CA2326202A1 - Procede et appareil pour deposer des revetements a texture biaxiale - Google Patents

Procede et appareil pour deposer des revetements a texture biaxiale

Info

Publication number
CA2326202A1
CA2326202A1 CA002326202A CA2326202A CA2326202A1 CA 2326202 A1 CA2326202 A1 CA 2326202A1 CA 002326202 A CA002326202 A CA 002326202A CA 2326202 A CA2326202 A CA 2326202A CA 2326202 A1 CA2326202 A1 CA 2326202A1
Authority
CA
Canada
Prior art keywords
substrate
deposition
biaxially textured
deposited
angle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA002326202A
Other languages
English (en)
Other versions
CA2326202C (fr
Inventor
Roger De Gryse
Jurgen Denul
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bekaert NV SA
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CA2326202A1 publication Critical patent/CA2326202A1/fr
Application granted granted Critical
Publication of CA2326202C publication Critical patent/CA2326202C/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/354—Introduction of auxiliary energy into the plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225—Oblique incidence of vaporised material on substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Moulding By Coating Moulds (AREA)
CA002326202A 1998-03-31 1999-03-30 Procede et appareil pour deposer des revetements a texture biaxiale Expired - Fee Related CA2326202C (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP98201006.8 1998-03-31
EP98201006 1998-03-31
PCT/EP1999/002168 WO1999050471A1 (fr) 1998-03-31 1999-03-30 Procede et appareil pour deposer des revetements a texture biaxiale

Publications (2)

Publication Number Publication Date
CA2326202A1 true CA2326202A1 (fr) 1999-10-07
CA2326202C CA2326202C (fr) 2008-06-17

Family

ID=8233538

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002326202A Expired - Fee Related CA2326202C (fr) 1998-03-31 1999-03-30 Procede et appareil pour deposer des revetements a texture biaxiale

Country Status (8)

Country Link
EP (1) EP1070154A1 (fr)
JP (1) JP2002509988A (fr)
KR (1) KR20010042128A (fr)
CN (1) CN1295628A (fr)
AU (1) AU746645C (fr)
CA (1) CA2326202C (fr)
RU (1) RU2224050C2 (fr)
WO (1) WO1999050471A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9597290B2 (en) 2013-02-15 2017-03-21 Regents Of The University Of Minnesota Particle functionalization

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100352976B1 (ko) * 1999-12-24 2002-09-18 한국기계연구원 전기도금법에 의한 2축 집합조직을 갖는 니켈 도금층 및 그 제조방법
EA200601832A1 (ru) * 2006-08-16 2008-02-28 Владимир Яковлевич ШИРИПОВ Способ ионной обработки поверхности диэлектрика и устройство для осуществления способа
EP2251454B1 (fr) 2009-05-13 2014-07-23 SiO2 Medical Products, Inc. Procédé de dégazage pour inspecter une surface revêtue
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
KR101794586B1 (ko) 2011-05-23 2017-11-08 삼성디스플레이 주식회사 스퍼터링용 분할 타겟 장치 및 그것을 이용한 스퍼터링 방법
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
JP6095678B2 (ja) 2011-11-11 2017-03-15 エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド 薬剤パッケージ用の不動態化、ｐＨ保護又は滑性皮膜、被覆プロセス及び装置
RU2502151C1 (ru) * 2012-04-24 2013-12-20 Федеральное государственное бюджетное учреждение науки Институт общей физики им. А.М. Прохорова Российской академии наук (ИОФ РАН) Способ изготовления фотокатода и устройство для изготовления фотокатода
EP2846755A1 (fr) 2012-05-09 2015-03-18 SiO2 Medical Products, Inc. Enrobage protecteur en saccharide pour conditionnement pharmaceutique
CA2890066C (fr) 2012-11-01 2021-11-09 Sio2 Medical Products, Inc. Procedes d'inspection de revetement
WO2014078666A1 (fr) 2012-11-16 2014-05-22 Sio2 Medical Products, Inc. Procédé et appareil pour détecter des caractéristiques d'intégrité de revêtement de barrière rapide
CA2892294C (fr) 2012-11-30 2021-07-27 Sio2 Medical Products, Inc. Controle de l'uniformite de depot chimique en phase vapeur active par plasma (pecvd) sur des seringues medicales, des cartouches et analogues
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
US20160015898A1 (en) 2013-03-01 2016-01-21 Sio2 Medical Products, Inc. Plasma or cvd pre-treatment for lubricated pharmaceutical package, coating process and apparatus
EP4234753A3 (fr) 2013-03-11 2023-11-01 SiO2 Medical Products, Inc. Emballage revêtu
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
US9863042B2 (en) 2013-03-15 2018-01-09 Sio2 Medical Products, Inc. PECVD lubricity vessel coating, coating process and apparatus providing different power levels in two phases
US10174420B2 (en) 2013-09-04 2019-01-08 Toyo Kohan Co., Ltd. Method for forming oxide layer, laminated substrate for epitaxial growth, and method for producing the same
US11066745B2 (en) 2014-03-28 2021-07-20 Sio2 Medical Products, Inc. Antistatic coatings for plastic vessels
KR102140210B1 (ko) * 2014-06-23 2020-07-31 어플라이드 머티어리얼스, 인코포레이티드 층을 증착하는 방법, 트랜지스터를 제조하는 방법, 전자 디바이스에 대한 층 스택, 및 전자 디바이스
CN104109841B (zh) * 2014-07-23 2016-08-24 中国科学院上海光学精密机械研究所 磁控溅射倾斜沉积镀膜装置
CN104593742B (zh) * 2015-01-20 2017-02-22 清华大学深圳研究生院 一种制备具有双轴织构的氧化物薄膜的设备和方法
CN108138316A (zh) 2015-08-18 2018-06-08 Sio2医药产品公司 具有低氧气传输速率的药物和其他包装
RU2620534C2 (ru) * 2015-09-08 2017-05-26 Федеральное государственное автономное образовательное учреждение высшего профессионального образования "Казанский (Приволжский) федеральный университет" (ФГАОУВПО КФУ) Способ нанесения покрытий и устройство для его осуществления
CN113808935B (zh) * 2020-06-16 2023-12-15 中微半导体设备(上海)股份有限公司 耐腐蚀涂层形成方法和装置、等离子体零部件和反应装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4333022A1 (de) * 1993-09-29 1995-03-30 Ronald Dipl Phys Gottzein Verfahren zur Herstellung bitexturierter Dünnfilme auf amorphen oder beliebig strukturierten Substraten
DE4436285C2 (de) * 1994-10-11 2002-01-10 Univ Stuttgart Verfahren und Vorrichtung zum Aufbringen von Orientierungsschichten auf ein Substrat zum Ausrichten von Flüssigkristallmolekülen
DE19641584C1 (de) * 1996-09-30 1998-01-08 Siemens Ag Anordnung und Verfahren zum Aufbringen einer dünnen Schicht auf ein Substrat

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9597290B2 (en) 2013-02-15 2017-03-21 Regents Of The University Of Minnesota Particle functionalization

Also Published As

Publication number Publication date
JP2002509988A (ja) 2002-04-02
AU746645C (en) 2003-02-20
AU3418899A (en) 1999-10-18
CA2326202C (fr) 2008-06-17
WO1999050471A1 (fr) 1999-10-07
AU746645B2 (en) 2002-05-02
EP1070154A1 (fr) 2001-01-24
CN1295628A (zh) 2001-05-16
KR20010042128A (ko) 2001-05-25
RU2224050C2 (ru) 2004-02-20

Similar Documents

Publication Publication Date Title
CA2326202A1 (fr) Procede et appareil pour deposer des revetements a texture biaxiale
IL72125A0 (en) Decorative carbon coating,its manufacture and articles coated therewith
CA2350319A1 (fr) Source de vapeur avec ouverture rectiligne et procede d'enrobage
WO2002042167A3 (fr) Procede d'application de revetements en poudre sur des substrats non metalliques
CA2237732A1 (fr) Angle de reflexion du depot de couches minces
CA2241678A1 (fr) Depot de dioxyde de silicium par un procede d'evaporation active par un plasma
EP0198459A3 (fr) Procédé et dispositif de pulvérisation d'un film mince
AU2020597A (en) Coating substrate
RU2000127113A (ru) Способ и устройство для осаждения двухосно текстурированных покрытий
AU3330193A (en) Method and system for removing a coating from a substrate using radiant energy and a particle stream
EP1666546A3 (fr) Procédé et dispositif pour la production de pigments d'interférence améliorés
ES2036956A1 (es) Procedimiento y dispositivo de recubrimiento de substratos.
WO2004017356A3 (fr) Procede et appareil de pulverisation reactive par magnetron pulse de revetements a couches minces sur de grands substrats au moyen de cathodes de pulverisation plus petites
ES2079222T3 (es) Procedimiento para la mejora de la adherencia de capas metalicas precipitadas sin corriente.
ATE183019T1 (de) Vorrichtung zum beschichten von substraten im vakuum
Pargellis Evaporating and sputtering: Substrate heating dependence on deposition rate
AU3616297A (en) Capped porous thin films
EP0745147A4 (fr) Procede et appareil d'application d'un revetement sur un substrat
JPS5629670A (en) Preparation of coated high speed steel
AU3573995A (en) Low surface energy coatings
RU93018049A (ru) Способ нанесения вакуумных металлизированных покрытий на диэлектрические подложки
AU5304898A (en) Process and device for forming a coating on a substrate by cathode sputtering
AU2826089A (en) Method of sputtering
AU8526098A (en) Glancing angle deposition of thin films
Biekehor Surface Treatment. Two Methods: Vapour Deposition and Sputtering. Vacuum Metallizing: Alternative to Galvanizing

Legal Events

Date Code Title Description
EEER Examination request
MKLA Lapsed