DE69011908D1 - Fokussierung eines Elektronenstrahls. - Google Patents

Fokussierung eines Elektronenstrahls.

Info

Publication number
DE69011908D1
DE69011908D1 DE69011908T DE69011908T DE69011908D1 DE 69011908 D1 DE69011908 D1 DE 69011908D1 DE 69011908 T DE69011908 T DE 69011908T DE 69011908 T DE69011908 T DE 69011908T DE 69011908 D1 DE69011908 D1 DE 69011908D1
Authority
DE
Germany
Prior art keywords
focusing
electron beam
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69011908T
Other languages
English (en)
Other versions
DE69011908T2 (de
Inventor
Kimio Kanda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of DE69011908D1 publication Critical patent/DE69011908D1/de
Application granted granted Critical
Publication of DE69011908T2 publication Critical patent/DE69011908T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/21Means for adjusting the focus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Automatic Focus Adjustment (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE69011908T 1989-03-10 1990-02-14 Fokussierung eines Elektronenstrahls. Expired - Fee Related DE69011908T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1056476A JPH0766770B2 (ja) 1989-03-10 1989-03-10 電子線照射装置

Publications (2)

Publication Number Publication Date
DE69011908D1 true DE69011908D1 (de) 1994-10-06
DE69011908T2 DE69011908T2 (de) 1995-03-23

Family

ID=13028156

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69011908T Expired - Fee Related DE69011908T2 (de) 1989-03-10 1990-02-14 Fokussierung eines Elektronenstrahls.

Country Status (4)

Country Link
US (1) US5032725A (de)
EP (1) EP0386894B1 (de)
JP (1) JPH0766770B2 (de)
DE (1) DE69011908T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0689687A (ja) * 1990-12-27 1994-03-29 Jeol Ltd 走査電子顕微鏡における自動焦点合わせ装置
JPH0594798A (ja) * 1991-05-21 1993-04-16 Jeol Ltd 焦点深度切り換え可能な電子顕微鏡等の電子光学観察装置
EP0810629B1 (de) * 1991-11-27 2000-06-28 Hitachi, Ltd. Elektronenstrahlgerät
JP2535695B2 (ja) * 1992-01-13 1996-09-18 株式会社東芝 走査型電子顕微鏡の自動焦点合わせ方法
JP3109785B2 (ja) * 1993-12-21 2000-11-20 株式会社日立製作所 走査電子顕微鏡の自動焦点合わせ装置
US6278114B1 (en) 1997-12-19 2001-08-21 Kabushiki Kaisha Toshiba Method and apparatus for measuring dimensions of a feature of a specimen
JP2000048756A (ja) * 1998-07-27 2000-02-18 Seiko Instruments Inc 荷電粒子ビーム光学系の調整を行う方法およびその装置
US6521891B1 (en) * 1999-09-03 2003-02-18 Applied Materials, Inc. Focusing method and system
KR102268019B1 (ko) * 2019-04-30 2021-06-22 (주)코셈 인공 지능 학습 데이터를 활용한 전자 현미경
DE102021102900B4 (de) * 2021-02-08 2022-11-17 Carl Zeiss Microscopy Gmbh Verfahren zum Betrieb eines Teilchenstrahlgeräts, Computerprogrammprodukt und Teilchenstrahlgerät zur Durchführung des Verfahrens
US12542252B1 (en) * 2023-01-26 2026-02-03 Carl Zeiss Microscopy Gmbh Method of operating a particle beam system, particle beam system, non-transitory storage medium and program

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5275261A (en) * 1975-12-19 1977-06-24 Jeol Ltd Test piece image dispaly unit
GB1585158A (en) * 1976-07-30 1981-02-25 Cambridge Scientific Instr Ltd Automatic focusing systems
JPS5457949A (en) * 1977-10-18 1979-05-10 Jeol Ltd Automatic focusing unit for scanning electron microscope and so on
JPS5750756A (en) * 1980-09-12 1982-03-25 Jeol Ltd Objective lens current control method for scan type electron microscope
JPS585956A (ja) * 1981-07-01 1983-01-13 Hitachi Ltd 電子顕微鏡
JPS5814460A (ja) * 1981-07-17 1983-01-27 Internatl Precision Inc 電子顕微鏡の焦点合わせ方法及びこの方法を応用した像撮影方法及び装置
GB2118009B (en) * 1982-03-02 1985-09-04 Cambridge Instr Ltd Improvements in and relating to electron beam focussing

Also Published As

Publication number Publication date
EP0386894B1 (de) 1994-08-31
EP0386894A3 (de) 1991-04-24
US5032725A (en) 1991-07-16
DE69011908T2 (de) 1995-03-23
JPH0766770B2 (ja) 1995-07-19
JPH02236937A (ja) 1990-09-19
EP0386894A2 (de) 1990-09-12

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee