AU6112290A - Workpiece coated with a solid solution layer, method for its production, use of the workpiece, and apparatus for carrying out the method - Google Patents

Workpiece coated with a solid solution layer, method for its production, use of the workpiece, and apparatus for carrying out the method

Info

Publication number
AU6112290A
AU6112290A AU61122/90A AU6112290A AU6112290A AU 6112290 A AU6112290 A AU 6112290A AU 61122/90 A AU61122/90 A AU 61122/90A AU 6112290 A AU6112290 A AU 6112290A AU 6112290 A AU6112290 A AU 6112290A
Authority
AU
Australia
Prior art keywords
workpiece
coated
layer
mixed crystal
production
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
AU61122/90A
Other versions
AU645758B2 (en
Inventor
Roland Schmid
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OC Oerlikon Balzers AG
Original Assignee
Balzers AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers AG filed Critical Balzers AG
Publication of AU6112290A publication Critical patent/AU6112290A/en
Application granted granted Critical
Publication of AU645758B2 publication Critical patent/AU645758B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0664—Carbonitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)

Abstract

The mixed crystal layer (C, D) of metaloids on a workpiece, applied by means of reactive physical coating, has an incorporation ratio of metaloids which changes continuously in the thickness direction. The mixed crystal layer (C, D) is present on a separation layer (A) of the workpiece. For the production of the metal layer (C, D), titanium is evaporated in a crucible, which is moved to and fro in front of the workpiece surfaces to be coated, in a vacuum chamber, and two gases which have different affinities to the vaporised titanium are passed in. To produce a first part layer (C) of the mixed crystal layer (C, D), the incorporation ratio of the gases is continuously changed. During coating, the workpieces rotate so that their surface sometimes faces the crucible and sometimes faces away. The coated workpieces are distinguished by high flank wear resistance and crater wear resistance. <IMAGE>
AU61122/90A 1989-08-21 1990-08-20 Workpiece coated with a solid solution layer, method for its production, use of the workpiece, and apparatus for carrying out the method Ceased AU645758B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH303789 1989-08-21
CH3037/89 1989-08-21

Publications (2)

Publication Number Publication Date
AU6112290A true AU6112290A (en) 1991-02-21
AU645758B2 AU645758B2 (en) 1994-01-27

Family

ID=4247204

Family Applications (1)

Application Number Title Priority Date Filing Date
AU61122/90A Ceased AU645758B2 (en) 1989-08-21 1990-08-20 Workpiece coated with a solid solution layer, method for its production, use of the workpiece, and apparatus for carrying out the method

Country Status (9)

Country Link
EP (1) EP0413853B1 (en)
JP (1) JP3388736B2 (en)
KR (1) KR0148355B1 (en)
CN (1) CN1039354C (en)
AT (1) ATE133718T1 (en)
AU (1) AU645758B2 (en)
BR (1) BR9004095A (en)
CA (1) CA2023049C (en)
DE (1) DE58909591D1 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0430872B1 (en) * 1989-11-22 1995-04-05 Balzers Aktiengesellschaft Tool or instrument with a wear-resistant hard layer for working or processing of organic material
CH680369A5 (en) * 1989-11-22 1992-08-14 Balzers Hochvakuum
DE69432165T2 (en) * 1993-03-15 2003-12-11 Kabushiki Kaisha Kobeseikosho, Kobe DEVICE AND SYSTEM FOR ARC PLATING
EP0625588B1 (en) * 1993-05-21 2001-10-24 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Plasmapolymer layer sequence as hard material layer with specifically adjustable adhesion behaviour
DE29615190U1 (en) * 1996-03-11 1996-11-28 Balzers Verschleissschutz GmbH, 55411 Bingen Plant for coating workpieces
DE10002861A1 (en) * 2000-01-24 2001-08-09 Walter Ag Cutting tool with carbonitride coating
DE10018143C5 (en) † 2000-04-12 2012-09-06 Oerlikon Trading Ag, Trübbach DLC layer system and method and apparatus for producing such a layer system
JP3637882B2 (en) † 2000-08-31 2005-04-13 住友電気工業株式会社 Surface coated boron nitride sintered body tool
DE102004010285A1 (en) * 2004-03-03 2005-09-29 Walter Ag Coating for a cutting tool and manufacturing process
CN103659954B (en) * 2014-01-02 2016-06-29 王梁 A kind of abrasion-resistant stee template and preparation method
JP7337358B2 (en) * 2019-09-13 2023-09-04 国立大学法人東海国立大学機構 Skiving device and skiving method

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH645137A5 (en) * 1981-03-13 1984-09-14 Balzers Hochvakuum METHOD AND DEVICE FOR EVAPORATING MATERIAL UNDER VACUUM.
AT381268B (en) * 1982-05-05 1986-09-25 Ver Edelstahlwerke Ag TOOL AND METHOD FOR THE PRODUCTION THEREOF
DE3425467A1 (en) * 1984-07-11 1986-01-23 Battelle-Institut E.V., 6000 Frankfurt METHOD FOR IMPROVING THE COLOR IMPRESSION OF TITAN NITRIDE LAYERS
DD246571A1 (en) * 1986-03-14 1987-06-10 Hochvakuum Dresden Veb DEVICE FOR PLASMA-ASSISTED SEPARATION OF COMPOUND LAYERS
JPH0732961B2 (en) * 1986-10-03 1995-04-12 三菱マテリアル株式会社 Surface coated tungsten carbide based cemented carbide cutting tool
US4904543A (en) * 1987-04-23 1990-02-27 Matsushita Electric Industrial Co., Ltd. Compositionally modulated, nitrided alloy films and method for making the same
AT387186B (en) * 1987-05-04 1988-12-12 Ver Edelstahlwerke Ag COATED CARBIDE BODY
ES2022946T5 (en) * 1987-08-26 1996-04-16 Balzers Hochvakuum PROCEDURE FOR THE CONTRIBUTION OF LAYERS ON SUBSTRATES.

Also Published As

Publication number Publication date
AU645758B2 (en) 1994-01-27
KR0148355B1 (en) 1998-11-02
EP0413853B1 (en) 1996-01-31
CN1049688A (en) 1991-03-06
BR9004095A (en) 1991-09-03
ATE133718T1 (en) 1996-02-15
CN1039354C (en) 1998-07-29
KR910004837A (en) 1991-03-29
DE58909591D1 (en) 1996-03-14
JPH0382748A (en) 1991-04-08
EP0413853A1 (en) 1991-02-27
JP3388736B2 (en) 2003-03-24
CA2023049C (en) 2002-01-15
CA2023049A1 (en) 1991-02-22

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Legal Events

Date Code Title Description
MK14 Patent ceased section 143(a) (annual fees not paid) or expired