DE60220850D1 - Tertiäre Amine mit einer Esterstruktur und Verfahren zu deren Herstellung - Google Patents
Tertiäre Amine mit einer Esterstruktur und Verfahren zu deren HerstellungInfo
- Publication number
- DE60220850D1 DE60220850D1 DE60220850T DE60220850T DE60220850D1 DE 60220850 D1 DE60220850 D1 DE 60220850D1 DE 60220850 T DE60220850 T DE 60220850T DE 60220850 T DE60220850 T DE 60220850T DE 60220850 D1 DE60220850 D1 DE 60220850D1
- Authority
- DE
- Germany
- Prior art keywords
- preparation
- tertiary amines
- ester structure
- ester
- amines
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C219/00—Compounds containing amino and esterified hydroxy groups bound to the same carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
- C07D307/26—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
- C07D307/30—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D307/32—Oxygen atoms
- C07D307/33—Oxygen atoms in position 2, the oxygen atom being in its keto or unsubstituted enol form
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C229/00—Compounds containing amino and carboxyl groups bound to the same carbon skeleton
- C07C229/02—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton
- C07C229/04—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated
- C07C229/06—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton
- C07C229/10—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton the nitrogen atom of the amino group being further bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
- C07C229/12—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton the nitrogen atom of the amino group being further bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings to carbon atoms of acyclic carbon skeletons
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C229/00—Compounds containing amino and carboxyl groups bound to the same carbon skeleton
- C07C229/02—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton
- C07C229/04—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated
- C07C229/06—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton
- C07C229/10—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton the nitrogen atom of the amino group being further bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
- C07C229/16—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton the nitrogen atom of the amino group being further bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings to carbon atoms of hydrocarbon radicals substituted by amino or carboxyl groups, e.g. ethylenediamine-tetra-acetic acid, iminodiacetic acids
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
- C07D307/04—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
- C07D307/10—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D307/12—Radicals substituted by oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D309/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings
- C07D309/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
- C07D309/08—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D309/10—Oxygen atoms
- C07D309/12—Oxygen atoms only hydrogen atoms and one oxygen atom directly attached to ring carbon atoms, e.g. tetrahydropyranyl ethers
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D317/00—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms
- C07D317/08—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3
- C07D317/10—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings
- C07D317/14—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D317/18—Radicals substituted by singly bound oxygen or sulfur atoms
- C07D317/24—Radicals substituted by singly bound oxygen or sulfur atoms esterified
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2601/00—Systems containing only non-condensed rings
- C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
- C07C2601/14—The ring being saturated
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001123927 | 2001-04-23 | ||
JP2001123927 | 2001-04-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60220850D1 true DE60220850D1 (de) | 2007-08-09 |
DE60220850T2 DE60220850T2 (de) | 2008-03-06 |
Family
ID=18973406
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60220850T Expired - Lifetime DE60220850T2 (de) | 2001-04-23 | 2002-04-23 | Tertiäre Amine mit einer Esterstruktur und Verfahren zu deren Herstellung |
Country Status (5)
Country | Link |
---|---|
US (2) | US7084303B2 (de) |
EP (1) | EP1253138B1 (de) |
KR (1) | KR100823815B1 (de) |
DE (1) | DE60220850T2 (de) |
TW (1) | TW588032B (de) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020142304A1 (en) * | 2001-03-09 | 2002-10-03 | Anderson Daniel G. | Uses and methods of making microarrays of polymeric biomaterials |
TWI300165B (en) * | 2003-08-13 | 2008-08-21 | Tokyo Ohka Kogyo Co Ltd | Resin for resist, positive resist composition and resist pattern formation method |
WO2005121193A1 (ja) * | 2004-06-08 | 2005-12-22 | Tokyo Ohka Kogyo Co., Ltd. | 重合体、ポジ型レジスト組成物およびレジストパターン形成方法 |
US20060003271A1 (en) * | 2004-06-30 | 2006-01-05 | Clark Shan C | Basic supercritical solutions for quenching and developing photoresists |
JP4603586B2 (ja) * | 2004-12-22 | 2010-12-22 | テレコム・イタリア・エッセ・ピー・アー | インクジェットプリントヘッド用の三次元的構造体及び関連する製造方法 |
EP1912679A4 (de) | 2005-06-15 | 2009-07-29 | Massachusetts Inst Technology | Aminhaltige lipide und ihre verwendungen |
JP6087504B2 (ja) | 2008-11-07 | 2017-03-01 | マサチューセッツ インスティテュート オブ テクノロジー | アミノアルコールリピドイドおよびその使用 |
NZ700688A (en) | 2009-12-01 | 2016-02-26 | Shire Human Genetic Therapies | Delivery of mrna for the augmentation of proteins and enzymes in human genetic diseases |
TWI507462B (zh) * | 2010-01-25 | 2015-11-11 | 羅門哈斯電子材料有限公司 | 包含有含氮化合物之光阻 |
WO2012027675A2 (en) | 2010-08-26 | 2012-03-01 | Massachusetts Institute Of Technology | Poly(beta-amino alcohols), their preparation, and uses thereof |
JP5527236B2 (ja) | 2011-01-31 | 2014-06-18 | 信越化学工業株式会社 | ポジ型化学増幅レジスト材料、パターン形成方法及び酸分解性ケトエステル化合物 |
EP2691443B1 (de) | 2011-03-28 | 2021-02-17 | Massachusetts Institute of Technology | Konjugierte lipomers und ihre verwendung |
DE102011102177A1 (de) * | 2011-05-20 | 2012-11-22 | Airbus Operations Gmbh | Anordnung zum Erzeugen und Aufbereiten von Wasser, Verfahren zum Erzeugen und Aufbereiten von Wasser sowie Luftfahrzeug mit einer solchen Anordnung |
JP6184945B2 (ja) | 2011-06-08 | 2017-08-23 | シャイアー ヒューマン ジェネティック セラピーズ インコーポレイテッド | mRNA送達のための脂質ナノ粒子組成物および方法 |
EP3536787A1 (de) | 2012-06-08 | 2019-09-11 | Translate Bio, Inc. | Nukleaseresistente polynukleotide und verwendungen davon |
CA2884870C (en) | 2012-08-13 | 2022-03-29 | Massachusetts Institute Of Technology | Amine-containing lipidoids and uses thereof |
EP2970955B1 (de) | 2013-03-14 | 2018-11-14 | Translate Bio, Inc. | Verfahren zur reinigung von messenger-rna |
EA037922B1 (ru) | 2013-03-14 | 2021-06-07 | Шир Хьюман Дженетик Терапис, Инк. | мРНК CFTR И КОМПОЗИЦИИ ДЛЯ ЛЕЧЕНИЯ МУКОВИСЦИДОЗА У МЛЕКОПИТАЮЩЕГО |
US9315472B2 (en) | 2013-05-01 | 2016-04-19 | Massachusetts Institute Of Technology | 1,3,5-triazinane-2,4,6-trione derivatives and uses thereof |
CA2928186A1 (en) | 2013-10-22 | 2015-04-30 | Shire Human Genetic Therapies, Inc. | Mrna therapy for phenylketonuria |
EP3060257B1 (de) | 2013-10-22 | 2021-02-24 | Translate Bio, Inc. | Lipidzusammensetzungen zur verabreichung von mrna |
ES2954366T3 (es) | 2013-10-22 | 2023-11-21 | Translate Bio Inc | Terapia de ácido ribonucleico mensajero para la deficiencia de argininosuccinato sintetasa |
ES2750661T3 (es) | 2014-04-25 | 2020-03-26 | Translate Bio Inc | Métodos para la purificación de ARN mensajero |
JP6557722B2 (ja) | 2014-05-30 | 2019-08-07 | シャイアー ヒューマン ジェネティック セラピーズ インコーポレイテッド | 核酸の送達のための生分解性脂質 |
ES2964588T3 (es) | 2014-06-24 | 2024-04-08 | Translate Bio Inc | Composiciones enriquecidas estereoquímicamente para la administración de ácidos nucleicos |
US9840479B2 (en) | 2014-07-02 | 2017-12-12 | Massachusetts Institute Of Technology | Polyamine-fatty acid derived lipidoids and uses thereof |
WO2017100744A1 (en) * | 2015-12-11 | 2017-06-15 | Preceres Inc. | Aminolipidoids and uses thereof |
MX2019010155A (es) | 2017-02-27 | 2020-12-10 | Translate Bio Inc | Arnm de cftr optimizado por codón novedoso. |
IL270631B2 (en) | 2017-05-16 | 2024-03-01 | Translate Bio Inc | Treatment of cystic fibrosis through the administration of mRNA with an optimal codon encoding ctfr |
US10738241B2 (en) * | 2018-01-23 | 2020-08-11 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Resin composition, cured photoresist and display panel |
CN112930396B (zh) | 2018-08-24 | 2024-05-24 | 川斯勒佰尔公司 | 用于纯化信使rna的方法 |
WO2022207938A1 (en) * | 2021-04-02 | 2022-10-06 | Universiteit Gent | Ionizable lipids and lipid nanoparticles comprising said ionizable lipids for delivery of therapeutic agents |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2729622A (en) | 1952-04-11 | 1956-01-03 | Du Pont | Polycarboxyl- and polycarbalkoxyl-containing polymerizable quaternary ammonium monomes and their polymers |
US4001304A (en) * | 1974-05-02 | 1977-01-04 | Rohm And Haas Company | Acrylic acid esters |
US4491628A (en) | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
DE3750275T3 (de) | 1986-06-13 | 1998-10-01 | Microsi Inc | Lackzusammensetzung und -anwendung. |
JPS63149640A (ja) | 1986-12-12 | 1988-06-22 | Konica Corp | 感光性組成物および感光性平版印刷版 |
US5023283A (en) * | 1986-12-24 | 1991-06-11 | Ciba-Geigy Corporation | N,N-bis(acyloxyethyl)hydroxylamine derivatives |
EP0273011B1 (de) * | 1986-12-24 | 1993-03-17 | Ciba-Geigy Ag | N,N-bis(hydroxyäthyl)hydroxylaminester-Stabilisatoren |
US5202217A (en) | 1989-08-08 | 1993-04-13 | Tosoh Corporation | Solubilization-inhibitor and positive resist composition |
EP0537524A1 (de) | 1991-10-17 | 1993-04-21 | Shipley Company Inc. | Strahlungsempfindliche Zusammensetzungen und Verfahren |
JPH05113666A (ja) | 1991-10-21 | 1993-05-07 | Nippon Zeon Co Ltd | レジスト組成物 |
US5580695A (en) | 1992-02-25 | 1996-12-03 | Japan Synthetic Rubber Co., Ltd. | Chemically amplified resist |
JP3010607B2 (ja) | 1992-02-25 | 2000-02-21 | ジェイエスアール株式会社 | 感放射線性樹脂組成物 |
US5609989A (en) | 1995-06-06 | 1997-03-11 | International Business Machines, Corporation | Acid scavengers for use in chemically amplified photoresists |
WO1998037458A1 (fr) | 1997-02-20 | 1998-08-27 | Nippon Zeon Co., Ltd. | Composition d'un agent de reserve |
JP3905257B2 (ja) * | 1999-08-24 | 2007-04-18 | 独立行政法人科学技術振興機構 | 新規なジオール化合物及びその製造法 |
US6673511B1 (en) * | 1999-10-29 | 2004-01-06 | Shin-Etsu Chemical Co., Ltd. | Resist composition |
JP3751518B2 (ja) | 1999-10-29 | 2006-03-01 | 信越化学工業株式会社 | 化学増幅レジスト組成物 |
-
2002
- 2002-04-22 TW TW091108255A patent/TW588032B/zh not_active IP Right Cessation
- 2002-04-22 KR KR1020020022005A patent/KR100823815B1/ko active IP Right Grant
- 2002-04-22 US US10/127,120 patent/US7084303B2/en not_active Expired - Lifetime
- 2002-04-23 EP EP02252827A patent/EP1253138B1/de not_active Expired - Fee Related
- 2002-04-23 DE DE60220850T patent/DE60220850T2/de not_active Expired - Lifetime
-
2006
- 2006-06-12 US US11/423,524 patent/US7378548B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE60220850T2 (de) | 2008-03-06 |
EP1253138A2 (de) | 2002-10-30 |
EP1253138B1 (de) | 2007-06-27 |
US7084303B2 (en) | 2006-08-01 |
EP1253138A3 (de) | 2003-09-24 |
KR20020082150A (ko) | 2002-10-30 |
US20020193622A1 (en) | 2002-12-19 |
KR100823815B1 (ko) | 2008-04-21 |
TW588032B (en) | 2004-05-21 |
US7378548B2 (en) | 2008-05-27 |
US20060217570A1 (en) | 2006-09-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |