DE60218755T2 - Verfahren zur herstellung von strukturen auf nanomassstab in lichtaushärtbaren zusammensetzungen mit einem elektrischen feld - Google Patents

Verfahren zur herstellung von strukturen auf nanomassstab in lichtaushärtbaren zusammensetzungen mit einem elektrischen feld Download PDF

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Publication number
DE60218755T2
DE60218755T2 DE60218755T DE60218755T DE60218755T2 DE 60218755 T2 DE60218755 T2 DE 60218755T2 DE 60218755 T DE60218755 T DE 60218755T DE 60218755 T DE60218755 T DE 60218755T DE 60218755 T2 DE60218755 T2 DE 60218755T2
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DE
Germany
Prior art keywords
polymerizable composition
substrate
template
electric field
templet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60218755T
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German (de)
English (en)
Other versions
DE60218755D1 (de
Inventor
C. Grant Austin WILLSON
S.V. Austin SREENIVASAN
Roger T. Austin BONNECAZE
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
The University of Texas System
The University of Texas at Austin
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The University of Texas System
The University of Texas at Austin
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Filing date
Publication date
Application filed by The University of Texas System, The University of Texas at Austin filed Critical The University of Texas System
Application granted granted Critical
Publication of DE60218755D1 publication Critical patent/DE60218755D1/de
Publication of DE60218755T2 publication Critical patent/DE60218755T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Landscapes

  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Polymerisation Methods In General (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Moulding By Coating Moulds (AREA)
DE60218755T 2001-05-16 2002-05-16 Verfahren zur herstellung von strukturen auf nanomassstab in lichtaushärtbaren zusammensetzungen mit einem elektrischen feld Expired - Fee Related DE60218755T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US29166401P 2001-05-16 2001-05-16
US291664P 2001-05-16
PCT/US2002/015551 WO2004063815A2 (en) 2001-05-16 2002-05-16 Method and system for fabricating nanoscale patterns in light curable compositions using an electric field

Publications (2)

Publication Number Publication Date
DE60218755D1 DE60218755D1 (de) 2007-04-19
DE60218755T2 true DE60218755T2 (de) 2007-11-15

Family

ID=32710708

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60218755T Expired - Fee Related DE60218755T2 (de) 2001-05-16 2002-05-16 Verfahren zur herstellung von strukturen auf nanomassstab in lichtaushärtbaren zusammensetzungen mit einem elektrischen feld

Country Status (7)

Country Link
EP (1) EP1512048B1 (cg-RX-API-DMAC10.html)
JP (1) JP2005520220A (cg-RX-API-DMAC10.html)
CN (1) CN1729428A (cg-RX-API-DMAC10.html)
AT (1) ATE356374T1 (cg-RX-API-DMAC10.html)
AU (1) AU2002368430A1 (cg-RX-API-DMAC10.html)
DE (1) DE60218755T2 (cg-RX-API-DMAC10.html)
WO (1) WO2004063815A2 (cg-RX-API-DMAC10.html)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY144124A (en) * 2002-07-11 2011-08-15 Molecular Imprints Inc Step and repeat imprint lithography systems
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6871558B2 (en) 2002-12-12 2005-03-29 Molecular Imprints, Inc. Method for determining characteristics of substrate employing fluid geometries
US7122079B2 (en) 2004-02-27 2006-10-17 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
US7654816B2 (en) * 2004-10-07 2010-02-02 Hewlett-Packard Development Company, L.P. Lithographic mask alignment
CN100395121C (zh) * 2004-11-19 2008-06-18 鸿富锦精密工业（深圳）有限公司 热压印方法
JP4742665B2 (ja) * 2005-04-28 2011-08-10 旭硝子株式会社 エッチング処理された処理基板の製造方法
JP4736522B2 (ja) * 2005-04-28 2011-07-27 旭硝子株式会社 エッチング処理された処理基板の製造方法
JP5002211B2 (ja) * 2005-08-12 2012-08-15 キヤノン株式会社 インプリント装置およびインプリント方法
JP5268239B2 (ja) * 2005-10-18 2013-08-21 キヤノン株式会社 パターン形成装置、パターン形成方法
DE102006007800B3 (de) * 2006-02-20 2007-10-04 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Strukturierungsverfahren und Bauteil mit einer strukturierten Oberfläche
CN101496106A (zh) * 2006-07-28 2009-07-29 国际商业机器公司 用于使聚合物层的表面图案化的器件和方法
KR101322133B1 (ko) * 2006-11-24 2013-10-25 엘지디스플레이 주식회사 임프린트 리소그래피용 스탬프 및 이를 이용한 임프린트리소그래피 방법
CN101446762B (zh) * 2008-12-31 2011-07-27 西安交通大学 非接触式模板约束下的电场诱导微复型方法
CN102253435A (zh) * 2011-07-11 2011-11-23 西安交通大学 一种利用电场诱导制造聚合物柱面微透镜的微加工方法
JP5328869B2 (ja) * 2011-10-21 2013-10-30 東芝機械株式会社 転写用の型の製造方法
JP6273860B2 (ja) * 2014-01-27 2018-02-07 大日本印刷株式会社 インプリントモールド及び半導体デバイスの製造方法
JP6980478B2 (ja) * 2017-09-29 2021-12-15 キヤノン株式会社 インプリント装置、インプリント方法および物品の製造方法
NL2021092B1 (en) * 2018-06-08 2019-12-13 Qlayers Holding B V Application of a coating on a base structure
CN109188862A (zh) 2018-10-11 2019-01-11 京东方科技集团股份有限公司 压印结构及其制造方法、压印模板

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1068535B (it) * 1975-11-03 1985-03-21 Ibm Apparecchio e processo elettrolito grafico
WO2000021689A1 (en) * 1998-10-09 2000-04-20 The Trustees Of Princeton University Microscale patterning and articles formed thereby
CA2395760A1 (en) * 1999-12-23 2001-06-28 University Of Massachusetts Methods and apparatus for forming submicron patterns on films

Also Published As

Publication number Publication date
AU2002368430A1 (en) 2004-08-10
WO2004063815A2 (en) 2004-07-29
CN1729428A (zh) 2006-02-01
JP2005520220A (ja) 2005-07-07
EP1512048A2 (en) 2005-03-09
WO2004063815A3 (en) 2004-12-29
ATE356374T1 (de) 2007-03-15
EP1512048B1 (en) 2007-03-07
DE60218755D1 (de) 2007-04-19

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8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: PUSCHMANN & BORCHERT, 82041 OBERHACHING

8339 Ceased/non-payment of the annual fee