DE60129377T2 - Lithographischer Projektionsapparat mit einer Stützanordnung - Google Patents

Lithographischer Projektionsapparat mit einer Stützanordnung Download PDF

Info

Publication number
DE60129377T2
DE60129377T2 DE60129377T DE60129377T DE60129377T2 DE 60129377 T2 DE60129377 T2 DE 60129377T2 DE 60129377 T DE60129377 T DE 60129377T DE 60129377 T DE60129377 T DE 60129377T DE 60129377 T2 DE60129377 T2 DE 60129377T2
Authority
DE
Germany
Prior art keywords
gas
pressure chamber
movable element
mask
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60129377T
Other languages
German (de)
English (en)
Other versions
DE60129377D1 (de
Inventor
Martinus Agnes Willem Cuijpers
Frank Auer
Robertus Nicodemus Jacobus Van Ballegoij
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE60129377D1 publication Critical patent/DE60129377D1/de
Application granted granted Critical
Publication of DE60129377T2 publication Critical patent/DE60129377T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • F16F15/023—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means
    • F16F15/027—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means comprising control arrangements
    • F16F15/0275—Control of stiffness
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Acoustics & Sound (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Magnetic Bearings And Hydrostatic Bearings (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
DE60129377T 2000-06-02 2001-05-30 Lithographischer Projektionsapparat mit einer Stützanordnung Expired - Lifetime DE60129377T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP00304713 2000-06-02
EP00304713 2000-06-02

Publications (2)

Publication Number Publication Date
DE60129377D1 DE60129377D1 (de) 2007-08-30
DE60129377T2 true DE60129377T2 (de) 2008-03-20

Family

ID=8173041

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60129377T Expired - Lifetime DE60129377T2 (de) 2000-06-02 2001-05-30 Lithographischer Projektionsapparat mit einer Stützanordnung

Country Status (4)

Country Link
US (1) US6473161B2 (https=)
JP (2) JP4028969B2 (https=)
KR (1) KR100592576B1 (https=)
DE (1) DE60129377T2 (https=)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6756751B2 (en) * 2002-02-15 2004-06-29 Active Precision, Inc. Multiple degree of freedom substrate manipulator
KR100588121B1 (ko) * 2002-03-01 2006-06-09 에이에스엠엘 네델란즈 비.브이. 마스크 또는 기판 이송방법, 상기 방법에 적합한저장박스, 디바이스 또는 장치 및 상기 방법을 포함하는디바이스제조방법
JP3746242B2 (ja) 2002-03-08 2006-02-15 ファナック株式会社 層流空気静圧軸受
JP2004063653A (ja) * 2002-07-26 2004-02-26 Nikon Corp 防振装置、ステージ装置及び露光装置
JP4175086B2 (ja) * 2002-10-29 2008-11-05 日本電気株式会社 検査用ウエハ支持装置及び検査用ウエハ支持方法
KR20060109430A (ko) * 2003-11-17 2006-10-20 가부시키가이샤 니콘 스테이지 구동 방법, 스테이지 장치, 및 노광장치
EP1737024A4 (en) * 2004-03-25 2008-10-15 Nikon Corp Exposure equipment, exposure method and device manufacturing method
WO2005096101A1 (ja) * 2004-03-30 2005-10-13 Pioneer Corporation 露光装置
US20080013060A1 (en) * 2004-07-23 2008-01-17 Nikon Corporation Support Apparatus, Stage Apparatus, Exposure Apparatus, And Device Manufacturing Method
US7462958B2 (en) * 2004-09-21 2008-12-09 Nikon Corporation Z actuator with anti-gravity
US20060061218A1 (en) * 2004-09-21 2006-03-23 Nikon Corporation Dual force wafer table
US7869000B2 (en) * 2004-11-02 2011-01-11 Nikon Corporation Stage assembly with lightweight fine stage and low transmissibility
US7417714B2 (en) * 2004-11-02 2008-08-26 Nikon Corporation Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage
JP4626753B2 (ja) * 2005-02-15 2011-02-09 株式会社ニコン ステージ装置及び露光装置
US7424846B2 (en) * 2005-04-18 2008-09-16 Nippei Toyama Corporation Pneumatically static balancer for machine tool
US7730746B1 (en) * 2005-07-14 2010-06-08 Imaging Systems Technology Apparatus to prepare discrete hollow microsphere droplets
US20070030462A1 (en) * 2005-08-03 2007-02-08 Nikon Corporation Low spring constant, pneumatic suspension with vacuum chamber, air bearing, active force compensation, and sectioned vacuum chambers
US7466396B2 (en) * 2005-10-13 2008-12-16 Nikon Corporation Lithography apparatus and method utilizing pendulum interferometer system
US20070236854A1 (en) * 2006-04-11 2007-10-11 Lee Martin E Anti-Gravity Device for Supporting Weight and Reducing Transmissibility
CN102193325B (zh) * 2010-03-19 2013-04-10 上海微电子装备有限公司 主动隔震装置的控制系统
CN102486215B (zh) * 2010-12-02 2014-02-19 上海微电子装备有限公司 一种重力补偿装置
JP5994298B2 (ja) * 2012-03-09 2016-09-21 日本精工株式会社 移動テーブル装置
WO2014004873A1 (en) * 2012-06-29 2014-01-03 Rudolph Technologies Inc. Flying sensor head
JP5541398B1 (ja) 2013-07-02 2014-07-09 日本精工株式会社 テーブル装置、及び搬送装置
KR102075686B1 (ko) * 2018-06-11 2020-02-11 세메스 주식회사 카메라 자세 추정 방법 및 기판 처리 장치

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6050921A (ja) * 1983-08-31 1985-03-22 Hitachi Ltd 上下駆動装置
US4818838A (en) * 1988-01-11 1989-04-04 The Perkin-Elmer Corporation Apparatus for preselecting and maintaining a fixed gap between a workpiece and a vacuum seal apparatus in particle beam lithography systems
JPH01181522A (ja) * 1988-01-12 1989-07-19 Sumitomo Heavy Ind Ltd 半導体素子製造用ｘ線露光装置
JPH0517876Y2 (https=) * 1988-01-22 1993-05-13
US5874820A (en) * 1995-04-04 1999-02-23 Nikon Corporation Window frame-guided stage mechanism
US6246204B1 (en) * 1994-06-27 2001-06-12 Nikon Corporation Electromagnetic alignment and scanning apparatus
US5959732A (en) * 1996-04-10 1999-09-28 Nikon Corporation Stage apparatus and a stage control method
WO1999005573A1 (en) * 1997-07-22 1999-02-04 Asm Lithography B.V. Supporting device with gas bearing
JPH11297616A (ja) * 1998-04-09 1999-10-29 Canon Inc ステージ装置およびこれを用いた露光装置ならびにデバイス製造方法
TWI242113B (en) * 1998-07-17 2005-10-21 Asml Netherlands Bv Positioning device and lithographic projection apparatus comprising such a device
JP4314648B2 (ja) * 1998-08-13 2009-08-19 株式会社ニコン ステージ装置およびそれを備えた光学装置
US6351041B1 (en) * 1999-07-29 2002-02-26 Nikon Corporation Stage apparatus and inspection apparatus having stage apparatus

Also Published As

Publication number Publication date
JP4028969B2 (ja) 2008-01-09
JP2007134729A (ja) 2007-05-31
US20020005939A1 (en) 2002-01-17
JP2002057102A (ja) 2002-02-22
JP4512081B2 (ja) 2010-07-28
DE60129377D1 (de) 2007-08-30
KR100592576B1 (ko) 2006-06-26
KR20010110130A (ko) 2001-12-12
US6473161B2 (en) 2002-10-29

Similar Documents

Publication Publication Date Title
DE60129377T2 (de) Lithographischer Projektionsapparat mit einer Stützanordnung
DE60132944T2 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE60033773T2 (de) Lithographischer Apparat mit einem ausbalancierten Positionierungssystem
DE69629087T2 (de) Positionierungsgerät mit einem referenzrahmen für ein messsystem
DE69930398T2 (de) Belichtungssystem mit einem parallelen Verbindungsmechanismus und Belichtungsverfahren
DE60036771T2 (de) Lithographischer Apparat mit einem ausbalancierten Positionierungssystem
DE602004010961T2 (de) Lithographischer Apparat
DE60223102T2 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE60036844T2 (de) Lithographischer Apparat mit einer Maskenklemmvorrichtung
DE60308161T2 (de) Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
US6337484B1 (en) Positioning device and lithographic projection apparatus comprising such a device
DE60119421T2 (de) Lithographisches Gerät und Maskenträger
DE69702601T2 (de) Zweidimensionale balancierte positioniervorrichtung und mit dieser positioniervorrichtung ausgerüstete lithographische vorrichtung
DE60035567T2 (de) Lithographischer Projektionsapparat mit System zur Positionierung eines Reflektors
DE60221180T2 (de) Lithographischer Apparat
DE60310498T2 (de) Verfahren zur Reinigung durch Entfernung von Teilchen von Oberflächen, Reinigungsvorrichtung und lithographischer Projektionsapparat
EP1160628A2 (en) Supporting assembly for lithographic projection apparatus
DE60302388T2 (de) Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
KR20160137693A (ko) 노광 장치 및 디바이스 제조방법
DE602005001835T2 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE60120825T2 (de) Lithographischer Apparat, Verfahren zur Herstellung einer Vorrichtung, sowie durch dieses Verfahren hergestellte Vorrichtung
DE69930088T2 (de) Projektionslithographie mit Servosteuerung
DE602005003082T2 (de) Verfahren zur Herstellung einer Vorrichtung
EP0973067A2 (en) Positioning device and lithographic projection apparatus comprising such a device
DE60218414T2 (de) Verfahren zur Herstellung eines Artikels, dabei hergestellter Artikel und lithographischer Apparat dafür

Legal Events

Date Code Title Description
8364 No opposition during term of opposition