ATE546760T1 - Verfahren zur herstellung lithographischer druckplatten - Google Patents
Verfahren zur herstellung lithographischer druckplattenInfo
- Publication number
- ATE546760T1 ATE546760T1 AT08102922T AT08102922T ATE546760T1 AT E546760 T1 ATE546760 T1 AT E546760T1 AT 08102922 T AT08102922 T AT 08102922T AT 08102922 T AT08102922 T AT 08102922T AT E546760 T1 ATE546760 T1 AT E546760T1
- Authority
- AT
- Austria
- Prior art keywords
- precursor
- lithographic printing
- printing plates
- producing lithographic
- heating
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Materials For Photolithography (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP08102922A EP2105799B1 (de) | 2008-03-26 | 2008-03-26 | Verfahren zur Herstellung lithographischer Druckplatten |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE546760T1 true ATE546760T1 (de) | 2012-03-15 |
Family
ID=39488349
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT08102922T ATE546760T1 (de) | 2008-03-26 | 2008-03-26 | Verfahren zur herstellung lithographischer druckplatten |
Country Status (8)
Country | Link |
---|---|
US (1) | US20110059401A1 (de) |
EP (1) | EP2105799B1 (de) |
CN (1) | CN101981508B (de) |
AT (1) | ATE546760T1 (de) |
BR (1) | BRPI0908914A2 (de) |
ES (1) | ES2378413T3 (de) |
PL (1) | PL2105799T3 (de) |
WO (1) | WO2009118281A1 (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102099748B (zh) | 2008-07-16 | 2013-07-17 | 爱克发印艺公司 | 制备平版印版前体的方法和设备 |
BR112012024532A2 (pt) | 2010-03-26 | 2016-09-06 | Fujifilm Corp | precursor de placa de impressão litográfica e método de produção do mesmo |
EP2755088B1 (de) * | 2013-01-11 | 2016-07-27 | Agfa Graphics NV | Verfahren zur Herstellung einer Flachdruckplatte |
Family Cites Families (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5910395A (en) | 1995-04-27 | 1999-06-08 | Minnesota Mining And Manufacturing Company | Negative-acting no-process printing plates |
DE10022786B4 (de) | 1999-05-12 | 2008-04-10 | Kodak Graphic Communications Gmbh | Auf der Druckmaschine entwickelbare Druckplatte |
US6071675A (en) | 1999-06-05 | 2000-06-06 | Teng; Gary Ganghui | On-press development of a lithographic plate comprising dispersed solid particles |
US6245481B1 (en) | 1999-10-12 | 2001-06-12 | Gary Ganghui Teng | On-press process of lithographic plates having a laser sensitive mask layer |
US6548222B2 (en) | 2000-09-06 | 2003-04-15 | Gary Ganghui Teng | On-press developable thermosensitive lithographic printing plates |
US6482571B1 (en) | 2000-09-06 | 2002-11-19 | Gary Ganghui Teng | On-press development of thermosensitive lithographic plates |
US6576401B2 (en) | 2001-09-14 | 2003-06-10 | Gary Ganghui Teng | On-press developable thermosensitive lithographic plates utilizing an onium or borate salt initiator |
US6387595B1 (en) | 2000-10-30 | 2002-05-14 | Gary Ganghui Teng | On-press developable lithographic printing plate having an ultrathin overcoat |
US6451510B1 (en) * | 2001-02-21 | 2002-09-17 | International Business Machines Corporation | Developer/rinse formulation to prevent image collapse in resist |
US6723493B2 (en) * | 2001-06-04 | 2004-04-20 | Gary Ganghui Teng | Negative lithographic printing plate comprising a specific compound in the photosensitive layer |
JP3869306B2 (ja) * | 2001-08-28 | 2007-01-17 | 東京エレクトロン株式会社 | 現像処理方法および現像液塗布装置 |
US6875557B2 (en) | 2001-08-29 | 2005-04-05 | Fuji Photo Film Co., Ltd. | Plate-making method of printing plate |
US6902865B2 (en) | 2002-07-22 | 2005-06-07 | Gary Ganghui Teng | Non-alkaline aqueous development of thermosensitive lithographic printing plates |
US20060234161A1 (en) * | 2002-10-04 | 2006-10-19 | Eric Verschueren | Method of making a lithographic printing plate precursor |
DE60324032D1 (de) * | 2003-07-17 | 2008-11-20 | Kodak Graphic Comm Gmbh | Verfahren zum behandeln von bilderzeugungsmaterialien |
DE602004021120D1 (de) | 2003-09-22 | 2009-06-25 | Agfa Graphics Nv | Photopolymerisierbare zusammensetzung. |
JP2007506125A (ja) | 2003-09-22 | 2007-03-15 | アグフア−ゲヴエルト | 光重合体印刷版前駆体 |
ATE533089T1 (de) | 2004-05-19 | 2011-11-15 | Agfa Graphics Nv | Verfahren zur herstellung einer fotopolymer- druckplatte |
EP2618215B1 (de) | 2004-05-31 | 2017-07-05 | Fujifilm Corporation | Verfahren zur Herstellung einer Lithografiedruckplatte |
ATE407799T1 (de) | 2004-07-29 | 2008-09-15 | Fujifilm Corp | Verfahren zur herstellung lithographischer druckplatten |
DE602005005403T2 (de) | 2004-08-24 | 2009-04-23 | Fujifilm Corp. | Verfahren zur Herstellung einer lithographischen Druckplatte |
EP1696275B1 (de) * | 2005-02-23 | 2014-04-02 | FUJIFILM Corporation | Verfahren zum Auffrischen eines Entwicklers in einem automatischen Entwicklergerät für eine lichtempfindliche lithografische Druckplattenvorstufe und automatisches Entwicklergerät für eine lichtempfindliche lithografische Druckplattenvorstufe |
EP1695822B1 (de) | 2005-02-28 | 2010-05-12 | FUJIFILM Corporation | Flachdruckplattenvorläufer und lithographisches Druckverfahren |
JP4792326B2 (ja) | 2005-07-25 | 2011-10-12 | 富士フイルム株式会社 | 平版印刷版の作製方法および平版印刷版原版 |
JP4815270B2 (ja) | 2005-08-18 | 2011-11-16 | 富士フイルム株式会社 | 平版印刷版の作製方法及び作製装置 |
EP1757981B1 (de) | 2005-08-26 | 2009-10-14 | Agfa Graphics N.V. | photopolymer Druckplattenvorläufer |
EP1767349B1 (de) * | 2005-09-27 | 2008-07-23 | Agfa Graphics N.V. | Verfahren zur Herstellung einer lithographischen Druckplatte |
EP1788442B1 (de) * | 2005-11-18 | 2010-07-28 | Agfa Graphics N.V. | Verfahren zur Herstellung einer Lithografiedruckform |
ATE497192T1 (de) | 2005-11-18 | 2011-02-15 | Agfa Graphics Nv | Verfahren zur herstellung einer lithografiedruckform |
DE602005013536D1 (de) | 2005-11-18 | 2009-05-07 | Agfa Graphics Nv | Verfahren zur Herstellung einer Lithografiedruckform |
WO2007057442A2 (en) | 2005-11-18 | 2007-05-24 | Agfa Graphics Nv | Method of making a photopolymer printing plate |
PL1788441T3 (pl) | 2005-11-18 | 2010-12-31 | Agfa Graphics Nv | Sposób wytwarzania kliszy do druku litograficznego |
DE602005012630D1 (de) | 2005-11-18 | 2009-03-19 | Agfa Graphics Nv | Verfahren zur Herstellung einer Lithografiedruckform |
PL1788443T3 (pl) | 2005-11-18 | 2014-12-31 | Agfa Nv | Sposób wytwarzania litograficznej płyty drukowej |
EP1788449A1 (de) | 2005-11-21 | 2007-05-23 | Agfa Graphics N.V. | Verfahren zur Herstellung einer Lithografiedruckform |
ES2324542T3 (es) | 2005-11-21 | 2009-08-10 | Agfa Graphics N.V. | Metodo para fabricar una plancha de impresion litografica. |
EP1793275B1 (de) | 2005-12-02 | 2013-07-03 | Fujifilm Corporation | Verfahren zur Herstellung einer Lithografiedruckplatte und Lithografiedruckplattenvorläufer |
JP4820640B2 (ja) | 2005-12-20 | 2011-11-24 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
EP1843203A1 (de) | 2006-04-03 | 2007-10-10 | Agfa Graphics N.V. | Verfahren zur Herstellung einer Fotopolymerdruckform |
EP1882585B1 (de) | 2006-07-25 | 2010-09-22 | FUJIFILM Corporation | Lithographiedruckplattenvorläufer und Verfahren zur Herstellung einer Lithographiedruckplatte |
-
2008
- 2008-03-26 EP EP08102922A patent/EP2105799B1/de not_active Not-in-force
- 2008-03-26 AT AT08102922T patent/ATE546760T1/de active
- 2008-03-26 PL PL08102922T patent/PL2105799T3/pl unknown
- 2008-03-26 ES ES08102922T patent/ES2378413T3/es active Active
-
2009
- 2009-03-23 US US12/933,879 patent/US20110059401A1/en not_active Abandoned
- 2009-03-23 CN CN2009801106123A patent/CN101981508B/zh not_active Expired - Fee Related
- 2009-03-23 BR BRPI0908914A patent/BRPI0908914A2/pt not_active IP Right Cessation
- 2009-03-23 WO PCT/EP2009/053355 patent/WO2009118281A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
PL2105799T3 (pl) | 2012-07-31 |
CN101981508B (zh) | 2013-07-17 |
EP2105799A1 (de) | 2009-09-30 |
CN101981508A (zh) | 2011-02-23 |
WO2009118281A1 (en) | 2009-10-01 |
BRPI0908914A2 (pt) | 2018-07-10 |
US20110059401A1 (en) | 2011-03-10 |
EP2105799B1 (de) | 2012-02-22 |
ES2378413T3 (es) | 2012-04-12 |
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