DE69110918D1 - Elektronenstrahlbestrahlungsapparat. - Google Patents

Elektronenstrahlbestrahlungsapparat.

Info

Publication number
DE69110918D1
DE69110918D1 DE69110918T DE69110918T DE69110918D1 DE 69110918 D1 DE69110918 D1 DE 69110918D1 DE 69110918 T DE69110918 T DE 69110918T DE 69110918 T DE69110918 T DE 69110918T DE 69110918 D1 DE69110918 D1 DE 69110918D1
Authority
DE
Germany
Prior art keywords
electron beam
beam irradiation
irradiation apparatus
electron
irradiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69110918T
Other languages
English (en)
Other versions
DE69110918T2 (de
Inventor
Toshiyuki C O Intellect Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Toshiba Electronic Device Solutions Corp
Original Assignee
Toshiba Corp
Toshiba Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Toshiba Microelectronics Corp filed Critical Toshiba Corp
Application granted granted Critical
Publication of DE69110918D1 publication Critical patent/DE69110918D1/de
Publication of DE69110918T2 publication Critical patent/DE69110918T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H01J37/3023—Programme control
    • H01J37/3026—Patterning strategy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
DE69110918T 1990-02-21 1991-02-21 Elektronenstrahlbestrahlungsapparat. Expired - Fee Related DE69110918T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2040330A JPH0779075B2 (ja) 1990-02-21 1990-02-21 電子ビーム露光装置

Publications (2)

Publication Number Publication Date
DE69110918D1 true DE69110918D1 (de) 1995-08-10
DE69110918T2 DE69110918T2 (de) 1995-12-14

Family

ID=12577608

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69110918T Expired - Fee Related DE69110918T2 (de) 1990-02-21 1991-02-21 Elektronenstrahlbestrahlungsapparat.

Country Status (5)

Country Link
US (1) US5083032A (de)
EP (1) EP0443565B1 (de)
JP (1) JPH0779075B2 (de)
KR (1) KR940009765B1 (de)
DE (1) DE69110918T2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2794793B2 (ja) * 1989-06-13 1998-09-10 ソニー株式会社 露光用マスクの製造方法
US5194741A (en) * 1991-03-20 1993-03-16 Fujitsu Limited Method for writing a pattern on an object by a focused electron beam with an improved efficiency
US6023068A (en) * 1991-05-30 2000-02-08 Canon Kabushiki Kaisha Semiconductor device manufacturing apparatus
JP2788139B2 (ja) * 1991-09-25 1998-08-20 株式会社日立製作所 電子線描画装置
JP2501726B2 (ja) * 1991-10-08 1996-05-29 インターナショナル・ビジネス・マシーンズ・コーポレイション コンピュ―タ・イメ―ジ生成装置及びデ―タ減縮方法
JP3409493B2 (ja) * 1995-03-13 2003-05-26 ソニー株式会社 マスクパターンの補正方法および補正装置
KR970006498A (ko) * 1995-07-31 1997-02-21 유충식 활성형 인성장호르몬의 정제 방법
US6674086B2 (en) * 1998-03-20 2004-01-06 Hitachi, Ltd. Electron beam lithography system, electron beam lithography apparatus, and method of lithography
JP4801268B2 (ja) * 2001-03-21 2011-10-26 ルネサスエレクトロニクス株式会社 電子ビーム露光用マスク、電子ビーム露光方法および半導体装置の製造方法
WO2005052652A2 (en) * 2003-11-25 2005-06-09 Zygo Corporation Optical fiber connectors and systems including optical fiber connectors

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57180128A (en) * 1981-04-30 1982-11-06 Toshiba Corp Equipment for electron beam exposure
USRE33193E (en) * 1981-09-30 1990-04-03 Hitachi, Ltd. Ion beam processing apparatus and method of correcting mask defects
JPS59150422A (ja) * 1983-01-31 1984-08-28 Fujitsu Ltd 露光処理方法
EP0182360B1 (de) * 1984-11-22 1989-06-28 Toshiba Machine Company Limited System zum kontinuierlichen Belichten gewünschter Muster und deren Hintergründe auf einer Target-Oberfläche
JP2540168B2 (ja) * 1987-09-25 1996-10-02 三菱電機株式会社 ビ―ム偏向位置補正装置

Also Published As

Publication number Publication date
JPH0779075B2 (ja) 1995-08-23
EP0443565A3 (en) 1992-02-26
DE69110918T2 (de) 1995-12-14
KR940009765B1 (ko) 1994-10-17
JPH03242921A (ja) 1991-10-29
EP0443565B1 (de) 1995-07-05
KR920000099A (ko) 1992-01-10
US5083032A (en) 1992-01-21
EP0443565A2 (de) 1991-08-28

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee