DE69031856T2 - Kompensation von lithographischen und Ätznäheeffekten - Google Patents
Kompensation von lithographischen und ÄtznäheeffektenInfo
- Publication number
- DE69031856T2 DE69031856T2 DE69031856T DE69031856T DE69031856T2 DE 69031856 T2 DE69031856 T2 DE 69031856T2 DE 69031856 T DE69031856 T DE 69031856T DE 69031856 T DE69031856 T DE 69031856T DE 69031856 T2 DE69031856 T2 DE 69031856T2
- Authority
- DE
- Germany
- Prior art keywords
- lithographic
- compensation
- etching effects
- etching
- effects
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005530 etching Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/941—Loading effect mitigation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/942—Masking
- Y10S438/948—Radiation resist
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Drying Of Semiconductors (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/413,356 US5057462A (en) | 1989-09-27 | 1989-09-27 | Compensation of lithographic and etch proximity effects |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69031856D1 DE69031856D1 (de) | 1998-02-05 |
DE69031856T2 true DE69031856T2 (de) | 1998-04-16 |
Family
ID=23636923
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69031856T Expired - Lifetime DE69031856T2 (de) | 1989-09-27 | 1990-09-19 | Kompensation von lithographischen und Ätznäheeffekten |
Country Status (5)
Country | Link |
---|---|
US (1) | US5057462A (de) |
EP (1) | EP0420489B1 (de) |
JP (1) | JPH0799431B2 (de) |
DE (1) | DE69031856T2 (de) |
ES (1) | ES2110412T3 (de) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR930008866B1 (ko) * | 1990-04-20 | 1993-09-16 | 가부시키가이샤 도시바 | 반도체장치 및 그 제조방법 |
JPH04212472A (ja) * | 1990-07-13 | 1992-08-04 | Toshiba Corp | 不揮発性半導体記憶装置の製造方法 |
US5710711A (en) * | 1992-10-21 | 1998-01-20 | Lucent Technologies Inc. | Method and integrated circuit adapted for partial scan testability |
US5656509A (en) * | 1995-05-10 | 1997-08-12 | Advanced Micro Devices, Inc. | Method and test structure for determining gouging in a flash EPROM cell during SAS etch |
KR0172561B1 (ko) * | 1995-06-23 | 1999-03-30 | 김주용 | 노강 마스크의 근접 효과 억제방법 |
KR0160924B1 (ko) * | 1995-06-30 | 1998-12-15 | 김주용 | 노광 마스크 |
US6653733B1 (en) * | 1996-02-23 | 2003-11-25 | Micron Technology, Inc. | Conductors in semiconductor devices |
US6143663A (en) * | 1998-01-22 | 2000-11-07 | Cypress Semiconductor Corporation | Employing deionized water and an abrasive surface to polish a semiconductor topography |
US6200896B1 (en) | 1998-01-22 | 2001-03-13 | Cypress Semiconductor Corporation | Employing an acidic liquid and an abrasive surface to polish a semiconductor topography |
US5858591A (en) * | 1998-02-02 | 1999-01-12 | Taiwan Semiconductor Manufacturing Company Ltd. | Optical proximity correction during wafer processing through subfile bias modification with subsequent subfile merging |
US6171180B1 (en) | 1998-03-31 | 2001-01-09 | Cypress Semiconductor Corporation | Planarizing a trench dielectric having an upper surface within a trench spaced below an adjacent polish stop surface |
US6534378B1 (en) | 1998-08-31 | 2003-03-18 | Cypress Semiconductor Corp. | Method for forming an integrated circuit device |
US5972124A (en) * | 1998-08-31 | 1999-10-26 | Advanced Micro Devices, Inc. | Method for cleaning a surface of a dielectric material |
US6232231B1 (en) | 1998-08-31 | 2001-05-15 | Cypress Semiconductor Corporation | Planarized semiconductor interconnect topography and method for polishing a metal layer to form interconnect |
US6566249B1 (en) | 1998-11-09 | 2003-05-20 | Cypress Semiconductor Corp. | Planarized semiconductor interconnect topography and method for polishing a metal layer to form wide interconnect structures |
US6596466B1 (en) | 2000-01-25 | 2003-07-22 | Cypress Semiconductor Corporation | Contact structure and method of forming a contact structure |
US6265120B1 (en) | 2000-02-01 | 2001-07-24 | Taiwan Semiconductor Manufacturing Company | Geometry design of active region to improve junction breakdown and field isolation in STI process |
DE10013995A1 (de) * | 2000-03-22 | 2001-09-27 | Chemagen Biopolymer Technologi | Magnetische, silanisierte Trägermaterialien auf Basis von Polyvinylalkohol |
US6555895B1 (en) * | 2000-07-17 | 2003-04-29 | General Semiconductor, Inc. | Devices and methods for addressing optical edge effects in connection with etched trenches |
US6969684B1 (en) | 2001-04-30 | 2005-11-29 | Cypress Semiconductor Corp. | Method of making a planarized semiconductor structure |
US6828678B1 (en) | 2002-03-29 | 2004-12-07 | Silicon Magnetic Systems | Semiconductor topography with a fill material arranged within a plurality of valleys associated with the surface roughness of the metal layer |
US7897008B2 (en) * | 2006-10-27 | 2011-03-01 | Taiwan Semiconductor Manufacturing Company, Ltd. | Apparatus and method for regional plasma control |
JP4511582B2 (ja) * | 2007-11-07 | 2010-07-28 | シャープ株式会社 | マスクパターンの補正方法、フォトマスク、および半導体装置の製造方法 |
US8387674B2 (en) | 2007-11-30 | 2013-03-05 | Taiwan Semiconductor Manufacturing Comany, Ltd. | Chip on wafer bonder |
US8003545B2 (en) * | 2008-02-14 | 2011-08-23 | Spansion Llc | Method of forming an electronic device including forming features within a mask and a selective removal process |
US8178280B2 (en) * | 2010-02-05 | 2012-05-15 | Taiwan Semiconductor Manufacturing Company, Ltd. | Self-contained proximity effect correction inspiration for advanced lithography (special) |
CN111982883B (zh) * | 2020-09-02 | 2023-04-14 | 鲁东大学 | 一种石墨烯/银十六角星阵列拉曼增强基底及其制备方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4463265A (en) * | 1982-06-17 | 1984-07-31 | Hewlett-Packard Company | Electron beam proximity effect correction by reverse field pattern exposure |
US4610948A (en) * | 1984-01-25 | 1986-09-09 | The United States Of America As Represented By The Secretary Of The Army | Electron beam peripheral patterning of integrated circuits |
US4761560A (en) * | 1984-01-25 | 1988-08-02 | The United States Of America As Represented By The Secretary Of The Army | Measurement of proximity effects in electron beam lithography |
JPS63208049A (ja) * | 1987-02-24 | 1988-08-29 | Nec Corp | 半導体製造用マスクの製造方法およびその装置 |
-
1989
- 1989-09-27 US US07/413,356 patent/US5057462A/en not_active Expired - Lifetime
-
1990
- 1990-09-19 EP EP90310242A patent/EP0420489B1/de not_active Expired - Lifetime
- 1990-09-19 ES ES90310242T patent/ES2110412T3/es not_active Expired - Lifetime
- 1990-09-19 DE DE69031856T patent/DE69031856T2/de not_active Expired - Lifetime
- 1990-09-27 JP JP25877290A patent/JPH0799431B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0420489A3 (en) | 1992-04-15 |
JPH0799431B2 (ja) | 1995-10-25 |
JPH03170929A (ja) | 1991-07-24 |
EP0420489A2 (de) | 1991-04-03 |
ES2110412T3 (es) | 1998-02-16 |
US5057462A (en) | 1991-10-15 |
DE69031856D1 (de) | 1998-02-05 |
EP0420489B1 (de) | 1997-12-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |