DE60220850D1 - Tertiäre Amine mit einer Esterstruktur und Verfahren zu deren Herstellung - Google Patents
Tertiäre Amine mit einer Esterstruktur und Verfahren zu deren HerstellungInfo
- Publication number
- DE60220850D1 DE60220850D1 DE60220850T DE60220850T DE60220850D1 DE 60220850 D1 DE60220850 D1 DE 60220850D1 DE 60220850 T DE60220850 T DE 60220850T DE 60220850 T DE60220850 T DE 60220850T DE 60220850 D1 DE60220850 D1 DE 60220850D1
- Authority
- DE
- Germany
- Prior art keywords
- preparation
- tertiary amines
- ester structure
- ester
- amines
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C219/00—Compounds containing amino and esterified hydroxy groups bound to the same carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
- C07D307/26—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
- C07D307/30—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D307/32—Oxygen atoms
- C07D307/33—Oxygen atoms in position 2, the oxygen atom being in its keto or unsubstituted enol form
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C229/00—Compounds containing amino and carboxyl groups bound to the same carbon skeleton
- C07C229/02—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton
- C07C229/04—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated
- C07C229/06—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton
- C07C229/10—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton the nitrogen atom of the amino group being further bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
- C07C229/12—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton the nitrogen atom of the amino group being further bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings to carbon atoms of acyclic carbon skeletons
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C229/00—Compounds containing amino and carboxyl groups bound to the same carbon skeleton
- C07C229/02—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton
- C07C229/04—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated
- C07C229/06—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton
- C07C229/10—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton the nitrogen atom of the amino group being further bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
- C07C229/16—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton the nitrogen atom of the amino group being further bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings to carbon atoms of hydrocarbon radicals substituted by amino or carboxyl groups, e.g. ethylenediamine-tetra-acetic acid, iminodiacetic acids
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
- C07D307/04—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
- C07D307/10—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D307/12—Radicals substituted by oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D309/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings
- C07D309/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
- C07D309/08—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D309/10—Oxygen atoms
- C07D309/12—Oxygen atoms only hydrogen atoms and one oxygen atom directly attached to ring carbon atoms, e.g. tetrahydropyranyl ethers
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D317/00—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms
- C07D317/08—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3
- C07D317/10—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings
- C07D317/14—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D317/18—Radicals substituted by singly bound oxygen or sulfur atoms
- C07D317/24—Radicals substituted by singly bound oxygen or sulfur atoms esterified
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2601/00—Systems containing only non-condensed rings
- C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
- C07C2601/14—The ring being saturated
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001123927 | 2001-04-23 | ||
JP2001123927 | 2001-04-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60220850D1 true DE60220850D1 (de) | 2007-08-09 |
DE60220850T2 DE60220850T2 (de) | 2008-03-06 |
Family
ID=18973406
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60220850T Expired - Lifetime DE60220850T2 (de) | 2001-04-23 | 2002-04-23 | Tertiäre Amine mit einer Esterstruktur und Verfahren zu deren Herstellung |
Country Status (5)
Country | Link |
---|---|
US (2) | US7084303B2 (de) |
EP (1) | EP1253138B1 (de) |
KR (1) | KR100823815B1 (de) |
DE (1) | DE60220850T2 (de) |
TW (1) | TW588032B (de) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020142304A1 (en) * | 2001-03-09 | 2002-10-03 | Anderson Daniel G. | Uses and methods of making microarrays of polymeric biomaterials |
TWI300165B (en) * | 2003-08-13 | 2008-08-21 | Tokyo Ohka Kogyo Co Ltd | Resin for resist, positive resist composition and resist pattern formation method |
WO2005121193A1 (ja) * | 2004-06-08 | 2005-12-22 | Tokyo Ohka Kogyo Co., Ltd. | 重合体、ポジ型レジスト組成物およびレジストパターン形成方法 |
US20060003271A1 (en) * | 2004-06-30 | 2006-01-05 | Clark Shan C | Basic supercritical solutions for quenching and developing photoresists |
JP4603586B2 (ja) | 2004-12-22 | 2010-12-22 | テレコム・イタリア・エッセ・ピー・アー | インクジェットプリントヘッド用の三次元的構造体及び関連する製造方法 |
CA2611944A1 (en) | 2005-06-15 | 2006-12-28 | Massachusetts Institute Of Technology | Amine-containing lipids and uses thereof |
AU2009311667B2 (en) | 2008-11-07 | 2016-04-14 | Massachusetts Institute Of Technology | Aminoalcohol lipidoids and uses thereof |
ES2666559T3 (es) | 2009-12-01 | 2018-05-07 | Translate Bio, Inc. | Entrega del mrna para la aumentación de proteínas y enzimas en enfermedades genéticas humanas |
EP2348360B1 (de) * | 2010-01-25 | 2017-09-27 | Rohm and Haas Electronic Materials LLC | Photoresist, der eine stickstoffhaltige Verbindung umfasst |
EP2609135A4 (de) | 2010-08-26 | 2015-05-20 | Massachusetts Inst Technology | Poly(beta-amino-alkohole), ihre herstellung und verwendungen davon |
JP5527236B2 (ja) | 2011-01-31 | 2014-06-18 | 信越化学工業株式会社 | ポジ型化学増幅レジスト材料、パターン形成方法及び酸分解性ケトエステル化合物 |
WO2012135025A2 (en) | 2011-03-28 | 2012-10-04 | Massachusetts Institute Of Technology | Conjugated lipomers and uses thereof |
DE102011102177A1 (de) * | 2011-05-20 | 2012-11-22 | Airbus Operations Gmbh | Anordnung zum Erzeugen und Aufbereiten von Wasser, Verfahren zum Erzeugen und Aufbereiten von Wasser sowie Luftfahrzeug mit einer solchen Anordnung |
EP4043025A1 (de) | 2011-06-08 | 2022-08-17 | Translate Bio, Inc. | Lipidnanoteilchenzusammensetzungen und verfahren zur mrna-freisetzung |
WO2013185067A1 (en) | 2012-06-08 | 2013-12-12 | Shire Human Genetic Therapies, Inc. | Nuclease resistant polynucleotides and uses thereof |
WO2014028487A1 (en) | 2012-08-13 | 2014-02-20 | Massachusetts Institute Of Technology | Amine-containing lipidoids and uses thereof |
SG10201710253QA (en) | 2013-03-14 | 2018-01-30 | Shire Human Genetic Therapies | Cftr mrna compositions and related methods and uses |
EP3467108B1 (de) | 2013-03-14 | 2024-05-22 | Translate Bio, Inc. | Verfahren zur reinigung von messenger-rna |
WO2014179562A1 (en) | 2013-05-01 | 2014-11-06 | Massachusetts Institute Of Technology | 1,3,5-triazinane-2,4,6-trione derivatives and uses thereof |
CN112618732A (zh) | 2013-10-22 | 2021-04-09 | 夏尔人类遗传性治疗公司 | 用于递送信使rna的脂质制剂 |
ES2954366T3 (es) | 2013-10-22 | 2023-11-21 | Translate Bio Inc | Terapia de ácido ribonucleico mensajero para la deficiencia de argininosuccinato sintetasa |
CA2928186A1 (en) | 2013-10-22 | 2015-04-30 | Shire Human Genetic Therapies, Inc. | Mrna therapy for phenylketonuria |
EA201691696A1 (ru) | 2014-04-25 | 2017-03-31 | Шир Хьюман Дженетик Терапис, Инк. | Способы очистки матричной рнк |
EP3587409B8 (de) | 2014-05-30 | 2022-07-13 | Translate Bio, Inc. | Biologisch abbaubare lipide zur freisetzung von nukleinsäuren |
AU2015279968B2 (en) | 2014-06-24 | 2019-11-14 | Translate Bio, Inc. | Stereochemically enriched compositions for delivery of nucleic acids |
WO2016004202A1 (en) | 2014-07-02 | 2016-01-07 | Massachusetts Institute Of Technology | Polyamine-fatty acid derived lipidoids and uses thereof |
WO2017100744A1 (en) * | 2015-12-11 | 2017-06-15 | Preceres Inc. | Aminolipidoids and uses thereof |
EA201991747A1 (ru) | 2017-02-27 | 2020-06-04 | Транслейт Био, Инк. | НОВАЯ КОДОН-ОПТИМИЗИРОВАННАЯ мРНК CFTR |
WO2018213476A1 (en) | 2017-05-16 | 2018-11-22 | Translate Bio, Inc. | Treatment of cystic fibrosis by delivery of codon-optimized mrna encoding cftr |
US10738241B2 (en) * | 2018-01-23 | 2020-08-11 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Resin composition, cured photoresist and display panel |
CN112930396B (zh) | 2018-08-24 | 2024-05-24 | 川斯勒佰尔公司 | 用于纯化信使rna的方法 |
EP4313937A1 (de) * | 2021-04-02 | 2024-02-07 | Universiteit Gent | Ionisierbare lipide und lipidnanopartikel mit den ionisierbaren lipiden zur abgabe von therapeutischen mitteln |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2729622A (en) | 1952-04-11 | 1956-01-03 | Du Pont | Polycarboxyl- and polycarbalkoxyl-containing polymerizable quaternary ammonium monomes and their polymers |
US4001304A (en) * | 1974-05-02 | 1977-01-04 | Rohm And Haas Company | Acrylic acid esters |
US4491628A (en) | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
EP0249139B2 (de) | 1986-06-13 | 1998-03-11 | MicroSi, Inc. (a Delaware corporation) | Lackzusammensetzung und -anwendung |
JPS63149640A (ja) | 1986-12-12 | 1988-06-22 | Konica Corp | 感光性組成物および感光性平版印刷版 |
DE3784880T2 (de) * | 1986-12-24 | 1993-08-05 | Ciba Geigy Ag | N,n-bis(hydroxyaethyl)hydroxylaminester-stabilisatoren. |
US5023283A (en) * | 1986-12-24 | 1991-06-11 | Ciba-Geigy Corporation | N,N-bis(acyloxyethyl)hydroxylamine derivatives |
US5202217A (en) | 1989-08-08 | 1993-04-13 | Tosoh Corporation | Solubilization-inhibitor and positive resist composition |
EP0537524A1 (de) | 1991-10-17 | 1993-04-21 | Shipley Company Inc. | Strahlungsempfindliche Zusammensetzungen und Verfahren |
JPH05113666A (ja) | 1991-10-21 | 1993-05-07 | Nippon Zeon Co Ltd | レジスト組成物 |
US5580695A (en) | 1992-02-25 | 1996-12-03 | Japan Synthetic Rubber Co., Ltd. | Chemically amplified resist |
JP3010607B2 (ja) | 1992-02-25 | 2000-02-21 | ジェイエスアール株式会社 | 感放射線性樹脂組成物 |
US5609989A (en) | 1995-06-06 | 1997-03-11 | International Business Machines, Corporation | Acid scavengers for use in chemically amplified photoresists |
WO1998037458A1 (fr) | 1997-02-20 | 1998-08-27 | Nippon Zeon Co., Ltd. | Composition d'un agent de reserve |
JP3905257B2 (ja) * | 1999-08-24 | 2007-04-18 | 独立行政法人科学技術振興機構 | 新規なジオール化合物及びその製造法 |
JP3751518B2 (ja) | 1999-10-29 | 2006-03-01 | 信越化学工業株式会社 | 化学増幅レジスト組成物 |
US6673511B1 (en) * | 1999-10-29 | 2004-01-06 | Shin-Etsu Chemical Co., Ltd. | Resist composition |
-
2002
- 2002-04-22 US US10/127,120 patent/US7084303B2/en not_active Expired - Lifetime
- 2002-04-22 KR KR1020020022005A patent/KR100823815B1/ko active IP Right Grant
- 2002-04-22 TW TW091108255A patent/TW588032B/zh not_active IP Right Cessation
- 2002-04-23 EP EP02252827A patent/EP1253138B1/de not_active Expired - Fee Related
- 2002-04-23 DE DE60220850T patent/DE60220850T2/de not_active Expired - Lifetime
-
2006
- 2006-06-12 US US11/423,524 patent/US7378548B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE60220850T2 (de) | 2008-03-06 |
US7084303B2 (en) | 2006-08-01 |
KR100823815B1 (ko) | 2008-04-21 |
EP1253138A2 (de) | 2002-10-30 |
US20060217570A1 (en) | 2006-09-28 |
TW588032B (en) | 2004-05-21 |
EP1253138B1 (de) | 2007-06-27 |
EP1253138A3 (de) | 2003-09-24 |
US7378548B2 (en) | 2008-05-27 |
KR20020082150A (ko) | 2002-10-30 |
US20020193622A1 (en) | 2002-12-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |