DE60144457D1 - Excimer- oder molekulare Fluor-Laservorrichtungen - Google Patents

Excimer- oder molekulare Fluor-Laservorrichtungen

Info

Publication number
DE60144457D1
DE60144457D1 DE60144457T DE60144457T DE60144457D1 DE 60144457 D1 DE60144457 D1 DE 60144457D1 DE 60144457 T DE60144457 T DE 60144457T DE 60144457 T DE60144457 T DE 60144457T DE 60144457 D1 DE60144457 D1 DE 60144457D1
Authority
DE
Germany
Prior art keywords
excimer
laser devices
molecular fluorine
fluorine laser
molecular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60144457T
Other languages
English (en)
Inventor
Koji Kakizaki
Akifumi Tada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Application granted granted Critical
Publication of DE60144457D1 publication Critical patent/DE60144457D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
DE60144457T 2000-03-15 2001-03-12 Excimer- oder molekulare Fluor-Laservorrichtungen Expired - Lifetime DE60144457D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000072201A JP3775469B2 (ja) 2000-03-15 2000-03-15 ＡｒＦエキシマレーザ装置、ＫｒＦエキシマレーザ装置及びフッ素レーザ装置

Publications (1)

Publication Number Publication Date
DE60144457D1 true DE60144457D1 (de) 2011-06-01

Family

ID=18590660

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60144457T Expired - Lifetime DE60144457D1 (de) 2000-03-15 2001-03-12 Excimer- oder molekulare Fluor-Laservorrichtungen

Country Status (5)

Country Link
US (1) US6754247B2 (de)
EP (1) EP1137132B1 (de)
JP (1) JP3775469B2 (de)
KR (1) KR20010092364A (de)
DE (1) DE60144457D1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3552979B2 (ja) * 1999-09-16 2004-08-11 ウシオ電機株式会社 ＡｒＦエキシマレーザ装置
US6862307B2 (en) * 2000-05-15 2005-03-01 Lambda Physik Ag Electrical excitation circuit for a pulsed gas laser
JP3755577B2 (ja) 2000-10-10 2006-03-15 ウシオ電機株式会社 露光用ＡｒＦ、ＫｒＦエキシマレーザ装置及びフッ素レーザ装置
JP2003142758A (ja) * 2001-11-01 2003-05-16 Komatsu Ltd フッ素分子レーザ装置
US6987790B2 (en) * 2003-02-14 2006-01-17 Lambda Physik Ag Excimer or molecular fluorine laser with several discharge chambers

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4876693A (en) * 1984-12-26 1989-10-24 Hughes Aircraft Company Integrated laser head and low inductance pulse forming circuit for pulsed gas lasers
DE3705165A1 (de) * 1986-02-18 1987-08-20 Mitsubishi Electric Corp Mit entladungserregung arbeitende laservorrichtung fuer kurze impulse
JPS63110780A (ja) 1986-10-29 1988-05-16 Toshiba Corp ガスレ−ザ発振装置
US5305338A (en) * 1990-09-25 1994-04-19 Mitsubishi Denki Kabushiki Kaisha Switch device for laser
US5260961A (en) * 1990-11-01 1993-11-09 Florod Corporation Sealed excimer laser with longitudinal discharge and transverse preionization for low-average-power uses
EP0526635B1 (de) * 1991-02-08 1995-07-05 Mitsubishi Denki Kabushiki Kaisha Pulslaservorrichtung
JP2738990B2 (ja) * 1991-05-27 1998-04-08 三菱電機株式会社 パルスレーザ装置
JPH07105548B2 (ja) * 1992-09-08 1995-11-13 株式会社日立製作所 放電励起エキシマレーザ発振装置
US5309462A (en) * 1993-02-17 1994-05-03 National Research Council Of Canada Magnetic spiker gas laser excitation circuit
JP3815578B2 (ja) * 1996-07-19 2006-08-30 忠弘 大見 エキシマレーザー発振装置
US5835520A (en) * 1997-04-23 1998-11-10 Cymer, Inc. Very narrow band KrF laser
US5936988A (en) * 1997-12-15 1999-08-10 Cymer, Inc. High pulse rate pulse power system
US5856991A (en) 1997-06-04 1999-01-05 Cymer, Inc. Very narrow band laser
JP3734204B2 (ja) * 1998-04-01 2006-01-11 株式会社小松製作所 パルスレーザの発光タイミング制御装置
US6269110B1 (en) * 1998-10-05 2001-07-31 Lambda Physik Ag Internal wavelength calibration for tunable ArF-excimer laser using atomic carbon and molecular oxygen absorption lines
US6188144B1 (en) * 1998-11-11 2001-02-13 Komatsu Ltd Power supply unit for pulsed laser using magnetic switch
JP3552979B2 (ja) 1999-09-16 2004-08-11 ウシオ電機株式会社 ＡｒＦエキシマレーザ装置
JP3296430B2 (ja) 1999-10-08 2002-07-02 株式会社ウシオ総合技術研究所 露光用ＡｒＦエキシマレーザ装置
JP3427889B2 (ja) 1999-12-21 2003-07-22 ウシオ電機株式会社 ＡｒＦエキシマレーザ装置及びフッ素レーザ装置
JP3755577B2 (ja) * 2000-10-10 2006-03-15 ウシオ電機株式会社 露光用ＡｒＦ、ＫｒＦエキシマレーザ装置及びフッ素レーザ装置

Also Published As

Publication number Publication date
US6754247B2 (en) 2004-06-22
EP1137132A2 (de) 2001-09-26
EP1137132B1 (de) 2011-04-20
KR20010092364A (ko) 2001-10-24
JP3775469B2 (ja) 2006-05-17
JP2001267666A (ja) 2001-09-28
EP1137132A3 (de) 2003-11-26
US20010022799A1 (en) 2001-09-20

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