DE69021337D1 - Verfahren zum Bilden einer Bornitrid enthaltenden Borschicht, Magnetkopf und Verfahren zu dessen Herstellung. - Google Patents

Verfahren zum Bilden einer Bornitrid enthaltenden Borschicht, Magnetkopf und Verfahren zu dessen Herstellung.

Info

Publication number
DE69021337D1
DE69021337D1 DE69021337T DE69021337T DE69021337D1 DE 69021337 D1 DE69021337 D1 DE 69021337D1 DE 69021337 T DE69021337 T DE 69021337T DE 69021337 T DE69021337 T DE 69021337T DE 69021337 D1 DE69021337 D1 DE 69021337D1
Authority
DE
Germany
Prior art keywords
producing
forming
magnetic head
layer containing
same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69021337T
Other languages
English (en)
Other versions
DE69021337T2 (de
Inventor
Satoshi Nishiyama
Kiyoshi Ogata
Hiroya Kirimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissin Electric Co Ltd
Original Assignee
Nissin Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP1300376A external-priority patent/JP2518424B2/ja
Priority claimed from JP30037789A external-priority patent/JPH03162562A/ja
Priority claimed from JP33210889A external-priority patent/JPH03191050A/ja
Application filed by Nissin Electric Co Ltd filed Critical Nissin Electric Co Ltd
Publication of DE69021337D1 publication Critical patent/DE69021337D1/de
Application granted granted Critical
Publication of DE69021337T2 publication Critical patent/DE69021337T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C23C14/0647—Boron nitride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/221—Ion beam deposition
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/10—Structure or manufacture of housings or shields for heads
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/187—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
    • G11B5/255—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features comprising means for protection against wear

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Magnetic Heads (AREA)
  • Thin Magnetic Films (AREA)
DE69021337T 1989-11-17 1990-11-16 Verfahren zum Bilden einer Bornitrid enthaltenden Borschicht, Magnetkopf und Verfahren zu dessen Herstellung. Expired - Fee Related DE69021337T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP1300376A JP2518424B2 (ja) 1989-11-17 1989-11-17 磁気ヘッドおよびその製造方法
JP30037789A JPH03162562A (ja) 1989-11-17 1989-11-17 窒化ホウ素薄膜の形成方法
JP33210889A JPH03191050A (ja) 1989-12-20 1989-12-20 高硬度窒化ホウ素含有薄膜の製造方法

Publications (2)

Publication Number Publication Date
DE69021337D1 true DE69021337D1 (de) 1995-09-07
DE69021337T2 DE69021337T2 (de) 1996-01-25

Family

ID=27338385

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69021337T Expired - Fee Related DE69021337T2 (de) 1989-11-17 1990-11-16 Verfahren zum Bilden einer Bornitrid enthaltenden Borschicht, Magnetkopf und Verfahren zu dessen Herstellung.

Country Status (3)

Country Link
EP (1) EP0429993B1 (de)
KR (1) KR100232922B1 (de)
DE (1) DE69021337T2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9225270D0 (en) * 1992-12-03 1993-01-27 Gec Ferranti Defence Syst Depositing different materials on a substrate
GB2273110B (en) * 1992-12-03 1996-01-24 Gec Marconi Avionics Holdings Depositing different materials on a substrate
KR100482279B1 (ko) * 2002-11-06 2005-04-14 한국과학기술연구원 바인더를 이용한 질화붕소 후막의 제조방법
KR100991770B1 (ko) 2010-03-15 2010-11-03 한국과학기술연구원 입방정계 질화붕소 박막의 증착 방법
JP2015046437A (ja) * 2013-08-27 2015-03-12 日本電信電話株式会社 立方晶窒化ホウ素薄膜の製造方法、および立方晶窒化ホウ素薄膜
CN108076646B (zh) * 2016-09-12 2019-12-13 Ｊｘ金属株式会社 强磁性材料溅射靶

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6063372A (ja) * 1983-09-19 1985-04-11 Agency Of Ind Science & Technol 高硬度窒化ホウ素薄膜の製造方法
US4656052A (en) * 1984-02-13 1987-04-07 Kyocera Corporation Process for production of high-hardness boron nitride film
JPS6231010A (ja) * 1985-08-01 1987-02-10 Alps Electric Co Ltd 磁気ヘツド
JPS63262457A (ja) * 1987-04-20 1988-10-28 Nissin Electric Co Ltd 窒化ホウ素膜の作製方法

Also Published As

Publication number Publication date
EP0429993B1 (de) 1995-08-02
KR100232922B1 (ko) 1999-12-01
KR910010406A (ko) 1991-06-29
EP0429993A2 (de) 1991-06-05
EP0429993A3 (en) 1991-09-25
DE69021337T2 (de) 1996-01-25

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee