DE602005022428D1 - Halbleiterbauelement und verfahren zur herstellung eines solchen bauelements - Google Patents

Halbleiterbauelement und verfahren zur herstellung eines solchen bauelements

Info

Publication number
DE602005022428D1
DE602005022428D1 DE602005022428T DE602005022428T DE602005022428D1 DE 602005022428 D1 DE602005022428 D1 DE 602005022428D1 DE 602005022428 T DE602005022428 T DE 602005022428T DE 602005022428 T DE602005022428 T DE 602005022428T DE 602005022428 D1 DE602005022428 D1 DE 602005022428D1
Authority
DE
Germany
Prior art keywords
region
semi
semiconductor
dielectric layer
component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005022428T
Other languages
English (en)
Inventor
Noort Wibo D Van
Petrus H Magnee
Lis K Nanver
Celine J Detcheverry
Ramon J Havens
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NXP BV
Original Assignee
NXP BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NXP BV filed Critical NXP BV
Publication of DE602005022428D1 publication Critical patent/DE602005022428D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/06Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/06Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/0611Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region
    • H01L27/0641Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region without components of the field effect type

Landscapes

  • Power Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Formation Of Insulating Films (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Bipolar Integrated Circuits (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Electrodes Of Semiconductors (AREA)
DE602005022428T 2004-04-27 2005-04-20 Halbleiterbauelement und verfahren zur herstellung eines solchen bauelements Active DE602005022428D1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
EP04101769 2004-04-27
EP04102908 2004-06-23
EP04103676 2004-07-30
PCT/IB2005/051293 WO2005104232A1 (en) 2004-04-27 2005-04-20 Semiconductor device and method of manufacturing such a device

Publications (1)

Publication Number Publication Date
DE602005022428D1 true DE602005022428D1 (de) 2010-09-02

Family

ID=34965515

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005022428T Active DE602005022428D1 (de) 2004-04-27 2005-04-20 Halbleiterbauelement und verfahren zur herstellung eines solchen bauelements

Country Status (9)

Country Link
US (1) US8084829B2 (de)
EP (1) EP1743372B1 (de)
JP (1) JP2007535162A (de)
KR (1) KR101205115B1 (de)
CN (1) CN1947250B (de)
AT (1) ATE475197T1 (de)
DE (1) DE602005022428D1 (de)
TW (1) TW200539442A (de)
WO (1) WO2005104232A1 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7768092B2 (en) * 2005-07-20 2010-08-03 Cree Sweden Ab Semiconductor device comprising a junction having a plurality of rings
KR101315282B1 (ko) * 2006-04-27 2013-10-08 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 이를 사용한 전자기기
US7868419B1 (en) * 2007-10-18 2011-01-11 Rf Micro Devices, Inc. Linearity improvements of semiconductor substrate based radio frequency devices
JP2011119512A (ja) * 2009-12-04 2011-06-16 Denso Corp 半導体装置およびその製造方法
US8492868B2 (en) * 2010-08-02 2013-07-23 International Business Machines Corporation Method, apparatus, and design structure for silicon-on-insulator high-bandwidth circuitry with reduced charge layer
KR101905823B1 (ko) * 2011-07-27 2018-10-08 엘지이노텍 주식회사 웨이퍼 제조 장치 및 웨이퍼 제조 방법
FI127794B (en) * 2017-02-15 2019-02-28 Aalto Korkeakoulusaeaetioe Semiconductor structures and their manufacture
KR102456608B1 (ko) * 2017-05-29 2022-10-19 테크놀로지안 투트키무스케스쿠스 브이티티 오와이 반도체 장치
EP3518280B1 (de) * 2018-01-25 2020-11-04 Murata Manufacturing Co., Ltd. Elektronisches produkt mit eingebettetem porösem dielektrikum und herstellungsverfahren
EP3789745B1 (de) * 2019-09-09 2024-04-10 Yageo Nexensos GmbH Flexible passive elektronische komponente und verfahren zur herstellung davon
FR3116151A1 (fr) * 2020-11-10 2022-05-13 Commissariat A L'energie Atomique Et Aux Energies Alternatives Procede de formation d’une structure de piegeage d’un substrat utile

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3582890B2 (ja) * 1995-05-23 2004-10-27 株式会社日立製作所 半導体装置
US6680489B1 (en) * 1995-12-20 2004-01-20 Advanced Technology Materials, Inc. Amorphous silicon carbide thin film coating
KR100297703B1 (ko) * 1998-02-24 2001-08-07 김덕중 반절연폴리실리콘(sipos)을이용한전력반도체장치및그제조방법
US6356183B1 (en) * 1999-08-17 2002-03-12 United Microelectronics Corp. Method of manufacturing an inductor
US6503838B1 (en) 1999-12-31 2003-01-07 Texas Instruments Incorporated Integrated circuit isolation of functionally distinct RF circuits
US6674131B2 (en) * 2000-06-27 2004-01-06 Matsushita Electric Industrial Co., Ltd. Semiconductor power device for high-temperature applications
SE520093C2 (sv) * 2000-12-13 2003-05-27 Ericsson Telefon Ab L M Skärmad induktor
US6737727B2 (en) * 2001-01-12 2004-05-18 International Business Machines Corporation Electronic structures with reduced capacitance
US6593185B1 (en) * 2002-05-17 2003-07-15 United Microelectronics Corp. Method of forming embedded capacitor structure applied to logic integrated circuit
JP4463482B2 (ja) * 2002-07-11 2010-05-19 パナソニック株式会社 Misfet及びその製造方法
US7316014B2 (en) 2002-07-12 2008-01-01 Bsquare Corporation Application modification system and method

Also Published As

Publication number Publication date
KR20070004089A (ko) 2007-01-05
CN1947250A (zh) 2007-04-11
TW200539442A (en) 2005-12-01
WO2005104232A1 (en) 2005-11-03
EP1743372A1 (de) 2007-01-17
KR101205115B1 (ko) 2012-11-26
ATE475197T1 (de) 2010-08-15
JP2007535162A (ja) 2007-11-29
US20080173974A1 (en) 2008-07-24
US8084829B2 (en) 2011-12-27
EP1743372B1 (de) 2010-07-21
CN1947250B (zh) 2012-09-26

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