DE60210381D1 - Verfahren zur Registrierung einer Kennung und Photomaskensatz - Google Patents

Verfahren zur Registrierung einer Kennung und Photomaskensatz

Info

Publication number
DE60210381D1
DE60210381D1 DE60210381T DE60210381T DE60210381D1 DE 60210381 D1 DE60210381 D1 DE 60210381D1 DE 60210381 T DE60210381 T DE 60210381T DE 60210381 T DE60210381 T DE 60210381T DE 60210381 D1 DE60210381 D1 DE 60210381D1
Authority
DE
Germany
Prior art keywords
registering
identifier
photomask set
photomask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60210381T
Other languages
English (en)
Inventor
Taisuke Hirooka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Metals Ltd
Original Assignee
Neomax Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Neomax Co Ltd filed Critical Neomax Co Ltd
Application granted granted Critical
Publication of DE60210381D1 publication Critical patent/DE60210381D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
DE60210381T 2001-08-09 2002-08-06 Verfahren zur Registrierung einer Kennung und Photomaskensatz Expired - Lifetime DE60210381D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001241662 2001-08-09

Publications (1)

Publication Number Publication Date
DE60210381D1 true DE60210381D1 (de) 2006-05-18

Family

ID=19072065

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60210381T Expired - Lifetime DE60210381D1 (de) 2001-08-09 2002-08-06 Verfahren zur Registrierung einer Kennung und Photomaskensatz

Country Status (3)

Country Link
US (1) US6924090B2 (de)
EP (1) EP1286219B1 (de)
DE (1) DE60210381D1 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6924090B2 (en) 2001-08-09 2005-08-02 Neomax Co., Ltd. Method of recording identifier and set of photomasks
JP2003076026A (ja) * 2001-09-05 2003-03-14 Sumitomo Special Metals Co Ltd 識別情報記録方法およびフォトマスクセット
WO2003028072A1 (fr) * 2001-09-20 2003-04-03 Renesas Technology Corp. Procede de fabrication de dispositif semi-conducteur
JP3614418B2 (ja) * 2002-10-04 2005-01-26 株式会社Ｎｅｏｍａｘ 薄膜磁気ヘッド用基板およびその製造方法
JP3958199B2 (ja) * 2002-12-10 2007-08-15 株式会社東芝 半導体装置及び半導体装置の製造方法
US7303844B2 (en) * 2004-03-31 2007-12-04 Silicon Labs Cp, Inc. Marking system for a semiconductor wafer to identify problems in mask layers
GB2420002B (en) * 2004-05-17 2008-12-10 Neomax Co Ltd Substrate for thin film magnetic head and method for manufacturing same
JP4268951B2 (ja) * 2005-04-06 2009-05-27 Ｔｄｋ株式会社 ウェハにおける識別情報記入方法
JP4838061B2 (ja) * 2006-02-10 2011-12-14 ラピスセミコンダクタ株式会社 半導体集積回路におけるチップｉｄ付加方法
KR100750802B1 (ko) * 2006-07-27 2007-08-20 동부일렉트로닉스 주식회사 반도체 소자 및 그 제조방법
US20080218900A1 (en) * 2007-03-09 2008-09-11 Tdk Corporation Multi-channel thin-film magnetic head and magnetic tape drive apparatus with the multi-channel thin-film magnetic head
US7919231B2 (en) * 2007-09-04 2011-04-05 Hitachi Global Storage Technologies Netherlands B.V. Photolithographic method and mask devices utilized for multiple exposures in the field of a feature
US11067895B2 (en) * 2017-01-13 2021-07-20 International Business Machines Corporation Method and structures for personalizing lithography

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2003A (en) * 1841-03-12 Improvement in horizontal windivhlls
JPH0655617B2 (ja) 1985-12-20 1994-07-27 株式会社イシダ カツト肉計量印字装置
JPS62296422A (ja) 1986-06-17 1987-12-23 Fujitsu Ltd 露光方法
US5302491A (en) * 1989-12-20 1994-04-12 North American Philips Corporation Method of encoding identification information on circuit dice using step and repeat lithography
JPH04102214A (ja) 1990-08-17 1992-04-03 Yamaha Corp 薄膜磁気ヘッドの製造法
US5175774A (en) * 1990-10-16 1992-12-29 Micron Technology, Inc. Semiconductor wafer marking for identification during processing
JP2950211B2 (ja) * 1995-08-02 1999-09-20 ティーディーケイ株式会社 薄膜磁気ヘッドの製造方法
JPH0981922A (ja) 1995-09-11 1997-03-28 Sony Corp 磁気ヘッド
JPH10134317A (ja) 1996-10-30 1998-05-22 Sumitomo Special Metals Co Ltd 薄膜磁気ヘッド用基板とその製造方法
JPH10261559A (ja) 1997-03-17 1998-09-29 Hitachi Ltd 半導体装置の製造方法および露光装置
JPH11126311A (ja) 1997-10-22 1999-05-11 Kyocera Corp 薄膜磁気ヘッド用基板
US6449123B1 (en) * 1999-08-16 2002-09-10 Sumitomo Special Metals Co., Ltd. Methods for marking a sintered product and for fabricating magnetic head substrate
JP4667559B2 (ja) * 2000-05-30 2011-04-13 ルネサスエレクトロニクス株式会社 半導体装置、フォトマスクおよび半導体装置の製造方法
JP2002075817A (ja) * 2000-08-24 2002-03-15 Tdk Corp ウエハ識別情報記入方法ならびにウエハ識別情報記入用露光方法および装置
CA2320612A1 (en) 2000-09-21 2002-03-21 David R. Seniuk Compact chip labelling using stepper technology
US6924090B2 (en) 2001-08-09 2005-08-02 Neomax Co., Ltd. Method of recording identifier and set of photomasks

Also Published As

Publication number Publication date
EP1286219A2 (de) 2003-02-26
US20030036025A1 (en) 2003-02-20
EP1286219B1 (de) 2006-04-05
US6924090B2 (en) 2005-08-02
EP1286219A3 (de) 2003-11-19

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Legal Events

Date Code Title Description
8332 No legal effect for de