DE602005008658D1 - Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung - Google Patents

Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung

Info

Publication number
DE602005008658D1
DE602005008658D1 DE602005008658T DE602005008658T DE602005008658D1 DE 602005008658 D1 DE602005008658 D1 DE 602005008658D1 DE 602005008658 T DE602005008658 T DE 602005008658T DE 602005008658 T DE602005008658 T DE 602005008658T DE 602005008658 D1 DE602005008658 D1 DE 602005008658D1
Authority
DE
Germany
Prior art keywords
making
lithographic apparatus
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005008658T
Other languages
English (en)
Inventor
Buel Henricus Wilhemus Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE602005008658D1 publication Critical patent/DE602005008658D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
DE602005008658T 2004-03-09 2005-02-23 Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung Active DE602005008658D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/795,801 US7094506B2 (en) 2004-03-09 2004-03-09 Lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
DE602005008658D1 true DE602005008658D1 (de) 2008-09-18

Family

ID=34827597

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005008658T Active DE602005008658D1 (de) 2004-03-09 2005-02-23 Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung

Country Status (4)

Country Link
US (2) US7094506B2 (de)
EP (1) EP1574905B1 (de)
JP (1) JP2005260232A (de)
DE (1) DE602005008658D1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4480339B2 (ja) * 2003-04-03 2010-06-16 新光電気工業株式会社 露光装置および露光方法、ならびに描画装置および描画方法
US7094506B2 (en) * 2004-03-09 2006-08-22 Asml Netherlands B.V Lithographic apparatus and device manufacturing method
JP2006023221A (ja) * 2004-07-09 2006-01-26 Tokyo Seimitsu Co Ltd 外観検査装置及び投影方法
JP4671661B2 (ja) * 2004-10-28 2011-04-20 新光電気工業株式会社 露光装置および露光方法
EP1856654A2 (de) * 2005-01-28 2007-11-21 ASML Holding N.V. Verfahren und system für maskenloses lithografisches rasterisierungsverfahren auf basis globaler optimierung
EP1978546A4 (de) * 2005-12-28 2010-08-04 Nikon Corp Belichtungsvorrichtung, belichtungsverfahren und bauelemente-herstellungsverfahren
EP2009678A4 (de) 2006-04-17 2011-04-06 Nikon Corp Optische beleuchtungsvorrichtung, belichtungsvorrichtung und bauelementeherstelllungsverfahren
US7936445B2 (en) * 2006-06-19 2011-05-03 Asml Netherlands B.V. Altering pattern data based on measured optical element characteristics
US7932019B2 (en) * 2006-11-13 2011-04-26 Samsung Electronics Co., Ltd. Gettering members, methods of forming the same, and methods of performing immersion lithography using the same
US20090303454A1 (en) * 2008-06-10 2009-12-10 Nikon Corporation Exposure apparatus with a scanning illumination beam

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US5523193A (en) * 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
ATE123885T1 (de) * 1990-05-02 1995-06-15 Fraunhofer Ges Forschung Belichtungsvorrichtung.
US5229872A (en) * 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
US6219015B1 (en) * 1992-04-28 2001-04-17 The Board Of Directors Of The Leland Stanford, Junior University Method and apparatus for using an array of grating light valves to produce multicolor optical images
JP3224041B2 (ja) * 1992-07-29 2001-10-29 株式会社ニコン 露光方法及び装置
US5729331A (en) * 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
JP3339149B2 (ja) * 1993-12-08 2002-10-28 株式会社ニコン 走査型露光装置ならびに露光方法
US5677703A (en) * 1995-01-06 1997-10-14 Texas Instruments Incorporated Data loading circuit for digital micro-mirror device
US5530482A (en) * 1995-03-21 1996-06-25 Texas Instruments Incorporated Pixel data processing for spatial light modulator having staggered pixels
US6133986A (en) * 1996-02-28 2000-10-17 Johnson; Kenneth C. Microlens scanner for microlithography and wide-field confocal microscopy
ATE216091T1 (de) 1997-01-29 2002-04-15 Micronic Laser Systems Ab Verfahren und gerät zur erzeugung eines musters auf einem mit fotoresist beschichteten substrat mittels fokusiertem laserstrahl
US6177980B1 (en) * 1997-02-20 2001-01-23 Kenneth C. Johnson High-throughput, maskless lithography system
SE509062C2 (sv) 1997-02-28 1998-11-30 Micronic Laser Systems Ab Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster
US5982553A (en) * 1997-03-20 1999-11-09 Silicon Light Machines Display device incorporating one-dimensional grating light-valve array
JPH113849A (ja) * 1997-06-12 1999-01-06 Sony Corp 可変変形照明フィルタ及び半導体露光装置
SE9800665D0 (sv) * 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
US6448568B1 (en) * 1999-07-30 2002-09-10 Applied Materials, Inc. Electron beam column using high numerical aperture photocathode source illumination
KR100827874B1 (ko) * 2000-05-22 2008-05-07 가부시키가이샤 니콘 노광 장치, 노광 장치의 제조 방법, 노광 방법, 마이크로 장치의 제조 방법, 및 디바이스의 제조 방법
US6618118B2 (en) * 2001-05-08 2003-09-09 Asml Netherlands B.V. Optical exposure method, device manufacturing method and lithographic projection apparatus
JP2002353105A (ja) * 2001-05-24 2002-12-06 Nikon Corp 照明光学装置，該照明光学装置を備えた露光装置，およびマイクロデバイスの製造方法
TW529172B (en) * 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
US6567217B1 (en) * 2001-11-06 2003-05-20 Eastman Kodak Company Image-forming system with enhanced gray levels
JP3563384B2 (ja) * 2001-11-08 2004-09-08 大日本スクリーン製造株式会社 画像記録装置
EP1316850A1 (de) 2001-11-30 2003-06-04 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
TW556043B (en) * 2001-11-30 2003-10-01 Asml Netherlands Bv Imaging apparatus, device manufacturing method and device manufactured by said method
TWI298825B (en) * 2002-06-12 2008-07-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US6870554B2 (en) * 2003-01-07 2005-03-22 Anvik Corporation Maskless lithography with multiplexed spatial light modulators
EP1482375B1 (de) 2003-05-30 2014-09-17 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
US7094506B2 (en) * 2004-03-09 2006-08-22 Asml Netherlands B.V Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
JP2005260232A (ja) 2005-09-22
US20050200819A1 (en) 2005-09-15
US7563562B2 (en) 2009-07-21
EP1574905A1 (de) 2005-09-14
US20060275709A1 (en) 2006-12-07
EP1574905B1 (de) 2008-08-06
US7094506B2 (en) 2006-08-22

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