DE60216838D1 - Magnetoresistives Element,Speicherelement mit dieses magnetoresistiven Element,und Aufnahme/Wiedergabe-Verfahren für das Speicherelement - Google Patents

Magnetoresistives Element,Speicherelement mit dieses magnetoresistiven Element,und Aufnahme/Wiedergabe-Verfahren für das Speicherelement

Info

Publication number
DE60216838D1
DE60216838D1 DE60216838T DE60216838T DE60216838D1 DE 60216838 D1 DE60216838 D1 DE 60216838D1 DE 60216838 T DE60216838 T DE 60216838T DE 60216838 T DE60216838 T DE 60216838T DE 60216838 D1 DE60216838 D1 DE 60216838D1
Authority
DE
Germany
Prior art keywords
magnetoresistive
memory element
memory
recording
reproducing method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60216838T
Other languages
English (en)
Other versions
DE60216838T2 (de
Inventor
Naoki Nishimura
Takashi Ikeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2001078470A external-priority patent/JP3658331B2/ja
Priority claimed from JP2001078472A external-priority patent/JP3634761B2/ja
Priority claimed from JP2001369769A external-priority patent/JP4065486B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE60216838D1 publication Critical patent/DE60216838D1/de
Application granted granted Critical
Publication of DE60216838T2 publication Critical patent/DE60216838T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/14Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements
    • G11C11/15Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements using multiple magnetic layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/32Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3254Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the spacer being semiconducting or insulating, e.g. for spin tunnel junction [STJ]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/32Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3268Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn
    • H01F10/3272Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn by use of anti-parallel coupled [APC] ferromagnetic layers, e.g. artificial ferrimagnets [AFI], artificial [AAF] or synthetic [SAF] anti-ferromagnets
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/32Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3286Spin-exchange coupled multilayers having at least one layer with perpendicular magnetic anisotropy
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B61/00Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
    • H10B61/20Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having three or more electrodes, e.g. transistors
    • H10B61/22Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having three or more electrodes, e.g. transistors of the field-effect transistor [FET] type
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00Galvanomagnetic devices
    • H10N50/10Magnetoresistive devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Nanotechnology (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Mram Or Spin Memory Techniques (AREA)
  • Hall/Mr Elements (AREA)
  • Semiconductor Memories (AREA)
DE60216838T 2001-03-19 2002-03-18 Magnetoresistives Element,Speicherelement mit dieses magnetoresistiven Element,und Aufnahme/Wiedergabe-Verfahren für das Speicherelement Expired - Lifetime DE60216838T2 (de)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2001078470A JP3658331B2 (ja) 2001-03-19 2001-03-19 メモリ素子の記録再生方法、磁気抵抗素子及び磁気ランダムアクセスメモリ
JP2001078472 2001-03-19
JP2001078472A JP3634761B2 (ja) 2001-03-19 2001-03-19 磁気抵抗素子、該磁気抵抗素子を用いたメモリ素子及び磁気ランダムアクセスメモリ、並びに記録再生方法
JP2001078470 2001-03-19
JP2001369769A JP4065486B2 (ja) 2001-12-04 2001-12-04 磁気抵抗効果膜の製造方法
JP2001369769 2001-12-04

Publications (2)

Publication Number Publication Date
DE60216838D1 true DE60216838D1 (de) 2007-02-01
DE60216838T2 DE60216838T2 (de) 2007-09-06

Family

ID=27346283

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60216838T Expired - Lifetime DE60216838T2 (de) 2001-03-19 2002-03-18 Magnetoresistives Element,Speicherelement mit dieses magnetoresistiven Element,und Aufnahme/Wiedergabe-Verfahren für das Speicherelement

Country Status (6)

Country Link
US (1) US6713830B2 (de)
EP (1) EP1244117B1 (de)
KR (1) KR100502113B1 (de)
CN (1) CN100490003C (de)
DE (1) DE60216838T2 (de)
TW (1) TWI272610B (de)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6724674B2 (en) * 2000-11-08 2004-04-20 International Business Machines Corporation Memory storage device with heating element
US6721201B2 (en) 2001-08-30 2004-04-13 Canon Kabushiki Kaisha Magnetoresistive film and memory using the same
JP2003086775A (ja) 2001-09-07 2003-03-20 Canon Inc 磁気メモリ装置およびその製造方法
US6841395B2 (en) * 2002-11-25 2005-01-11 International Business Machines Corporation Method of forming a barrier layer of a tunneling magnetoresistive sensor
US6845038B1 (en) 2003-02-01 2005-01-18 Alla Mikhailovna Shukh Magnetic tunnel junction memory device
JP4086731B2 (ja) * 2003-07-16 2008-05-14 キヤノン株式会社 画像出力装置及びその制御方法、プリンタおよびその制御方法
US7221582B2 (en) * 2003-08-27 2007-05-22 Hewlett-Packard Development Company, L.P. Method and system for controlling write current in magnetic memory
JP2005079258A (ja) * 2003-08-29 2005-03-24 Canon Inc 磁性体のエッチング加工方法、磁気抵抗効果膜、および磁気ランダムアクセスメモリ
US6967863B2 (en) * 2004-02-25 2005-11-22 Grandis, Inc. Perpendicular magnetization magnetic element utilizing spin transfer
US7706179B2 (en) * 2004-08-04 2010-04-27 The Florida International University Board Of Trustees Three dimensional magnetic memory and/or recording device
US7075807B2 (en) * 2004-08-18 2006-07-11 Infineon Technologies Ag Magnetic memory with static magnetic offset field
EP1667116B1 (de) * 2004-11-05 2007-01-17 SkiData AG Vorrichtung zum Beschreiben einer Magnetschicht
US7602591B2 (en) * 2005-06-22 2009-10-13 Tdk Corporation Exchange-coupled free layer with out-of-plane magnetization
US8582252B2 (en) * 2005-11-02 2013-11-12 Seagate Technology Llc Magnetic layer with grain refining agent
US7755153B2 (en) * 2006-01-13 2010-07-13 Macronix International Co. Ltd. Structure and method for a magnetic memory device with proximity writing
TWI304586B (en) * 2006-03-20 2008-12-21 Univ Nat Yunlin Sci & Tech System for reducing critical current of magnetic random access memory
US20080173975A1 (en) * 2007-01-22 2008-07-24 International Business Machines Corporation Programmable resistor, switch or vertical memory cell
US7596017B2 (en) * 2007-02-27 2009-09-29 National Yunlin University Of Science And Technology Magnetic random access memory and method of reducing critical current of the same
WO2009001706A1 (ja) * 2007-06-25 2008-12-31 Nec Corporation 磁気抵抗効果素子、および磁気ランダムアクセスメモリ
US8194436B2 (en) * 2007-09-19 2012-06-05 Nec Corporation Magnetic random access memory, write method therefor, and magnetoresistance effect element
US7859025B2 (en) * 2007-12-06 2010-12-28 International Business Machines Corporation Metal ion transistor
US7929258B2 (en) * 2008-01-22 2011-04-19 Seagate Technology Llc Magnetic sensor including a free layer having perpendicular to the plane anisotropy
US8223533B2 (en) * 2008-09-26 2012-07-17 Kabushiki Kaisha Toshiba Magnetoresistive effect device and magnetic memory
JP5316967B2 (ja) 2008-12-02 2013-10-16 富士電機株式会社 磁気メモリー素子及び不揮発性記憶装置
JP4915626B2 (ja) * 2009-03-18 2012-04-11 株式会社東芝 磁気抵抗効果素子および磁気ランダムアクセスメモリ
EP2434540A4 (de) * 2009-05-19 2014-12-03 Fuji Electric Co Ltd Magnetisches speicherelement und speichervorrichtung damit
JP5542831B2 (ja) * 2009-09-24 2014-07-09 株式会社東芝 磁気メモリ
JP5214691B2 (ja) 2010-09-17 2013-06-19 株式会社東芝 磁気メモリ及びその製造方法
JP5542761B2 (ja) * 2011-09-20 2014-07-09 株式会社東芝 磁気抵抗効果素子およびその製造方法
JP5535161B2 (ja) * 2011-09-20 2014-07-02 株式会社東芝 磁気抵抗効果素子およびその製造方法
JP5665707B2 (ja) * 2011-09-21 2015-02-04 株式会社東芝 磁気抵抗効果素子、磁気メモリ及び磁気抵抗効果素子の製造方法
EP2605246B1 (de) * 2011-12-12 2015-02-11 Crocus Technology S.A. Selbstbezogenes Magnetdirektzugriffsspeicherelement mit einer synthetischen Speicherschicht
EP2608208B1 (de) * 2011-12-22 2015-02-11 Crocus Technology S.A. Selbstbezogene MRAM-Zelle und Verfahren zum Beschreiben der Zelle unter Verwendung eines SST-Vorgangs
US8981503B2 (en) * 2012-03-16 2015-03-17 Headway Technologies, Inc. STT-MRAM reference layer having substantially reduced stray field and consisting of a single magnetic domain
JP5542856B2 (ja) * 2012-03-21 2014-07-09 株式会社東芝 磁気抵抗効果素子及び磁気メモリ
KR101446338B1 (ko) * 2012-07-17 2014-10-01 삼성전자주식회사 자기 소자 및 그 제조 방법
US9041130B2 (en) 2013-09-09 2015-05-26 Kabushiki Kaisha Toshiba Magnetic memory device
US9123879B2 (en) 2013-09-09 2015-09-01 Masahiko Nakayama Magnetoresistive element and method of manufacturing the same
US9231196B2 (en) 2013-09-10 2016-01-05 Kuniaki SUGIURA Magnetoresistive element and method of manufacturing the same
US9385304B2 (en) 2013-09-10 2016-07-05 Kabushiki Kaisha Toshiba Magnetic memory and method of manufacturing the same
US9368717B2 (en) 2013-09-10 2016-06-14 Kabushiki Kaisha Toshiba Magnetoresistive element and method for manufacturing the same
US9299917B2 (en) * 2013-09-30 2016-03-29 Northwestern University Magnetic tunnel junctions with control wire
RU2561232C1 (ru) * 2014-06-17 2015-08-27 Федеральное государственное бюджетное учреждение науки институт физики им. Л.В. Киренского Сибирского отделения Российской академии наук Чувствительный элемент на основе магнитоимпеданса
US20170263678A1 (en) * 2016-03-11 2017-09-14 Kabushiki Kaisha Toshiba Magnetic memory device
JP2017224372A (ja) 2016-06-16 2017-12-21 東芝メモリ株式会社 磁気メモリ装置
JP2018037513A (ja) 2016-08-31 2018-03-08 東芝メモリ株式会社 半導体装置
CN106772147B (zh) * 2016-11-18 2019-03-19 清华大学 一种中大磁场全象限测量方法
CN107587109B (zh) * 2017-08-21 2019-06-04 华侨大学 具有高垂直偏置场及大翻转场平台的复合多层膜结构

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5173873A (en) * 1990-06-28 1992-12-22 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration High speed magneto-resistive random access memory
EP0686970A3 (de) * 1994-06-10 1996-07-24 Canon Kk Magneto-optisches Aufzeichnungsmedium und Wiedergabemethode dafür
JPH08106660A (ja) * 1994-10-05 1996-04-23 Canon Inc 光磁気記録媒体及び該媒体を用いた情報再生方法
JP3679593B2 (ja) * 1998-01-28 2005-08-03 キヤノン株式会社 磁性薄膜素子および磁性薄膜メモリ素子およびその記録再生方法
US5930164A (en) * 1998-02-26 1999-07-27 Motorola, Inc. Magnetic memory unit having four states and operating method thereof
EP0959475A3 (de) * 1998-05-18 2000-11-08 Canon Kabushiki Kaisha Magnetischer Dünnfilmspeicher sowie Schreibe- und Leseverfahren und Anordnung unter Verwendung solchen Speichers
US6055179A (en) * 1998-05-19 2000-04-25 Canon Kk Memory device utilizing giant magnetoresistance effect
EP0971423A1 (de) * 1998-07-10 2000-01-12 Interuniversitair Micro-Elektronica Centrum Vzw Spin-Valve-Struktur und Herstellungsverfahren
DE19917036C2 (de) * 1999-04-15 2002-11-14 Werner Schmitz Sprossenfenster
JP3559722B2 (ja) * 1999-04-16 2004-09-02 キヤノン株式会社 磁気抵抗素子、固体メモリ
EP1115164B1 (de) * 2000-01-07 2005-05-25 Sharp Kabushiki Kaisha Magnetoresistive Anordnung und diese verwendendes magnetisches Speicherelement
US6172904B1 (en) * 2000-01-27 2001-01-09 Hewlett-Packard Company Magnetic memory cell with symmetric switching characteristics
JP2003526911A (ja) 2000-03-09 2003-09-09 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 結合層を備える磁気装置並びにそのような装置を製造及び作動させる方法

Also Published As

Publication number Publication date
US6713830B2 (en) 2004-03-30
EP1244117A3 (de) 2003-07-16
KR100502113B1 (ko) 2005-07-19
EP1244117A2 (de) 2002-09-25
CN100490003C (zh) 2009-05-20
US20020167059A1 (en) 2002-11-14
EP1244117B1 (de) 2006-12-20
CN1389870A (zh) 2003-01-08
TWI272610B (en) 2007-02-01
KR20030009084A (ko) 2003-01-29
DE60216838T2 (de) 2007-09-06

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