DE69033441T2 - Geometrie und Gestaltungen eines Geräts zum Magnetronzerstäuben - Google Patents
Geometrie und Gestaltungen eines Geräts zum MagnetronzerstäubenInfo
- Publication number
- DE69033441T2 DE69033441T2 DE69033441T DE69033441T DE69033441T2 DE 69033441 T2 DE69033441 T2 DE 69033441T2 DE 69033441 T DE69033441 T DE 69033441T DE 69033441 T DE69033441 T DE 69033441T DE 69033441 T2 DE69033441 T2 DE 69033441T2
- Authority
- DE
- Germany
- Prior art keywords
- materials
- reaction zones
- geometry
- designs
- deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Revoked
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0047—Activation or excitation of reactive gases outside the coating chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0073—Reactive sputtering by exposing the substrates to reactive gases intermittently
- C23C14/0078—Reactive sputtering by exposing the substrates to reactive gases intermittently by moving the substrates between spatially separate sputtering and reaction stations
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US43596589A | 1989-11-13 | 1989-11-13 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69033441D1 DE69033441D1 (de) | 2000-03-02 |
DE69033441T2 true DE69033441T2 (de) | 2000-05-18 |
Family
ID=23730544
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69027004T Expired - Fee Related DE69027004T2 (de) | 1989-11-13 | 1990-11-12 | Geometrie und Gestaltungen eines Geräts zum Magnetronzerstäuben |
DE69033441T Revoked DE69033441T2 (de) | 1989-11-13 | 1990-11-12 | Geometrie und Gestaltungen eines Geräts zum Magnetronzerstäuben |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69027004T Expired - Fee Related DE69027004T2 (de) | 1989-11-13 | 1990-11-12 | Geometrie und Gestaltungen eines Geräts zum Magnetronzerstäuben |
Country Status (5)
Country | Link |
---|---|
EP (2) | EP0428358B1 (de) |
JP (1) | JPH03211275A (de) |
AT (2) | ATE138111T1 (de) |
CA (1) | CA2029755C (de) |
DE (2) | DE69027004T2 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102013221029A1 (de) | 2013-10-16 | 2015-04-16 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zur Herstellung uniformer Schichten auf bewegten Substraten und derart hergestellte Schichten |
Families Citing this family (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05287520A (ja) * | 1992-04-10 | 1993-11-02 | Sanyo Shinku Kogyo Kk | 成膜装置 |
FR2694131B1 (fr) * | 1992-07-21 | 1996-09-27 | Balzers Hochvakuum | Procede et installation pour la fabrication d'un composant, notamment d'un composant optique, et composant optique ainsi obtenu. |
DE69331538T2 (de) * | 1992-12-01 | 2002-08-29 | Matsushita Electric Ind Co Ltd | Verfahren zur Herstellung einer elektrischen Dünnschicht |
GB2273110B (en) * | 1992-12-03 | 1996-01-24 | Gec Marconi Avionics Holdings | Depositing different materials on a substrate |
GB9225270D0 (en) * | 1992-12-03 | 1993-01-27 | Gec Ferranti Defence Syst | Depositing different materials on a substrate |
FR2711450B1 (fr) * | 1993-10-18 | 1996-01-05 | Pixel Int Sa | Installation et procédé pour la fabrication d'écrans plats de visualisation. |
JPH08176821A (ja) * | 1994-12-26 | 1996-07-09 | Shincron:Kk | 薄膜形成方法および装置 |
EP0947601A1 (de) * | 1998-03-26 | 1999-10-06 | ESSILOR INTERNATIONAL Compagnie Générale d'Optique | Organisches Substrat mit optischen Schichten hergestellt mittels Magnetron-Zerstäubung und Verfahren |
JP3735461B2 (ja) | 1998-03-27 | 2006-01-18 | 株式会社シンクロン | 複合金属の化合物薄膜形成方法及びその薄膜形成装置 |
SG101511A1 (en) * | 2001-11-12 | 2004-01-30 | Inst Data Storage | Vacuum deposition method |
DE10347521A1 (de) | 2002-12-04 | 2004-06-24 | Leybold Optics Gmbh | Verfahren zur Herstellung Multilayerschicht und Vorrichtung zur Durchführung des Verfahrens |
DE10311466B4 (de) * | 2003-03-15 | 2005-07-21 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zum reaktiven Magnetron-Sputtern |
DE102005033769B4 (de) * | 2005-07-15 | 2009-10-22 | Systec System- Und Anlagentechnik Gmbh & Co.Kg | Verfahren und Vorrichtung zur Mehrkathoden-PVD-Beschichtung und Substrat mit PVD-Beschichtung |
US8221551B2 (en) * | 2006-07-04 | 2012-07-17 | Ulvac, Inc. | Apparatus for producing a reflector |
TWI383059B (zh) * | 2007-02-12 | 2013-01-21 | Hon Hai Prec Ind Co Ltd | 濺鍍式鍍膜裝置及方法 |
CN101622374B (zh) * | 2007-03-01 | 2012-07-18 | 株式会社爱发科 | 薄膜形成方法及薄膜形成装置 |
JP2008275919A (ja) * | 2007-04-27 | 2008-11-13 | Ulvac Japan Ltd | 防汚層を備えた反射防止層の成膜方法及び同成膜を行うための成膜装置 |
JP2008275918A (ja) * | 2007-04-27 | 2008-11-13 | Ulvac Japan Ltd | 防汚層を備えた反射防止層の成膜方法及び同成膜を行うための成膜装置 |
CN101809185B (zh) | 2007-10-26 | 2013-05-08 | 沉积科学公司 | 薄膜涂覆系统和方法 |
DE102008050499B4 (de) | 2008-10-07 | 2014-02-06 | Systec System- Und Anlagentechnik Gmbh & Co. Kg | PVD-Beschichtungsverfahren, Vorrichtung zur Durchführung des Verfahrens und nach dem Verfahren beschichtete Substrate |
JP4574739B1 (ja) * | 2010-03-08 | 2010-11-04 | 三容真空工業株式会社 | 成膜装置 |
JP5930791B2 (ja) | 2011-04-28 | 2016-06-08 | 日東電工株式会社 | 真空成膜方法、及び該方法によって得られる積層体 |
CN102212779A (zh) * | 2011-06-15 | 2011-10-12 | 星弧涂层科技(苏州工业园区)有限公司 | 磁控溅射镀膜装置 |
JP5963193B2 (ja) | 2011-07-29 | 2016-08-03 | 日東電工株式会社 | 積層体の製造方法 |
JP5959099B2 (ja) * | 2011-07-29 | 2016-08-02 | 日東電工株式会社 | 積層体の製造方法 |
KR20130060544A (ko) | 2011-11-30 | 2013-06-10 | 현대자동차주식회사 | 나노멀티레이어 코팅층 형성방법 및 형성장치 |
DE102014207447A1 (de) * | 2014-04-17 | 2015-10-22 | Magna International Inc. | Beschichtetes Stahlbauteil, Verfahren zur Herstellung des Stahlbauteils und Herstellungsanlage |
CN104611675B (zh) * | 2015-01-12 | 2017-09-26 | 宜昌南玻显示器件有限公司 | 磁控溅射镀膜设备及ito玻璃的制备方法 |
CN107532290B (zh) | 2015-03-31 | 2022-04-01 | 布勒阿尔策瑙股份有限公司 | 用于生产涂覆的基板的方法 |
RU186847U1 (ru) * | 2018-05-31 | 2019-02-06 | Общество с ограниченной ответственностью "Научно - производственное предприятие "Вакуумные ионно - плазменные технологии" (ООО НПП "ВИП-технологии") | Планетарный рабочий стол для групповой ионно-плазменной обработки изделий в вакуумных шлюзовых системах |
RU2747487C2 (ru) * | 2018-06-19 | 2021-05-05 | Общество с ограниченной ответственностью "АкадемВак" | Магнетронное распылительное устройство |
DE102020100826A1 (de) * | 2020-01-15 | 2021-07-15 | Technische Universität Dresden | Vorrichtung zum Bearbeiten von Werkstücken und Verfahren zum Betreiben der Vorrichtung |
CN111235540B (zh) * | 2020-03-18 | 2024-03-29 | 杭州朗旭新材料科技有限公司 | 一种磁控溅射设备及磁控溅射方法 |
CN111893444B (zh) * | 2020-08-19 | 2022-08-09 | 山东交通职业学院 | 一种固体润滑薄膜的低温制备方法及应用 |
JP2023551406A (ja) * | 2020-11-19 | 2023-12-08 | アプライド マテリアルズ インコーポレイテッド | 保護層源 |
CN113862632B (zh) * | 2021-09-24 | 2023-06-30 | 北京北方华创真空技术有限公司 | 一种柔性镀膜设备的真空腔室 |
DE102021130675A1 (de) | 2021-11-23 | 2023-05-25 | Optics Balzers Ag | Polarisationsstrahlteiler und Verfahren zu dessen Herstellung |
CN114875358B (zh) * | 2022-05-10 | 2024-04-19 | 北京大学深圳研究生院 | 一种复合真空镀膜设备及其使用方法 |
CN115110048B (zh) * | 2022-06-20 | 2023-05-02 | 肇庆市科润真空设备有限公司 | 基于磁控溅射的pecvd镀膜装置及方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4420385A (en) * | 1983-04-15 | 1983-12-13 | Gryphon Products | Apparatus and process for sputter deposition of reacted thin films |
US4777908A (en) * | 1986-11-26 | 1988-10-18 | Optical Coating Laboratory, Inc. | System and method for vacuum deposition of thin films |
US4851095A (en) * | 1988-02-08 | 1989-07-25 | Optical Coating Laboratory, Inc. | Magnetron sputtering apparatus and process |
EP0409451A1 (de) * | 1989-07-18 | 1991-01-23 | Optical Coating Laboratory, Inc. | Verfahren zum Auftragen von dünnen optischen Schichten auf sowohl flachen als auch nicht flachen Substraten |
-
1990
- 1990-11-12 DE DE69027004T patent/DE69027004T2/de not_active Expired - Fee Related
- 1990-11-12 AT AT90312323T patent/ATE138111T1/de not_active IP Right Cessation
- 1990-11-12 AT AT95117528T patent/ATE189272T1/de not_active IP Right Cessation
- 1990-11-12 EP EP90312323A patent/EP0428358B1/de not_active Expired - Lifetime
- 1990-11-12 DE DE69033441T patent/DE69033441T2/de not_active Revoked
- 1990-11-12 EP EP95117528A patent/EP0716160B1/de not_active Revoked
- 1990-11-13 JP JP2306982A patent/JPH03211275A/ja active Pending
- 1990-11-13 CA CA002029755A patent/CA2029755C/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102013221029A1 (de) | 2013-10-16 | 2015-04-16 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zur Herstellung uniformer Schichten auf bewegten Substraten und derart hergestellte Schichten |
Also Published As
Publication number | Publication date |
---|---|
EP0428358B1 (de) | 1996-05-15 |
EP0428358A2 (de) | 1991-05-22 |
CA2029755A1 (en) | 1991-05-14 |
DE69033441D1 (de) | 2000-03-02 |
EP0716160B1 (de) | 2000-01-26 |
EP0428358A3 (en) | 1991-07-24 |
EP0716160A1 (de) | 1996-06-12 |
DE69027004D1 (de) | 1996-06-20 |
ATE189272T1 (de) | 2000-02-15 |
ATE138111T1 (de) | 1996-06-15 |
DE69027004T2 (de) | 1996-11-14 |
CA2029755C (en) | 2000-08-01 |
JPH03211275A (ja) | 1991-09-17 |
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