DE68915049T2 - Ausrichtungsverfahren in der Elektronenstrahl-Lithographie. - Google Patents
Ausrichtungsverfahren in der Elektronenstrahl-Lithographie.Info
- Publication number
- DE68915049T2 DE68915049T2 DE68915049T DE68915049T DE68915049T2 DE 68915049 T2 DE68915049 T2 DE 68915049T2 DE 68915049 T DE68915049 T DE 68915049T DE 68915049 T DE68915049 T DE 68915049T DE 68915049 T2 DE68915049 T2 DE 68915049T2
- Authority
- DE
- Germany
- Prior art keywords
- electron beam
- alignment process
- beam lithography
- lithography
- alignment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/196,397 US4871919A (en) | 1988-05-20 | 1988-05-20 | Electron beam lithography alignment using electric field changes to achieve registration |
Publications (2)
Publication Number | Publication Date |
---|---|
DE68915049D1 DE68915049D1 (de) | 1994-06-09 |
DE68915049T2 true DE68915049T2 (de) | 1994-11-17 |
Family
ID=22725239
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE68915049T Expired - Fee Related DE68915049T2 (de) | 1988-05-20 | 1989-02-23 | Ausrichtungsverfahren in der Elektronenstrahl-Lithographie. |
Country Status (4)
Country | Link |
---|---|
US (1) | US4871919A (de) |
EP (1) | EP0342316B1 (de) |
JP (1) | JPH0719743B2 (de) |
DE (1) | DE68915049T2 (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02231708A (ja) * | 1989-03-06 | 1990-09-13 | Fujitsu Ltd | 半導体装置の位置合わせマーク検出方法及び装置 |
IT1235796B (it) * | 1989-09-11 | 1992-10-26 | Josb S P A | Macchina utensile a sostituzione automatica di "attuatori multifunzione" per eseguire automaticamente una sequenza di operazioni diverse, in particolare per l'installazione di organi di collegamento per l'assemblaggio di sottoinsiemi meccanici quali strutture aeronautiche, automobilistiche, nautiche ecc |
CA2038012A1 (en) * | 1990-03-14 | 1991-09-15 | Hideki Shimizu | Oxide superconductor lamination and method of manufacturing the same |
US5053699A (en) * | 1990-05-25 | 1991-10-01 | Texas Instruments Incorporated | Scanning electron microscope based parametric testing method and apparatus |
US5703373A (en) * | 1995-11-03 | 1997-12-30 | The United States Of America As Represented By The Secretary Of The Navy | Alignment fiducial for improving patterning placement accuracy in e-beam masks for x-ray lithography |
US6008060A (en) * | 1998-04-14 | 1999-12-28 | Etec Systems, Inc. | Detecting registration marks with a low energy electron beam |
US6243209B1 (en) | 1999-05-20 | 2001-06-05 | Etec Systems, Inc. | Method and apparatus for providing rectangular shape array of light beams |
DE10142593B4 (de) * | 2001-08-31 | 2005-07-14 | Infineon Technologies Ag | Verfahren zur gegenseitigen Justierung von Strukturen auf einer Mehrebenen-Phasenschiebemaske |
DE10142592C2 (de) * | 2001-08-31 | 2003-07-10 | Infineon Technologies Ag | Verfahren zur Justierung und Belichtung der zweiten Ebene einer Phasenschiebemaske |
JP3790215B2 (ja) * | 2002-12-26 | 2006-06-28 | 株式会社東芝 | 半導体装置の製造方法及び半導体製造装置 |
JP5965345B2 (ja) * | 2013-03-29 | 2016-08-03 | 住友重機械イオンテクノロジー株式会社 | イオン注入装置のための高電圧電極の絶縁構造および高電圧絶縁方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3580749A (en) * | 1968-11-13 | 1971-05-25 | Westinghouse Electric Corp | Method and apparatus for selective etching of insulating layers |
US3710101A (en) * | 1970-10-06 | 1973-01-09 | Westinghouse Electric Corp | Apparatus and method for alignment of members to electron beams |
US3879613A (en) * | 1971-12-13 | 1975-04-22 | Philips Corp | Methods of manufacturing semiconductor devices |
US3811069A (en) * | 1972-06-20 | 1974-05-14 | Westinghouse Electric Corp | Signal stabilization of an alignment detection device |
US3832561A (en) * | 1973-10-01 | 1974-08-27 | Westinghouse Electric Corp | Method and apparatus for electron beam alignment with a substrate by schottky barrier contacts |
US3849659A (en) * | 1973-09-10 | 1974-11-19 | Westinghouse Electric Corp | Alignment of a patterned electron beam with a member by electron backscatter |
US4008402A (en) * | 1974-07-18 | 1977-02-15 | Westinghouse Electric Corporation | Method and apparatus for electron beam alignment with a member by detecting X-rays |
US4238686A (en) * | 1979-09-05 | 1980-12-09 | Bell Telephone Laboratories, Incorporated | Method of analyzing localized nonuniformities in luminescing materials |
US4407933A (en) * | 1981-06-11 | 1983-10-04 | Bell Telephone Laboratories, Incorporated | Alignment marks for electron beam lithography |
JPS58130525A (ja) * | 1982-01-28 | 1983-08-04 | Sanyo Electric Co Ltd | 電子ビ−ム露光における位置合せ法 |
JPS58180022A (ja) * | 1982-04-14 | 1983-10-21 | Sanyo Electric Co Ltd | 電子ビ−ム露光における位置合せ方法 |
-
1988
- 1988-05-20 US US07/196,397 patent/US4871919A/en not_active Expired - Fee Related
-
1989
- 1989-02-23 EP EP89103136A patent/EP0342316B1/de not_active Expired - Lifetime
- 1989-02-23 DE DE68915049T patent/DE68915049T2/de not_active Expired - Fee Related
- 1989-03-20 JP JP1066421A patent/JPH0719743B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0342316B1 (de) | 1994-05-04 |
JPH0222809A (ja) | 1990-01-25 |
JPH0719743B2 (ja) | 1995-03-06 |
US4871919A (en) | 1989-10-03 |
EP0342316A3 (en) | 1990-05-09 |
DE68915049D1 (de) | 1994-06-09 |
EP0342316A2 (de) | 1989-11-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |