DE60144457D1 - Excimer- oder molekulare Fluor-Laservorrichtungen - Google Patents
Excimer- oder molekulare Fluor-LaservorrichtungenInfo
- Publication number
- DE60144457D1 DE60144457D1 DE60144457T DE60144457T DE60144457D1 DE 60144457 D1 DE60144457 D1 DE 60144457D1 DE 60144457 T DE60144457 T DE 60144457T DE 60144457 T DE60144457 T DE 60144457T DE 60144457 D1 DE60144457 D1 DE 60144457D1
- Authority
- DE
- Germany
- Prior art keywords
- excimer
- laser devices
- molecular fluorine
- fluorine laser
- molecular
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000072201A JP3775469B2 (ja) | 2000-03-15 | 2000-03-15 | ArFエキシマレーザ装置、KrFエキシマレーザ装置及びフッ素レーザ装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60144457D1 true DE60144457D1 (de) | 2011-06-01 |
Family
ID=18590660
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60144457T Expired - Lifetime DE60144457D1 (de) | 2000-03-15 | 2001-03-12 | Excimer- oder molekulare Fluor-Laservorrichtungen |
Country Status (5)
Country | Link |
---|---|
US (1) | US6754247B2 (de) |
EP (1) | EP1137132B1 (de) |
JP (1) | JP3775469B2 (de) |
KR (1) | KR20010092364A (de) |
DE (1) | DE60144457D1 (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3552979B2 (ja) * | 1999-09-16 | 2004-08-11 | ウシオ電機株式会社 | ArFエキシマレーザ装置 |
US6862307B2 (en) * | 2000-05-15 | 2005-03-01 | Lambda Physik Ag | Electrical excitation circuit for a pulsed gas laser |
JP3755577B2 (ja) | 2000-10-10 | 2006-03-15 | ウシオ電機株式会社 | 露光用ArF、KrFエキシマレーザ装置及びフッ素レーザ装置 |
JP2003142758A (ja) * | 2001-11-01 | 2003-05-16 | Komatsu Ltd | フッ素分子レーザ装置 |
US6987790B2 (en) * | 2003-02-14 | 2006-01-17 | Lambda Physik Ag | Excimer or molecular fluorine laser with several discharge chambers |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4876693A (en) * | 1984-12-26 | 1989-10-24 | Hughes Aircraft Company | Integrated laser head and low inductance pulse forming circuit for pulsed gas lasers |
DE3705165A1 (de) * | 1986-02-18 | 1987-08-20 | Mitsubishi Electric Corp | Mit entladungserregung arbeitende laservorrichtung fuer kurze impulse |
JPS63110780A (ja) | 1986-10-29 | 1988-05-16 | Toshiba Corp | ガスレ−ザ発振装置 |
US5305338A (en) * | 1990-09-25 | 1994-04-19 | Mitsubishi Denki Kabushiki Kaisha | Switch device for laser |
US5260961A (en) * | 1990-11-01 | 1993-11-09 | Florod Corporation | Sealed excimer laser with longitudinal discharge and transverse preionization for low-average-power uses |
EP0526635B1 (de) * | 1991-02-08 | 1995-07-05 | Mitsubishi Denki Kabushiki Kaisha | Pulslaservorrichtung |
JP2738990B2 (ja) * | 1991-05-27 | 1998-04-08 | 三菱電機株式会社 | パルスレーザ装置 |
JPH07105548B2 (ja) * | 1992-09-08 | 1995-11-13 | 株式会社日立製作所 | 放電励起エキシマレーザ発振装置 |
US5309462A (en) * | 1993-02-17 | 1994-05-03 | National Research Council Of Canada | Magnetic spiker gas laser excitation circuit |
JP3815578B2 (ja) * | 1996-07-19 | 2006-08-30 | 忠弘 大見 | エキシマレーザー発振装置 |
US5835520A (en) * | 1997-04-23 | 1998-11-10 | Cymer, Inc. | Very narrow band KrF laser |
US5936988A (en) * | 1997-12-15 | 1999-08-10 | Cymer, Inc. | High pulse rate pulse power system |
US5856991A (en) | 1997-06-04 | 1999-01-05 | Cymer, Inc. | Very narrow band laser |
JP3734204B2 (ja) * | 1998-04-01 | 2006-01-11 | 株式会社小松製作所 | パルスレーザの発光タイミング制御装置 |
US6269110B1 (en) * | 1998-10-05 | 2001-07-31 | Lambda Physik Ag | Internal wavelength calibration for tunable ArF-excimer laser using atomic carbon and molecular oxygen absorption lines |
US6188144B1 (en) * | 1998-11-11 | 2001-02-13 | Komatsu Ltd | Power supply unit for pulsed laser using magnetic switch |
JP3552979B2 (ja) | 1999-09-16 | 2004-08-11 | ウシオ電機株式会社 | ArFエキシマレーザ装置 |
JP3296430B2 (ja) | 1999-10-08 | 2002-07-02 | 株式会社ウシオ総合技術研究所 | 露光用ArFエキシマレーザ装置 |
JP3427889B2 (ja) | 1999-12-21 | 2003-07-22 | ウシオ電機株式会社 | ArFエキシマレーザ装置及びフッ素レーザ装置 |
JP3755577B2 (ja) * | 2000-10-10 | 2006-03-15 | ウシオ電機株式会社 | 露光用ArF、KrFエキシマレーザ装置及びフッ素レーザ装置 |
-
2000
- 2000-03-15 JP JP2000072201A patent/JP3775469B2/ja not_active Expired - Lifetime
-
2001
- 2001-03-12 DE DE60144457T patent/DE60144457D1/de not_active Expired - Lifetime
- 2001-03-12 EP EP01106068A patent/EP1137132B1/de not_active Expired - Lifetime
- 2001-03-13 US US09/803,983 patent/US6754247B2/en not_active Expired - Lifetime
- 2001-03-15 KR KR1020010013359A patent/KR20010092364A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
US6754247B2 (en) | 2004-06-22 |
EP1137132A2 (de) | 2001-09-26 |
EP1137132B1 (de) | 2011-04-20 |
KR20010092364A (ko) | 2001-10-24 |
JP3775469B2 (ja) | 2006-05-17 |
JP2001267666A (ja) | 2001-09-28 |
EP1137132A3 (de) | 2003-11-26 |
US20010022799A1 (en) | 2001-09-20 |
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