CA2326202A1 - Method and apparatus for deposition of biaxially textured coatings - Google Patents

Method and apparatus for deposition of biaxially textured coatings

Info

Publication number
CA2326202A1
CA2326202A1 CA002326202A CA2326202A CA2326202A1 CA 2326202 A1 CA2326202 A1 CA 2326202A1 CA 002326202 A CA002326202 A CA 002326202A CA 2326202 A CA2326202 A CA 2326202A CA 2326202 A1 CA2326202 A1 CA 2326202A1
Authority
CA
Canada
Prior art keywords
substrate
deposition
biaxially textured
deposited
angle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA002326202A
Other languages
French (fr)
Other versions
CA2326202C (en
Inventor
Roger De Gryse
Jurgen Denul
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bekaert NV SA
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CA2326202A1 publication Critical patent/CA2326202A1/en
Application granted granted Critical
Publication of CA2326202C publication Critical patent/CA2326202C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/354—Introduction of auxiliary energy into the plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225—Oblique incidence of vaporised material on substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Moulding By Coating Moulds (AREA)

Abstract

A deposition method and apparatus is described for manufacture of biaxially textured coatings where the biaxial texturing is induced by bon-bardment during deposition by energetic particles under a specifically controlled angle. The method for deposition of biaxially textured coadngs onto a substrate (6) utilizes one or more maginetron sputtering devices (1) generating both a flux of material to be deposited and a flux (5) of energetic particles with a controllable direction and thereby controllable angle of incidence on the substrate (6). The magnetron sputter source (1) generates a beam (5) of energetic particles together with material to be deposited, said source being adapted so that said beam (5) is directed towards a substrate (6) under an angle controlled in such a way that a biaxially textured coating is deposited on the substrate (6).
CA002326202A 1998-03-31 1999-03-30 Method and apparatus for deposition of biaxially textured coatings Expired - Fee Related CA2326202C (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP98201006 1998-03-31
EP98201006.8 1998-03-31
PCT/EP1999/002168 WO1999050471A1 (en) 1998-03-31 1999-03-30 Method and apparatus for deposition of biaxially textured coatings

Publications (2)

Publication Number Publication Date
CA2326202A1 true CA2326202A1 (en) 1999-10-07
CA2326202C CA2326202C (en) 2008-06-17

Family

ID=8233538

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002326202A Expired - Fee Related CA2326202C (en) 1998-03-31 1999-03-30 Method and apparatus for deposition of biaxially textured coatings

Country Status (8)

Country Link
EP (1) EP1070154A1 (en)
JP (1) JP2002509988A (en)
KR (1) KR20010042128A (en)
CN (1) CN1295628A (en)
AU (1) AU746645C (en)
CA (1) CA2326202C (en)
RU (1) RU2224050C2 (en)
WO (1) WO1999050471A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9597290B2 (en) 2013-02-15 2017-03-21 Regents Of The University Of Minnesota Particle functionalization

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100352976B1 (en) * 1999-12-24 2002-09-18 한국기계연구원 Electrical Plating Process and Device for Ni Plate Layer Having Biaxial Texture
EA200601832A1 (en) * 2006-08-16 2008-02-28 Владимир Яковлевич ШИРИПОВ METHOD OF ION TREATMENT OF SURFACE DIELECTRICS AND DEVICE FOR IMPLEMENTATION OF METHOD
MX345403B (en) 2009-05-13 2017-01-30 Sio2 Medical Products Inc Pecvd coating using an organosilicon precursor.
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
KR101794586B1 (en) 2011-05-23 2017-11-08 삼성디스플레이 주식회사 Separated target apparatus for sputtering and sputtering method using the same
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
EP2776603B1 (en) 2011-11-11 2019-03-06 SiO2 Medical Products, Inc. PASSIVATION, pH PROTECTIVE OR LUBRICITY COATING FOR PHARMACEUTICAL PACKAGE, COATING PROCESS AND APPARATUS
RU2502151C1 (en) * 2012-04-24 2013-12-20 Федеральное государственное бюджетное учреждение науки Институт общей физики им. А.М. Прохорова Российской академии наук (ИОФ РАН) Method of making photocathode and apparatus for making photocathode
CA2887352A1 (en) 2012-05-09 2013-11-14 Sio2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
EP2914762B1 (en) 2012-11-01 2020-05-13 SiO2 Medical Products, Inc. Coating inspection method
US9903782B2 (en) 2012-11-16 2018-02-27 Sio2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
WO2014085348A2 (en) 2012-11-30 2014-06-05 Sio2 Medical Products, Inc. Controlling the uniformity of pecvd deposition on medical syringes, cartridges, and the like
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
US9662450B2 (en) 2013-03-01 2017-05-30 Sio2 Medical Products, Inc. Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
KR102472240B1 (en) 2013-03-11 2022-11-30 에스아이오2 메디컬 프로덕츠, 인크. Coated Packaging
WO2014144926A1 (en) 2013-03-15 2014-09-18 Sio2 Medical Products, Inc. Coating method
WO2015033808A1 (en) * 2013-09-04 2015-03-12 東洋鋼鈑株式会社 Method for depositing oxide layer, and layered substrate for epitaxial growth and process for producing same
US11066745B2 (en) 2014-03-28 2021-07-20 Sio2 Medical Products, Inc. Antistatic coatings for plastic vessels
CN106415790B (en) * 2014-06-23 2020-09-01 应用材料公司 Method for depositing a layer, method for manufacturing a transistor, layer stack for an electronic device and electronic device
CN104109841B (en) * 2014-07-23 2016-08-24 中国科学院上海光学精密机械研究所 Magnetron sputtering inclined deposition plating apparatus
CN104593742B (en) * 2015-01-20 2017-02-22 清华大学深圳研究生院 Equipment and method for preparing oxide film with biaxial texture
US11077233B2 (en) 2015-08-18 2021-08-03 Sio2 Medical Products, Inc. Pharmaceutical and other packaging with low oxygen transmission rate
RU2620534C2 (en) * 2015-09-08 2017-05-26 Федеральное государственное автономное образовательное учреждение высшего профессионального образования "Казанский (Приволжский) федеральный университет" (ФГАОУВПО КФУ) Method of coating and device for its implementation
CN113808935B (en) * 2020-06-16 2023-12-15 中微半导体设备(上海)股份有限公司 Corrosion-resistant coating forming method and device, plasma component and reaction device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4333022A1 (en) * 1993-09-29 1995-03-30 Ronald Dipl Phys Gottzein Method for producing bitextured thin films on amorphous or arbitrarily structured substrates
DE4436285C2 (en) * 1994-10-11 2002-01-10 Univ Stuttgart Method and device for applying orientation layers on a substrate for aligning liquid crystal molecules
DE19641584C1 (en) * 1996-09-30 1998-01-08 Siemens Ag Vacuum coating device for application of substrate thin-film layers

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9597290B2 (en) 2013-02-15 2017-03-21 Regents Of The University Of Minnesota Particle functionalization

Also Published As

Publication number Publication date
AU746645B2 (en) 2002-05-02
EP1070154A1 (en) 2001-01-24
AU746645C (en) 2003-02-20
CN1295628A (en) 2001-05-16
RU2224050C2 (en) 2004-02-20
AU3418899A (en) 1999-10-18
WO1999050471A1 (en) 1999-10-07
CA2326202C (en) 2008-06-17
JP2002509988A (en) 2002-04-02
KR20010042128A (en) 2001-05-25

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