DE60015631D1 - Besonders stabiler Excimer- oder molekularer Fluor-Laser - Google Patents
Besonders stabiler Excimer- oder molekularer Fluor-LaserInfo
- Publication number
- DE60015631D1 DE60015631D1 DE60015631T DE60015631T DE60015631D1 DE 60015631 D1 DE60015631 D1 DE 60015631D1 DE 60015631 T DE60015631 T DE 60015631T DE 60015631 T DE60015631 T DE 60015631T DE 60015631 D1 DE60015631 D1 DE 60015631D1
- Authority
- DE
- Germany
- Prior art keywords
- particularly stable
- molecular fluorine
- fluorine laser
- stable excimer
- excimer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70025—Production of exposure light, i.e. light sources by lasers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
- H01S3/134—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US124785 | 1993-09-22 | ||
US12478599P | 1999-03-17 | 1999-03-17 | |
US12706299P | 1999-03-31 | 1999-03-31 | |
US127062 | 1999-03-31 | ||
US484818 | 2000-01-18 | ||
US09/484,818 US6243405B1 (en) | 1999-03-17 | 2000-01-18 | Very stable excimer or molecular fluorine laser |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60015631D1 true DE60015631D1 (de) | 2004-12-16 |
DE60015631T2 DE60015631T2 (de) | 2005-03-17 |
Family
ID=27383160
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60015631T Expired - Lifetime DE60015631T2 (de) | 1999-03-17 | 2000-03-10 | Besonders stabiler Excimer- oder molekularer Fluor-Laser |
Country Status (4)
Country | Link |
---|---|
US (1) | US6243405B1 (de) |
EP (1) | EP1037339B1 (de) |
JP (1) | JP2000286495A (de) |
DE (1) | DE60015631T2 (de) |
Families Citing this family (41)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6529531B1 (en) * | 1997-07-22 | 2003-03-04 | Cymer, Inc. | Fast wavelength correction technique for a laser |
US6757316B2 (en) * | 1999-12-27 | 2004-06-29 | Cymer, Inc. | Four KHz gas discharge laser |
US6393037B1 (en) * | 1999-02-03 | 2002-05-21 | Lambda Physik Ag | Wavelength selector for laser with adjustable angular dispersion |
US6345065B1 (en) * | 1998-06-04 | 2002-02-05 | Lambda Physik Ag | F2-laser with line selection |
US6389052B2 (en) * | 1999-03-17 | 2002-05-14 | Lambda Physik Ag | Laser gas replenishment method |
US6965624B2 (en) * | 1999-03-17 | 2005-11-15 | Lambda Physik Ag | Laser gas replenishment method |
US6678291B2 (en) * | 1999-12-15 | 2004-01-13 | Lambda Physik Ag | Molecular fluorine laser |
US6327290B1 (en) * | 1999-02-12 | 2001-12-04 | Lambda Physik Ag | Beam delivery system for molecular fluorine (F2) laser |
US6700915B2 (en) | 1999-03-12 | 2004-03-02 | Lambda Physik Ag | Narrow band excimer laser with a resonator containing an optical element for making wavefront corrections |
US6795474B2 (en) * | 2000-11-17 | 2004-09-21 | Cymer, Inc. | Gas discharge laser with improved beam path |
JP3444350B2 (ja) * | 1999-11-17 | 2003-09-08 | ウシオ電機株式会社 | エキシマレーザ装置 |
US6735232B2 (en) * | 2000-01-27 | 2004-05-11 | Lambda Physik Ag | Laser with versatile output energy |
US6570901B2 (en) * | 2000-02-24 | 2003-05-27 | Lambda Physik Ag | Excimer or molecular fluorine laser having lengthened electrodes |
US6392743B1 (en) * | 2000-02-29 | 2002-05-21 | Cymer, Inc. | Control technique for microlithography lasers |
WO2001084678A2 (en) | 2000-04-18 | 2001-11-08 | Lambda Physik Ag | Stabilization technique for high repetition rate gas discharge lasers |
US6862307B2 (en) * | 2000-05-15 | 2005-03-01 | Lambda Physik Ag | Electrical excitation circuit for a pulsed gas laser |
DE10024079A1 (de) * | 2000-05-17 | 2001-11-22 | Asclepion Meditec Ag | Verfahren und Vorrichtung zur Kontrolle der Energie und/oder Position eines gepulsten und gescannten Laserstrahles |
US6603789B1 (en) | 2000-07-05 | 2003-08-05 | Lambda Physik Ag | Narrow band excimer or molecular fluorine laser with improved beam parameters |
US6721345B2 (en) | 2000-07-14 | 2004-04-13 | Lambda Physik Ag | Electrostatic precipitator corona discharge ignition voltage probe for gas status detection and control system for gas discharge lasers |
US6807205B1 (en) | 2000-07-14 | 2004-10-19 | Lambda Physik Ag | Precise monitor etalon calibration technique |
US6801561B2 (en) | 2000-09-25 | 2004-10-05 | Lambda Physik Ag | Laser system and method for spectral narrowing through wavefront correction |
US6747741B1 (en) | 2000-10-12 | 2004-06-08 | Lambda Physik Ag | Multiple-pass interferometric device |
US6839372B2 (en) * | 2000-11-17 | 2005-01-04 | Cymer, Inc. | Gas discharge ultraviolet laser with enclosed beam path with added oxidizer |
JP2002198590A (ja) * | 2000-12-27 | 2002-07-12 | Gigaphoton Inc | フッ素分子レーザ装置、及びフッ素露光装置 |
JP2002223020A (ja) * | 2001-01-26 | 2002-08-09 | Gigaphoton Inc | フッ素分子レーザ装置、及びフッ素露光装置 |
US20050100072A1 (en) * | 2001-11-14 | 2005-05-12 | Rao Rajasekhar M. | High power laser output beam energy density reduction |
JP4033333B2 (ja) * | 2002-02-21 | 2008-01-16 | ギガフォトン株式会社 | ガスレーザ装置及びガスレーザ装置のフッ素濃度制御方法 |
DE10251435B3 (de) * | 2002-10-30 | 2004-05-27 | Xtreme Technologies Gmbh | Strahlungsquelle zur Erzeugung von extrem ultravioletter Strahlung |
US7741639B2 (en) * | 2003-01-31 | 2010-06-22 | Cymer, Inc. | Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control |
US7088450B2 (en) * | 2003-04-03 | 2006-08-08 | Coherent, Inc. | Method and apparatus for measuring amplified stimulated emission in the output of a master oscillator power amplifier system |
US7085296B2 (en) * | 2003-12-05 | 2006-08-01 | Branson Ultrasonics Corporation | Dual parameter laser optical feedback |
US20050286599A1 (en) * | 2004-06-29 | 2005-12-29 | Rafac Robert J | Method and apparatus for gas discharge laser output light coherency reduction |
US8379687B2 (en) | 2005-06-30 | 2013-02-19 | Cymer, Inc. | Gas discharge laser line narrowing module |
US7321607B2 (en) * | 2005-11-01 | 2008-01-22 | Cymer, Inc. | External optics and chamber support system |
US8476552B2 (en) * | 2008-03-31 | 2013-07-02 | Electro Scientific Industries, Inc. | Laser systems and methods using triangular-shaped tailored laser pulses for selected target classes |
US8598490B2 (en) | 2008-03-31 | 2013-12-03 | Electro Scientific Industries, Inc. | Methods and systems for laser processing a workpiece using a plurality of tailored laser pulse shapes |
US8526473B2 (en) * | 2008-03-31 | 2013-09-03 | Electro Scientific Industries | Methods and systems for dynamically generating tailored laser pulses |
DE102009021238A1 (de) * | 2009-05-14 | 2010-11-18 | Siemens Aktiengesellschaft | Verfahren zur Identifizierung von Verschmutzung und /oder Betauung von Bauelementen eines Spannungszwischenkreis-Umrichters |
JP5500197B2 (ja) * | 2012-03-29 | 2014-05-21 | ウシオ電機株式会社 | レーザリフトオフ方法およびレーザリフトオフ装置 |
CN111819741A (zh) | 2018-03-12 | 2020-10-23 | Asml荷兰有限公司 | 控制系统和方法 |
CN113783100B (zh) * | 2021-05-31 | 2023-04-11 | 北京科益虹源光电技术有限公司 | 激光器的能量补偿方法及装置 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4977573A (en) * | 1989-03-09 | 1990-12-11 | Questek, Inc. | Excimer laser output control device |
US5143659A (en) * | 1989-10-04 | 1992-09-01 | Eastman Kodak Company | Method and apparatus for manufacturing aspherically shaped small lenses |
GB8927209D0 (en) * | 1989-12-01 | 1990-01-31 | British Aerospace | Apparatus for controlling the composition of a laser gas or gas mixture |
US5103454A (en) * | 1991-03-07 | 1992-04-07 | Lumonics Inc. | Light beam attenuation |
US5440578B1 (en) * | 1993-07-16 | 2000-10-24 | Cymer Inc | Gas replenishment method ad apparatus for excimer lasers |
JP2816813B2 (ja) * | 1994-04-12 | 1998-10-27 | 株式会社小松製作所 | エキシマレーザ装置 |
US5978406A (en) * | 1998-01-30 | 1999-11-02 | Cymer, Inc. | Fluorine control system for excimer lasers |
US6157662A (en) * | 1999-02-12 | 2000-12-05 | Lambda Physik Gmbh | F2 (157nm) laser employing neon as the buffer gas |
-
2000
- 2000-01-18 US US09/484,818 patent/US6243405B1/en not_active Expired - Lifetime
- 2000-03-10 EP EP00105119A patent/EP1037339B1/de not_active Expired - Lifetime
- 2000-03-10 DE DE60015631T patent/DE60015631T2/de not_active Expired - Lifetime
- 2000-03-16 JP JP2000073277A patent/JP2000286495A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
EP1037339A3 (de) | 2001-04-25 |
DE60015631T2 (de) | 2005-03-17 |
EP1037339B1 (de) | 2004-11-10 |
JP2000286495A (ja) | 2000-10-13 |
EP1037339A2 (de) | 2000-09-20 |
US6243405B1 (en) | 2001-06-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |