ATE189272T1 - Geometrie und gestaltungen eines geräts zum magnetronzerstäuben - Google Patents

Geometrie und gestaltungen eines geräts zum magnetronzerstäuben

Info

Publication number
ATE189272T1
ATE189272T1 AT95117528T AT95117528T ATE189272T1 AT E189272 T1 ATE189272 T1 AT E189272T1 AT 95117528 T AT95117528 T AT 95117528T AT 95117528 T AT95117528 T AT 95117528T AT E189272 T1 ATE189272 T1 AT E189272T1
Authority
AT
Austria
Prior art keywords
materials
reaction zones
sputting
magnetron
geometry
Prior art date
Application number
AT95117528T
Other languages
English (en)
Inventor
James W Seeser
Thomas H Allen
Erik R Dickey
Bryant P Hichwa
Rolf F Illsley
Robert F Klinger
Paul M Lefebvre
Michael A Scobey
Richard I Seddon
David L Soberanis
Michael D Temple
Horn Craig C Van
Patrick R Wenthworth
Original Assignee
Optical Coating Laboratory Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=23730544&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE189272(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Optical Coating Laboratory Inc filed Critical Optical Coating Laboratory Inc
Application granted granted Critical
Publication of ATE189272T1 publication Critical patent/ATE189272T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0047—Activation or excitation of reactive gases outside the coating chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0073—Reactive sputtering by exposing the substrates to reactive gases intermittently
    • C23C14/0078—Reactive sputtering by exposing the substrates to reactive gases intermittently by moving the substrates between spatially separate sputtering and reaction stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Physical Vapour Deposition (AREA)
AT95117528T 1989-11-13 1990-11-12 Geometrie und gestaltungen eines geräts zum magnetronzerstäuben ATE189272T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US43596589A 1989-11-13 1989-11-13

Publications (1)

Publication Number Publication Date
ATE189272T1 true ATE189272T1 (de) 2000-02-15

Family

ID=23730544

Family Applications (2)

Application Number Title Priority Date Filing Date
AT95117528T ATE189272T1 (de) 1989-11-13 1990-11-12 Geometrie und gestaltungen eines geräts zum magnetronzerstäuben
AT90312323T ATE138111T1 (de) 1989-11-13 1990-11-12 Geometrie und gestaltungen eines geräts zum magnetronzerstäuben

Family Applications After (1)

Application Number Title Priority Date Filing Date
AT90312323T ATE138111T1 (de) 1989-11-13 1990-11-12 Geometrie und gestaltungen eines geräts zum magnetronzerstäuben

Country Status (5)

Country Link
EP (2) EP0428358B1 (de)
JP (1) JPH03211275A (de)
AT (2) ATE189272T1 (de)
CA (1) CA2029755C (de)
DE (2) DE69027004T2 (de)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
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JPH05287520A (ja) * 1992-04-10 1993-11-02 Sanyo Shinku Kogyo Kk 成膜装置
FR2694131B1 (fr) * 1992-07-21 1996-09-27 Balzers Hochvakuum Procede et installation pour la fabrication d'un composant, notamment d'un composant optique, et composant optique ainsi obtenu.
DE69331538T2 (de) * 1992-12-01 2002-08-29 Matsushita Electric Ind Co Ltd Verfahren zur Herstellung einer elektrischen Dünnschicht
GB9225270D0 (en) * 1992-12-03 1993-01-27 Gec Ferranti Defence Syst Depositing different materials on a substrate
GB2273110B (en) * 1992-12-03 1996-01-24 Gec Marconi Avionics Holdings Depositing different materials on a substrate
FR2711450B1 (fr) * 1993-10-18 1996-01-05 Pixel Int Sa Installation et procédé pour la fabrication d'écrans plats de visualisation.
JPH08176821A (ja) * 1994-12-26 1996-07-09 Shincron:Kk 薄膜形成方法および装置
EP0947601A1 (de) * 1998-03-26 1999-10-06 ESSILOR INTERNATIONAL Compagnie Générale d'Optique Organisches Substrat mit optischen Schichten hergestellt mittels Magnetron-Zerstäubung und Verfahren
JP3735461B2 (ja) * 1998-03-27 2006-01-18 株式会社シンクロン 複合金属の化合物薄膜形成方法及びその薄膜形成装置
SG101511A1 (en) * 2001-11-12 2004-01-30 Inst Data Storage Vacuum deposition method
DE10347521A1 (de) 2002-12-04 2004-06-24 Leybold Optics Gmbh Verfahren zur Herstellung Multilayerschicht und Vorrichtung zur Durchführung des Verfahrens
DE10311466B4 (de) * 2003-03-15 2005-07-21 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum reaktiven Magnetron-Sputtern
DE102005033769B4 (de) * 2005-07-15 2009-10-22 Systec System- Und Anlagentechnik Gmbh & Co.Kg Verfahren und Vorrichtung zur Mehrkathoden-PVD-Beschichtung und Substrat mit PVD-Beschichtung
CN101484830B (zh) * 2006-07-04 2010-12-01 株式会社爱发科 反射镜的制造装置及其制造方法
TWI383059B (zh) * 2007-02-12 2013-01-21 Hon Hai Prec Ind Co Ltd 濺鍍式鍍膜裝置及方法
WO2008108185A1 (ja) * 2007-03-01 2008-09-12 Ulvac, Inc. 薄膜形成方法及び薄膜形成装置
JP2008275918A (ja) * 2007-04-27 2008-11-13 Ulvac Japan Ltd 防汚層を備えた反射防止層の成膜方法及び同成膜を行うための成膜装置
JP2008275919A (ja) * 2007-04-27 2008-11-13 Ulvac Japan Ltd 防汚層を備えた反射防止層の成膜方法及び同成膜を行うための成膜装置
JP2011500971A (ja) * 2007-10-26 2011-01-06 デポジッション サイエンス インク 薄膜コーティングシステムおよび方法
DE102008050499B4 (de) 2008-10-07 2014-02-06 Systec System- Und Anlagentechnik Gmbh & Co. Kg PVD-Beschichtungsverfahren, Vorrichtung zur Durchführung des Verfahrens und nach dem Verfahren beschichtete Substrate
JP4574739B1 (ja) * 2010-03-08 2010-11-04 三容真空工業株式会社 成膜装置
JP5930791B2 (ja) * 2011-04-28 2016-06-08 日東電工株式会社 真空成膜方法、及び該方法によって得られる積層体
CN102212779A (zh) * 2011-06-15 2011-10-12 星弧涂层科技(苏州工业园区)有限公司 磁控溅射镀膜装置
JP5959099B2 (ja) * 2011-07-29 2016-08-02 日東電工株式会社 積層体の製造方法
JP5963193B2 (ja) 2011-07-29 2016-08-03 日東電工株式会社 積層体の製造方法
KR20130060544A (ko) 2011-11-30 2013-06-10 현대자동차주식회사 나노멀티레이어 코팅층 형성방법 및 형성장치
DE102013221029A1 (de) 2013-10-16 2015-04-16 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zur Herstellung uniformer Schichten auf bewegten Substraten und derart hergestellte Schichten
DE102014207447A1 (de) * 2014-04-17 2015-10-22 Magna International Inc. Beschichtetes Stahlbauteil, Verfahren zur Herstellung des Stahlbauteils und Herstellungsanlage
CN104611675B (zh) * 2015-01-12 2017-09-26 宜昌南玻显示器件有限公司 磁控溅射镀膜设备及ito玻璃的制备方法
CN107532290B (zh) 2015-03-31 2022-04-01 布勒阿尔策瑙股份有限公司 用于生产涂覆的基板的方法
RU186847U1 (ru) * 2018-05-31 2019-02-06 Общество с ограниченной ответственностью "Научно - производственное предприятие "Вакуумные ионно - плазменные технологии" (ООО НПП "ВИП-технологии") Планетарный рабочий стол для групповой ионно-плазменной обработки изделий в вакуумных шлюзовых системах
RU2747487C2 (ru) * 2018-06-19 2021-05-05 Общество с ограниченной ответственностью "АкадемВак" Магнетронное распылительное устройство
DE102020100826A1 (de) * 2020-01-15 2021-07-15 Technische Universität Dresden Vorrichtung zum Bearbeiten von Werkstücken und Verfahren zum Betreiben der Vorrichtung
CN111235540B (zh) * 2020-03-18 2024-03-29 杭州朗旭新材料科技有限公司 一种磁控溅射设备及磁控溅射方法
CN111893444B (zh) * 2020-08-19 2022-08-09 山东交通职业学院 一种固体润滑薄膜的低温制备方法及应用
CN116568855A (zh) * 2020-11-19 2023-08-08 应用材料公司 保护层源
CN113862632B (zh) * 2021-09-24 2023-06-30 北京北方华创真空技术有限公司 一种柔性镀膜设备的真空腔室
DE102021130675A1 (de) 2021-11-23 2023-05-25 Optics Balzers Ag Polarisationsstrahlteiler und Verfahren zu dessen Herstellung
CN114875358B (zh) * 2022-05-10 2024-04-19 北京大学深圳研究生院 一种复合真空镀膜设备及其使用方法
CN115110048B (zh) * 2022-06-20 2023-05-02 肇庆市科润真空设备有限公司 基于磁控溅射的pecvd镀膜装置及方法

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US4420385A (en) * 1983-04-15 1983-12-13 Gryphon Products Apparatus and process for sputter deposition of reacted thin films
US4777908A (en) * 1986-11-26 1988-10-18 Optical Coating Laboratory, Inc. System and method for vacuum deposition of thin films
US4851095A (en) * 1988-02-08 1989-07-25 Optical Coating Laboratory, Inc. Magnetron sputtering apparatus and process
EP0409451A1 (de) * 1989-07-18 1991-01-23 Optical Coating Laboratory, Inc. Verfahren zum Auftragen von dünnen optischen Schichten auf sowohl flachen als auch nicht flachen Substraten

Also Published As

Publication number Publication date
EP0428358A3 (en) 1991-07-24
CA2029755A1 (en) 1991-05-14
JPH03211275A (ja) 1991-09-17
EP0716160B1 (de) 2000-01-26
DE69033441T2 (de) 2000-05-18
EP0428358B1 (de) 1996-05-15
CA2029755C (en) 2000-08-01
DE69033441D1 (de) 2000-03-02
ATE138111T1 (de) 1996-06-15
DE69027004D1 (de) 1996-06-20
DE69027004T2 (de) 1996-11-14
EP0428358A2 (de) 1991-05-22
EP0716160A1 (de) 1996-06-12

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