DE602007000740D1 - Terahertzprüfvorrichtung und Prüfverfahren - Google Patents

Terahertzprüfvorrichtung und Prüfverfahren

Info

Publication number
DE602007000740D1
DE602007000740D1 DE200760000740 DE602007000740T DE602007000740D1 DE 602007000740 D1 DE602007000740 D1 DE 602007000740D1 DE 200760000740 DE200760000740 DE 200760000740 DE 602007000740 T DE602007000740 T DE 602007000740T DE 602007000740 D1 DE602007000740 D1 DE 602007000740D1
Authority
DE
Germany
Prior art keywords
electromagnetic wave
transmission line
inspection object
supply unit
conductive region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE200760000740
Other languages
German (de)
English (en)
Inventor
Toshihiko Ouchi
Shintaro Kasai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE602007000740D1 publication Critical patent/DE602007000740D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3581—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using far infrared light; using Terahertz radiation

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Toxicology (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
DE200760000740 2006-04-28 2007-04-05 Terahertzprüfvorrichtung und Prüfverfahren Active DE602007000740D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006125670A JP4709059B2 (ja) 2006-04-28 2006-04-28 検査装置及び検査方法

Publications (1)

Publication Number Publication Date
DE602007000740D1 true DE602007000740D1 (de) 2009-05-07

Family

ID=38436785

Family Applications (1)

Application Number Title Priority Date Filing Date
DE200760000740 Active DE602007000740D1 (de) 2006-04-28 2007-04-05 Terahertzprüfvorrichtung und Prüfverfahren

Country Status (6)

Country Link
US (2) US7557588B2 (cg-RX-API-DMAC10.html)
EP (1) EP1850115B1 (cg-RX-API-DMAC10.html)
JP (1) JP4709059B2 (cg-RX-API-DMAC10.html)
CN (1) CN100520290C (cg-RX-API-DMAC10.html)
AT (1) ATE426798T1 (cg-RX-API-DMAC10.html)
DE (1) DE602007000740D1 (cg-RX-API-DMAC10.html)

Families Citing this family (31)

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JP4217646B2 (ja) * 2004-03-26 2009-02-04 キヤノン株式会社 認証方法及び認証装置
JP4250603B2 (ja) * 2005-03-28 2009-04-08 キヤノン株式会社 テラヘルツ波の発生素子、及びその製造方法
JP4390147B2 (ja) * 2005-03-28 2009-12-24 キヤノン株式会社 周波数可変発振器
JP2006275910A (ja) * 2005-03-30 2006-10-12 Canon Inc 位置センシング装置及び位置センシング方法
JP4402026B2 (ja) 2005-08-30 2010-01-20 キヤノン株式会社 センシング装置
JP4773839B2 (ja) * 2006-02-15 2011-09-14 キヤノン株式会社 対象物の情報を検出する検出装置
JP4898472B2 (ja) 2006-04-11 2012-03-14 キヤノン株式会社 検査装置
JP5006642B2 (ja) 2006-05-31 2012-08-22 キヤノン株式会社 テラヘルツ波発振器
JP5196750B2 (ja) 2006-08-25 2013-05-15 キヤノン株式会社 発振素子
JP4873746B2 (ja) * 2006-12-21 2012-02-08 キヤノン株式会社 発振素子
US7869036B2 (en) * 2007-08-31 2011-01-11 Canon Kabushiki Kaisha Analysis apparatus for analyzing a specimen by obtaining electromagnetic spectrum information
JP5144175B2 (ja) * 2007-08-31 2013-02-13 キヤノン株式会社 電磁波を用いる検査装置及び検査方法
JP5186176B2 (ja) * 2007-10-19 2013-04-17 株式会社ジェーシービー 認証システム及び認証用可搬媒体
JP4807707B2 (ja) * 2007-11-30 2011-11-02 キヤノン株式会社 波形情報取得装置
JP4975001B2 (ja) * 2007-12-28 2012-07-11 キヤノン株式会社 波形情報取得装置及び波形情報取得方法
JP4834718B2 (ja) * 2008-01-29 2011-12-14 キヤノン株式会社 パルスレーザ装置、テラヘルツ発生装置、テラヘルツ計測装置及びテラヘルツトモグラフィー装置
JP5357531B2 (ja) * 2008-02-05 2013-12-04 キヤノン株式会社 情報取得装置及び情報取得方法
JP5178398B2 (ja) * 2008-08-27 2013-04-10 キヤノン株式会社 光伝導素子
JP5665305B2 (ja) * 2008-12-25 2015-02-04 キヤノン株式会社 分析装置
JP5612842B2 (ja) 2009-09-07 2014-10-22 キヤノン株式会社 発振器
JP5654760B2 (ja) 2010-03-02 2015-01-14 キヤノン株式会社 光素子
JP2013167591A (ja) * 2012-02-17 2013-08-29 Murata Mfg Co Ltd 物質センシング方法及び物質センシング装置
DE202013003163U1 (de) * 2013-04-04 2013-05-27 Hübner GmbH Vorrichtung zur Identifizierung von Stoffen in z. B. einer Postsendung
CN103604985B (zh) * 2013-10-25 2016-04-27 西北核技术研究所 一种大功率微波脉冲圆波导探测结构及方法
EP3069120B1 (en) * 2013-11-15 2024-08-14 Luna Innovations Incorporated System for determining at least one property of a sheet dielectric sample using terahertz radiation
CN105057231B (zh) * 2015-08-21 2017-07-28 爱德森（厦门）电子有限公司 一种在线电磁材质分选的方法
CN106353634A (zh) * 2016-10-17 2017-01-25 深圳市太赫兹科技创新研究院 太赫兹时域反射系统
KR102285056B1 (ko) * 2019-10-31 2021-08-04 주식회사 마인즈아이 테라헤르츠파 분광기술 기반 계측시스템
CN115468928B (zh) * 2021-06-10 2025-09-16 上海理工大学 光检测载片及所适用的检测处理方法
CN115121550B (zh) * 2022-06-27 2025-02-14 江苏大学 一种晶圆清洗装置及其方法
CN115825582B (zh) * 2022-11-01 2023-11-03 深圳技术大学 一种便携式微气象电磁参数测试装置

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JP3211100B2 (ja) * 1991-11-18 2001-09-25 長野日本無線株式会社 分注装置
US6593753B2 (en) * 1994-07-26 2003-07-15 Phase Dynamics, Inc. System and method for monitoring substances and reactions
US6297489B1 (en) * 1996-05-02 2001-10-02 Hamamatsu Photonics K.K. Electron tube having a photoelectron confining mechanism
US5929644A (en) * 1997-01-30 1999-07-27 Tlc Precision Wafer Technology, Inc. Non-destructive method and apparatus for monitoring a selected semiconductor characteristic of a semiconductor sample during fabrication
US7152007B2 (en) * 2000-02-28 2006-12-19 Tera View Limited Imaging apparatus and method
JP4425420B2 (ja) * 2000-04-03 2010-03-03 独立行政法人理化学研究所 マイクロアレイ作製装置
DE10192655D2 (de) * 2000-07-10 2003-06-12 Haring Bolivar Peter Verfahren zum Nachweis von Polynucleotidsequenzen
JP4025055B2 (ja) * 2001-11-05 2007-12-19 独立行政法人理化学研究所 固定化装置
US20040066207A1 (en) * 2002-10-05 2004-04-08 Bottoms Wilmer R. Flexible DUT interface assembly
DE10257225B3 (de) 2002-12-07 2004-04-08 Technische Universität Braunschweig Carolo-Wilhelmina Messeinrichtung zur Molekularanalyse chemischer oder biologischer Substanzen
KR100988085B1 (ko) * 2003-06-24 2010-10-18 삼성전자주식회사 고밀도 플라즈마 처리 장치
EP1642153B1 (en) * 2003-06-25 2009-10-28 Canon Kabushiki Kaisha High frequency electrical signal control device and sensing system
JP3950820B2 (ja) * 2003-06-25 2007-08-01 キヤノン株式会社 高周波電気信号制御装置及びセンシングシステム
JP4533044B2 (ja) 2003-08-27 2010-08-25 キヤノン株式会社 センサ
JP4136858B2 (ja) 2003-09-12 2008-08-20 キヤノン株式会社 位置検出装置、及び情報入力装置
CN1614391A (zh) * 2003-11-03 2005-05-11 中国科学院上海应用物理研究所 中草药真伪及质量鉴别的快速无损分析方法
JP2005157601A (ja) 2003-11-25 2005-06-16 Canon Inc 電磁波による積層状物体計数装置及び計数方法
JP4505629B2 (ja) * 2004-01-19 2010-07-21 国立大学法人静岡大学 界面検出装置及び界面検出方法
JP4217646B2 (ja) 2004-03-26 2009-02-04 キヤノン株式会社 認証方法及び認証装置
JP4546326B2 (ja) 2004-07-30 2010-09-15 キヤノン株式会社 センシング装置
JP4390147B2 (ja) 2005-03-28 2009-12-24 キヤノン株式会社 周波数可変発振器
JP4250603B2 (ja) 2005-03-28 2009-04-08 キヤノン株式会社 テラヘルツ波の発生素子、及びその製造方法
JP2006275910A (ja) 2005-03-30 2006-10-12 Canon Inc 位置センシング装置及び位置センシング方法
JP4402026B2 (ja) 2005-08-30 2010-01-20 キヤノン株式会社 センシング装置
JP4773839B2 (ja) 2006-02-15 2011-09-14 キヤノン株式会社 対象物の情報を検出する検出装置
JP4481946B2 (ja) 2006-03-17 2010-06-16 キヤノン株式会社 検出素子及び画像形成装置
JP5132146B2 (ja) 2006-03-17 2013-01-30 キヤノン株式会社 分析方法、分析装置、及び検体保持部材
JP4898472B2 (ja) 2006-04-11 2012-03-14 キヤノン株式会社 検査装置
JP5196750B2 (ja) 2006-08-25 2013-05-15 キヤノン株式会社 発振素子

Also Published As

Publication number Publication date
JP4709059B2 (ja) 2011-06-22
US7557588B2 (en) 2009-07-07
EP1850115A1 (en) 2007-10-31
JP2007298358A (ja) 2007-11-15
CN100520290C (zh) 2009-07-29
ATE426798T1 (de) 2009-04-15
EP1850115B1 (en) 2009-03-25
US7782067B2 (en) 2010-08-24
US20070252604A1 (en) 2007-11-01
CN101063609A (zh) 2007-10-31
US20090201030A1 (en) 2009-08-13

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