DE60133838D1 - Verfahren zur temperaturgesteuerten dampfabscheidung auf einem substrat - Google Patents

Verfahren zur temperaturgesteuerten dampfabscheidung auf einem substrat

Info

Publication number
DE60133838D1
DE60133838D1 DE60133838T DE60133838T DE60133838D1 DE 60133838 D1 DE60133838 D1 DE 60133838D1 DE 60133838 T DE60133838 T DE 60133838T DE 60133838 T DE60133838 T DE 60133838T DE 60133838 D1 DE60133838 D1 DE 60133838D1
Authority
DE
Germany
Prior art keywords
substrate
vapor deposition
layer
temperature controlled
steam separation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60133838T
Other languages
English (en)
Other versions
DE60133838T2 (de
Inventor
Dina Katsir
Zvi Finkelstein
Israel Tartakovsky
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Acktar Ltd
Original Assignee
Acktar Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Acktar Ltd filed Critical Acktar Ltd
Publication of DE60133838D1 publication Critical patent/DE60133838D1/de
Application granted granted Critical
Publication of DE60133838T2 publication Critical patent/DE60133838T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/541Heating or cooling of the substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
DE60133838T 2000-04-09 2001-04-05 Verfahren zur temperaturgesteuerten dampfabscheidung auf einem substrat Expired - Lifetime DE60133838T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IL13555000A IL135550A0 (en) 2000-04-09 2000-04-09 Method and apparatus for temperature controlled vapor deposition on a substrate
PCT/IL2001/000326 WO2001076768A1 (en) 2000-04-09 2001-04-05 Method and apparatus for temperature controlled vapor deposition on a substrate

Publications (2)

Publication Number Publication Date
DE60133838D1 true DE60133838D1 (de) 2008-06-12
DE60133838T2 DE60133838T2 (de) 2009-06-10

Family

ID=11074035

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60133838T Expired - Lifetime DE60133838T2 (de) 2000-04-09 2001-04-05 Verfahren zur temperaturgesteuerten dampfabscheidung auf einem substrat

Country Status (7)

Country Link
EP (1) EP1390157B1 (de)
JP (1) JP4439156B2 (de)
AT (1) ATE393840T1 (de)
AU (1) AU2001250604A1 (de)
DE (1) DE60133838T2 (de)
IL (1) IL135550A0 (de)
WO (1) WO2001076768A1 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2418628B (en) 2004-10-01 2006-12-13 Acktar Ltd Improved laminates and the manufacture thereof
JP4747658B2 (ja) * 2005-04-22 2011-08-17 大日本印刷株式会社 成膜装置及び成膜方法
JP4747665B2 (ja) * 2005-05-11 2011-08-17 大日本印刷株式会社 成膜装置及び成膜方法
WO2007014924A1 (en) 2005-07-29 2007-02-08 Tibotec Pharmaceuticals Ltd. Macrocyclic inhibitors of hepatitis c virus
CN101965640A (zh) * 2008-03-04 2011-02-02 索莱克山特公司 太阳能电池的制造方法
JP5528727B2 (ja) * 2009-06-19 2014-06-25 富士フイルム株式会社 薄膜トランジスタ製造装置、酸化物半導体薄膜の製造方法、薄膜トランジスタの製造方法、酸化物半導体薄膜、薄膜トランジスタ及び発光デバイス
JP5278218B2 (ja) * 2009-07-15 2013-09-04 住友金属鉱山株式会社 長尺樹脂フィルム処理装置およびロール冷却装置と、ロール冷却方法および長尺樹脂フィルムとロールの冷却方法
JP5959099B2 (ja) * 2011-07-29 2016-08-02 日東電工株式会社 積層体の製造方法
CN103628046B (zh) * 2012-08-24 2015-11-11 中微半导体设备(上海)有限公司 一种调节基片表面温度的控温系统和控温方法
US10821240B2 (en) 2014-02-11 2020-11-03 Vapor Cartridge Technology Llc Methods and drug delivery devices using cannabis
US9220294B2 (en) 2014-02-11 2015-12-29 Timothy McCullough Methods and devices using cannabis vapors
US9380813B2 (en) * 2014-02-11 2016-07-05 Timothy McCullough Drug delivery system and method
US20220115185A1 (en) * 2019-02-20 2022-04-14 Panasonic Intellectual Property Management Co., Ltd. Film production method, film production device, and electrode foil production method
CA3154135A1 (en) 2019-09-16 2021-03-25 Vapor Cartridge Technology Llc Drug delivery system with stackable substrates

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59173266A (ja) * 1983-03-23 1984-10-01 Fuji Photo Film Co Ltd 薄膜形成装置
EP0344316B1 (de) * 1987-07-30 1994-11-02 Matsushita Electric Industrial Co., Ltd. Verfahren zur herstellung eines elektrolytischen kondensators
US4844009A (en) * 1987-11-28 1989-07-04 Leybold Aktiengesellschaft Apparatus for coating webs of material having an open structure in depth
WO1989010430A1 (en) * 1988-04-27 1989-11-02 American Thin Film Laboratories, Inc. Vacuum coating system
US5239026A (en) * 1991-08-26 1993-08-24 Minnesota Mining And Manufacturing Company Low loss high numerical aperture cladded optical fibers
US5803976A (en) * 1993-11-09 1998-09-08 Imperial Chemical Industries Plc Vacuum web coating
TW289900B (de) * 1994-04-22 1996-11-01 Gould Electronics Inc
TW359688B (en) * 1995-02-28 1999-06-01 Nisshin Steel Co Ltd High anticorrosion Zn-Mg series-plated steel sheet and method of manufacture it
DE69636627T2 (de) * 1995-08-04 2007-08-30 Ngimat Co. Chemischen gasphasenabscheidung und pulverbildung mittels einer thermischen spritzmethode aus beinahe superkitischen und superkritischen flussigkeitlösungen

Also Published As

Publication number Publication date
JP2005537385A (ja) 2005-12-08
EP1390157B1 (de) 2008-04-30
ATE393840T1 (de) 2008-05-15
EP1390157A1 (de) 2004-02-25
AU2001250604A1 (en) 2001-10-23
EP1390157A4 (de) 2006-06-07
IL135550A0 (en) 2001-05-20
JP4439156B2 (ja) 2010-03-24
WO2001076768A1 (en) 2001-10-18
DE60133838T2 (de) 2009-06-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition