DE602005022594D1 - Verfahren zur Herstellung einer Lithografiedruckform - Google Patents

Verfahren zur Herstellung einer Lithografiedruckform

Info

Publication number
DE602005022594D1
DE602005022594D1 DE602005022594T DE602005022594T DE602005022594D1 DE 602005022594 D1 DE602005022594 D1 DE 602005022594D1 DE 602005022594 T DE602005022594 T DE 602005022594T DE 602005022594 T DE602005022594 T DE 602005022594T DE 602005022594 D1 DE602005022594 D1 DE 602005022594D1
Authority
DE
Germany
Prior art keywords
precursor
lithographic printing
printing plate
coating
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005022594T
Other languages
English (en)
Inventor
Damme Marc Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa NV
Original Assignee
Agfa Graphics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Graphics NV filed Critical Agfa Graphics NV
Publication of DE602005022594D1 publication Critical patent/DE602005022594D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3057—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the processing units other than the developing unit, e.g. washing units
DE602005022594T 2005-11-18 2005-11-18 Verfahren zur Herstellung einer Lithografiedruckform Active DE602005022594D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP05110917A EP1788442B1 (de) 2005-11-18 2005-11-18 Verfahren zur Herstellung einer Lithografiedruckform

Publications (1)

Publication Number Publication Date
DE602005022594D1 true DE602005022594D1 (de) 2010-09-09

Family

ID=36950481

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005022594T Active DE602005022594D1 (de) 2005-11-18 2005-11-18 Verfahren zur Herstellung einer Lithografiedruckform

Country Status (8)

Country Link
US (1) US8092983B2 (de)
EP (2) EP2214056B1 (de)
CN (1) CN101322075B (de)
AT (1) ATE475908T1 (de)
DE (1) DE602005022594D1 (de)
ES (2) ES2396931T3 (de)
PL (2) PL1788442T3 (de)
WO (1) WO2007057336A1 (de)

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JP2009069761A (ja) * 2007-09-18 2009-04-02 Fujifilm Corp 平版印刷版の製版方法
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US8323874B2 (en) 2008-01-22 2012-12-04 Eastman Kodak Company Method of making lithographic printing plates
EP2105799B1 (de) 2008-03-26 2012-02-22 Agfa Graphics N.V. Verfahren zur Herstellung lithographischer Druckplatten
ES2390362T3 (es) 2008-07-16 2012-11-12 Agfa Graphics N.V. Método de fabricación de precursores de planchas de impresión litográfica
ES2382371T3 (es) 2008-10-23 2012-06-07 Agfa Graphics N.V. Plancha de impresión litográfica
JP2010197620A (ja) 2009-02-24 2010-09-09 Fujifilm Corp 平版印刷版原版の自動現像装置及び処理方法
JP2011090294A (ja) 2009-09-24 2011-05-06 Fujifilm Corp 平版印刷版の作製方法
JP2011221522A (ja) 2010-03-26 2011-11-04 Fujifilm Corp 平版印刷版の作製方法
JP5591623B2 (ja) * 2010-08-13 2014-09-17 ＡｚエレクトロニックマテリアルズＩｐ株式会社 リソグラフィー用リンス液およびそれを用いたパターン形成方法
JP2012073594A (ja) 2010-08-31 2012-04-12 Fujifilm Corp 平版印刷版の作製方法
JP2012073595A (ja) 2010-08-31 2012-04-12 Fujifilm Corp 平版印刷版の作製方法
CN106313870B (zh) * 2016-08-19 2018-06-15 浙江康尔达新材料股份有限公司 一种可成像涂层、热敏阴图平版印刷版及其制版方法
JP6808056B2 (ja) * 2017-08-30 2021-01-06 富士フイルム株式会社 搬送型洗出し装置
CN113954502B (zh) * 2021-10-26 2023-04-07 浙江康尔达新材料股份有限公司 一种光敏阴图型平版印刷版前体及其利用该前体形成平版印刷版制版方法
EP4239411A1 (de) 2022-03-04 2023-09-06 Eco3 Bv Verfahren und vorrichtung zum verarbeiten eine lithografiedruckplattenvorläufers

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Also Published As

Publication number Publication date
ATE475908T1 (de) 2010-08-15
PL1788442T3 (pl) 2011-01-31
ES2396931T3 (es) 2013-03-01
EP2214056A3 (de) 2010-08-11
US20080274427A1 (en) 2008-11-06
EP2214056B1 (de) 2012-12-26
EP1788442A1 (de) 2007-05-23
CN101322075A (zh) 2008-12-10
CN101322075B (zh) 2011-08-10
EP1788442B1 (de) 2010-07-28
EP2214056A2 (de) 2010-08-04
US8092983B2 (en) 2012-01-10
WO2007057336A1 (en) 2007-05-24
ES2347442T3 (es) 2010-10-29
PL2214056T3 (pl) 2013-05-31

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