DE602006000742D1 - Herstellungsverfahren für piezoelektrisches Bauelement - Google Patents
Herstellungsverfahren für piezoelektrisches BauelementInfo
- Publication number
- DE602006000742D1 DE602006000742D1 DE200660000742 DE602006000742T DE602006000742D1 DE 602006000742 D1 DE602006000742 D1 DE 602006000742D1 DE 200660000742 DE200660000742 DE 200660000742 DE 602006000742 T DE602006000742 T DE 602006000742T DE 602006000742 D1 DE602006000742 D1 DE 602006000742D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing
- piezoelectric component
- piezoelectric
- component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/03—Assembling devices that include piezoelectric or electrostrictive parts
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders; Supports
- H03H9/10—Mounting in enclosures
- H03H9/1064—Mounting in enclosures for surface acoustic wave [SAW] devices
- H03H9/1092—Mounting in enclosures for surface acoustic wave [SAW] devices the enclosure being defined by a cover cap mounted on an element forming part of the surface acoustic wave [SAW] device on the side of the IDT's
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02992—Details of bus bars, contact pads or other electrical connections for finger electrodes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/42—Piezoelectric device making
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49126—Assembling bases
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49128—Assembling formed circuit to base
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
- Y10T29/49156—Manufacturing circuit on or in base with selective destruction of conductive paths
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49789—Obtaining plural product pieces from unitary workpiece
- Y10T29/49798—Dividing sequentially from leading end, e.g., by cutting or breaking
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005197081 | 2005-07-06 | ||
JP2005197081A JP2007019132A (ja) | 2005-07-06 | 2005-07-06 | 圧電振動装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE602006000742D1 true DE602006000742D1 (de) | 2008-04-30 |
DE602006000742T2 DE602006000742T2 (de) | 2009-04-30 |
Family
ID=37396019
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE200660000742 Active DE602006000742T2 (de) | 2005-07-06 | 2006-07-05 | Herstellungsverfahren für piezoelektrisches Bauelement |
Country Status (6)
Country | Link |
---|---|
US (1) | US7421767B2 (de) |
EP (1) | EP1742353B1 (de) |
JP (1) | JP2007019132A (de) |
KR (1) | KR100822096B1 (de) |
CN (1) | CN100525091C (de) |
DE (1) | DE602006000742T2 (de) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100653089B1 (ko) * | 2005-10-31 | 2006-12-04 | 삼성전자주식회사 | 탄성 표면파 디바이스 웨이퍼 레벨 패키지 및 그 패키징방법 |
JP2007335468A (ja) * | 2006-06-12 | 2007-12-27 | Hitachi Media Electoronics Co Ltd | 中空封止素子およびその製造方法 |
US8299678B2 (en) * | 2007-06-28 | 2012-10-30 | Kyocera Corporation | Surface acoustic wave device and method for production of same |
WO2009104328A1 (ja) * | 2008-02-18 | 2009-08-27 | セイコーインスツル株式会社 | 圧電振動子の製造方法、圧電振動子、発振器、電子機器及び電波時計 |
US8476809B2 (en) * | 2008-04-29 | 2013-07-02 | Sand 9, Inc. | Microelectromechanical systems (MEMS) resonators and related apparatus and methods |
US8410868B2 (en) | 2009-06-04 | 2013-04-02 | Sand 9, Inc. | Methods and apparatus for temperature control of devices and mechanical resonating structures |
JP4567775B2 (ja) * | 2008-08-26 | 2010-10-20 | 富士通メディアデバイス株式会社 | 弾性表面波デバイスおよびその製造方法 |
JP4851549B2 (ja) * | 2009-02-10 | 2012-01-11 | 日本電波工業株式会社 | 圧電デバイス |
US9048811B2 (en) | 2009-03-31 | 2015-06-02 | Sand 9, Inc. | Integration of piezoelectric materials with substrates |
FR3003246B1 (fr) | 2013-03-13 | 2017-12-22 | Commissariat Energie Atomique | Procede d'encapsulation de micro-dispositif par scellement anodique |
TWI661494B (zh) | 2014-07-31 | 2019-06-01 | 美商西凱渥資訊處理科技公司 | 多層暫態液相接合 |
US10541152B2 (en) | 2014-07-31 | 2020-01-21 | Skyworks Solutions, Inc. | Transient liquid phase material bonding and sealing structures and methods of forming same |
US9862592B2 (en) | 2015-03-13 | 2018-01-09 | Taiwan Semiconductor Manufacturing Co., Ltd. | MEMS transducer and method for manufacturing the same |
US10432168B2 (en) * | 2015-08-31 | 2019-10-01 | General Electric Company | Systems and methods for quartz wafer bonding |
CN107786929B (zh) * | 2016-08-26 | 2023-12-26 | 华景科技无锡有限公司 | 硅麦克风 |
JP6465097B2 (ja) * | 2016-11-21 | 2019-02-06 | 横河電機株式会社 | 振動式トランスデューサ |
JP6338071B2 (ja) * | 2016-11-29 | 2018-06-06 | 国立大学法人 東京大学 | 振動発電デバイス |
US20180159502A1 (en) | 2016-12-02 | 2018-06-07 | Skyworks Solutions, Inc. | Methods of manufacturing electronic devices to prevent water ingress during manufacture |
DE102019120844A1 (de) * | 2019-08-01 | 2021-02-04 | Horst Siedle Gmbh & Co. Kg | Verfahren zur Herstellung von abgedichteten Funktionselementen |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57155821A (en) * | 1981-03-20 | 1982-09-27 | Fujitsu General Ltd | Unidirectional saw exciter |
US4639631A (en) | 1985-07-01 | 1987-01-27 | Motorola, Inc. | Electrostatically sealed piezoelectric device |
JP3265889B2 (ja) | 1995-02-03 | 2002-03-18 | 松下電器産業株式会社 | 表面弾性波装置及びその製造方法 |
JPH1187052A (ja) * | 1997-09-09 | 1999-03-30 | Futaba Corp | 有機エレクトロルミネッセンス素子 |
GB0016861D0 (en) | 2000-07-11 | 2000-08-30 | Univ Cranfield | Improvements in or relating to filters |
JP3975430B2 (ja) | 2001-09-28 | 2007-09-12 | セイコーエプソン株式会社 | 弾性表面波装置の製造方法 |
JP2003163567A (ja) * | 2001-11-22 | 2003-06-06 | Nippon Dempa Kogyo Co Ltd | 水晶振動子 |
CN1742430B (zh) * | 2002-02-12 | 2010-04-28 | 松下电器产业株式会社 | 弹性表面波装置 |
JP2005125447A (ja) | 2003-10-23 | 2005-05-19 | Hitachi Ltd | 電子部品およびその製造方法 |
JP2006197554A (ja) * | 2004-12-17 | 2006-07-27 | Seiko Epson Corp | 弾性表面波デバイス及びその製造方法、icカード、携帯用電子機器 |
-
2005
- 2005-07-06 JP JP2005197081A patent/JP2007019132A/ja not_active Withdrawn
-
2006
- 2006-06-30 US US11/428,097 patent/US7421767B2/en active Active
- 2006-07-05 EP EP20060013918 patent/EP1742353B1/de not_active Expired - Fee Related
- 2006-07-05 DE DE200660000742 patent/DE602006000742T2/de active Active
- 2006-07-06 CN CNB2006101002705A patent/CN100525091C/zh not_active Expired - Fee Related
- 2006-07-06 KR KR20060063526A patent/KR100822096B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP1742353A1 (de) | 2007-01-10 |
US7421767B2 (en) | 2008-09-09 |
CN100525091C (zh) | 2009-08-05 |
KR20070005524A (ko) | 2007-01-10 |
KR100822096B1 (ko) | 2008-04-15 |
CN1893266A (zh) | 2007-01-10 |
EP1742353B1 (de) | 2008-03-19 |
DE602006000742T2 (de) | 2009-04-30 |
JP2007019132A (ja) | 2007-01-25 |
US20070006434A1 (en) | 2007-01-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |