Kodak Company | Lithographic printing plate precursors and stacks |
US8298750B2 (en) | 2009-09-08 | 2012-10-30 | Eastman Kodak Company | Positive-working radiation-sensitive imageable elements |
US8426104B2 (en) | 2009-10-08 | 2013-04-23 | Eastman Kodak Company | Negative-working imageable elements |
US20110097666A1 (en) | 2009-10-27 | 2011-04-28 | Celin Savariar-Hauck | Lithographic printing plate precursors |
US8936899B2 (en) | 2012-09-04 | 2015-01-20 | Eastman Kodak Company | Positive-working lithographic printing plate precursors and use |
CA2763435C (en) | 2009-10-29 | 2017-07-11 | Mylan Group | Gallotannic compounds for lithographic printing plate coating compositions |
US8329383B2 (en) | 2009-11-05 | 2012-12-11 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
US20110236832A1 (en) | 2010-03-26 | 2011-09-29 | Celin Savariar-Hauck | Lithographic processing solutions and methods of use |
KR101277721B1 (ko) * | 2010-04-07 | 2013-06-24 | 제일모직주식회사 | 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터 |
US20120090486A1 (en) | 2010-10-18 | 2012-04-19 | Celin Savariar-Hauck | Lithographic printing plate precursors and methods of use |
US8900798B2 (en) | 2010-10-18 | 2014-12-02 | Eastman Kodak Company | On-press developable lithographic printing plate precursors |
US8530143B2 (en) | 2010-11-18 | 2013-09-10 | Eastman Kodak Company | Silicate-free developer compositions |
US20120129093A1 (en) | 2010-11-18 | 2012-05-24 | Moshe Levanon | Silicate-free developer compositions |
US8939080B2 (en) * | 2010-11-18 | 2015-01-27 | Eastman Kodak Company | Methods of processing using silicate-free developer compositions |
US20120141942A1 (en) | 2010-12-03 | 2012-06-07 | Domenico Balbinot | Method of preparing lithographic printing plates |
US20120141941A1 (en) | 2010-12-03 | 2012-06-07 | Mathias Jarek | Developing lithographic printing plate precursors in simple manner |
US20120141935A1 (en) | 2010-12-03 | 2012-06-07 | Bernd Strehmel | Developer and its use to prepare lithographic printing plates |
US20120192741A1 (en) | 2011-01-31 | 2012-08-02 | Moshe Nakash | Method for preparing lithographic printing plates |
US20120199028A1 (en) | 2011-02-08 | 2012-08-09 | Mathias Jarek | Preparing lithographic printing plates |
US8530142B2 (en) | 2011-03-15 | 2013-09-10 | Eastman Kodak Company | Flexographic printing plate precursor, imaging assembly, and use |
US8632940B2 (en) | 2011-04-19 | 2014-01-21 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
US8722308B2 (en) | 2011-08-31 | 2014-05-13 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
US8703381B2 (en) | 2011-08-31 | 2014-04-22 | Eastman Kodak Company | Lithographic printing plate precursors for on-press development |
US8618003B2 (en) | 2011-12-05 | 2013-12-31 | Eastman Kodak Company | Method of making electronic devices using selective deposition |
US20130255515A1 (en) | 2012-03-27 | 2013-10-03 | Celin Savariar-Hauck | Positive-working lithographic printing plate precursors |
US8679726B2 (en) | 2012-05-29 | 2014-03-25 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
US8889341B2 (en) | 2012-08-22 | 2014-11-18 | Eastman Kodak Company | Negative-working lithographic printing plate precursors and use |
US9063423B2 (en) | 2013-02-28 | 2015-06-23 | Eastman Kodak Company | Lithographic printing plate precursors and use |
US8945813B2 (en) | 2013-04-18 | 2015-02-03 | Eastman Kodak Company | Mask forming imageable material and use |
US9201302B2 (en) | 2013-10-03 | 2015-12-01 | Eastman Kodak Company | Negative-working lithographic printing plate precursor |
JP5993054B1 (ja) * | 2015-03-27 | 2016-09-14 | 奥本 健二 | 広い吸収帯を示す薄膜とそれを含むデバイスとそれらの製法 |
US20170021656A1 (en) | 2015-07-24 | 2017-01-26 | Kevin Ray | Lithographic imaging and printing with negative-working photoresponsive printing members |
US20170217149A1 (en) | 2016-01-28 | 2017-08-03 | Eastman Kodak Company | Negatively-working lithographic printing plate precursor and method |
CN106313870B (zh) | 2016-08-19 | 2018-06-15 | 浙江康尔达新材料股份有限公司 | 一种可成像涂层、热敏阴图平版印刷版及其制版方法 |
US20180157176A1 (en) | 2016-12-02 | 2018-06-07 | Eastman Kodak Company | Lithographic printing plate precursor and use |
EP3566099B1 (de) | 2017-01-04 | 2021-02-24 | Eastman Kodak Company | Negativ arbeitender lithographie-druckplattenvorläufer und verwendung |
US10828884B2 (en) | 2017-03-02 | 2020-11-10 | Eastman Kodak Company | Lithographic printing plate precursors and method of use |
US10576730B2 (en) | 2017-07-19 | 2020-03-03 | Eastman Kodak Company | Method for preparing lithographic printing plates |
CN111051072B (zh) | 2017-08-31 | 2021-08-03 | 富士胶片株式会社 | 平版印刷版原版、平版印刷版的制作方法及平版印刷方法 |
JP7319282B2 (ja) | 2018-02-16 | 2023-08-01 | ミラクロン コーポレーション | マスク要素前駆体およびレリーフ像形成システム |
US20200096865A1 (en) | 2018-09-21 | 2020-03-26 | Eastman Kodak Company | Lithographic printing plate precursor and color-forming composition |
US20210078350A1 (en) | 2019-09-17 | 2021-03-18 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
US11117412B2 (en) | 2019-10-01 | 2021-09-14 | Eastman Kodak Company | Lithographic printing plate precursors and method of use |
US11633948B2 (en) | 2020-01-22 | 2023-04-25 | Eastman Kodak Company | Method for making lithographic printing plates |
US11714354B2 (en) | 2020-03-25 | 2023-08-01 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
US11760081B2 (en) | 2020-09-04 | 2023-09-19 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
CN116490365A (zh) | 2020-12-04 | 2023-07-25 | 伊斯曼柯达公司 | 平版印版前体和使用方法 |
JP2023554644A (ja) | 2020-12-17 | 2023-12-28 | イーストマン コダック カンパニー | 平版印刷版原版および使用方法 |
WO2022212032A1 (en) | 2021-04-01 | 2022-10-06 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
EP4101830A1 (de) | 2021-06-10 | 2022-12-14 | FEW Chemicals GmbH | Neuartige diaryliodoniumsalzmischungen als photoinitiatoren mit niedrigem molekulargewicht und minimierter kristallisierung und erhöhter löslichkeit |
US20230091079A1 (en) | 2021-07-23 | 2023-03-23 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
US20230314935A1 (en) | 2022-03-03 | 2023-10-05 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
US20240061337A1 (en) | 2022-08-04 | 2024-02-22 | Eastman Kodak Company | Lithographic printing plate precursors, methods of using and manufacture |
US20240069439A1 (en) | 2022-08-12 | 2024-02-29 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US862005A (en) * | 1906-09-05 | 1907-07-30 | Patrick Mcdermott | Smoke-condenser. |
US4701402A (en) * | 1984-02-13 | 1987-10-20 | Minnesota Mining And Manufacturing Company | Oxidative imaging |
US4632895A (en) * | 1984-08-23 | 1986-12-30 | Minnesota Mining And Manufacturing Company | Diffusion or sublimation transfer imaging system |
US4908040A (en) * | 1986-11-07 | 1990-03-13 | Ciba-Geigy Corporation | Anionic cyclodiylide compounds, their preparation and use in washing agents as shading dyes |
CA1323949C (en) * | 1987-04-02 | 1993-11-02 | Michael C. Palazzotto | Ternary photoinitiator system for addition polymerization |
JP2566145B2 (ja) * | 1987-07-15 | 1996-12-25 | 東北金属工業 株式会社 | スイッチング電源回路 |
JPH02201351A (ja) * | 1989-01-30 | 1990-08-09 | Konica Corp | ハロゲン化銀写真感光材料 |
-
1990
- 1990-02-27 GB GB909004337A patent/GB9004337D0/en active Pending
-
1991
- 1991-02-01 DE DE69102451T patent/DE69102451T2/de not_active Expired - Fee Related
- 1991-02-01 EP EP91300821A patent/EP0444786B1/de not_active Expired - Lifetime
- 1991-02-11 US US07/653,358 patent/US5208135A/en not_active Expired - Lifetime
- 1991-02-26 JP JP3030886A patent/JP2931114B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US5208135A (en) | 1993-05-04 |
JP2931114B2 (ja) | 1999-08-09 |
EP0444786B1 (de) | 1994-06-15 |
DE69102451T2 (de) | 1994-10-06 |
JPH04356564A (ja) | 1992-12-10 |
GB9004337D0 (en) | 1990-04-25 |
EP0444786A1 (de) | 1991-09-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |