DE602004019477D1 - Magnetoresistives Element, Magnetkopf und Magnetisches Aufnahme- / Wiedergabegerät - Google Patents

Magnetoresistives Element, Magnetkopf und Magnetisches Aufnahme- / Wiedergabegerät

Info

Publication number
DE602004019477D1
DE602004019477D1 DE602004019477T DE602004019477T DE602004019477D1 DE 602004019477 D1 DE602004019477 D1 DE 602004019477D1 DE 602004019477 T DE602004019477 T DE 602004019477T DE 602004019477 T DE602004019477 T DE 602004019477T DE 602004019477 D1 DE602004019477 D1 DE 602004019477D1
Authority
DE
Germany
Prior art keywords
reproducing device
magnetoresistive element
magnetic
magnetic recording
magnetic head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602004019477T
Other languages
English (en)
Inventor
Hideaki Fukuzawa
Yuasa Hiromi
Hashimoto Susumu
Iwasaki Hitoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Publication of DE602004019477D1 publication Critical patent/DE602004019477D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/33Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/32Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/33Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • G11B5/3906Details related to the use of magnetic thin film layers or to their effects
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/32Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3254Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the spacer being semiconducting or insulating, e.g. for spin tunnel junction [STJ]
    • H01F10/3259Spin-exchange-coupled multilayers comprising at least a nanooxide layer [NOL], e.g. with a NOL spacer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/32Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3268Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn
DE602004019477T 2003-07-24 2004-07-23 Magnetoresistives Element, Magnetkopf und Magnetisches Aufnahme- / Wiedergabegerät Active DE602004019477D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003201131A JP4469570B2 (ja) 2003-07-24 2003-07-24 磁気抵抗効果素子、磁気ヘッドおよび磁気記録再生装置

Publications (1)

Publication Number Publication Date
DE602004019477D1 true DE602004019477D1 (de) 2009-04-02

Family

ID=33549876

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004019477T Active DE602004019477D1 (de) 2003-07-24 2004-07-23 Magnetoresistives Element, Magnetkopf und Magnetisches Aufnahme- / Wiedergabegerät

Country Status (6)

Country Link
US (2) US7471492B2 (de)
EP (2) EP2031608A3 (de)
JP (1) JP4469570B2 (de)
KR (1) KR100776870B1 (de)
CN (1) CN1323386C (de)
DE (1) DE602004019477D1 (de)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4469570B2 (ja) * 2003-07-24 2010-05-26 株式会社東芝 磁気抵抗効果素子、磁気ヘッドおよび磁気記録再生装置
US7522380B2 (en) * 2005-06-14 2009-04-21 Seagate Technology Llc Head to disc interface tunneling giant magnetoresistive sensor
JP4496242B2 (ja) * 2007-08-29 2010-07-07 株式会社東芝 スピントランジスタ及び磁気メモリ
JP5157891B2 (ja) * 2008-12-26 2013-03-06 富士通株式会社 磁気検出素子および磁気再生装置
KR101535461B1 (ko) * 2009-01-06 2015-07-10 삼성전자주식회사 자성구조체를 포함하는 정보저장장치와 그의 제조 및 동작방법
US8933522B2 (en) * 2012-09-28 2015-01-13 Intel Corporation Repeated spin current interconnects
CN108010549B (zh) * 2017-12-04 2021-03-16 西安交通大学 一种自旋极化电流发生器及其磁性装置
JP7068109B2 (ja) * 2018-09-04 2022-05-16 株式会社東芝 磁気ヘッド及び磁気記録再生装置
JP7071900B2 (ja) * 2018-09-04 2022-05-19 株式会社東芝 磁気ヘッド及び磁気記録再生装置
DE102019102544A1 (de) 2019-02-01 2020-08-06 Vacuumschmelze Gmbh & Co. Kg Verfahren zur vorbehandlung von edelstahlsubstraten vor dem löten mittels nanokristalliner lötfolien
JP7136340B2 (ja) * 2019-04-09 2022-09-13 株式会社村田製作所 磁気抵抗素子および磁気センサ

Family Cites Families (19)

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NL8600390A (nl) * 1986-02-17 1987-09-16 Philips Nv Magneetkop met magnetoweerstandselement.
US5206590A (en) * 1990-12-11 1993-04-27 International Business Machines Corporation Magnetoresistive sensor based on the spin valve effect
US5576915A (en) * 1993-03-15 1996-11-19 Kabushiki Kaisha Toshiba Magnetoresistive head with antiferromagnetic sublayers interposed between first and second spin-valve units to exchange bias inner magnetic films thereof
US5701222A (en) * 1995-09-11 1997-12-23 International Business Machines Corporation Spin valve sensor with antiparallel magnetization of pinned layers
JPH09214016A (ja) 1996-02-02 1997-08-15 Fujitsu Ltd 半導体感磁性素子及びそれを用いた磁気ヘッド装置
JPH1091920A (ja) * 1996-09-11 1998-04-10 Nec Corp 磁気抵抗効果型ヘッド
JPH1098220A (ja) * 1996-09-20 1998-04-14 Sanyo Electric Co Ltd 磁気抵抗効果素子
JPH1196516A (ja) * 1997-09-19 1999-04-09 Fujitsu Ltd スピンバルブ磁気抵抗効果型ヘッドの製造法及びこの製造方法で製造されたスピンバルブ磁気抵抗効果型ヘッド
JP3558951B2 (ja) * 2000-03-16 2004-08-25 シャープ株式会社 磁気メモリ素子及びそれを用いた磁気メモリ
JP2001273612A (ja) * 2000-03-28 2001-10-05 Yamaha Corp 磁気抵抗効果型磁気ヘッドおよびその製造方法ならびにこの磁気抵抗効果型磁気ヘッドを備えた磁気記録再生装置
JP3604617B2 (ja) * 2000-06-12 2004-12-22 富士通株式会社 磁気検出素子
US6549383B1 (en) * 2000-10-06 2003-04-15 International Business Machines Corporation Pinned layer having a CoFeNb or CoFeNbHf film for increasing magnetic softness and reducing current shunting
US6580589B1 (en) * 2000-10-06 2003-06-17 International Business Machines Corporation Pinned layer structure for a spin valve sensor having cobalt iron (CoFe) and cobalt iron oxide (CoFeO) laminated layers
US6724583B2 (en) * 2000-12-19 2004-04-20 Seagate Technology Llc Adjustable permanent magnet bias
US6700757B2 (en) * 2001-01-02 2004-03-02 Hitachi Global Storage Technologies Netherlands B.V. Enhanced free layer for a spin valve sensor
JP2003008105A (ja) 2001-06-25 2003-01-10 Matsushita Electric Ind Co Ltd 磁気抵抗素子および磁気メモリ
JP3854107B2 (ja) * 2001-08-10 2006-12-06 アルプス電気株式会社 スピンバルブ型薄膜素子及びこのスピンバルブ型薄膜素子を用いた薄膜磁気ヘッド
KR100511077B1 (ko) * 2003-03-14 2005-08-30 한국과학기술연구원 하이브리드형 자성체/반도체 스핀소자 및 그 제조방법
JP4469570B2 (ja) * 2003-07-24 2010-05-26 株式会社東芝 磁気抵抗効果素子、磁気ヘッドおよび磁気記録再生装置

Also Published As

Publication number Publication date
US7719799B2 (en) 2010-05-18
EP2031608A3 (de) 2009-03-11
US20050057862A1 (en) 2005-03-17
US7471492B2 (en) 2008-12-30
KR20050012168A (ko) 2005-01-31
KR100776870B1 (ko) 2007-11-16
EP1505610A2 (de) 2005-02-09
US20090097166A1 (en) 2009-04-16
EP2031608A2 (de) 2009-03-04
CN1323386C (zh) 2007-06-27
JP2005044895A (ja) 2005-02-17
CN1577495A (zh) 2005-02-09
JP4469570B2 (ja) 2010-05-26
EP1505610A3 (de) 2006-05-17
EP1505610B1 (de) 2009-02-18

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